• 제목/요약/키워드: ionization rate

검색결과 265건 처리시간 0.024초

몬테칼로 방법을 사용한 HgCdTe에서의 전자 전송 특성에 관한 연구 (A study on the electron transport properties in HgCdTe using monte carlo method)

  • 유상동;곽계달
    • 전자공학회논문지D
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    • 제35D권2호
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    • pp.40-51
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    • 1998
  • Electron transport properties are investigated by Monte Carlo simulation in n-HgCdTe. The material is easily degenerated at low temperature or being slightly doped, and is characterized by small band gap and large nonparabolic factor. The degeneracy is incorporated in the Monte Carlo simulation by taking into account the electron-electron scattering and the pauli exclusion principle. In the conventional method, however, the electron-electron scattering rate was developed under the assumption of parabolic conduction band. A new formulation of the electron-electron scattering rate is develop considering the band nonparabolicity and overlap integral. The electron-electron scattering effects on the electron distribution,impact ionization coefficienty, electron temperature, drift velocity and electron energy are presented.

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WEDM 가공특성에 대한 방전액의 전기전도율의 영향 (Electrical Conductivity of Dielectric on WEDM Characteristics)

  • 김창호;여홍태
    • 대한기계학회논문집A
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    • 제27권10호
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    • pp.1800-1808
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    • 2003
  • This work deals with the electrical conductivity of dielectric on output parameters such as metal removal rate and surface roughness value of a carbon steel(SM25C) and sintered carbides cut by wire-electrical discharge machining(W-EDM). Dielectric has several functions like insulation, ionization, cooling, the removal of waste metal particles. The presence of minute particles(gap debris) in spark gap contaminates and lowers the breakdown strength of dielectric. And it is considered that too much debris in spark gap is generally believed to be the cause of arcing. Experimental results show that increases of cobalt amount in carbides affects the metal removal rate and worsens the surface quality as a greater quantity of solidified metal deposits on the eroded surface. Lower electrical conductivity of the dielectric results in a lower metal removal rate because the gap between wire electrode and workpiece reduced. Especially, the surface characteristics of rough-cut workpiece and wire electrode were analyzed too. Debris were analyzed also through scanning electron microscopy(SEM) and surface roughness tester. Micro cracks and some of electrode material are found on the workpiece surface by energy dispersive spectrometer(EDS).

방전액의 전도율의 변화에 따른 와이어방전가공의 가공특성 (Machining Characteristics of WEDM due to Electrical Conductivity of Dielectric)

  • 김창호;강재원
    • 한국공작기계학회논문집
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    • 제15권6호
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    • pp.15-21
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    • 2006
  • This work deals with the electrical conductivity of dielectric on output parameters such as metal removal rate and surface roughness value of a carbon steel(SM25C) and sintered carbides cut by wire electrical discharge machining (WEDM). Dielectric has several functions like insulation, ionization, cooling, the removal of waste metal particles. The presence of minute metal particles(debris) in spark gap contaminates and lowers the breakdown strength of dielectric. And it is considered that too much debris in spark gap is generally believed to be the cause of arcing. Experimental results show that increases of cobalt amount in carbides affects the metal removal rate and worsens the surface quality as a greater quantity of solidified metal deposits on the eroded surface. Lower electrical conductivity of the dielectric results in a lower metal removal rate because the gap between wire electrode and workpiece reduced. Especially, the surface characteristics of rough-cut workpiece and wire electrode were analyzed too. Debris were analyzed also through scanning electron microscopy(SEM) and surface roughness tester. Micro cracks and some of electrode material are found on the workpiece surface by energy dispersive spectrometer(EDS).

글로벌 모델에 의한 저온 고밀도 플루오로카본 플라즈마 특성의 공정변수 의존성 해석 (Analysis of Process Parameter dependency on the characteristics of high density fluoro carbon plasma using global model)

  • 이호준;태흥식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 추계학술대회 논문집 학회본부 C
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    • pp.879-881
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    • 1999
  • Radical and ion densities in a CF4 plasma have been calculated as a function of input power density. 9as pressure and feed gas flow rate using simple 0 dimensional global model. Fluorine atom is found to be the most abundant neutral particle. Highly fragmented species such as CF and CF+ become dominant neutral and ionic radical at the high power condition. As the pressure increases. ion density increases but ionization rate decreases due to the decrease in electron temperature. The fractional dissociation of CF4 feed gas decreases with pressure after increasing at the low pressure range. Electron density and temperature are almost independent of flow rate within calculation conditions studied. The fractional dissociation of CF4 monotonically decreases with flow rate. which results in increase in CF3 and decrease in CF density. The calculation results show that the SiO2 etch selectivity improvement correlates to the increase in the relative density of fluorocarbon ion and neutral radicals which has high C/F ratio.

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인터벤션 방사선발생장치에서 입사표면선량률 평가 (Evaluation of Radiation Entrance Surface Dose Rates for Interventional Radiology Equipment)

  • 강병삼;장광현
    • 대한방사선기술학회지:방사선기술과학
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    • 제43권5호
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    • pp.353-357
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    • 2020
  • IVR procedures are on the rise, and patient doses are on the rise. It is necessary to evaluate fluoroscopy dose in IVR procedure. Evaluate ESD on IVR equipment as a reference to DRL settings, I would like to present the direction of improvement in the ESD rate test criteria for fluoroscopy dose. The experimental method is measured with 6cc ionization chamber under the 20cm PMMA Phantom. Radiation is subject to abdominal procedure. The average dose rate of the incident surface was 21.6 ± 11.4 mGy/min. The highest dose equipment was 58.5 mGy/min, and there was no equipment exceeding the domestic standard of 100 mGy/min. However, there were five units above 50 mGy/min. To reduce fluoroscopy dose, it is recommended to reduce pulse rate, The dose increases as the image receptor ages. It is recommended to modify the domestic inspection criteria to 50 mGy/min.

