• Title/Summary/Keyword: high pressure discharge

검색결과 512건 처리시간 0.026초

Numerical prediction of a flashing flow of saturated water at high pressure

  • Jo, Jong Chull;Jeong, Jae Jun;Yun, Byong Jo;Moody, Frederick J.
    • Nuclear Engineering and Technology
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    • 제50권7호
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    • pp.1173-1183
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    • 2018
  • Transient fluid velocity and pressure fields in a pressurized water reactor (PWR) steam generator (SG) secondary side during the blowdown period of a feedwater line break (FWLB) accident were numerically simulated employing the saturated water flashing model. This model is based on the assumption that compressed water in the SG is saturated at the beginning and decompresses into the two-phase region where saturated vapor forms, creating a mixture of steam bubbles in water by bulk boiling. The numerical calculations were performed for two cases of which the outflow boundary conditions are different from each other; one is specified as the direct blowdown discharge to the atmosphere and the other is specified as the blowdown discharge to an extended calculation domain with atmospheric pressure on its boundary. The present simulation results obtained using the two different outflow boundary conditions were discussed through a comparison with the predictions using a simple non-flashing model neglecting the effects of phase change. In addition, the applicability of each of the non-flashing water discharge and saturated water flashing models for the confirmatory assessments of new SG designs was examined.

고전압 펄스 방전을 이용한 지하수 관정 스크린 공막힘 재생법 연구 (Feasibility Study for the Cleaning of Well Screens using High-voltage Pulsed Discharge)

  • 정경재;이석근;당정증;최길환;황용석;김철영;박영준
    • 지질공학
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    • 제23권1호
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    • pp.29-36
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    • 2013
  • 스크린 공막힘에 의하여 채수량이 감소된 지하수 관정은 여러 방법을 통하여 재생시켜주면 지하수 채수량을 개선시켜 관정의 수명을 연장할 수 있다. 본 논문에서는 화약이나 압축 유체를 사용하는 기존의 공막힘 재생기술을 대신할 수 있는 고전압 펄스 방전에 의한 지하수 관정 스크린 공막힘의 재생법에 대하여 연구하였다. 본 기술은 수중에 삽입된 전극에 순간적으로 고전압의 전기에너지를 주입하여 이 때 전극 사이에서 발생하는 고온, 고압의 플라즈마의 팽창력에 의하여 발생하는 수중 충격파를 이용하는 기술로, 기존 기술 대비 취급이 용이하며 구조가 간단하고 충격압의 크기 조절이 용이하다는 장점을 갖는다. 본 연구에서는 축전기 방전형 펄스 발생장치를 사용하여 약 200 J의 전기에너지를 수중에 삽입된 전극에 순간적으로 주입함으로써 전극으로부터 6 cm 떨어진 곳에서 약 10.7MPa의 수중 충격압을 얻었다. 이 충격압의 크기는 축전기의 충전 전압을 바꿔줌으로써 손쉽게 조절이 가능하였으며, 다양한 전압에서의 실험을 통하여 방전 전류의 첨두치와 선형적인 관계를 갖고 있음을 알았다. 또한 지하수 관정에 사용되는 스크린과 유사한 시료에 대한 모의실험을 통하여 이 기술을 이용한 지하수 관정의 세척 가능성을 확인하였다.

글로우방전을 이용한 폴리에스테르섬유의 발수가공 (Water Repellent Finishes of Polyester Fiber Using Glow Discharge)

  • Mo, Sang Young;Kim, Gi Lyong;Kim, Tae Nyun;Chun, Tae Il
    • 한국염색가공학회지
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    • 제5권4호
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    • pp.29-41
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    • 1993
  • In order to surface Hydrophobilization of Poly(ethylene terephthalate) (PET) fiber samples were treated in the atmosphere of CF$_{4}$ or $C_{2}$F$_{6}$glow discharge. The sample used in this study was PET film which is 75$\mu$m thick made by Teijin, O-Type(Japan). The cleaned samples were placed in plasma reactor made of pyrex glass cylinder, and plasma processing was carried out by glow discharge of CF$_{4}$ or $C_{2}$F$_{6}$ gas, being continuously fed by gas flow and continuously pumped out by a vacuum system. Electric power source for generate plasma state was sustained alternating current(60Hz) and voltage was sustained 600 volt. The duration of plasma treatment varied from 15 to 120 seconds except special case, the monomer gase pressure varied from 0.02 to 0.3 Torr and power range was 10 to 90 watts. The hydrophobic features of changed PET surface were evaluated by contact angle measurement and surface chemical characteristics were analyzed by ESCA. Results can be summerized as follows. 1. The most favorable setting position of substrate was the center area between the two electrodes. 2. $C_{2}$F$_{6}$ discharge current was lower than that of CF$_{4}$ when same voltage was sustained. Treated efficiency between CF$_{4}$ and $C_{2}$F$_{6}$ did not revealed significant differences under same electric power(wattage). 3. When monomer pressure is very low below 0.02 torr, as though substrate is exposed to CF$_{4}$ or $C_{2}$F$_{6}$ plasma, it tend to be hydrophilic through a little of fluorine bond and a great deal of oxidizing reaction. 4. There brought good hydrophobilization when monomer pressure was more 0.1 torr and duration of glow discharge treatment was over 45 seconds. When monomer pressure was too high, discharge current became low. Although prolong the duration, there was no more high hydrophobilization. 5. According to ESCA analysis, there were a little CF bond and a prevailing CF$_{2}$ bond in CF$_{4}$-treated substrate. There were CF$_{3}$, a little CF and a prevailing CF$_{2}$ bond in $C_{2}$F$_{6}$-treated substrate.d substrate.

