• 한국표면공학회지
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• 제32권3호
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• pp.257-264
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• 1999

Thin reflective films are synthesized by using PVD methods with a bright metal of Al or Ag. For purposes of improving the reflectance and adhesion of such films particularly, substrate bias was applied during sputtering (namely, ion-plating) to enhance the deposition process with higher energy. And we succeeded in fabricating a quality silver film which possesses an adhesion of $85{\;}Kg/\textrm{cm}^2$ and a high reflectivity of more than 96%. Both of reflectivity and adhesion are better in case of bias sputtering as controlled than nonbias sputtering, particularly the bias of 50-100 V showed most effective. The microstructures of sample films were examined by using various equipments and the XRD spectrum in particular showed that <111> direction is the preferred growth orientation.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2007년도 춘계학술발표회 초록집
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• pp.136-138
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• 2007

최근 기계가공기술의 발달에 따라 내마모용 TiN 박막의 수요가 증가하였고, TiN박막은 내마모용으로 높은 경도 및 밀착력을 필요로 한다. TiN박막을 증착시키는 방법은 PVD, CVD 등 여러 가지가 있으나 본 연구에서 공구강 SKD 61기판 표면과 Radical Nitriding(RN) 처리된 SKD 61 기판에 arc ion plating(AIP)를 이용하여 TiN 박막을 증착시켜 표면경도를 향상시키고, 이 코팅층의 미세구조가 기계적 특성에 미치는 영향을 연구하였다. 그 결과 RN처리된 SKD61에서 코팅 두께가 많이 나왔고, 스크래치테스트 결과 접착력이 향상되었음을 알 수 있었다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2018년도 춘계학술대회 논문집
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• pp.33.1-33.1
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• 2018

pH is expressed mathematically as $pH=-{\log}[H^+]$, is a measure of the hydrogen ion concentration, [$H^+$] to specify the acidity or basicity of an aqueous solution. The pH scale usually ranges from 0 to 14. Every aqueous solution can be measured to determine its pH value. The pH values below 7.0 express the acidity, above 7.0 are alkalinity and pH 7.0 is a neutral solution. The solution pH can be determined by indicator or by measurement using pH sensor, which measuring the voltage generated between a glass electrode and a reference electrode according to the Nernst Equation. The pH value of solutions depends on the temperature and the activity of contained ions. In nickel electroless plating process, the controlled pH value in some limited ranges are extremely important to achieve optimal deposition rate, phosphorus content as well as solution stability. Basically, nickel electroless plating solution contains of $Ni^{2+}ions$, reducing agent, buffer and complexing agents. The plating processes are normally carried out at $82-92^{\circ}C$. However, the change of its pH values with temperatures does not follow any rule. Thus, the purpose of study is to understand the relationship between pH and temperature of some based solutions and electroless nickel plating solutions. The change of pH with changing temperatures is explained by view of the thermal dynamic and the practical measurements.

• 기술사
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• 제16권3호
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• pp.68-73
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• 1983

IC전자부품 중 DIP계 종류를 바렐을 사용하여 주석도금 할 때에 그 전착현상을 조사하여 부분전류의 동태를 설명할 수 있는 변화인자를 알아보려 하였다. DIP와 같은 모양인 IC부품은 부분전도체로 구분되어지며 그 전착상태를 one-dimensional model로 분석하였을때, 가입전류밀도, 바렐의 회전속도, 용액중 금속이온 농도와 깊은 관계가 있음을 보인다. 다공질과 같은 것으로 간주한 one-dimensional model로서 의 이론식은 J=$\delta$'/$\beta$-{-c$^3$/${\gamma}$-exp-(1-$\alpha$)n$\Phi$}로 표현된다.

• 한국산업보건학회지
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• 제34권1호
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• pp.98-105
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• 2024

Objectives: The purpose of this study was to identify the exposure level of airborne hexavalent chromium in the plating industry and the exposure level compared to domestic and international occupational exposure limits. Methods: A total 92 samples were collected from ten industrial plating sites. Hexavalent chromium samples were collected using a three-stage cassette equipped with a 37 mm, 5 ㎛ pore size PVC filter. The analysis was performed by ion chromatography. Results: The geometric mean of hexavalent chromium concentration in the plating industry was 0.052 ㎍/m², and it was found that the average exposure level was 0.8 times the South Korean exposure limit. When applying the US ACGIH TLV, however, the average concentration was more than twice as high. Conclusions: The South Korean exposure limit for hexavalent chromium needs to be strengthened due to significant differences in exposure levels according to domestic and international occupational exposure limits. Furthermore, respiratory and dermal sensitization should be labeled.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2000년도 춘계학술발표회 초록집
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• pp.38-38
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• 2000

• 한국재료학회:학술대회논문집
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• 한국재료학회 2005년도 춘계학술발표대회 및 제8회 신소재 심포지엄 논문개요집
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• pp.284-284
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• 2005

• 한국재료학회:학술대회논문집
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• 한국재료학회 1996년도 재료학회 추계학술발표회
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• pp.75-75
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• 1996

• 한국진공학회:학술대회논문집
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• 한국진공학회 2008년도 제34회 동계학술대회 초록집
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• pp.332-332
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• 2008

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2014년도 추계학술대회 논문집
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• pp.301-301
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• 2014