• 제목/요약/키워드: low doping

검색결과 507건 처리시간 0.025초

CeO$_2$ 도핑에 의한 불규칙 입자형상의 이트리아 안정화 지르코니아 제조 (Preparation of Yttria-stabilized Zirconia with Irregular Grain Shapes by Ceria Doping)

  • 이종국;강현희;김영정;김환
    • 한국세라믹학회지
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    • 제35권12호
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    • pp.1294-1300
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    • 1998
  • Yttria-stabilized zirconia ceramics with irregular grain shapes and curved grain boundaries was prepared by ceria doping. The amount of ceria doped into zirconia compacts by a dipping method were at range of 2 to 20 mol% Irregular grain shapes and curved grain boundaries were formed only inspecimens doped with more than 8mol% cerial. Ceria-doped specimens showed large grain size and low sintered density compared with pure yttria-stabilized zirconia which was due to the increase in the contents of stabilizer and cubic phase. The amount of doped ceria was larger on the surface than the inside regions and therefore mi-crostructure and phase on the surface were different from those in the inside regions. Transgranular frac-ture mode was observed ion ceria doped specimens due to irregular large grain sizes.

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박형 결정질 실리콘 태양전지 제작을 위한 웨이퍼 두께에 따른 특성 연구 (Characteristics of doping process with various wafer thicknesses for thin crystalline silicon solar cell application)

  • 정경택;이희준;송희은;유권종;양오봉
    • 한국태양에너지학회:학술대회논문집
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    • 한국태양에너지학회 2011년도 춘계학술발표대회 논문집
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    • pp.101-104
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    • 2011
  • Many studies in crystalline silicon solar cell fabrication have been focused on high efficiency and low cost. In this paper, we carried out the doping procedure by varying the silicon wafer thicknesses and sheet resistance. The silicon wafers with various thicknesses were obtained by shiny etching and texturing. The thicknesses of wafers were 100, 120, 150, and $180{\mu}m$. The emitter layer formed by $POCl_3$ doping process had sheet resistance with 40 and $80{\Omega}/sq$ for selective emitter application. This experiment indicated wafer thickness did not influence sheet resistance but lifetime was strongly effected.

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전기방사방법에 의해 합성된 ZnO 중공 나노섬유의 trimethylamine 가스 감응 특성 (Trimethylamine Sensing Characteristics of Molybdenum doped ZnO Hollow Nanofibers Prepared by Electrospinning)

  • 김보영;윤지욱;이철순;박준식;이종흔
    • 센서학회지
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    • 제24권6호
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    • pp.419-422
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    • 2015
  • Pure and Mo-doped ZnO hollow nanofibers were prepared by single capillary electrospinning and their gas sensing characteristics toward 5 ppm ethanol, trimethylamine (TMA), CO and $H_2$ were investigated. The gas responses and responding kinetics were dependent upon sensing temperature and Mo doping. Mo-doped ZnO hollow nanofibers showed high response to 5 ppm TMA ($R_a/R_g=111.7$, $R_a$: resistance in air, $R_g$: resistance in gas) at $400^{\circ}C$, while the responses of pure ZnO hollow nanofibers was low ($R_a/R_g=47.1$). In addition, the doping of Mo enhanced selectivity toward TMA. The enhancement of gas response and selectivity to TMA by Mo doping to ZnO nanofibers was discussed in relation to the interaction between basic analyte gas and acidic additive materials.

