• 제목/요약/키워드: low band gap

검색결과 305건 처리시간 0.029초

Large Area Bernal Stacked Bilayer Graphene Grown by Multi Heating Zone Low Pressure Chemical Vapor Deposition

  • Han, Jaehyun;Yeo, Jong-Souk
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.239.2-239.2
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    • 2015
  • Graphene is a most interesting material due to its unique and outstanding properties. However, semi-metallic properties of graphene along with zero bandgap energy structure limit further application to optoelectronic devices. Recently, many researchers have shown that band gap can be induced in the Bernal stacked bilayer graphene. Several methods have been used for the controlled growth of the Bernal staked bilayer graphene, but it is still challenging to control the growth process. In this paper, we synthesize the large area Bernal stacked bilayer graphene using multi heating zone low pressure chemical vapor deposition (LPCVD). The synthesized bilayer graphenes are characterized by Raman spectroscopy, optical microscope (OM), scanning electron microscopy (SEM). High resolution transmission electron microscopy (HRTEM) is used for the observation of atomic resolution image of the graphene layers.

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Excimer Laser-Assisted In Situ Phosphorus Doped $Si_{(1-x)}Ge_x$ Epilayer Activation

  • Bae, Ji-Cheul;Lee, Young-Jae
    • ETRI Journal
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    • 제25권4호
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    • pp.247-252
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    • 2003
  • This paper presents results from experiments on laser-annealed SiGe-selective epitaxial growth (LA-SiGe-SEG). The SiGe-SEG technology is attractive for devices that require a low band gap and high mobility. However, it is difficult to make such devices because the SiGe and the highly doped region in the SiGe layer limit the thermal budget. This results in leakage and transient enhanced diffusion. To solve these problems, we grew in situ doped SiGe SEG film and annealed it on an XMR5121 high power XeCl excimer laser system. We successfully demonstrated this LA-SiGe-SEG technique with highly doped Ge and an ultra shallow junction on p-type Si (100). Analyzing the doping profiles of phosphorus, Ge compositions, surface morphology, and electric characteristics, we confirmed that the LA-SiGe-SEG technology is suitable for fabricating high-speed, low-power devices.

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마이크로스트립 라인 전압제어 가변 대역통과필터 (Microstrip line tunable phase shifter)

  • 채동규;;윤기완;박재영;고영준
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2002년도 춘계종합학술대회
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    • pp.227-229
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    • 2002
  • 본 논문에서는 마이크로스트립 라인 전압제어 가변 대역통과필터를 제안한다. 박막 강유전체의 상대 유전율은 인가 전압에 따라 변하는 특성을 이용하였고, Au/BSTO/MgO/Au 구조로 설계하였다. 커플링 수가 3개인 공진기를 연결하여 공진기 사이의 간격을 잘 조절한 격과, 중심 주파수 16 GHz 에서 1.9 GHz의 튜닝 범위, 800MHz 내의 좁은 대역폭, 3dB 이내의 작은 삽입손실을 갖는 필터를 설계할 수 있었다.

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Inorganic ferroelectric materials for LC alignment for high performance display design

  • 이원규;최지혁;나현재;임지훈;한정민;황정연;서대식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 추계학술대회 논문집
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    • pp.161-161
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    • 2009
  • Ion bombarded inorganic materials for LC alignment has been researched as it provides controllability in a nonstop process for producing high-resolution displays. Many optically transparent insulators such as $SiOx$ and a-C:H have been investigated as potential candidates for inorganic alignment materials. Even so, LC orientation on a new material with superior capacity is required to produce high-performance displays. Many inorganic materials with high permittivities can reduce the voltage losses due to the LC alignment layer that are a trade-off for its capacitance. The minimum voltage for device operation can be applied to the LC under low external voltage using these materials. This means that low power consumption for LCD applications can be achieved using a high-k alignment structure in which the LC can be driven effectively with a low threshold voltage. Among the many other potential high-k oxides, HfO2 is considered to be one of the most promising due to its remarkable properties of high dielectric constant, relatively low leakage current, large band gap (5.68 eV), and high transparency. Due to these characteristics, HfO2 can be used in LC alignment to increase the capacitance of the inorganic alignment layer for low-voltage driving of LCs.

