• Title/Summary/Keyword: high current density

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Composited Conductive Materials for Enhancing the Ultrafast Performance for Anode in Lithium-Ion Battery (리튬이온전지 음극의 고속 성능 향상을 위한 도전재 복합화)

  • Ki-Wook, Sung;Hyo-Jin, Ahn
    • Korean Journal of Materials Research
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    • v.32 no.11
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    • pp.474-480
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    • 2022
  • Lithium-ion batteries (LIBs) are powerful energy storage devices with several advantages, including high energy density, large voltage window, high cycling stability, and eco-friendliness. However, demand for ultrafast charge/discharge performance is increasing, and many improvements are needed in the electrode which contains the carbon-based active material. Among LIB electrode components, the conductive additive plays an important role, connecting the active materials and enhancing charge transfer within the electrode. This impacts electrical and ionic conductivity, electrical resistance, and the density of the electrode. Therefore, to increase ultrafast cycling performance by enhancing the electrical conductivity and density of the electrode, we complexed Ketjen black and graphene and applied conductive agents. This electrode, with the composite conductive additives, exhibited high electrical conductivity (12.11 S/cm), excellent high-rate performance (28.6 mAh/g at current density of 3,000 mA/g), and great long-term cycling stability at high current density (88.7 % after 500 cycles at current density of 3,000 mA/g). This excellent high-rate performance with cycling stability is attributed to the increased electrical conductivity, due to the increased amount of graphene, which has high intrinsic electrical conductivity, and the high density of the electrode.

The Influence of Electrolytic Condition on Tunnel Etching and Capacitance Gain of High purity Aluminium Foil on capacitor (전해조건이 고순도 알루미늄 박 콘덴서의 터널에칭과 정전용량에 미치는 영향)

  • 이재운;이병우;김용현;이광학;김흥식
    • Journal of the Korean institute of surface engineering
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    • v.30 no.1
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    • pp.44-56
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    • 1997
  • Influence of electrochemical etching conditions on capacitance gain of aluminium electrolytic on capacitor foil has been investigated by etching cubic textured high purity aluminum foil in dilute hydrochloric acid. Uniformly distributed etch pit tunnels on aluminum surface have been obtained by pretreatment aluminium foil in 10% NaOH solution for 5 minutes followed by electrochemical etching. Electrostatic capacitance of etched aluminium foil anodized to high voltage increased with the increase of current density, total charge, temperature and concentration of electrolyte up to maximum CV-value and then deceased. Election optical observation of the etched foil revealed that the density of etch of etch pits increased with the increase of current density and concentration of electrolyte. this increase of etch pit density enlarged of the increase of capacitance. However, abnormal high current density and high electrolyte concentration induced the local dissolution of the foil surface which resulted the decrease of foil capacitance.

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A Study on Effect on Current Density Distribution, Inductance Gradient, and Contact Force by Variation of Armature and Rail Structure (아마츄어 및 레일의 구조 변화에 따른 전류 밀도, 인덕턴스 경도 및 접촉력의 영향 연구)

  • 김복기
    • The Transactions of the Korean Institute of Electrical Engineers B
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    • v.50 no.2
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    • pp.59-64
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    • 2001
  • The distribution of current in the conductors influenced by the armature geometry and velocity is an important parameter for determining performance of an electromagnetic launcher(EML). the electric current in the early launching stage tends to flow on the outer surfaces of the conductors, resulting in very high local electric current density. However, the tendency for current to concentrate on the surface is driven by the velocity skin effect later in launching stage. The high current density produces high local heating and, consequently, increases armature wear which causes several defects on EML system. This paper investigates the effects of rail/armature geometry on current density distribution, launcher inductance gradient (L'), and contact force. Three geometrical parameters are used here to characterize the railgun system. These are the ratio of contact length to root length, relative position of contact leading edge to root trailing edge, and the ratio of rail overhang to the rail height. The distribution of current density, L', contact force between various configurations of the armature and the rail are analyzed and compared by using the EMAP3D program.

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Development of Ultral Clean Machining Technology with Electrolytic Polishing Process

  • Lee, Eun-Sang;Park, Jeong--Woo;Moon, Young-Hun
    • International Journal of Precision Engineering and Manufacturing
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    • v.2 no.1
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    • pp.18-25
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    • 2001
  • Electrolytic polishing is the anodic dissolution process in the transpassive state. It removes non-metallic inclusion and improves mechanical and corrosion resistance of stainless steel. If there is a Bailby layer, it will be removed and the true structure of the surface will be restored. Electrolytic polishing is normally used to remove a very thin layer of material from the surface of metal object. A new electrolyte composed of phosphoric, sulfuric and distilled water has been developed in this study. Two current density, high & low current density regions, have been applied in this study. In this study, In the region of high current density, there is no plateau region but excellent electrolytic polishing effect can be accomplished in short machining time because material removel process and leveling process occur simultaneously. In the low current density region, there can be found plateau region. The material removal process and leveling process occur successively. The aim of this work is to determine electrolytic polishing for stainless steel in terms of high & low current density and workpiece surface roughness.

