• 제목/요약/키워드: high transmittance

검색결과 913건 처리시간 0.026초

Pulsed DC 마그네트론 스퍼터링으로 제조한 소다라임 유리의 고투과 및 대전방지 박막특성 연구 (A study on the high transparent and antistatic thin films on sodalime glass by reactive pulsed DC magnetron sputtering)

  • 정종국;임실묵
    • 한국표면공학회지
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    • 제55권6호
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    • pp.353-362
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    • 2022
  • Recently, transmittance of photomasks for ultra-violet (UV) region is getting more important, as the light source wavelength of an exposure process is shortened due to the demand for technologies about high integration and miniaturization of devices. Meanwhile, such problems can occur as damages or the reduction of yield of photomask as electrostatic damage (ESD) occurs in the weak parts due to the accumulation of static electricity and the electric charge on chromium metal layers which are light shielding layers, caused by the repeated contacts and the peeling off between the photomask and the substrate during the exposure process. Accordingly, there have been studies to improve transmittance and antistatic performance through various functional coatings on the photomask surface. In the present study, we manufactured antireflection films of Nb2O5, | SiO2 structure and antistatic films of ITO designed on 100 × 100 × 3 mmt sodalime glass by DC magnetron sputtering system so that photomask can maintain high transmittance at I-line (365 nm). ITO thin film deposited using In/Sn (10 wt.%) on sodalime glass was optimized to be 10 nm-thick, 3.0 × 103 𝛺/☐ sheet resistance, and about 80% transmittance, which was relatively low transmittance because of the absorption properties of ITO thin film. High average transmittance of 91.45% was obtained from a double side antireflection and antistatic thin films structure of Nb2O5 64 nm | SiO2 41 nm | sodalime glass | ITO 10 nm | Nb2O5 64 nm | SiO2 41 nm.

Improved Vertically-Aligned Nematic Mode for High Performance Displays

  • Jhun, Chul Gyu;Gwag, Jin Seog
    • Journal of the Optical Society of Korea
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    • 제18권6호
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    • pp.783-787
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    • 2014
  • This paper presents an improved vertical alignment nematic liquid crystal mode characterized by the protrusions or slits of the top substrate and additional stripe type common electrodes with polarity switching of the bottom substrate to improve multi-domain vertically aligned (MVA) and patterned vertically aligned (PVA) nematic modes. MVA and PVA modes have disadvantages such as an LC disclination in the vicinity of the middle region of electrodes between the top and bottom protrusions in MVA mode or the top and bottom slits in PVA mode. Therefore, the stripe type common electrode generating a horizontal electric field and the protrusion or slit producing some pretilt of liquid crystals (LCs) were used to improve the LC disclination, which influences the transmittance and response speed. The simulation results showed that the proposed VA mode has higher transmittance than the MVA and PVA modes. As a result, the proposed VA mode can improve the response speed and transmittance remarkably, which makes it useful for upgrading the LCD display quality.

고굴절 네마틱 액정에서의 액정 디스플레이의 고속응답 특성 (Fast Response Characteristics in Liquid Crystal Display in the High birefringence nematic liquid crystal)

  • 김종환;황정연;서대식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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    • pp.498-501
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    • 2003
  • We investigated response characteristics of twisted nematic (TN) cell with different nematic liquid crystals (NLCs) and cell gap d on a rubbed polyimide (PI) surface. High transmittance and fast response time of the TN cell on the rubbed PI surface were achieved by using high birefringence (${\Delta}n$) and low cell gap d. The transmittance and response time of the TN cell on the rubbed PI surface decreased with decreasing ${\Delta}nd$. The fast response time of TN cell using high birefringence with ${\Delta}nd=0.363$ on the rubbed PI surface was measured 5.1 ms.

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실리카 콜로이드 나노입자를 이용한 반사 방지막의 제조 (II) (High-Transmittance Films Coated from Silica Colloidal Nano-Particles (II))

  • 황연
    • 한국세라믹학회지
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    • 제42권6호
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    • pp.399-404
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    • 2005
  • Anti-reflection film was coated by using spherical silica nano colloidal particles and fumed silica particles. Silica colloid sol was reserved between two inclined slide glasses by capillary force, and particles were stacked to form a film onto the substrate as the upper glass was sliding. The deposition processes were studied to enhance the wavelength dependency of the light transmittance and to control the effective refractive index of the film. Both of the spherical and fumed silica particles showed an enhancement of $4.0-4.4\%$ in light transmittance by one step coating. The dependence of the transmittance on wavelength was largely improved at the longer wavelength by partial coating of fumed particles on the film of spherical particles. The effective refractive index of the film was controlled by removing latex particles that were co-deposited with silica particles. Using this process the light reflectance from one side of the glass substrate could be reduced from $4.2\%$ to $0.6\%$ although zero reflectance was not achieved due to the agglomeration of the latex particles.

