• Title/Summary/Keyword: gas phase reaction

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A Study on the Formation of Octanenitrile as a Precursor for Synthesis of Carboxylic Acid (카르복실산 합성전구체(合成前驅體)로서의 옥탄니트릴의 생성반응(生成反應)에 관(關한) 연구(硏究))

  • Kim, Yong-In;Oh, Yang-Hwan;Kim, Kwang-Sik;Lee, Dong-Woo
    • Journal of the Korean Applied Science and Technology
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    • v.6 no.2
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    • pp.29-37
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    • 1989
  • Using the quarternary ammonium salts as phase transfer catalyst, the nucleophilic substitution reaction of 1-chlorooctane with sodium-cyanide was investigate kinetically with respect to the formation of octanenitrile. The product was analyzed with gas chromatograph, and quantity of octanenitrile was measured. The reaction condition was considered by the effect of the reaction temperature, of the species and the amount of catalyst, of the speed of strirring, and of the concentration of reactants. The reaction was carried out in the first order on the concentration of 1-chlorooctane and sodium cyanide, respectively. The over-all order was 2nd. The activation energies for the nucleophilic substitution reaction of 1-chlorooctane and 1-bromooctane under tetrabutylammonium hydrogen-sulfate were calculated as 2.05 and 10.08kcal/mol, respectively. The effect of various caltalysts was decreased in the order of tetrabutylammonium bromide, terabutylammonium, tetrabutylammonium hydrogensulfate, and tetrabutylammonium iodide. The reaction rate was dependent on the concentration of sodium-cyanide dissolved in the aqueous phase, and the good result was shown when the mol ratio between 1-chlorooctane and sodium cyanide was one per three.

Metal-Organic Vapor Phase Epitaxy : A Review II. Process and charactristics (MOVPE 단결정층 성장법 II. MOVPE공정 및 특징)

  • 정원국
    • Journal of the Korean institute of surface engineering
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    • v.23 no.2
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    • pp.1-10
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    • 1990
  • Metal-Organic Vapor Phase Epitaxy (MOVPE) is an epitaxial process utilizaing ane or more of organometallice as reactnte to grow compound semicond semiconductror layers. MOVPE is basically a cold wall process in which reactants are delivered without reacting with each other to the heated substrate where reactants are thermally decomposed to from compound semiconductors through chemical reaction. Since reactants are delivered as gas phase and the formation of the single crystal compunds depends on the thermal decomposition of the reactants, details of MOVPE relies on the hydrodynamics and pyroltsis and chemical reation of reactants inside on reaction chamber. It has been demonstrated that MOVPE is capable of growing virtually all of the III-V, II-VI and IV-VI compound semiconductrs, fabricating ultrathin epilayers, for ming abrupt hetrointerfaces with monolayer transition width, and is suitable for multi-wafer operation yilding a high throghtput. Overiew of reactror componts and layer, characteristics, and status of MOVPE are discussed.

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Understanding Coal Gasification and Combustion Modeling in General Purpose CFD Code (범용 CFD 코드에서 석탄 가스화 및 연소 모델링에 관한 이해)

  • Lee, Hoo-Kyung;Choi, Sang-Min;Kim, Bong-Keun
    • Journal of the Korean Society of Combustion
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    • v.15 no.3
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    • pp.15-24
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    • 2010
  • The purpose of this study is to assess approaches to modeling coal gasification and combustion in general purpose CFD codes. Coal gasification and combustion involve complex multiphase flows and chemical reactions with strong influences of turbulence and radiation. CFD codes would treat coal particles as a discrete phase and gas species are considered as a continuous phase. An approach to modeling coal reaction in $FLUENT^{(R)}$, selected in this study as a typical commercial CFD code, was evaluated including its devolatilization, gas phase reactions, and char oxidation, turbulence, and radiation submodels. CFD studies in the literature were reviewed to show the uncertainties and limitations of the results. Therefore, the CFD analysis gives useful information, but the results should be carefully interpreted based on understandings on the uncertainties associated with the modelings of coal gasification and combustion.

