• 제목/요약/키워드: high blocking voltage

검색결과 103건 처리시간 0.023초

LIGBT with Dual Cathode for Improving Breakdown Characteristics

  • Kang, Ey-Gook;Moon, Seung-Hyun;Sung, Man-Young
    • Transactions on Electrical and Electronic Materials
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    • 제1권4호
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    • pp.16-19
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    • 2000
  • Power transistors to be used in Power Integrated Circuits(PIC) are required to have low on resistance, fast switching speed, and high breakdown voltage. The lateral IGBTs(LIGBTs)are promising power devices for high voltage PIC applications, because of its superior device characteristics. In this paper, dual cathode LIGBT(DCIGBT) for high voltage is presented. We have verified the effectiveness of high blocking voltage in the new device by using two dimensional devices simulator. We have analyzed the forward blocking characteristics , the latch up performance and turn off characteristics of the proposed structure. Specially, we have focused forward blocking of LIGBT. The forward blocking voltage of conventional LIGBT and the proposed LIGBT are 120V and 165V, respectively. . The forward blocking characteristics of the proposed LIGBT is better than that of the conventional LIGBT. This forward blocking comparison exhibits a 1.5 times improvement in the proposed LIGBT.

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고내압 특성을 위한 진성영역과 트렌치 구조를 갖는 베이스 저항 사이리스터 (A Novel Trench Electrode BRT with Intrinsic Region for High Blocking Voltage)

  • 강이구;성만영
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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    • pp.243-246
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    • 2001
  • In this paper, we have proposed a novel trench electrode Base Resistance Thyristor(BRT) and trench electrode BRT with a intrinsic region. A new power BRTs have shown superior electrical characteristics including snab-back effict and forward blocking voltage more than the conventional BRT. Especially, the trench electrode BRT with intrinsic region has obtained high blocking voltage of 1600V. The blocking voltage of conventional BRT is about 400V at the same size. Because the breakdown mechanism of BRT is avalanch breakdown by impact ionization, the trench electrode BRT with intrinsic region has suppressed impact ionization, effectively. If we use this principle, we can develope super high voltage power devices and applicate to another power devices including IGBT, EST and etc.

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고내압 특성을 위한 진성영역과 트렌치 구조를 갖는 베이스 저항 사이리스터 (A Novel Trench Electrode BRT with Intrinsic Region for High Blocking Voltage)

  • 강이구;성만영
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집
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    • pp.243-246
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    • 2001
  • In this paper, we have proposed a novel trench electrode Base Resistance Thyristor(BRT) and trench electrode BRT with a intrinsic region. A new power BRTs have shown superior electrical characteristics including snab-back effect and forward blocking voltage more than the conventional BRT. Especially, the trench electrode BRT with intrinsic region has obtained high blocking voltage of 1600V. The blocking voltage of conventional BRT is about 400V at the same size. Because the breakdown mechanism of BRT is avalanch breakdown by impact ionization, the trench electrode BRT with intrinsic region has suppressed impact ionization, effectively. If we use this principle, we can develope super high voltage power devices and applicate to another power devices including IGBT, EST and etc.

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고내압 특성을 위한 진성영역과 트렌치 구조를 갖는 베이스 저항 사이리스터 (A Novel Trench Electrode BRT with the Intrinsic Region for Superior Electrical Characteristics)

  • 강이구;성만영
    • 한국전기전자재료학회논문지
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    • 제15권3호
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    • pp.201-207
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    • 2002
  • In this paper, we haute proposed a novel trench electrode Base Resistance Thyristor(BRT) and trench electrode BRT with a intrinsic region. New power BRTs have shown superior electrical characteristics including the snab-back effect and the forward blocking voltage more than the conventional BRT. Especially, the trench electrode BRT with the intrinsic region has obtained high blocking voltage of 1600V. The blocking voltage of conventional BRT is about 400V at the same size. Because the breakdown mechanism of the BRT is the avalanch breakdown by impact ionization, the trench electrode BRT with intrinsic region has suppressed impact ionization, effectively. If we use this principle, we can develop a super high voltage power device and it applies to another power device including IGBT, EST and etc.

정보통신기기용 과도전압 차단장치의 개발에 관한 연구 (A Study on the Development of a Transient Voltage Blocking Device for Info-communication Facilities)

  • 한주순
    • Journal of Advanced Marine Engineering and Technology
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    • 제23권2호
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    • pp.159-167
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    • 1999
  • This paper presents a new transient voltage blocking device(TOBD)which low power and high frequency bandwidth to protect info-communication facilities from transient voltages. Conventional protection devices have some problems such as low frequency bandwidth low ener-gy capacity and high remnant voltage. in order to improve these limitations a hybrid type TOBD which consists of a gas tube avalanche diodes and junction type field effect transistor (JFETs) is developed. The TOBD differs from the conventional protection devices in configuration and JFETs are used as an active non-linear element and a high speed switching diode with low capacitance limited high current. Therefore the avalanche diode with low energy capacity are protected from the high current and the TOBD has a very small input capacitance. From the performance test using combination surge generator which can produce $1.2/50{\mu}m$ 4.2 kV/max, $8/20{\mu}m$ 2.1 kAmax it is confirmed that the proposed TOBD has an excellent protection per-formance in tight clamping voltage and limiting current characteristics.

