• Journal of Mechanical Science and Technology
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• 제16권7호
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• pp.966-974
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• 2002

An analytic approach has been employed to study condensate film thickness distribution inside cave-shaped cavity of a flat plate heat pipe. The results indicate that the condensate film thickness largely depends on mass flow rate and local velocity of condensate. The increasing rate of condensate film for circular region reveals about 50% higher value than that of vertical region. The physical properties of working fluid affect significantly the condensate film thickness, such as the condensate film thickness for the case of FC-40 are 5 times larger than that of water. In comparison with condensation on a vertical wall, the average heat transfer coefficient in the cave-shaped cavity presented 10∼15% lower values due to the fact that the average film thickness formed inside the cave-shaped cavity was larger than that of the vertical wall with an equivalent flow length. A correlation formula which is based on the condensate film analysis for the cave-shaped cavity to predict average heat transfer coefficient is presented. Also, the critical minimum fill charge ratio of working fluid based on condensate film analysis has been predicted, and the minimum fill charge ratios for FC-40 and water are about Ψ$\_$crit/=3∼7%, Ψ$\_$crit/=0.5∼1.3% respectively, in the range of heat flux q"=5∼90kW/㎡.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1995년도 하계학술대회 논문집 C
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• pp.1098-1101
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• 1995

NbTi thin films were prepared on Si wafer and Cu substrate by rf magnetron sputtering in the range of sputtering pressure $3{\times}10^{-2}$torr to $3{\times}10^{-4}$torr at room temperature. The influence of sputtering pressure and substrate type on crystallographic orientation and morphology of NbTi thin films was investigated by using X-ray diffraction(XRD) and scanning electron microscopy(SEM), respectively. And the effect of crystallographic orientation and morphology of NbTi film on electromagnetic behaviors was estimated by measuring critical current in various applied magnetic field. The film morphology changed from porous structure consisting of tapered crystallites to densely deposited film decreasing with sputtering pressure. The change of crystallographic orientation with the sputtering pressure and rf power was calculated from the texture coefficient of(002) plane based on XRD patterns. It was found that a change of texture coefficient of(002) plane increased with decreasing sputtering pressure. From observation of critical current in various applied magnetic field, we have identified that the change of critical current abruptly decrease applying with magnetic field and NbTi film produced at high sputtering pressure does not exhibit superconductivity but at low sputtering pressure shows superconductivity.

• 한국전기전자재료학회논문지
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• 제14권6호
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• pp.470-474
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• 2001

This paper describes the fabrication and characteristics of CrN thin-film type pressure sensors, in which the sensing elements were deposited on SuS. 630 diaphragm by DC reactive magnetron sputtering in an argon-nitride atmosphere(Ar-(10%)N$_2$). The optimized condition of CrN thin-film sensing elements was thickness range of 3500$\AA$ and annealing condition(300$\^{C}$, 3 hr) in Ar-10%N$_2$ deposition atmosphere. Under optimum conditions, the CrN thin-films for strain gauges is obtained a high resistivity, ρ=1147.65 $\mu$Ωcm, a low temperature coefficient of resistance, TCR=186ppm/$\^{C}$ and a high temporal stability with a good longitudinal, 11.17. The output sensitivity of fabricated CrN thin-film type pressure sensors is 2.36 mV/V, 4∼20nA and the maximum non-linearity is 0.4%FS and hysteresis is less than 0.2%FS.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 하계학술대회 논문집
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• pp.737-740
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• 2001

This paper describes the fabrication and characteristics of CrN thin-film type pessure sensors, which the sensing elements were deposited on SUS. 630 diaphragm by DC reactive magnetron sputtering in an argon-nitride atmosphere(Ar-(10%)N$_2$). The optimized condition of CrN thin-film sensing elements was thickness range of 3500${\AA}$ and annealing condition(300$^{\circ}C$, 3 hr) in Ar-10 %N$_2$deposition atmosphere. Under optimum conditions, the CrN thin-films for strain gauges is obtained a high resistivity, $\rho$=1147.65 ${\mu}$$\Omega$cm, a low temperature coefficient of resistance, TCR=-186 ppm/$^{\circ}C$ and a high temporal stability with a good longitudinal, 11.17. The output sensitivity of fabricated CrN thin-film type pressure sensors is 2.36 mV/V, 4∼20 mA and the maximum non-linearity is 0.4 %FS and hysteresis is less than 0.2 %FS.

• 한국표면공학회지
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• 제42권4호
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• pp.173-178
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• 2009

DLC film was synthesized on plastic injection mold(SKD11, $30\;mm\;{\times}\;19\;mm\;{\times}\;0.5\;mm$) and Si(100) wafer for 2 h at $130^{\circ}C$ under 6 mTorr using hybrid method of rf sputtering and ion source. The obtained film was analysed by Raman spectroscopy, AFM, TEM, Nano indenter and scratch tester, etc. The film was defined as an amorphous phase. In the Raman spectrum, broad peak of $sp^2$-bonded carbon attributed to graphite at $1550\;cm^{-1}$ were observed, and the ratio of ID($sp^3$ diamond intensity)/IG($sp^2$ graphite intensity) was approximately 0.54. The adhesion of DLC film was more than 80 N with scratch tester when $0.2\;{\mu}m$ thickness Cr was coated as interlayer. The micro-hardness was distributed at 35~37 GPa. The friction coefficient was 0.02~0.07, and surface roughness(Ra) was 0.34~1.64 nm. The lifetime of DLC coated plastic injection mold using as a connector part in computer was more than 2 times of non-coated mold.