Gate-All-Around SOI MOSFET의 소자열화 (Hot Electron Induced Device Degradation in Gate-All-Around SOI MOSFETs)

  • 최낙종;유종근;박종태
    • 대한전자공학회논문지SD
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    • 제40권10호
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    • pp.32-38
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    • 2003
  • SIMOX 웨이퍼를 사용하여 제작된 GAA 구조 SOI MOSFET의 열전자에 의한 소자열화를 측정·분석하였다. nMOSFET의 열화는 스트레스 게이트 전압이 문턱전압과 같을 때 최대가 되었는데 이는 낮은 게이트 전압에서 PBT 작용의 활성화로 충격이온화가 많이 되었기 때문이다. 소자의 열화는 충격이혼화로 생성된 열전자와 홀에의한 계면상태 생성이 주된 원인임을 degradation rate와 dynamic transconductance 측정으로부터 확인하였다. 그리고 pMOSFET의 열화의 원인은 DAHC 현상에서 생성된 열전자 주입에 의한 전자 트랩핑이 주된 것임을 스트레스 게이트 전압변화에 따른 드레인 전류 변화로부터 확인 할 수 있었다.

GC/MS에 의한 오미자 Lignan성분의 동정 (Identification of Lignan Compounds in Fruits of Schisandra chinensis BAILLON by Gas Chromatography/Mass Spectrometry)

  • 손현주;복진영
    • Applied Biological Chemistry
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    • 제32권4호
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    • pp.344-349
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    • 1989
  • GC/MS를 이용하여 오미자의 chloroform-methanol 추출물로부터 11종의 lignan 성분을 동정하였다. GC column은 SPB-1 fused silica capillary $(0.25mm\;ID{\times}30m,\;Supelco)$를 사용하였고 column oven의 온도는 $200^{\circ}C$부터 $300^{\circ}C$까지 분당 $4^{\circ}C$씩 승온하였으며 MS의 ionization voltage는 70eV (El mode)이었다. 동정된 lignan 성분은 gomisin J, deoxyschizandrin, gomisin N, schizandrin, wuweizisu C, gomisin A, angeloylgomisin H, tigloylgomisin H, angeloylgomisin Q, gomisin B 및 benzoylgomisin H이었으며, GC chromatogram 상에서 이들 화합물의 분리상태는 양호하였다.

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형광 X 선을 이용한 100 KeV 이하의 에너지 영역에서의 단색 Photon 선원개발에 관한 연구 (Development of Monoenergetic Photon Source in the Energe Range below 100 keV by the X-ray Fluorescence Method)

  • 이연명;이건재;하석호;황선태;이경주
    • Journal of Radiation Protection and Research
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    • 제10권1호
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    • pp.14-28
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    • 1985
  • 고순도 물질의 $K_{\alpha}$형광 X-선을 이용하여 100 keV 이하에서의 단색 Photon 선원을 개발하였다. 단색 Photon은 방사선 측정기기의 교정에 매우 유용한 것으로 얇은 금속박막의 Radiator에 제동복사선을 조사하여 얻을 수 있다. 본 실험에서는 $_{47}Ag,\;_{50}Sn,\;_{68}Er,\;_{70}Yb,\;_{82}Pb$, 등의 Radiator를 사용하여 20 keV 에서 80 keV의 범위에서 단색 Photon을 얻어내어 고순도 HpGe LEPS로 0.64-0.94에 이르는 단색도를 얻어내었고 600cc 얇은창이온전리함을 사용하여 8.3mR/h 에서 232. 5mR/h에 이르는 선량률을 얻어 내였다.

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Particle-in-cell 기법을 이용한 전자기장내 플라즈마 입자의 거동 해석 (Numerical Analysis on Plasma Particles inside Electro-magnetic Field Using Particle-in-cell Method)

  • 한두희;조민경;신준수;성홍계;김수겸
    • 한국항공우주학회지
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    • 제45권11호
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    • pp.932-938
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    • 2017
  • 플라자마의 거동을 오일러리안 격자와 라그랑지안 입자를 혼합하여 해석하는 Particle-in-cell 기법을 적용하여 간략화된 홀추력기를 해석하였다. 본 연구는 중성입자, 이온입자 뿐만 아니라 전자도 라그랑지안 기법으로 개별추적 계산하기 때문에 message passing interface 기법을 이용해 대용량 계산이 가능한 병렬클러스터링을 적용하였다. 계산에 앞서 일정한 벡터의 자기장에서 전자군의 나선형 거동을 해석하였고, 절대해와 일치함을 확인하여 코드를 검증하였다. 실린더 내부에 반경방향으로 일정한 자기장과 축방향으로 일정한 전기장을 고정시켜 플라즈마의 거동을 PIC 모델을 이용하여 해석하였다. 반응 실린더 내부에 전자가 로렌츠 힘에 의해 이중나선을 그리며 구속되는 현상이 잘 포착되었고, 고속 회전하는 전자와 주입된 중성입자가 충돌하여 이온화 되었고, 대전된 입자가 축방향의 전기장에 의해 급 가속하는 현상 또한 잘 모사되어 플라즈마의 플룸 거동을 모사하였다.