• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2001.10a
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• pp.186-189
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• 2001

The main method in micro-etching process, used in manufacturing semiconductors, electronic components, circuits, is Photo Masking method that exposes and develops on the photo-sensitivity solutions or films. This method enables one to process highly precisely, $\pm$0.03 mm in end line location area. But this has limits in a high speed / wide width process, difficulties in endless masking, and the problem of high price. We have developed the direct masking method to make use of Gravure printing, widely used in grocery packing sheet printing. We made cylinder tools to influence the masking quality by laser stream process. We have confirmed that the end line location accuracy in the line width of the product is improved from 0.12 mm to $\pm$0.07 mm level, after etching process.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.15 no.6
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• pp.529-534
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• 2002

Recently, As the higher frequency in clock of digital system being demanded and the density of circuits gets high for purpose of making light and minimizing system, the study for solution of digital signal distortion being interested. In this paper, the distortion of square pulse caused by dispersion as it propagates along a single microstrip line and crosstalk between lines on the Multi-Transmission Lines (MTL) is investigated. The dispersion and crosstalk of pulse signals is analyzed regarding to the structure of transmission line such as relative permittivity, substrate height, strip width of the microstrip line and pulse width of signal pulse.

• Proceedings of the Korea Electromagnetic Engineering Society Conference
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• 2005.11a
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• pp.197-202
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• 2005

In this paper, we analyzed the signal distortion incorporating meander-shaped transmission line on PCB in broadband frequency range, up to 50GHz. This broadband characteristic provides reasonable analysis of digital pulse having very short rising time. Simulation results reveal suppression characteristic at multiband which is dependent on only the width of meander arm. This width of arm also can be adjusted using different permittivity because it provides different effective wave-length. It is found that the suppression characteristic shows sharpness with as a function of the number of arms. However, these characteristics shown limitation for microstrip line structure rather than for stripline structure, so we can avoid these unwanted phenomena using stripline structure.

• Proceedings of the KIEE Conference
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• 1987.07b
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• pp.1296-1300
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• 1987

NMR spectrum analysis is performed to obtain the preliminary data for cancer detection. As NMR spectrum of plasma is dominated by the resonances of water, the resonances of plasma lipoprotein lipid is obscured by the water resonance. Thus, we can obtain the signal of plasma lipoprotein lipid using Ultracentrifugation. we analyzed the spectrum measuring the mean line widths of the methyl and methylene resonances for normal control group. As a result, the line width was Hz To obtain a potentially valuable approach to the detection of cancer, the performance of additional clinical trials in larger populations will be made.

• Proceedings of the Korea Electromagnetic Engineering Society Conference
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• 2003.11a
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• pp.376-379
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• 2003

In this raper, proposed easy half-wavelength LPF and acceptor structure in actuality manufacture using EBG (Electromagnatic Bandgap) structure for application of micro-strip circuit. Because conventional half-wavelength LPF and acceptor is narrow line-width of High impedance, actuality manufacture is difficult. Width that in proposed structure narrow microstrip line of High impedance EBG structure use and has equal impedance embodied to wide microstrip line. Also, it is seen that actuality manufacture is available applying to half-wavelength LPF that have cut-off Frequency of 3GHz.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1747-1751
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• 2008

Electrohydrodynamic jet printing (EHDP) technique is widely used for the direct writing. However, in the existing EHDP method, the printing characteristics are affected by the printing substrate used, and the line width of the printed is determined by the geometry of the nozzle. We propose an EHDP method which is capable of (1) removing the effect from the substrate, and (2) controlling the line width through the ON/OFF control of the each nozzle in the nozzle array. Printing characteristics of our EHDP system were examined and successful ON/OFF control of the nozzle array were demonstrated. By using the proposed EHDP, it is expected that stable meniscus regardless of the substrate and different line widths even using the same nozzle can be achieved.

• Journal of the Korean Society of Clothing and Textiles
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• v.39 no.6
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• pp.826-837
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• 2015

This study analyzes the shapes of the adjustment of a Napoleon Collar which combines a stand collar with an upper collar. It established experimental conditions for fixing the conditions of Napoleon Collar components (lapel width, stand collar size and upper collar size) as well as varied the shape of the neckline, the length of the curve of a stand collar and the size of the drawing space at the center back. It produced 22 test clothes of muslin, which were dressed on dress form No. 8. The results indicate that: 1. Neckline shape determines the amount of stand and fall. Less curved neckline stands higher against the neck and a more curved neckline is laid lower onto the body. 2. A shorter curve length of a stand collar allows a longer roll line to fall farther away from the neck with more space between the neck and collar. However, the longer the depth of curve of a stand collar creates a shorter roll line that stands high against neck and closer to neck without any space between the neck and collar with a collar line matching the neck of the dress form. 3. The smaller the drawing space at the center back creates a shorter the style line of the upper collar. However, a narrower back width of the collar creates a bigger drawing space at the center back with a longer the style line and a more naturally placed back width of the collar. 4. A Napoleon Collar creates a longer depth of curve for a stand collar and a smaller drawing space at the center back that is tightly and stably stuck to the neck.

