• 제목/요약/키워드: high-purity

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국산 지르콘사로부터 부분 안정화 지르코니아의 제조 및 그 응용에 관한 연구 I. 국산 지르콘사로부터 고순도 지르코니아 분말의 제조 (The Study on the Preparation of PSZ from the Domestic Zircon Sand its Applications I. Preparation of the High Purity Zirconia Powder form Domestic Zircon Sand)

  • 김환;선우식;신건철;황규홍
    • 한국세라믹학회지
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    • 제24권2호
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    • pp.186-192
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    • 1987
  • ZrO2 powders having high purity were prepared from domestic zircon sand using the caustic fusion method and the soda ash sintering process. In the caustic fusion method, ZrO2 recovery was reached to 96% when 100/140 mesh zircon was reacted with NaOH at the NaOH/Zircon mole ratio 6 and at 650$^{\circ}C$ for 2 hours. And in the soda ash sintering process, ZrO2 was recovered to 88.5% when -325 mesh zircon was reacted with Na2CO3 at the Na2CO3/Zircon mole ratio 1.1 and 1050$^{\circ}C$ for 2 hours. In both cases, Zr component was extracted to ZrOCl2, subsequently crystallized to ZrOCl2$.$8H2O to increase the purity, and converted to ZrO2 by precipitation. And to increase the sinter ability of powder, Cl- ion was removed and strong agglomeration was avoided by methanol distribution of Zr(OH)4 precipitates.

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회중석의 염소화 생성물로부터 고순도 WO3의 합성 (Synthesis of High Purity Tungsten Oxide with Tungsten Chloride from the Chlorination of Scheelite)

  • 엄명헌;박용성;이철태
    • 공업화학
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    • 제4권4호
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    • pp.798-806
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    • 1993
  • 본 연구는 유동층 반응기에서 회중석의 염소화 생성물인 텅스텐염화물로부터 고순도 tungsten oxide를 합성하기 위해 수행하였다. 텅스텐염화물은 용해시작 불과 1분 이내에 거의 완전히 $H_2O_2$ 용액에서 용해되었으며 적정용해조건은, $H_2O_2$의 농도 0.5%, 용해온도 $15^{\circ}C$, 텅스텐 염화물 0.5g에 대한 $H_2O_2$용액의 양은 30ml이었다. 이 조건하에서 얻어진 용해 생성물로부터 제조되어진 텅스텐 산화물은 순도 99.53%의 $WO_3$였다.

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KI 폐용액(廢溶液)으로부터 분별결정법(分別結晶法)에 의한 고순도(高純度) KI결정(結晶) 제조(製造)에 관한 연구(硏究) (Manufacture of High Purity KI Crystal by Fractional Crystallization Method from Aqueous Waste of KI)

  • 김대원;장성태;최성범
    • 자원리싸이클링
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    • 제22권1호
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    • pp.48-54
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    • 2013
  • LCD용 편광필름에 핵심적으로 사용되어진 요오드화칼륨 (KI, Potassium Iodide) 폐용액으로부터 분별결정법을 이용하여 고순도의 요오드화칼륨 결정을 제조하는 실험을 행하였다. 본 연구에서는 붕소, 나트륨 및 PVA 등의 불순물을 포함한 1.3% 요오드화칼륨 폐액을 3회에 걸쳐 농축하였으며, 용해도 차이를 이용하여 최대 불순물인 붕소화합물을 제거하고, 여과지를 이용하여 유기물을 제거하였다. 또한 24시간 숙성을 통하여 $K_2SO_4$ 형태로 불순물을 제거하여 99.5% 이상의 고순도 요오드화칼륨 결정을 제조하였으며, 재결정을 통하여 농축되어진 불순물을 약 70% 제거할 수 있었다.

Chiral Purity Test of Bevantolol by Capillaryelectrophoresis and High Performance Liquid Chromatography

  • Long, Pham Hai;Trung, Tran Quoc;Oh, Joung-Won;Kim, Kyeong-Ho
    • Archives of Pharmacal Research
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    • 제29권9호
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    • pp.808-813
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    • 2006
  • Two methods for the chiral purity determination of bevantolol were developed, namely capillary electrophoresis (CE) using carboxymethyl-${\beta}$-cyclodextrin (CM-${\beta}$-CD) as a chiral selector and high-perfomance liquid chromatography (HPLC) using a chiral stationary phase. In the HPLC method, the separation of bevantolol enantiomers was performed on a Chiralpak AD-H column by isocratic elution with n-hexane-ethanol-diethylamine (10:90:0.1, v/v/v) as mobile phase. In the CE method, bevantolol enantiomers were separated on an uncoated fused silica capillary with 50 mM amonium phosphate dibasic adjusted to a pH 6.5 with phosphoric acid containing 15 mM CM-${\beta}$-CD as running buffer. Validation data such as linearity, recovery, detection limit, and precision of the two methods are presented. The detection limits of S-(-)-bevantolol were 0.1% and 0.05% for CE and HPLC method, respectively and R-(+)-bevantolol were 0.15% and 0.05% for CE and HPLC method, respectively. There was generally good agreement between the HPLC and CE results.