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글로우 방전/방출분광분석법에 의한 주철시료의 분석 (Analysis of Cast Iron by Glow Discharge Emission Spectrometry)

  • 조경행;우진춘;한명섭
    • 분석과학
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    • 제6권3호
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    • pp.297-305
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    • 1993
  • 글로우 방전 방출원을 다색화장치에 연결시켜 개발된 글로우방전/방출분광법으로 탄소의 농도가 수 퍼센트에 이르러 스파크방출분광법으로서는 분석이 곤란한 주철시료를 분석하고 정확성을 검토하고자 하였다. 알곤가스 압력, 전압, 방전시간 등 glow discharge lamp(GDL)의 방전조건을 최적화시키고 이 조건에서 두 종류의 주철 표준시료(BAS, LECO)에 대해 원소별 방출 복사선의 세기와 농도의 상관관계를 조사하였다. Mn, Si, P, S 등 대부분 원소의 검정곡선이 양호한 직선성을 보여 주었고 탄소의 경우에는 표준시료의 종류에 따라 절편과 기울기값이 미소하게 계통적인 차이를 나타내었다.

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의사 DC 방전용 형광등 전자 안정기에 관한 연구 (A Study on Pseudo DC Discharging Electronic Bal lasts for Fluorescent Lamp)

  • 이범익;정화진;지철근
    • 한국조명전기설비학회:학술대회논문집
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    • 한국조명전기설비학회 1992년도 추계학술발표회논문집
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    • pp.11-15
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    • 1992
  • Currently-using low-pressure lamps are usually drivel by the AC power supply. There are good and bad points according to high or low frequency in AC power driving type. For the low-pressure lamps, its efficiency increases and flicker decreases when it ignites at high frequency. So we already use the high-frequency electronic ballast of the low-pressure discharge lamps broadly. But there are EMI interference in high-frequency driving type because of giving the fluorescent lamp the high- frequency current. So recently, we have a tendency to compensate for that defects by DC driving method. As follows, we suggest pseudo DC discharging electronic bar lasts for fluorescent lamps which have the characteristics of high efficiency and no flicker by driving constant current boosted square wave.

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이종절연재의 연면절연특성 (Surface Discharge Characteristics in Different Media)

  • 신성하
    • 한국산업융합학회 논문집
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    • 제15권2호
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    • pp.49-54
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    • 2012
  • With the improvement of industrial society, the high quality electrical energy, simplification of operation and maintenance, ensuring reliability and safety are being required. This paper reviews a basic data of the surface discharge characteristics for teflon resin in not only pure $N_2$, $N_2:O_2$ mixture gas and Dry-Air as being focused on environmentally friendly insulating Gas also $SF_6$. Used electrodes are Knife to Knife. With the changing distance of electrodes and pressure, we can find it, surface discharge voltages and surface dielectric strengths, respectively. Surface discharge Voltages of $N_2:O_2=80:20$ mixture gas are more higher than the $N_2:O_2$ Mixture gases.

Plasma Propagation Speed and Electron Temperature of Atmospheric Pressure Non-Thermal Ar Plasma Jet

  • 한국희;김동준;김현철;김윤중;김중길;이원영;나야나;조광섭
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.512-513
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    • 2013
  • Space and time resolved discharge images from an atmospheric pressure non-thermal Ar plasma jet have been observed by a ICCD camera to investigate the electron temperatures. Plasma jet device consisting of a syringe electrode inserted into a glass tube has been introduced. A high voltage is applied to the syringe electrode. The syringe needle has an outer diameter of 1.8 mm, an inner diameter of 1.3 mm, and a total length of 39.0 mm. The needle is inserted into a glass tube of outer diameter 2.4 mm and inner diameter 2.0 mm, and a total length of 80.0 mm. The Ar plasma propagation speed on the cathode has been shown to be about 2.1 km/s at input discharge voltage of 3.6 kV, discharge current of 19.9 mA and driving frequency of about 45 kHz. Particularly, the electron temperature in plasma jet were found to be about 1.8 eV at input discharge voltage of 3.6 kV and driving frequency of 45 kHz, respectively.