• 한국전기전자재료학회논문지
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• 제20권6호
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• pp.520-526
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• 2007

In order to acquire fundamental informations to fabricate high precision thin film resistors, NiCr/NiCrSi alloy films were prepared using Ni and Cr targets. Effect of composition on the electrical properties of the NiCr/NiCrSi alloy film were then investigated. Considering the effect of Si doping on the electrical and material characteristics, the lower TCR (temperature coefficient of resistance) values could be achieved for samples with Ni/Cr ratio of $0.8{\sim}1.5$ (in a range of relative higher specific resistivity and Cr composition of $40\;wt%{\sim}55\;wt%$) and with Si doping. Consequently, the sample prepared using a DC power showed a good TCR of $-25\;ppm/^{\circ}C$, which implies that increase of specific resistivity and decrease of TCR would be achieved more efficiently not for Ni-Cr binary material but for Si doped Ni-Cr ternary material, and not using RF power but using DC power in the sputtering process.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1996년도 추계학술대회 논문집 학회본부
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• pp.200-202
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• 1996

MgO film was deposited on the glass substrate by the hollow cathode discharge ion plating method and the characteristics of the MgO thin film such as deposition rate, crystalline orientation, surface morphology and secondary electron coefficient were investigated. The deposition rate of MgO thin films were $430^{\sim}1270{\AA}$/min at various temperatures and biases. The crystalline orientation of the MgO thin film changed from (200) to (220) upon increasing the HCD current from 100A to 200A. These results indicated that the crystallin orientation of the MgO thin film was determined by the super-saturation ratio. The (200) peak decreased and the (220) peak increased as the substrate bias increased, while both peaks increased as the substrate temperature increased. The grain size increased as the substrate bias increased and the secondary electron emission coefficient increased as the substrate bias increased.

• Bulletin of the Korean Chemical Society
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• 제16권9호
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• pp.886-891
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• 1995

Electroactive monolayers based on zirconium(Ⅳ) phosphonate film were prepared on gold and tin oxide electrodes by sequential layer-by-layer depostion technique. High transfer coefficient values and surface coverages of surface bound redox molecules were obtained from the electrochemical measurements of heterogeneous electron transfer rates for monolayer modified electrodes. 1,10-Decanediylbis(phosphonic acid) (DBPA) monolayer as insulating barrier was effective in blocking electron transfer. However, these film modified oxide electrode shows voltammetric behavior of diffusion/permeation process taking place at very small exposed area of modified electrode through channels due to structural defects within film when a very fast redox couple such as Ru(NH3)63+ is hired.

• 한국안전학회지
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• 제20권1호
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• pp.18-23
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• 2005

This study deals with the friction and wear characteristics of C-N coated SCM415 steel. The PSII(plasma source ion implantation) apparatus was built and a SCM415 test piece with steel substrate was treated with carbon nitrogen by this apparatus. The composition and structure of the surface layer were analyzed and compared with that of PVD(physical vapor decomposition) coated TiN layer. It was found that both of friction coefficient of C-N coating and TiN coating decreased with increasing load, however, C-N coating showed relatively lower faction coefficient than that of TiN coating. The micro-vickers hardness of C-N film is 3200 Hv, which is $32\~43\%$ higher than that of TiN film. The critical load of C-N film is 52N, which is $25\%$ higher than that of TiN film. The hardness of C-N film fabricated by Plasma ion implantation is $61\~70\%$ higher than that of base material, and faction coefficient is $14\~50\%$ lower than that of base material. It is also interesting to note that the friction was changed from adhesive wear mode to light oxidizing wear mode.

• 한국광학회지
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• 제35권1호
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• pp.1-8
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• 2024

유리기층에 코팅되어 있는 박막의 광학상수를 정확하게 분석하기 위해, 반투명 기층 위에 다층박막이 코팅되어 있는 시료의 유사 투과타원 상수 표현과 투과율 표현을 구체적으로 제시하였다. 두꺼운 기층에서 일어나는 다중반사로 인한 빛의 세기를 결맞지 않도록 중첩하는 동시에, 반투명 기층의 광흡수 영역에서 기층의 흡수를 정확하게 반영함으로써 다층박막이 코팅된 반투명 기층 시료의 정확한 모델링 분석이 가능하게 하였다. 흡광도가 매우 낮은 파장대역에서 투과율 측정에 기반한 분석과 타원법에 기반한 모델링 분석 방법이 가지는 박막의 소광계수의 차이를 투과율의 민감도와 타원상수의 민감도 분석을 통하여 비교 분석하였다. 투과율 분석법과 반사 타원법을 SiN 박막이 코팅된 유리기층 시료에 적용함으로써 소광계수가 매우 작을 때에도 SiN 박막의 복소굴절률과 두께를 정확하게 결정할 수 있음을 보였다.