• 제목/요약/키워드: ion current density

검색결과 399건 처리시간 0.024초

질소이온의 주입이 생체안전성 티타늄임플란트의 내식성에 미치는 영향 (Effect of Nitrogen Ion Implantation on Corrosion Resistance of Biocompatible Ti Implant)

  • 최종운;손선희
    • 한국안전학회지
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    • 제14권3호
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    • pp.134-139
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    • 1999
  • In this study, PSII(plasma source ion implantation) was used to improve the biocompatibility of bone-anchored Ti implant. According to potentiodynamic anodic polarization test in deaerated Hank's solution, open circuit potential of ion implanted specimens were increased compare to that of unimplanted specimen ; besides, passive current density and critical anodic current density of ion implanted specimens were lower than unimplanted specimen.

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Role of Magnetic Field Configuration in a Performance of Extended Magnetron Sputtering System with a Cylindrical Cathode

  • Chun, Hui-Gon;Sochugov, Nikolay S.;You, Yong-Zoo;Soloviv, Andrew A.;Zakharov, Alexander N,
    • 반도체디스플레이기술학회지
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    • 제2권3호
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    • pp.19-23
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    • 2003
  • Extended unbalanced magnetron sputtering system based on the cylindrical magnetron with a rotating cathode was developed. The unbalanced configuration of magnetic field was realized by means of additional lines of permanent magnets, placed along both sides of a 89 mm outer diameter and 600 mm long cylindrical cathode. The performance of the unbalanced magnetron was assessed in terms of the ion current density and the ion-to-atom ratio incident at the substrate. Furthermore, the paper presents the comparison of the internal plasma parameters, such as the electron temperature, electron density, plasma and floating potentials, measured by a Langmuir probe in various positions from the cathode, for conventional and unbalanced constructions of the cylindrical magnetron. The plasma density and ion current density are about 3-5 times higher than those of conventional one, in the unbalanced magnetron in a 0.24 Pa Ar atmosphere with a DC cathode power of 3 kW.

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Dual-frequency Capacitively Coupled Plasma-enhanced Chemical Vapor Deposition System for Solar Cell Manufacturing

  • 권형철;원임희;신현국;;이재구
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.310-311
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    • 2011
  • Dual-frequency (DF) capacitively coupled plasmas (CCP) are used to separately control the mean ion energy and flux at the electrodes [1]. This separate control in capacitively coupled radio frequency discharges is one of the most important issues for various applications of plasma processing. For instance, in the Plasma Enhanced Chemical Vapor Deposition processes such as used for solar cell manufacturing, this separate control is most relevant. It principally allows to increase the ion flux for high deposition rates, while the mean ion energy is kept constant at low values to prevent highly energetic ion bombardment of the substrate to avoid unwanted damage of the surface structure. DF CCP can be analyzed in a fashion similar to single-frequency (SF) driven with effective parameters [2]. It means that DF CCP can be converted into SF CCP with effective parameters such as effective frequency and effective current density. In this study, comparison of DF CCP and its converted effective SF CCP is carried out through particle-in-cell/Monte Carlo (PIC-MCC) simulations. The PIC-MCC simulation shows that DF CCP and its converted effective SF CCP have almost the same plasma characteristics. In DF CCP, the negative resistance arises from the competition of the effective current and the effective frequency [2]. As the high-frequency current increases, the square of the effective frequency increases more than the effective current does. As a result, the effective voltage decreases with the effective current and it leads to an increase of the ion flux and a decrease of the mean ion energy. Because of that, the negative resistance regime can be called the preferable regime for solar cell manufacturing. In this preferable regime, comparison of DF (13.56+100 or 200 MHz) CCP and SF (60 MHz) CCP with the same effective current density is carried out. At the lower effective current density (or at the lower plasma density), the mean ion energy of SF CCP is lower than that of DF CCP. At the higher effective current density (or at the higher plasma density), however, the mean ion energy is lower than that of SF CCP. In this case, using DF CCP is better than SF CCP for solar cell manufacturing processes.

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이온유체방정식을 이용한 Plasma Sheath 시변 해석 (Analysis of Time-Dependent Behavior of Plasma Sheath using Ion Fluid Model)

  • 이호준;이해준
    • 전기학회논문지
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    • 제56권12호
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    • pp.2173-2178
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    • 2007
  • Dynamics of plasma sheath was analyzed using simple ion fluid model with poison equation. Incident ion current, energy, potential distribution and space charge density profile were calculated as a function of time. The effects of initial floating sheath on the evolution of biased sheath were compared with ideal matrix sheath. The effects of finite rising time of pulse bias voltage on the ion current and energy was studied. The influence of surface charging on the evolution of sheath was also investigated

리튬이온전지 음극의 고속 성능 향상을 위한 도전재 복합화 (Composited Conductive Materials for Enhancing the Ultrafast Performance for Anode in Lithium-Ion Battery)

  • 성기욱;안효진
    • 한국재료학회지
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    • 제32권11호
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    • pp.474-480
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    • 2022
  • Lithium-ion batteries (LIBs) are powerful energy storage devices with several advantages, including high energy density, large voltage window, high cycling stability, and eco-friendliness. However, demand for ultrafast charge/discharge performance is increasing, and many improvements are needed in the electrode which contains the carbon-based active material. Among LIB electrode components, the conductive additive plays an important role, connecting the active materials and enhancing charge transfer within the electrode. This impacts electrical and ionic conductivity, electrical resistance, and the density of the electrode. Therefore, to increase ultrafast cycling performance by enhancing the electrical conductivity and density of the electrode, we complexed Ketjen black and graphene and applied conductive agents. This electrode, with the composite conductive additives, exhibited high electrical conductivity (12.11 S/cm), excellent high-rate performance (28.6 mAh/g at current density of 3,000 mA/g), and great long-term cycling stability at high current density (88.7 % after 500 cycles at current density of 3,000 mA/g). This excellent high-rate performance with cycling stability is attributed to the increased electrical conductivity, due to the increased amount of graphene, which has high intrinsic electrical conductivity, and the high density of the electrode.