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Microelectromechnical system 소자를 위한 박막형 2차전지용 $SnO_2$ 음극박막의 충방전 특성 평가 (Charge/Discharge Characteristics of $SnO_2$ thin film as an anode of thin film secondary battery for microelectromechanical system device)

  • 남상철;조원일;전은정;신영화;윤영수
    • 한국진공학회지
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    • 제9권1호
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    • pp.36-41
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    • 2000
  • $SnO-2$ thin films for thin film secondary battery anode were deposited n glass substrate with stain-less steel collector and charge/discharge experiments were conducted to investigate feasibility of $SnO-2$ thin film as a new anode material. The as-deposited films were pure $SnO-2$ phase which is not related to deposition condition. The grain size on the surface of as-deposited films increased with increase of oxygen partial pressure. However, the grain size did not show any change above oxygen partial pressure of 80:20. The surface roughness of the as-deposited films increased after decreasing because of resputtering effect of oxygen negative ion in plasma. All films showed typical $SnO-2$ anode characteristics which has a side effect at the first cycle, which is not related to the deposition condition. The charge/discharge experiments of 200cycles indicated that capacity of $SnO-2$ films depended on oxygen contents and surface roughness. The cycle characteristics was determined by initial charge/discharge reaction. The $SnO-2$ film with low initial capacity showed more stable cycle characteristics than film with high initial capacity.

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Type III 수소 저장 용기에서 가스 모델(gas model)에 따른 배출(discharge) 현상의 수치 해석적 연구 (Numerical Analysis of Discharge Flow in Type III Hydrogen Tank with Different Gas Models)

  • 김무선;류준형;정수연;이성우;최성웅
    • 한국수소및신에너지학회논문집
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    • 제31권6호
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    • pp.558-563
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    • 2020
  • Hydrogen is attracting attention as an alternative energy source as an eco-friendly fuel without emitting environmental pollutants. In order to use hydrogen as an energy source, technologies such as hydrogen production and storage must be used, and new storage methods are being studied. In this study, the behavior of hydrogen in the storage tank were numerically studied under high-pressure hydrogen discharge conditions in a Type III hydrogen tank. Numerical results were compared with the experimental value and the results were quantitatively analyzed to verify the numerical implementation. With the results of pressure and temperature values under a given discharge condition, the Redich-Kwong gas model showed the adequate models with the smallest error between numerical and experimental results.

BaTiO3 타겟의 R.F. 방전 중 변수에 따른 광반사분광 특성 (Optical Emission Spectroscopy with Parameters During R.F. Discharge of BaTiO3 Target)

  • 박상식
    • 한국재료학회지
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    • 제21권9호
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    • pp.509-514
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    • 2011
  • In this study, optical emission spectroscopy was used to monitor the plasma produced during the RF magnetron sputtering of a $BaTiO_3$ target. The intensities of chemical species were measured by real time monitoring with various discharge parameters such as RF power, pressure, and discharge gas. The emission lines of elemental and ionized species from $BaTiO_3$ and Ti targets were analyzed to evaluate the film composition and the optimized growth conditions for $BaTiO_3$ films. The emissions from Ar(I, II), Ba(I, II) and Ti(I) were found during sputtering of the $BaTiO_3$ target in Ar atmosphere. With increasing RF power, all the line intensities increased because the electron density increased with increasing RF power. When the Ar pressure increased, the Ba(II) and Ti(I) line intensity increased, but the $Ar^+$ line intensity decreased with increasing pressure. This result shows that high pressure is of greater benefit for the ionization of Ba than for that of Ar. Oxygen depressed the intensity of the plasma more than Ar did. When the Ar/$O_2$ ratio decreased, the intensity of Ba decreased more sharply than that of Ti. This result indicates that the plasma composition strongly depends on the discharge gas atmosphere. When the oxygen increased, the Ba/Ti ratio and the thickness of the films decreased. The emission spectra showed consistent variation with applied power to the Ti target during co-sputtering of the $BaTiO_3$ and Ti targets. The co-sputtered films showed a Ba/Ti ratio of 1.05 to 0.73 with applied power to the Ti target. The films with different Ba/Ti ratios showed changes in grain size. Ti excess films annealed at $600^{\circ}C$ did not show the second phase such as $BaTi_2O_5$ and $TiO_2$.