Enhancement of NOx photo-oxidation by Fe-doped TiO2 nanoparticles

  • Martinez-Oviedo, Adriana;Ray, Schindra Kumar;Gyawali, Gobinda;Rodriguez-Gonzalez, Vicente;Lee, Soo Wohn
    • Journal of Ceramic Processing Research
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    • 제20권3호
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    • pp.222-230
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    • 2019
  • Microwave hydrothermal-assisted sol-gel method was employed to synthesize the Fe doped TiO2 photocatalyst. The morphological analysis suggests anatase phase nanoparticles of ~20 nm with an SBET area of 283.99 ㎡/g. The doping of Fe ions in TiO2 created oxygen vacancies and Ti3+ species as revealed through the XPS analysis. The reduction of the band gap (3.1 to 2.8 eV) is occurred by doping effect. The as-prepared photocatalyst was applied for removal of NOx under solar light irradiation. The doping of Fe in TiO2 facilitates 75 % of NOx oxidation efficiency which is more than two-fold enhancement than the TiO2 photocatalyst. The possible reason of enhancement is associated with high surface area, oxygen vacancy, and reduction of the band gap. Also, the low production of toxic intermediates, NO2 gas, is further confirmed by Combustion Ion Chromatography. The mechanism related NOx oxidation by the doped photocatalyst is explained in this study.

p 형 반도체 층의 Mg 델타 도핑을 이용한 센서 광원 용 LED의 성능 향상 (Improvement of the LED Performance Using Mg Delta-doing in p Type Cladding Layer for Sensor Application)

  • 김유경;이승섭;전주호;김만경;장수환
    • 센서학회지
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    • 제31권1호
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    • pp.31-35
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    • 2022
  • The efficacy improvement of the light emitting diode (LED) was studied for the realization of small-size, low power consumption, and highly sensitive bio-sensor instrument. The performance of the LED with Mg delta-doping at the interface of AlGaN/GaN super-lattice in p type cladding layer was simulated. The device with Mg delta-doping showed improved current, radiative recombination rate, electroluminescence, and light output power compared to the conventional LED structure. Under the bias condition of 5 V, the improved device exhibited 20.8% increase in the light output power. This is attributed to the increment of hole concentration from stable ionization of Mg in p type cladding layer. This result is expected to be used for the miniaturization, power saving, and sensitivity improvement of the bio-sensor system.

CHARACTERISTICS OF THE HETEROEPITAXIAL Si1-xGex FILMS GROWN BY RTCVD METHOD

  • Chung, W.J.;Kwon, Y.K.;Bae, Y.H.;Kim, K.I.;Kang, B.K.;Sohn, B.K.
    • 한국진공학회지
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    • 제4권S2호
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    • pp.84-89
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    • 1995
  • The growth and the film characteristics of heteroepitaxial $Si_{1-x}Ge_x$ films growth by the Rapid Thermal Chemical Vapor Deposition(RTCVD)method are described. For the growth of $Si_{1-x}Ge_x$ heteroepitaxial layers, $SiH_4/GeH_4/H_2$gas mixtures are used. The growth conditions are varied to investigate their effects on the Si/Ge composition ratios, the interface abruptness and crystalline properties. The Si/Ge composition ratios are analyzed with the RBS and the SIMS techniques, and the interface abruptness are deduced from these data. The crystalline properties are analyzed from TEM pictures. The experimental data shows that the crystalline perfection is excellent at the growth temperature of as low as $650^{\circ}C$, and the composition ratios change linearly with $SiH_4/GeT_$$ gas mixing ratios in our experimental ranges. Boron doping experiments are also performed using 200 ppm $B_2H_6$ source gas. The doping profiles are measured with SIMS technique. The SIMS data shows that the doping abruptness can be controlled within about 200$\AA$/decade.

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고저 접합 에미터 구조를 갖는 $N^+NPP^+$ Si 태양전지의 효율 개선 (Efficiency Improvement of $N^+NPP^+$ Si Solar Cell with High Low Junction Emitter Structure)