EUV 펠리클 투과도에 따른 이미지 전사 특성 분석 (Imaging Performance of the Dependence of EUV Pellicle Transmittance)

  • 우동곤;김정환;김정식;홍성철;안진호
    • 반도체디스플레이기술학회지
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    • 제15권3호
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    • pp.35-39
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    • 2016
  • Extreme Ultraviolet Lithography (EUVL) is the most promising technique in the field of Next Generation Lithography (NGL) expected to be used in the 1x-nm node for High Volume Manufacturing (HVM). But there exits remaining challenges for proper defect control of EUV mask. It was considered development of EUV pellicle for protecting the EUV mask has many obstacles due to high extinction coefficient of EUV wavelength. Recently researchers in the industry of semiconductor argue about the necessity of EUV pellicle and make effort to achieve it. In this paper, we investigated that the relationship between imaging performance and transmittance of EUV pellicle quantitatively. We made in-house EUV pellicle and analyzed its imaging performance of the dependence of pellicle transmittance using Coherent Scattering Microscopy(CSM). The imaging performance of EUV mask with pellicle is affected by its transmittance and we found that the performance of EUV mask improved with higher transmittance pellicle.

새로운 전극구조를 통한 수직배향 액정 셀의 투과특성 향상 (An improved electrode structure of the Patterned Vertical Aligned Liquid Crystal Cell for high transmittance)

  • 최용현;손정희;이기동
    • 한국정보통신학회논문지
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    • 제11권9호
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    • pp.1724-1728
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    • 2007
  • 본 논문에서는 PVA(Patterned Vertical Alignment)액정 셀의 광투과율 향상을 위한 새로운 전극 구조를 제안하였다. 제안한 전극 구조의 액정 디렉터의 분포 및 광투과율 계산은 상용 시뮬레이터인 'TechWiz LCD'를 사용하였다. 광 시야각을 위한 전극구조에 의해 투과율 감소를 발생시키는 부분에 대해 연구하여 그 부분의 액정 디렉터 분포를 변화시킬 수 있는 구조를 제안하였다. 그리고 기존 PVA모드와 제안한 구조를 사용한 PVA모드의 광투과율을 계산하여 비교하였다. 그 결과로부터 제안한 PVA액정 셀의 광투과율이 높아짐을 확인할 수 있었다.

PVA Technology for High Performance LCD Monitors

  • Kim, Kyeong-Hyeon;Souk, Jun-Hyung
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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    • pp.1-4
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    • 2000
  • We have developed a high performance vertical alignment TFT-LCD, that shows a high light transmittance, and wide viewing angle characteristics with an unusually high contrast ratio. In order to optimize the electro-optical properties we have studied the effect of cell parameters, multi-domain structure and retardation film compensation. With the optimized cell parameters and process conditions, we have achieved a 24" wide UXGA TFT-LCD monitor (16:10 aspect ratio 1920X1200) showing a contrast ratio over 500:1, panel transmittance near 4.5%, response time near 27 ms, and viewing angle higher than 80 degree in all directions.

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폴리에스터 필름의 광투과도 향상에 대한 연구 (Study on the Improvement of Light Transmittance of Polyester Film)

  • 김시민;박수영
    • 폴리머
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    • 제36권5호
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    • pp.662-667
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    • 2012
  • 평판 디스플레이에 사용되는 PET 필름의 광학적 특성을 알아보기 위하여 필름 표면 굴절률, 필름 표면조도 및 필름 내부입자가 광투과율에 미치는 영향을 알아 보았다. 필름표면에 굴절률이 낮은 코팅층을 형성함에 따라 필름의 광투과율이 향상되었고, 최대의 광투과율을 가지는 코팅두께가 있음을 확인하였다. 표면 거칠기의 영향에 대해서는 표면조도를 나타내는 Ra를 입사 파장의 1/4 이하로 조절한 경우 광손실이 발생되지 않았다. 필름 내 무기입자는 입사된 광의 흡수 및 산란을 발생시켜 광손실을 증가시켰다.

Change of Transmittance by Frit Size in Transparent Dielectric of PDP

  • Cha, Myung-Lyoung;Jeon, Jae-Sam;Hwang, Seong-Jin;Kim, Hyung-Sun
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.548-551
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    • 2004
  • For the improvements in high transmittance, one of the most important factors of transparent dielectric is pore contents and pore size. This study have investigated the effect of frit size on the transmittance of zinc-boric system with a Pb-free composition. A mixed glass paste was used for thick films, which were made by screen printing methods on a glass substrate (PD200). These dielectric layers were measured for surface roughness, pores content and transmittance. The results show that increase of pore size and content have detrimental effects on the transmittance of films compared to those found in the PbO system.

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Polyethylene 계열 절연재료의 환경적·기계적 특성 (Wet Environmental and Mechanical Characteristics for Polyethylene-based Insulating Materials)

  • 송우창;최원석;박하용
    • 전기학회논문지P
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    • 제63권2호
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    • pp.119-123
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    • 2014
  • In this study, four kinds of specimens of PE(polyethylene)-based insulating materials were prepared for selecting the optimum insulation materials in a wet environment. The specimens were tested by various methods, the anti tracking test, the transmittance test in the water vapor transmittance(WVT) and the abrasion resistive test, etc. The HDPE(high-density polyethylene) specimen was showed excellent property in the tracking resistance test and the lowest transmittance in water vapor transmittance test. In the abrasion resistive test, the LLDPE(linear low-density polyethylene) and MDPE(medium-density Polyethylene) were showed excellent mechanical properties. The value of cut-through resistance for MDPE and HDPE were superior to that for LLDPE and LDPE(low-density polyethylene).