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비정질/마이크로 탠덤 구조형 실리콘 박막 태양전지 ([ $a-Si:H/{\mu}c-Si:H$ ] thin-film tandem solar cells)

  • 이정철;송진수;윤경훈
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2006년도 춘계학술대회
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    • pp.228-231
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    • 2006
  • This paper briefly introduces silicon based thin film solar cells: amorphous (a-Si:H), microcrystalline ${\mu}c-Si:H$ single junction and $a-Si:H/{\mu}c-Si:H$ tandem solar cells. The major difference of a-Si:H and ${\mu}c-Si:H$ cells comes from electro-optical properties of intrinsic Si-films (active layer) that absorb incident photon and generate electron-hole pairs. The a-Si:H film has energy band-gap (Eg) of 1.7-1.8eV and solar cells incorporating this wide Eg a-Si:H material as active layer commonly give high voltage and low current, when illuminated, compared to ${\mu}c-Si:H$ solar cells that employ low Eg (1.1eV) material. This Eg difference of two materials make possible tandem configuration in order to effectively use incident photon energy. The $a-Si:H/{\mu}c-Si:H$ tandem solar cells, therefore, have a great potential for low cost photovoltaic device by its various advantages such as low material cost by thin-film structure on low cost substrate instead of expensive c-Si wafer and high conversion efficiency by tandem structure. In this paper, the structure, process and operation properties of Si-based thin-film solar cells are discussed.

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저전압 SoC용 밴드갭 기준 전압 발생기 회로 설계 (A Bandgap Reference Voltage Generator Design for Low Voltage SoC)

  • 이태영;이재형;김종희;심외용;김태훈;박무훈;하판봉;김영희
    • 한국정보통신학회논문지
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    • 제12권1호
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    • pp.137-142
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    • 2008
  • 본 논문에서는 $Low-V_T$ 트랜지스터가 필요 없는 로직공정으로 Parasitic NPN BJT를 이용하여 저 전압에서 동작 가능한 밴드갭 기준전압 발생기 회로를 제안하였다. $0.18{\mu}m$ triple-well 공정을 사용한 BGR회로를 측정 한 결과 VREF의 평균전압은 0.72V $3{\sigma}$는 45.69mV로 양호하게 측정되었다.

Comparison of Luminescence Properties of Electrochemical Luminescence Cells for Various Electrode Materials and Structures

  • Pooyodying, Pattarapon;Ok, Jung-Woo;Sung, Youl-Moon
    • Journal of Electrical Engineering and Technology
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    • 제12권4호
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    • pp.1605-1610
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    • 2017
  • The electrochemical luminescence (ECL) device was investigated, which has similar structure to the dye-sensitized solar cell. The structure of the ECL cell in this experiment reliably induces a large amount of the oxidation around electrodes. The band gap of the ECL electrode is of 3.0 - 3.2 eV. Titanium dioxide ($TiO_2$) nanoparticle has following properties: a band gap of 3.4 eV, a low-priced material, and 002 preferred orientation (Z-axis). Zinc Oxide (ZnO) nanorod is easy to grow in a vertical direction. In this paper, in order to determine material suitable for the ECL device, the properties of various materials for electrodes of ECL devices such as ZnO nanorod (ZnO-NR) and $TiO_2$ nanoparticle ($TiO_2-NP$) were compared. The threshold voltage of the light emission of the ZnO-NR was 2.0 V which is lower than 2.5 V of $TiO_2-NP$. In the other hand, the luminance of $TiO_2-NP$ was $44.66cd/m^2$ and was higher than that of $34cd/m^2$ of ZnO-NR at the same applied voltage of 4 V. Based on the experimental results, we could conclude that $TiO_2-NP$ is a more suitable electrode material in ECL device than the ZnO-NR.

