• Title/Summary/Keyword: high voltage plasma

Search Result 559, Processing Time 0.027 seconds

High Luminous Efficacy and Low Driving Voltage PDP with SrO-MgO Double Protective Layer

  • Whang, Ki-Woong;Jung, Hae-Yoon;Lee, Tae-Ho;Cheong, Hee-Woon
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 2009.10a
    • /
    • pp.173-176
    • /
    • 2009
  • We suggest a new protective layer for PDP consists of SrO and MgO double layer. This double layer structure protects SrO layer from the contamination by $H_2O$ or $CO_2$ in the air and enable SrO to play as the main cathode material. It was confirmed that the high secondary electron emission characteristics of SrO by Xe ion can bring considerable driving voltage reduction and improvement of luminance and luminous efficacy in PDP.

  • PDF

A STUDY OF DISCHARGE VOLTAGE IN PLANER PLASMA SYSTEM (평면형 PLASMA 시스템에서의 방전 전압에 관한 연구)

  • Kim, Jong-Sik;Kang, Bong-Ku;Kwon, O-Dae
    • Proceedings of the KIEE Conference
    • /
    • 1989.07a
    • /
    • pp.426-428
    • /
    • 1989
  • As a first phase of plasma study intended for semiconductor processing research, we have studied the discharge phenomena. In particular, we have obtained a specific formula for the breakdown voltage as a function of the neutral state pressure of reactive gases. Our experimental results with H2,O2,Ar,CF4 seem ro verify this formula. In addition we find the voltage levels for various gases in the descending order of CF4>O2=Ar>H2 in high pressure region, while H2>CF4>O2>Ar in low pressure region. When H2 and CF4 were mixed, we observe the overall voltage dominated by the gas with lower breakdown volotage.

  • PDF

A Study on the Properties of the Dual-mode Plasma Torch System for Melting the Non-conductive Waste (비전도성 폐기물 용융처리를 위한 혼합형 플라즈마토치 시스템 특성 연구)

  • Moon, Young-Pyo;Choi, Jang-Young
    • The Transactions of The Korean Institute of Electrical Engineers
    • /
    • v.65 no.1
    • /
    • pp.73-80
    • /
    • 2016
  • The preliminary test for the dual mode plasma torch system was carried out to explore the operation properties in advance. The dual mode plasma torch system that is able to operate in transferred, non-transferred, or dual mode is very adequate for melting the mixed wastes including nonconductive materials such as concrete, asbestos, etc. since it exploits both the high efficiency of heat transfer to the melt in transferred mode and stable operation in non-transferred mode. Also, system operation including restarting is reliable and very easy. A stationary melter with a refractory structure was designed and manufactured considering the melting behavior of slags to minimize the refractory erosion. The power supply for the dual mode plasma torch system built with high power insulated gate bipolar transistor (IGBT) modules has functions for both current control and voltage control and is sufficient to suppress the harmonics during the operation of the plasma torch. The power supply provides two different voltages for transferred operation and non-transferred. It is confirmed that the operation voltage in transferred is always higher than non-transferred. The dual mode plasma torch system was successfully developed and is under operation for a melting experiment to optimize operation data.

Influences of Plasma Treatment on the Electrical Characteristics of rf-magnefrom sputtered $BaTa_2O_6$ Thin Films (플라즈마 표면 처리가 $BaTa_2O_6$박막의 전기적 특성에 미치는 효과에 관한 연구)

  • Kim, Young-Sik;Lee, Yun-Hi;Ju, Byeong-Kwon;Sung, Mang-Young;Oh, Myung-Hwan
    • The Transactions of the Korean Institute of Electrical Engineers C
    • /
    • v.48 no.5
    • /
    • pp.319-325
    • /
    • 1999
  • Direct current(d.c.)leakage current voltage characteristics of radio-frequencymagnetron sputtered BaTa\sub 2\O\sub 6\ film capacitors with aluminum(A1) top and indium tin oxide (ITO) bottom electrodes have been investigatedas a function of applied field and temperature. In order to study surfacetreatment effect on the electrical characteristics of as-deposited film weperformed exposure of oxygen plasma on $BaTa_2O_6$ surface. d. c.current-voltage (I-V), bipolar pulse charge-voltage (Q-V), d. c. current-time (I-t) andcapacitance-frequency (C-f) analysis were performed on films. All ofthe films exhibita low leakage current, a high breakdown field strength (3MV/cm-4.5MV/cm), and high dielectric constant (20-30). From the temperature dependence of leakage current,we can conclude that the dominant conduction mechanism is ascribed toSchottky emission at high electric field (>1MV/cm) and hopping conduction at lowelectric field (<1MV/cm). According to our results, the oxide plasma surfacetreatmenton as-deposited $BaTa_2O_6$ resulted in lowering interfacebarrier height and thus, leakage current when a negative voltage applied to the A1 electrode. This can be explained by reduction of surface contamination via etching surface and filling defects such as oxygen vacancies.

  • PDF

Gray Scale Plasma Display Panel with a New High-Speed Drive

  • Ryeom, Jeong-Duk
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
    • /
    • v.21 no.9
    • /
    • pp.7-11
    • /
    • 2007
  • The objective of this study is to evaluate the characteristics of a newly proposed high-speed drive method for the gray scale display for high-resolution plasma display panels(PDP). In the experiment it was found that the characteristics of gray scale display are not closely affected by a priming period below 50[${\mu}s$], the width of the priming period, and that it can be driven stably from the brightest sub-field to the darkest sub-field even though a priming discharge is applied to the 1 TV-field only once. Moreover, from the experimental result, the gray scale pattern of 8-bit and 9 sub-fields was stably displayed in the experimental PDP with scan pulses having the pulse width of 0.7[${\mu}s$]. An address voltage margin of about 25[V] and a sustain voltage margin of about 10[V] was obtained.