• Journal of The Korean Astronomical Society
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• v.29 no.spc1
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• pp.333-335
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• 1996

Here we report the results from spectroscopic observations of soloar active regions in the HeI 10830 ${\AA}$ line at the German Vacuum Tower Telescope(VTT) in Tenerife during the August 199:3 International EFR(Emerging Flux Region) Campaign. Four active regions in various stages of their evolution, i.e., NOAA7558, 7560, 7561, and 7562, were ovserved on 10 August 1993. From the observed HeI 10830 ${\AA}$ spectra in these active regions, spectroscopic quantities such as equivalent width(EW), doppler shift, doppler width, etc., were derived(see Figure l(a)) and the correlation between them were studied(see Figure l(b)). Our main results are as follows: (I)In NOAA7562, which is a young and evolving EFR, the EW is large, while it is small around a simple and roundish spot of NOAA7558. (2)In these active regions, redshift in the 10830 line is dominant when the EW is larger. (3)As the doppler width increases, the line tends to shift redward. (4)When the EW is smaller, it seems to exist another component which have dynamic characteristics different from the redshifting component. In NOAA7560 and NOAA7561, regions which have several small spots, the values of the EW are intermediate. Results (2) and (3) may suggest the possible existence of downflow above active regions, if the HeI 10830 ${\AA}$line is formed in the upper chromopshere, and it is consistent with the earlyer result from the SMM extreme-ultraviolet observation by Klimchuk(1987, Astrophys. J., 323, 368) (to be submitted. to Astronomy and Astrophysics; an extended abstract)

• Journal of Fashion Business
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• v.15 no.5
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• pp.178-194
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• 2011

Due to the population growth of the old aged, Korea is also entering into an aging society. But a research on the pattern design to the old aged is much to be desired. The purpose of this research is to design skirt pattern fitted for each body type by categorizing the lower body type of the old aged woman. For the way of research, categorized the body type by using the female measuring size from the 65 years old to 99 years old which has been measured by the Korean body size research as an assay data, and base on this data, a suitable skirt pattern for each body type of the old aged woman was designed by practicing the exterior evaluation. The data analysis was done with the statistical treatment in SPSS 12.0, and the results are as follows. The lower body type of the old aged woman were divided into the type 1. The circumference article is the biggest compared to the height article regarding to the lower body type of the old aged woman. The type 2. The height article and the circumference and thickness articles are the poorest. The type 3. The height article is the biggest and the hip width and calf circumference are thicker than the waist width. The type 4. The height article is the lowest and the waist width is thicker instead the hip and leg are thinner. In type 1, The pattern was modified by increasing 1cm a length of the dart and raising up 1.2cm at the cross point between side line and waist line. In type 2, the basic pattern was used, and in type 3, using the outline of the basic pattern however, increased 1cm a length of the dart and modified the amounts of dart by handling the art in curve, and modified the waist line to be more three-dimensional curves by raising up 1 cm at the cross point between waist line and side line and falling down 0.5cm at the cross point between the back center line and the waist line. In type 4, modified the amounts of front and back dart to 1.25cm, and raised up 0.8cm at the cross point between side line and waist line, and modified the waist line and the side seam line in a gentle curve by reducing circumference of the skirt tail to 1cm from the side seam line.

• Journal of the Korean Ceramic Society
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• v.44 no.3 s.298
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• pp.157-161
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• 2007

Line width under $100\;{\mu}m$ with good resolution is difficult to achieve using conventional thick-film process utilizing screen printing method. However combined with lithography technology finer line and space for miniaturization and highly integrated package is achievable. In this study, photosensitive Ag paste of optimum formulation used for thick film lithography technology was fabricated by various Ag powder, glass powder and additives. As the result, line width of $30\;{\mu}m$ with good definition and reduced mismatch during co-firing with LTCC substrate was acquired. Formulated Ag paste was used to pattern embedded fine line inductor with over 90% yield.