다양한 반도체-유전체 덮개층 조합을 이용한 InGaAs/InGaAsP 양자우물의 무질서화 (Dielectric cap quantum well disordering for band gap tuning of InGaAs/InGaAsP quantum well structure using various combinations of semiconductor-dielectric capping layers)

  • 조재원;이희택;최원준;우덕하;김선호;강광남
    • 한국진공학회지
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    • 제11권4호
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    • pp.207-211
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    • 2002
  • 반도체-유전체 덮개층의 다양한 조합이 I $n_{0.53}$G $a_{0.47}$As/InGaAsP(Q1.25) 양자우물 무질서화에 미치는 영향을 PL(Photoluminescence)을 이용하여 조사하였다. 청색 편이에 대한 문턱 온도는 약 $750^{\circ}C$ 였으며 전반적으로 온도가 올라감에 따라 청색 편이도 점차 증가하였으나 $SiO_2$의 경우에는 온도가 올라감에 따라 포화되는 경향을 보였다. $SiN_{x}$$SiO_2$보다 더 큰 청색 편이를 야기하였는데 이것은 $SiN_{x}$의 낮은 성장 온도와 관계가 있는 것으로 생각된다. $SiN_{x}$의 경우 P의 확산이, 그리고 $SiO_2$의 경우 Ga의 확산이 청색 편이에 중요한 역할을 하는 것으로 여겨진다.겨진다.

Optical and dielectric properties of nano BaNbO3 prepared by a combustion technique

  • Vidya, S.;Mathai, K.C.;John, Annamma;Solomon, Sam;Joy, K.;Thomas, J.K.
    • Advances in materials Research
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    • 제2권3호
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    • pp.141-153
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    • 2013
  • Nanocrystalline Barium niobate ($BaNbO_3$) has been synthesized by a novel auto-igniting combustion technique. The X-Ray diffraction studies reveals that $BaNbO_3$ posses a cubic structure with lattice constant $a=4.071{\AA}$. Phase purity and structure of the nano powder are further examined using Fourier-Transform Infrared and Raman spectroscopy. The average particle size of the as prepared nano particles from the Transmission Electron Microscopy is 20 nm. The UV-Vis absorption spectra of the samples are recorded and the calculated average optical band gap is 3.74eV. The sample is sintered at an optimized temperature of $1425^{\circ}C$ for 2h and attained nearly 98% of the theoretical density. The morphology of the sintered pellet is studied with Scanning Electron Microscopy. The dielectric constant and loss factor of a well-sintered $BaNbO_3$ at 5MHz sample is found to be 32.92 and $8.09{\times}10^{-4}$ respectively, at room temperature. The temperature coefficient of dielectric constant was $-179pp/^{\circ}C$. The high dielectric constant, low loss and negative temperature coefficient of dielectric constant makes it a potential candidate for temperature sensitive dielectric applications.

ZnO/rutile-$TiO_2$, ZnO, rutile-$TiO_2$, CdS를 이용한 Congo red의 광 촉매 분해반응 (Photocatalytic Degradation of a Congo red Using ZnO/rutile-$TiO_2$, ZnO, rutile-$TiO_2$ and CdS)

  • 김창석;류해일
    • 분석과학
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    • 제14권3호
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    • pp.259-265
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    • 2001
  • ZnO, CdS, rutile-$TiO_2$ 및 혼합 rutile-$TiO_2$/ZnO와 같은 여러 반도체를 이용하여 Congo Red를 광 촉매 분해시켰다. 연구 결과 ZnO, CdS, rutile-$TiO_2$ 중에서는 CdS의 광 촉매 효과가 제일 컸는데 이것은 CdS가 제일 작은 band gap 에너지를 가지고 있기 때문이었다. 또한 혼합 촉매에서는 ZnO의 함량이 rutile-$TiO_2$에 비하여 상대적으로 높을수록 분해 반응을 촉진하였다. 이것은 $Zn^{2+}$ 가수분해 생성물이 구조적으로 안정한 화합물인 rutile-$TiO_2$의 표면을 덮음으로서 자외선 흡수를 차단하기 때문에 라디칼 생성을 저해하기 때문이었다.

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