The Lithium Ion Battery Technology

  • Lee, Ki-Young
    • Carbon letters
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    • 제2권1호
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    • pp.72-75
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    • 2001
  • The performance of Li-ion system based on $LiCoO_2$ and Graphite is well optimized for the 3C applications. The charge-discharge mode, the manufacturing process, the cell performance and the thermal reactions affecting safety has been explained in the engineering point of view. The energy density of the current LIB system is in the range of 300~400 Wh/l. In order to achieve the energy density higher than 500 Wh/l, the active materials should be modified or changed. Adopting new high capacity anode materials would be effective to improve energy density.

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플라즈마 잠김 이온 주입에 대한 플라즈마 덮개의 해석 (Sheath analysis for a plasma immersion ion implantation)

  • 김영권;김영삼;조대근;최은하;조광섭
    • 한국진공학회지
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    • 제7권4호
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    • pp.381-389
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    • 1998
  • 플라즈마 잠김 이온 주입에서 플라즈마 덮개의 동력학에 대한 모델로부터 시료면에 주입되는 이온 전류밀도의 시간적인 변화를 해석하였다. 시료에 주입되는 이온의 전류밀도 는 플라즈마 덮개의 형성이후 특정 시간에 최대값을 갖게되고, 점차 줄어든다. 이러한 이온 주입 전류밀도의 변화를 이온의 충돌, 시료 면의 충전시간, 그리고 시료 면에 인가되는 파형 에 대하여 나타내었다.

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고분자전해질 연료전지에서 고분자막의 이온전도도에 미치는 전류밀도의 영향 (Effect of Current Density on Ion Conductivity of Membrane in Proton Exchange Membrane)

  • 황병찬;오소형;이대웅;정회범;유승을;구영모;나일채;이정훈;박권필
    • Korean Chemical Engineering Research
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    • 제56권1호
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    • pp.1-5
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    • 2018
  • 본 연구에서는 고분자전해질 연료전지(PEMFC)가 실제 구동되는 고전류밀도 범위까지 임피던스를 분석해 이온전도도에 대해 연구하였다. 가스확산층(GDL)유무가 임피던스에 미치는 영향을 수소투과도 측정에 의해 간접적으로 검토하였다. 저전류 범위(<$80mA/cm^2$)에서 상대습도(RH)가 60% 이상 높을 때는 고분자 막의 수분 함량이 충분해 막의 이온전도도가 전류 변화의 영향을 받지 않았다. 그러나 RH가 낮을 때는 전류밀도가 증가하면서 수분 생성에 의해 이온전도도가 증가했다. 고전류 영역($100{\sim}800mA/cm^2$)에서 HFR (High Frequency Resistance)로 구한 막의 이온전도도 실험값과 수치해석에 의해 구한 값을 비교하였다. RH 100%에서는 실험값과 모사한 값 모두 전류 변화에 영향을 받지 않고 일정한 이온전도도를 유지함을 보였다. RH 30~70%에서는 전류밀도 증가에 따라 이온전도도가 증가하다 일정해 지는 경향을 나타냈다.

초고압 직류 가공 송전선로에서 발생되는 이온 계측시스템 개발 (The Development of System for Measuring Ion Generated from HVDC Overhead Transmission Line)

  • 주문노;양광호;이동일;신구용;임재섭
    • 전기학회논문지
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    • 제57권11호
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    • pp.2035-2040
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    • 2008
  • The electrical discharge of high voltage direct current(HVDC) overhead transmission line generate audible noise, radio noise, electric field, ion current and induced voltage on the ground. These items are major factors to design environmentally friendly configuration of DC transmission line. Therefore, HVDC transmission lines must be designed to keep all these corona effects within acceptable levels. Several techniques have been used to assess interference caused by ions on HVDC overhead transmission line. In this study, to assess the ion characteristic of DC line, the ion current density and induced voltage caused by ion flow were measured by plate electrodes manufactured from a metal flat board and charged bodies, respectively. The charged body has two types of cylinder and cylindrical plate. From the results of calibration experiments, the sensitivity of flat electrode and charged body can be obtained. At present, the developed system is used to investigate the ion generation characteristics of Kochang DC ${\pm}500kV$ test line.

이온 분석기에 의한 ECR 플라즈마의 특성 분석 및 실리콘 식각에 관한 연구 (Characterization of ECR Plasma by Using Ion Analyzer and Its Silicon Etching)

  • 이석현;이호준;황기웅
    • 대한전기학회논문지
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    • 제41권5호
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    • pp.492-501
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    • 1992
  • In this paper, an ion analyzer is used in conjunction with a Langmuir probe to study the chracteristics of ECR plasma such as the ion temperature, ion current density and electron temperature as the operating pressure, ${\mu}$-wave power and axial position change, Silicon etching has been performed with RF-biasing and its etching chracteristics have been discussed in terms of the ion energy distribution function. The maximum value of ion current density appears in the range of 10S0-3T mbar and the broadening of ion energy distribution function increases as pressure increases. Therefore, as pressure decreases, anisotropy increases but selectivity to photoresist decreases.