Optimization Method for Plasmonic Color Filters of High Optical Efficiency

  • Lee, Seonuk;Park, Junsu;Ju, Byeong-Kwon
    • International Journal of Internet, Broadcasting and Communication
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    • 제7권2호
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    • pp.9-15
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    • 2015
  • Various studies with regard to increasing the optical efficiency of plasmonic color filters have previously been conducted, such as mixing materials or applying diverse pattern shapes. Fundamentally, it is important to maximize the photonic crystal effect by finding the optimum periods of lattice as well as calculating the most efficient transmission area. In this study, we propose a technical method for optimizing the plasmonic color filters that have a high color gamut and luminance by analyzing the light spectrums based on the 1931 color coordinate system. Moreover, we suggest a calculation method in order to define the individual color purity of red and green and blue filters. Consequently, efficiency values are obtained independently from each color filter by evaluating the color purity and the luminance. The final result obtained from simulation are 27.6% of relative luminance and 25.3% of color gamut. The proposed optimization method is applicable to all plasmonic color filters having photonic crystal arrays.

전자선 용해법에 의한 V의 정련 및 용해에 관한 연구 (A Study on Refining and Melting of V by Electron Beam Melting)

  • 김휘준;백홍구;윤우영;이진형;강춘식
    • 한국주조공학회지
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    • 제15권3호
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    • pp.235-241
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    • 1995
  • In order to improve the production process of low cost and high purity Vanadium, this study was done to reduce $V_2O_5$ into V-Al master alloy by Aluminothermic Reduction, followed by refining of V-Al master alloy electron beam melting. As melting time was increased in electron beam melting of V, the contents of interstitial impurities and Al, Fe were decreased but the contents of Si, Mo and W were increased due to lower vapor pressure of these elements than that of matrix V. Consequently, it was profitable that melting of V was done for 180 seconds. In addition, with number of melting, the purity of V did not significantly vary, because volatile impurities in V were removed mostly during the first step of melting. As a result of V refining by electron beam melting, high purity Vanadium of 3N(99.91wt%) was acquired including interstitial impurities total contents of which were maximum 400ppm.

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Plasma Resistance and Etch Mechanism of High Purity SiC under Fluorocarbon Plasma

  • Jang, Mi-Ran;Paek, Yeong-Kyeun;Lee, Sung-Min
    • 한국세라믹학회지
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    • 제49권4호
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    • pp.328-332
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    • 2012
  • Etch rates of Si and high purity SiC have been compared for various fluorocarbon plasmas. The relative plasma resistance of SiC, which is defined as the etch rate ratio of Si to SiC, varied between 1.4 and 4.1, showing generally higher plasma resistance of SiC. High resolution X-ray photoelectron analysis revealed that etched SiC has a surface carbon content higher than that of etched Si, resulting in a thicker fluorocarbon polymer layer on the SiC surface. The plasma resistance of SiC was correlated with this thick fluorocarbon polymer layer, which reduced the reaction probability of fluorine-containing species in the plasma with silicon from the SiC substrate. The remnant carbon after the removal of Si as volatile etch products augments the surface carbon, and seems to be the origin of the higher plasma resistance of SiC.

Rational Design of Extractive Distillation Toward Enhanced Separation of HFPO from HFP/HFPO Mixture

  • Lee, Yongtaek
    • 청정기술
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    • 제24권1호
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    • pp.15-20
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    • 2018
  • Hexafluoropropyleneoxide ($C_3F_6O$, HFPO) is highly expensive and it may be used as a raw material for the synthesis of various fluorine based compounds. Currently, extractive distillation method has gained considerable attention to collect the HFPO from a mixture of HFPO / hexafluoropropylene ($C_3F_6$, HFP). Optimized operating conditions are studied using a theoretical method for the extraction process. Among available solvents for the purification process, the use of 1,1-dichloro-1-fluoroethane exhibits a high purity of HFPO as a top product and minimize the required heat duty. Since the boiling point of the solvent increases as the pressure in the column increases, the enhanced extractive capability of the solvent led to the high purity of HFPO at the high pressure.