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Current Efficiency and Composit ion of Zn-Cr and Zn-Cr-X Ternary Alloy Electrodeposits (고속도금된 Zn-Cr 및 Zn-Cr-X 3원합금의 전류효율 및 조성)

  • Ye G.C.;Kim D.Y.;Ahn D.S.
    • Journal of the Korean institute of surface engineering
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    • v.36 no.3
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    • pp.256-262
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    • 2003
  • The current efficiency and the composition of Zn-Cr and Zn-Cr-X (X : Co, Mn) alloy electrodeposits were investigated by using chloride bath with EDTA auditive and flow cell plating system. The current efficiency of Zn-Cr alloy decreased with increasing current density, while it increased with the content of Co and Mn of the Zn-Cr-X alloy bath in high current density region. The Cr content in Zn-Cr alloy increased from 1.4-2.7 to $28wt\%$ with increasing current density and the phase structure of the alloys changed from $\eta-Zn$ through $\eta-Zn+\gamma'-ZnCr\;to\;\gamma'-ZnCr$ with Increasing Cr content of the alloys. The Co content in Zn-Cr-Co alloys increased with Co content of the bath, while Cr content of the alloy increased or decreased in low current density region $(10-75A/dm^2)$ or high current density region $(75-100A/dm^2)$, respectively. $\gamma-ZnCo$ phase was formed in the Zn-Cr-Co alloy with above $9.0wt\%$ Co. The content of Mn and Cr in Zn-Cr-Mn alloys increased or decreased with the increase of current density in high current density region, respectively while Cr content of the alloy decreased noticeably with the increase of Mn content in the bath. Two phases of $\delta_1-ZnMn$ and $\gamma'-ZnCr$ were formed in the Zn-Cr-Mn alloy with above $8.6wt\%$ Mn.

MF(Multi-Function) Cathode for High Current Density CRT

  • Kim, Tae-Wook;Bae, Min-Cheol;Youn, Young-Jun
    • Journal of Information Display
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    • v.5 no.4
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    • pp.23-26
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    • 2004
  • A limitation of oxide cathode is the high current density, caused by low electrical conductivity of an emitter layer. This limitation can be overcome by increasing the conductivity, and uniform dispersion of Ni powder and pore agent could be achieved by using the screen-printing method. This new cathode has shown not only high current density reliability but also improved performance characteristics and as such given the name "Multi-Function cathode". It is expected to be a good replacement of the impregnated cathode.

Electrodeposition behaviors of zinc from neutral chloride baths at high current density (중성염화물욕에서 아연의 고전류밀도 전착특성)

  • 김영근
    • Journal of the Korean institute of surface engineering
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    • v.29 no.4
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    • pp.219-228
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    • 1996
  • Neutral Zinc Electroplating(NZE) utilizing the electrolyte of pH 6 to 8 has advantages in waste treatment and the protection of equipment. NZE is beneficially used in chromating treatment, but the limiting current density and the current efficiency are low. Therefore this study is investigated to analyse the characteristics of NZE and to obtain high current density and current efficiency. The deposition potential of zinc in the NZE bath is about 110mV, which is lower than acidic bath. The current density possibily increases up to 60A/d$\m^2$ in lower complexing agent content and pH 6. More than 90% of cathodic current efficiency was obtained in NZE bath. The NZE morphology shows smaller grains than acidic bath. The addition of 4$m\ell$/1 second brightener gives finer morphology. As pH becomes higher, (002) plan decreases and (100), (101) and (110) planes increase in the no additives solution.

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Effects of Process Variables on The Electrochemical Recovery of Palladium in A HCl Solution

  • Kim, Min-Seuk;Lee, Jae-Chun;Kim, Won-Baek
    • Resources Recycling
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    • v.14 no.1
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    • pp.55-63
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    • 2005
  • This study investigated the electrochemical recovery of palladium in a HCl solution that is used for palladium leaching. The high acidity of HCl solution and the low concentration of Pd ions increased the cathodic overpotential and reduced the limiting current density. Lowering the current density produced dense deposits; however, they were under high tensile stress. Raising the temperature affected both the densification and the stress, which enabled the attainment of dense Pd deposits under low stress. Lowering the current density and raising the temperature up to 70$^{\circ}C$ was recommended for the recovery of palladium as sound bulk Pd deposits. Current efficiency was over 85% at the initial stage of recovery may decrease the current efficiency, since a low Pd ion concentration results in a low limiting current density.

High-rate growth $YBa_2$$Cu_3$$O_{7-x}$ thick films and thickness dependence of critical current density (Y$Ba_2$$Cu_3$$O_{7-x}$ 후막의 고속 증착과 임계 전류 밀도의 두께 의존성)

  • Jo W.
    • Progress in Superconductivity
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    • v.6 no.1
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    • pp.13-18
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    • 2004
  • High-.ate in-situ$ YBa_2$Cu$Cu_3$$O_{7-x}$ (YBCO) film growth was demonstrated by means of the electron beam co-evaporation. Even though our oxygen pressure is low, ∼$5 ${\times}$10^{-5}$ Torr, we can synthesize as-grown superconducting YBCO films at a deposition rate of around 10 nm/s. Relatively high temperatures of around 90$0^{\circ}C$ was necessary in this process so far, and it suggests that this temperature at a given oxygen activity allows a Ba-Cu-O liquid formation along with an YBCO epitaxy. Local critical current density shows a clear correlation with local resistivity. Homogeneous transport properties with a large critical current density ($4 ∼ 5 MA/\textrm{cm}^2$ at 77K, 0T) are observed in top faulted region while it is found that the bottom part carries little supercurrent with a large local resistivity. Therefore, it is possible that thickness dependence of critical current density is closely related with a topological variation of good superconducting paths and/or grains in the film bodies. The information derived from it may be useful in the characterization and optimization of superconducting films for electrical power and other applications.

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Pulse Rectifier For Electroplating (전기도금용 펄스 전원장치)

  • 권순걸
    • Proceedings of the KIPE Conference
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    • 2000.07a
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    • pp.685-688
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    • 2000
  • Pulse plating is about to deposit material at high current density compared to conventional DC plating. For example pulse plating can get more fine grain can improve adhension and metal distribution and current efficiency can reduce internal stress and crack. therefore we studied pulsed power supply which has high current density and improve deposition quality and increase plating speed in this paper.

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