Modifications of ITO Surfaces in Organic EL Devices by $O_2$ Plasma Treatment (O$_2$ 플라즈마 처리에 의한 ITO 표면개질 변화에 따른 유기 EL 소자 특성)

  • 박상무;김형권;이덕출
    • The Transactions of the Korean Institute of Electrical Engineers C
    • /
    • v.52 no.6
    • /
    • pp.261-266
    • /
    • 2003
  • We investigated the effect of oxygen plasma treatment of indium-tin oxide(ITO) surface on the performance of electroluminescence(EL) devices. ITO surface treated oxygen plasma has been analyzed using atomic force microscope(AFM) and X-ray photoelectron spectroscopy(XPS), to investigate the relations between the properties of the ITO surface and the properties of the current-voltage-luminance(I-V-L) characteristics of the fabricated OLED with the structure of ITO(plasma treatment) / TPD / Alq$_3$/ Al. It is found that the oxygen plasma treatment of ITO anode improve the hole injection of the OLED due to the modification of the surface states. The treated ITO anode nay be low voltage with high luminance efficiency.

Manufacturing of High Quality Coated Paper using Environmental Friendly Plasma Technology (I) - Surface treatment of base paper by different voltages - (친환경 플라즈마 기술을 이용한 고품질 인쇄용지 제조 (제1보) - 전압의 변화에 따른 도공원지 표면처리 -)

  • Shin, Dong-Joon;Kim, Sun-Kyung;Lee, Yong-Kyu
    • Journal of Korea Technical Association of The Pulp and Paper Industry
    • /
    • v.43 no.5
    • /
    • pp.55-59
    • /
    • 2011
  • Atmospheric plasma technology was utilized in order to modify surface characteristics of base paper for coating. Argon(Ar) and oxygen(O2) gases were used. It was found that contact angle of a water droplet was decreased with increasing voltage during plasma treatment, meaning that the hydrophilicity of paper surface was increased. On the other hand, the physical properties like roughness and optical properties such as gloss, brightness and opacity were not influenced by the plasma treatment. In conclusion, atmospheric plasma technology can be utilized to control hydrophilicity of paper surface without affecting physical properties of the paper.

Improved Dual-Path Energy Recovery Circuit using a Current Source and a Voltage Source for High Resolution and Large-Sized Plasma Display Panel

  • Yi, Kang-Hyun;Moon, Gun-Woo
    • Proceedings of the KIPE Conference
    • /
    • 2008.06a
    • /
    • pp.544-546
    • /
    • 2008
  • An improved dual-path energy recovery circuit (ERC) using a current source and a voltage source for plasma display panel (PDP) is proposed. The proposed ERC uses the voltage source to charge a panel and the current source to discharge the panel. Thus, the proposed circuit can make the panel charge to $V_S$ and discharge to 0V, fully and it is possible to achieve zero voltage switching (ZVS) of all switches in H-bridge inverter and zero current switching (ZCS) of all switches in the ERC. Moreover, it has less conduction and switching loss in ERC devices by the dual energy recovery paths for charging and discharging the panel. Furthermore, it has features of canceling the gas discharge current, high performance and the low cost ERC components. The operation principle and features of the proposed ERC are presented in detail and verified with 42-inch SD PDP.

  • PDF

Dry Etching of Al2O3 Thin Films in O2/BCl3/Ar Inductively Coupled Plasma

  • Yang, Xeng;Woo, Jong-Chang;Um, Doo-Seung;Kim, Chang-Il
    • Transactions on Electrical and Electronic Materials
    • /
    • v.11 no.5
    • /
    • pp.202-205
    • /
    • 2010
  • In this study, the etch properties of $Al_2O_3$ thin films deposited by atomic layer deposition were investigated as a function of the $O_2$ content in $BCl_3$/Ar inductively coupled plasma. The experiments were performed by comparing the etch rates and selectivity of $Al_2O_3$ over the hard mask materials as functions of the input plasma parameters, such as the gas mixing ratio, DC-bias voltage, ratio-frequency (RF) power and process pressure. The highest obtained etch rate was 477 nm/min at an RF power of 700 W, $O_2$ to $BCl_3$/Ar gas ratio of 15%, DC-bias voltage of -100 V and process pressure of 15 mTorr. The deposition occurred on the surfaces when the amount of $O_2$ added to the $BCl_3$/Ar gas was too high at a low DC-bias voltage or high process pressure. X-ray photoelectron spectroscopy was used to investigate the chemical reactions on the etched surface.

Development of Nonthermal Bioplasma Source Applicable to Human Liquid Fluids

  • Min, Boo-Ki;Oh, Hyun-Joo;Song, Ki-Baek;Uhm, Han-Sup;Kang, Seung-Oun;Choi, Eun-Ha
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2011.08a
    • /
    • pp.327-327
    • /
    • 2011
  • A nonthermal bioplasma source was developed for application to human liquid fluids by making use of nano-size tungsten tips. Characteristics of the plasma source are investigated. Here we have used the AC voltage system. The bioplasma source generated by a tungsten tip with quartz tube and ground electrode is a low-temperature plasma without making any noticeable damage to cells at a low power operation. The breakdown voltage and current signals are measured by high voltage probe (Tektronix P6015A) and current probe (P6021). Variation of breakdown temperature near the tip electrode is larger than that in the neighborhood of ground electrode. Bubble formation during discharge has been recorded and investigated by using the high speed camera. The existence and behavior of hydroxyl and superoxide radicals are detected and measured by spectrometers. The electrical and optical properties of breakdown characteristics are also investigated.

  • PDF