Theoretical Studies on the Gas-Phase Wittig-Oxy-Cope Rearrangement of Deprotonated Diallyl Ether

  • Kim, Chang-Kon;Lee, Ik-Choon;Lee, Hai-Whang;Lee, Bon-Su
    • Bulletin of the Korean Chemical Society
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    • v.12 no.6
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    • pp.678-681
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    • 1991
  • The Wittig-oxy-Cope rearrangements of deprotonated diallyl ether, I, $CH_2={\bar{C}}H-CH-O-CH_2-CH=CH_2$, have been investigated theoretically by the AM1 method. A two step mechanism forming a Wittig product ion, II, $(CH_2=CH)$ $(CH_2=CH-CH_2)$ $CHO^-$, through a radical-pair intermediate was found to provide the most favored reaction pathway in the Wittig rearrangement. The subsequent oxy-Cope rearrangement from species II also involves a two step mechanism through a biradicaloid intermediate. The intramolecular proton transfer in I (to form $CH_2=CH-CH_2-O-{\bar{C}}H-CH=CH_2$) is a higher activation energy barrier process compared to the Wittig and oxy-Cope rearrangements and is considered to be insignificant. These results are in good agreement with the condensed-phase as well as gas-phase experimental results.

Stability of ZnAl2O4 Catalyst for Reverse-Water-Gas-Shift Reaction (RWGSR)

  • Joo, Oh-Shim;Jung, Kwang-Deog
    • Bulletin of the Korean Chemical Society
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    • v.24 no.1
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    • pp.86-90
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    • 2003
  • Reverse-Water-Gas-Shift reaction (RWGSR) was carried out over the ZnO, $Al_2O_3,\;and\;ZnO/Al_2O_3$ catalysts at the temperature range from 400 to 700 ℃. The ZnO showed good specific reaction activity but this catalyst was deactivated. All the catalysts except the $ZnO/Al_2O_3$ catalyst (850 ℃) showed low stability for the RWGSR and was deactivated at the reaction temperature of 600 ℃. The $ZnO/Al_2O_3$ catalyst calcined at 850 ℃ was stable during 210 hrs under the reaction conditions of 600 ℃ and 150,000 GHSV, showing CO selectivity of 100% even at the pressure of 5 atm. The high stability of the $ZnO/Al_2O_3$ catalyst (850 ℃) was attributed to the prevention of ZnO reduction by the formation of $ZnAl_2O_4$ spinel structure. The spinel structure of $ZnAl_2O_4$ phase in the $ZnO/Al_2O_3$ catalyst calcined at 850 ℃ was confirmed by XRD and electron diffraction.

Fabrication of Organic-Inorganic Superlattice Films Toward Potential Use For Gas Diffusion Barrier

  • Yun, Gwan-Hyeok;Muduli, Subas Kumar;Seong, Myeong-Mo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.394-394
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    • 2012
  • We fabricated organic-inorganic superlattice films using molecular layer deposition (MLD) and atomic layer deposition (ALD). The MLD is a gas phase process in the vacuum like to atomic layer deposition (ALD) and also relies on a self-terminating surface reaction of organic precursor which results in the formation of a monolayer in each sequence. In the MLD process, 'Alucone' is very famous organic thin film fabricated using MLD. Alucone layers were grown by repeated sequential surface reactions of trimethylaluminum and ethylene glycol at substrate temperature of $80^{\circ}C$. In addition, we developed UV-assisted $Al_2O_3$ with gas diffusion barrier property better than typical $Al_2O_3$. The UV light was very effective to obtain defect-free, high quality $Al_2O_3$ thin film which is determined by water vapor transmission rate (WVTR). Ellipsometry analysis showed a self-limiting surface reaction process and linear growth of each organic, inorganic film. Composition of the organic films was confirmed by infrared (IR) spectroscopy. Ultra-violet (UV) spectroscopy was employed to measure transparency of the organic-inorganic superlattice films. WVTR is calculated by Ca test. Organic-inorganic superlattice films using UV-assisted $Al_2O_3$ and alucone have possible use in gas diffusion barrier for OLED.

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A Gas-Phase Investigation of Oxygen-Hydrogen Exchange Reaction of O(3P) + C2H5 → H(2S) + C2H4O