  • 장지근;김봉렬
    • 대한전자공학회논문지
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    • 제21권1호
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    • pp.62-70
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    • 1984
  • 비저항이 10Ω-cm, 두께가 13∼15mi1인 <111> oriented, p형 Si기판을 이용하여 N+PP+ BSF 전지와 에미터 영역이 N+N 고저 접합으로 이루어진 N+NPP+ HELEBSF(high low emitter bach surface field) 전지를 설계 제작하였다. 접합형 태양전지의 에미터 영역에서 고저 접합구조가 효율 개선에 미치는 영향을 검토하기 위해 HLEBSF 전지의 N영역을 제외하고는 같은 마스크와 동시 공정을 통해 N+PP-전지와 N+NPP+ 전지의 가영역에서 물리적 파라미터들(불순물 농도, 두께)을 동일하게 만들었다. 100mW/㎠의 인공조명에서 측정한 결과 N+PP+ 전지들의 전면적 (유효 수광면적) 평균 변환효율이 10.94%(12.16%)이었고, N+NPP+ 전지들의 평균 변환효율은 12.07% (13.41%)로 나타났다. N+NPP+ 전지의 효율개선은 N+N-고저 접합 에미터 구조가 N+ 에미터 영역에서 나타나는 heavy doping effects를 제거함으로써 에미터 재결합 전류의 증가를 억제하고 나아가 개방전압(Voc)과 단락전류(Ish)의 값을 증가시켜 준 결과로 볼 수 있다.

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Highly Doped Nano-crystal Embedded Polymorphous Silicon Thin Film Deposited by Using Neutral Beam Assisted CVD at Room Temperature

  • 장진녕;이동혁;소현욱;홍문표
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.154-155
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    • 2012
  • The promise of nano-crystalites (nc) as a technological material, for applications including display backplane, and solar cells, may ultimately depend on tailoring their behavior through doping and crystallinity. Impurities can strongly modify electronic and optical properties of bulk and nc semiconductors. Highly doped dopant also effect structural properties (both grain size, crystal fraction) of nc-Si thin film. As discussed in several literatures, P atoms or radicals have the tendency to reside on the surface of nc. The P-radical segregation on the nano-grain surfaces that called self-purification may reduce the possibility of new nucleation because of the five-coordination of P. In addition, the P doping levels of ${\sim}2{\times}10^{21}\;at/cm^3$ is the solubility limitation of P in Si; the solubility of nc thin film should be smaller. Therefore, the non-activated P tends to segregate on the grain boundaries and the surface of nc. These mechanisms could prevent new nucleation on the existing grain surface. Therefore, most researches shown that highly doped nc-thin film by using conventional PECVD deposition system tended to have low crystallinity, where the formation energy of nucleation should be higher than the nc surface in the intrinsic materials. If the deposition technology that can make highly doped and simultaneously highly crystallized nc at low temperature, it can lead processes of next generation flexible devices. Recently, we are developing a novel CVD technology with a neutral particle beam (NPB) source, named as neutral beam assisted CVD (NBaCVD), which controls the energy of incident neutral particles in the range of 1~300eV in order to enhance the atomic activation and crystalline of thin films at low temperatures. During the formation of the nc-/pm-Si thin films by the NBaCVD with various process conditions, NPB energy directly controlled by the reflector bias and effectively increased crystal fraction (~80%) by uniformly distributed nc grains with 3~10 nm size. In the case of phosphorous doped Si thin films, the doping efficiency also increased as increasing the reflector bias (i.e. increasing NPB energy). At 330V of reflector bias, activation energy of the doped nc-Si thin film reduced as low as 0.001 eV. This means dopants are fully occupied as substitutional site, even though the Si thin film has nano-sized grain structure. And activated dopant concentration is recorded as high as up to 1020 #/$cm^3$ at very low process temperature (< $80^{\circ}C$) process without any post annealing. Theoretical solubility for the higher dopant concentration in Si thin film for order of 1020 #/$cm^3$ can be done only high temperature process or post annealing over $650^{\circ}C$. In general, as decreasing the grain size, the dopant binding energy increases as ratio of 1 of diameter of grain and the dopant hardly be activated. The highly doped nc-Si thin film by low-temperature NBaCVD process had smaller average grain size under 10 nm (measured by GIWAXS, GISAXS and TEM analysis), but achieved very higher activation of phosphorous dopant; NB energy sufficiently transports its energy to doping and crystallization even though without supplying additional thermal energy. TEM image shows that incubation layer does not formed between nc-Si film and SiO2 under later and highly crystallized nc-Si film is constructed with uniformly distributed nano-grains in polymorphous tissues. The nucleation should be start at the first layer on the SiO2 later, but it hardly growth to be cone-shaped micro-size grains. The nc-grain evenly embedded pm-Si thin film can be formatted by competition of the nucleation and the crystal growing, which depend on the NPB energies. In the evaluation of the light soaking degradation of photoconductivity, while conventional intrinsic and n-type doped a-Si thin films appeared typical degradation of photoconductivity, all of the nc-Si thin films processed by the NBaCVD show only a few % of degradation of it. From FTIR and RAMAN spectra, the energetic hydrogen NB atoms passivate nano-grain boundaries during the NBaCVD process because of the high diffusivity and chemical potential of hydrogen atoms.