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Memory Characteristics of High Density Self-assembled FePt Nano-dots Floating Gate with High-k $Al_2O_3$ Blocking Oxide

  • Lee, Gae-Hun;Lee, Jung-Min;Yang, Hyung-Jun;Kim, Kyoung-Rok;Song, Yun-Heub
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.388-388
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    • 2012
  • In this letter, We have investigated cell characteristics of the alloy FePt-NDs charge trapping memory capacitors with high-k $Al_2O_3$ dielectrics as a blocking oxide. The capacitance versus voltage (C-V) curves obtained from a representative MOS capacitor embedded with FePt-NDs synthesized by the post deposition annealing (PDA) treatment process exhibit the window of flat-band voltage shift, which indicates the presence of charge storages in the FePt-NDs. It is shown that NDs memory with high-k $Al_2O_3$ as a blocking oxide has performance in large memory window and low leakage current when the diameter of ND is below 2 nm. Moreover, high-k $Al_2O_3$ as a blocking oxide increases the electric field across the tunnel oxide, while reducing the electric field across the blocking layer. From this result, this device can achieve lower P/E voltage and lower leakage current. As a result, a FePt-NDs device with high-k $Al_2O_3$ as a blocking oxide obtained a~7V reduction in the programming voltages with 7.8 V memory.

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Numerical Analysis on the Electrical Characteristics of FS TIGBT

  • Lee, Jong-Seok;Kang, Ey-Goo;Sung, Man-Young
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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    • pp.63-64
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    • 2006
  • Here we present detailed simulation results of trench field stop IGBTs. Besides the reduced on-state voltage drop there is also an Increase of forward blocking voltage. A trench gate IGBT has low on-state voltage drop mainly due to the removal of the JFET region and a field stop IGBT has high forward blocking voltages due to the trapezoidal field distribution under blocking condition. We have simulated the static characteristics of TIGBT with field stop technology by 2D simulator(MEDICI). The simulated result of forward blocking voltage and on-state voltage drop is about 1,408V and 1.3V respectively at $110{\mu}m$ N-drift thickness.

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Design of Snubber Capacitor for Equalization of Voltage Sharing in Series Connected SiC MOSFETs

  • Min, Juhwa;Suh, Yongsug
    • 전력전자학회:학술대회논문집
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    • 전력전자학회 2017년도 전력전자학술대회
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    • pp.188-189
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    • 2017
  • There has been a growing demand for power semiconductor switches equipped with high-voltage blocking capability of kV range and fast-switching characteristics of ns range in various plasma application. This paper investigates the application of SiC MOSFETs in the particular plasma application which requires the blocking voltage of 4.5kV and the switching transient time of less than 100ns. In order to meet the required blocking voltage, the series connection of multiple SiC MOSFETs is adopted in this paper. Also, snubber capacitors are employed to equalize the voltage sharing among the series connected SiC MOSFETs. The simulation and experimental result successfully verifies the application of SiC MOSFETs and snubber capacitors in the plasma application requiring high-voltage and fast-switching load dynamics.

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향상된 항복특성을 위한 수평형 파워 MOS의 설계 (A Design of Lateral Power MOS with Improved Blocking Characteristics)

  • 김대종
    • 한국컴퓨터산업교육학회:학술대회논문집
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    • 한국컴퓨터산업교육학회 2003년도 제4회 종합학술대회 논문집
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    • pp.95-98
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    • 2003
  • Power semiconductors are being currently used as a application of intelligent power inverters to a refrigerator, a washing machine and a vacuum cleaner as well as core parts of industrial system. The rating of semiconductor devices is an important factor in decision on the field of application and the forward blocking voltage is one of factors in decision of the rating. The Power MOS device has a merit of high input impedance, short switching time, and stability in temperature as well known. Power MOS devices are mainly used as switches in the field of power electronics, especially the on-state resistance and breakdown voltage are regarded as the most important parameters. Power MOS devices that enable a small size, a light weight, high-integration and relatively high voltage are required these days. In this paper, we proposed the new lateral power MOS which has forward blocking voltage of 250V and contains trench electrodes and verified manufactural possibility by using TSUPREM-4 that is process simulator.

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NSCR_PPS 소자에서 채널차단 이온주입 변화에 따른 최적의 정전기보호소자 설계 (Optimal Design of ESD Protection Device with different Channel Blocking Ion Implantation in the NSCR_PPS Device)

  • 서용진;양준원
    • 한국위성정보통신학회논문지
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    • 제11권4호
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    • pp.21-26
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    • 2016
  • PPS 소자가 삽입된 N형 실리콘 제어 정류기(NSCR_PPS) 소자에서 채널차단영역의 이온주입 변화가 정전기 보호 성능에 미치는 영향을 연구하였다. 종래의 NSCR 표준소자는 on 저항, 스냅백 홀딩 전압 및 열적 브레이크다운 전압이 너무 낮아 마이크로칩의 정전기보호소자로 적용이 어려웠다. 그러나 본 연구에서 제안하는 채널 차단 영역의 이온주입 조건을 변화시켜 각각 변형설계된 소자에서는 채널 차단 이온주입이 정전기 보호성능의 향상에 영향을 주는 중요한 파라미터였으며, CPS_PDr+HNF 구조의 변형소자는 정전기보호소자의 설계창을 만족시키는 향상된 정전기보호성능을 나타내어 고전압 동작용 마이크로 칩의 정전기보호 소자로 적용 가능함을 확인하였다.