  • Jang, Su-Chan;Park, Min-Jin;Choi, Jong-Ho
    • Bulletin of the Korean Chemical Society
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    • v.35 no.3
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    • pp.839-844
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    • 2014
  • The gas-phase radical-radical reaction $O(^3P)$ + $C_2H_5$ (ethyl) ${\rightarrow}$ $H(^2S)$ + $CH_3CHO$(acetaldehyde) was investigated by applying a combination of vacuum-ultraviolet laser-induced fluorescence spectroscopy in a crossed beam configuration and ab initio calculations. The two radical reactants $O(^3P)$ and $C_2H_5$ were respectively produced by photolysis of $NO_2$ and supersonic flash pyrolysis of the synthesized precursor azoethane. Doppler profile analysis of the nascent H-atom products in the Lyman-${\alpha}$ region revealed that the average translational energy of the products and the average fraction of the total available energy released as translational energy were $5.01{\pm}0.72kcalmol^{-1}$ and 6.1%, respectively. The empirical data combined with CBS-QB3 level ab initio theory and statistical calculations demonstrated that the title exchange reaction is a major channel and proceeds via an addition-elimination mechanism through the formation of a short-lived, dynamical addition complex on the doublet potential energy surface. On the basis of systematic comparison with several exchange reactions of hydrocarbon radicals, the observed small kinetic energy release can be explained in terms of the loose transition state with a product-like geometry and a small reverse activation barrier along the reaction coordinate.

The Kientic Study of Ozone$(O_3)$ with Sulfur Trioxide#(SO_3)$ in the Gas Phase (기체상태에서의 오존$(O_3)$과 삼산화황$(SO_3)$의 반응연구)

  • Kwon Young Sik
    • Journal of the Korean Chemical Society
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    • v.36 no.5
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    • pp.644-651
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    • 1992
  • The kinetics of the gas phase reaction of ozone(∼0.5 torr) with sulfur trioxide was investigated in the range of 6∼12 torr pressure at 69∼150${\circ}C$. The reaction rate of ozone with sulfur trioxide was faster than the reaction rate of $O_3 in the presence of CO_2 alone. No evidence for a molecular reaction of O_3 with SO_3 was found and the faster rate is probably due to impurity (HX) from the SO_3 reactant which gives rise to a chain reaction initiated by O_3 + HX → OH + O_2 + X and also SO_3 has a larger collision diameter, which may be attributed to the O3 thermal decomposition more feasibly. The proposed experimental law [-d(O_3)/dt] = k_a(SO_3)(O_3) + k_b(O_3)^{3/2} gives a rate constant ka(M-1 s-1) = (1.55 {\pm} 0.67) {\times} 105 e-{(9.27 0{\pm}0.43)kcal/RT}.$

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Development of Analysis Model for Down Scaled Two Phase Catalytic Reactor (초소형 촉매 이상 분해 반응기 해석 모델 개발)

  • Lee, Dae-Hoon;Kwon, Se-Jin
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.28 no.1
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    • pp.24-30
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    • 2004
  • Analysis model for the two-phase catalytic reactor is presented. With the progress in development of micro thermofluidic devices, needs fur understanding of the phenomena in two phase reaction in cm scale has been arisen. To investigate thermal and reactive performance of down scaled two phase reactor simple analysis model that is a kind of lumped flow model is proposed. Analysis model presented is based on the experiment on mm scale model reactor. Target experiment is catalytic decomposition of 70wt% hydrogen peroxide with existence of perovskite L $a_{0.8}$S $r_{0.2}$Co $O_3$ catalyst. It is composed of balance equations of mass and energy. Each phase is considered to be a species fur the simplicity. Axial diffusion and transversal distribution of properties are neglected. Two phase catalytic reaction is modeled as successive gasification of liquid lump around catalyst and reaction in gas phase. Heat transfer is modeled by model function ofNu number. Modeled Nu is expressed as Nu=N $u_{0}$ (1+ $a_1$( $a_2$ $T^{-}$ $a_3$)exp( $a_4$ $T^{-1}$)exp( $a_{5}$ z). Transfer coefficients are determined by the comparison of experimental results. With the model, heat transfer characteristics are investigated. Also by the mass transfer coefficient, characteristics in mass transfer is investigated. With the result basic understanding on design and analysis of mm scale two-phase reactive device is obtained. Also it can be further applied to micro scale reactive device fabricated by micromachining.ing..

Nitridation of Silicon Powder Compacts in Air (Air 분위기에서 규소성형체의 질화반응)

  • 최석홍;안영필
    • Journal of the Korean Ceramic Society
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    • v.25 no.4
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    • pp.380-384
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    • 1988
  • This investigation includes nitridation phenomena of silicon powder compacts in air. Nitridation reaction condition has been provided with using silicon nitride bed and active carbon additive. Reaction products are Oxynitride, $\alpha$-Si3N4, and $\beta$-Si3N4, Oxynitride(Si2N2O) phase in formed at outer surface layer ofsilicon powder compacts. $\alpha$-Si3N4, and $\beta$-Si3N4 are formed at inner region of powder compacts. Microstructural observation indicates that nitridation mechanism in this work is the same as conventional nitridation mechanism nitrogen gas.

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