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스퍼터링 증착한 CdTe 박막의 효과적인 Ag 도핑을 위한 이온 교환법 연구 (A Study on Ion Exchange Method for Effective Ag Doping of Sputtering-Deposited CdTe Thin Film)

  • 김철준;박주선;이우선
    • 전기학회논문지
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    • 제60권6호
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    • pp.1169-1174
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    • 2011
  • CdTe thin-film solar cell technology is well known that it can theoretically improve its conversion efficiency and manufacturing costs compared to the conventional silicon solar cell technology, due to its optical band gap energy (about 1.45eV) for solar energy absorption, high light absorption capability and low cost requirements for producing solar cells. Although the prior studies obtained the high light absorption, CdTe thin film solar cell has not been come up to the sufficient efficiency yet. So, doping method was selected for the improvement of the electrical characteristics in CdTe solar cells. Some elements including Cu, Ag, Cd and Te were generally used for the p-dopant as substitutional acceptors in CdTe thin film. In this study, the sputtering-deposited CdTe thin film was immersed in $AgNO_3$ solution for ion exchange method to dope Ag ions. The effects of immersion temperature and Ag-concentration were investigated on the optical properties and electrical characteristics of CdTe thin film by using Auger electron spectroscopy depth-profile, UV-visible spectrophotometer, and a Hall effect measurement system. The best optical and electrical characteristics were sucessfully obtained by Ag doping at high temperature and concentration. The larger and more uniform diffusion of Ag ions made increase of the Ag ion density in CdTe thin film to decrease the series resistance as well as mede the faster diffusion of light by the metal ions to enhance the light absorption.

Li Ion Diffusivity and Rate Performance of the LiFePO4 Modified by Cr Doping

  • Park, Chang-Kyoo;Park, Sung-Bin;Shin, Ho-Chul;Cho, Won-Il;Jang, Ho
    • Bulletin of the Korean Chemical Society
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    • 제32권1호
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    • pp.191-195
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    • 2011
  • This study reports the root cause of the improved rate performance of $LiFePO_4$ after Cr doping. By measuring the chemical diffusion coefficient of lithium ($D_{Li}$) using cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS), the correlation between the electrochemical performance of $LiFePO_4$ and Li diffusion is acquired. The diffusion constants for $LiFePO_4$/C and $LiFe_{0.97}Cr_{0.03}PO_4$/C measured from CV are $2.48{\times}10^{-15}$ and $4.02{\times}10^{-15}cm^2s^{-1}$, respectively, indicating significant increases in diffusivity after the modification. The difference in diffusivity is also confirmed by EIS and the $D_{Li}$ values obtained as a function of the lithium content in the cathode. These results suggest that Cr doping facilitates Li ion diffusion during the charge-discharge cycles. The low diffusivity of the $LiFePO_4$/C leads to the considerable capacity decline at high discharge rates, while high diffusivity of the $LiFe_{0.97}Cr_{0.03}PO_4$/C maintains the initial capacity, even at high C-rates.