• Title/Summary/Keyword: etching solution.

Search Result 531, Processing Time 0.021 seconds

COMPARISON OF MARGINAL LEAKAGE OF WEDGE-SHAPED CLASS V CAVITY ACCORDING TO RESTORATIVE MATERIALS (쐐기 형태의 5급와동에서 수복재료에 따른 변연 미세누출의 비교)

  • Jang, Hyun-Joo;Lee, Hee-Joo;Hur, Bock
    • Restorative Dentistry and Endodontics
    • /
    • v.25 no.1
    • /
    • pp.56-62
    • /
    • 2000
  • The purpose of this study was to assess the effects of restorative materials on the marginal leakage of wedge-shaped class V cavity. The study was performed in vitro in 25 defect-free permanent, extracted teeth. Wedge-shaped class V cavities were prepared and then the teeth were randomly selected and restored according to the following. Group A : restoration with Tetric Ceram(composite resin) Group B : restoration with Tetric flow(flowable resin) Group C : restoration with Compoglass after acid etching(compomer) Group D : restoration with Compoglass(compomer) Group E : restoration with Fuji II LC improved(resin-modified GIC) After thermocycling, the specimens were immersed in 5% basic fuchsin solution for 6 hours and sectioned longitudinally through the center of the restoration. The degree of marginal leakage was measured as the extent of dye penetration under the stereomicroscope. The data were analysed using one-way ANOVA. When significant differences found, multiple comparisons were made using Duncan's Multiple Range Test. The results were as follows: 1. The occlusal margins of all groups except for Fuji II LC improved showed lesser leakage than gingival margins and there was statistically significant difference(p<0.05). 2. At the occlusal margins, group A, B showed same marginal leakage scores, and others were decreased as group C, D, E in that order. There were statistically significant difference between group A, Band group D, E, group C and group E(p<0.05). 3. At the gingival margins, group B, C showed same marginal leakage scores, and others were decreased as group A, D, E in that order. But there was statistically significant difference between group B, C and group E(p<0.05). 4. In the Compoglass restoration, acid-etching technique was beneficial for marginal sealing ability at all of margins. But there was no statistically significant difference (p>0.05). In the restorations for wedge-shaped class V cavities, resin restoration with acid etching technique is recommended.

  • PDF

Characterization of saturation of CR-39 detector at high alpha-particle fluence

  • Ghazaly, M. El;Hassan, Nabil M.
    • Nuclear Engineering and Technology
    • /
    • v.50 no.3
    • /
    • pp.432-438
    • /
    • 2018
  • The occurrence of saturation in the CR-39 detector reduces and limits its detection dynamic range; nevertheless, this range could be extended using spectroscopic techniques and by measuring the net bulk rate of the saturated CR-39 detector surface. CR-39 detectors were irradiated by 1.5 MeV high alpha-particle fluence varying from $0.06{\times}10^8$ to $7.36{\times}10^8\;alphas/cm^2$ from Am-241 source; thereafter, they were etched in a 6.25N NaOH solution at a temperature of $70^{\circ}C$ for different durations. Net bulk etch rate measurement of the 1.5 MeV alpha-irradiated CR-39 detector surface revealed that rate increases with increasing etching time and reaches its maximum value at the end of the alpha-particle range. It is also correlated with the alpha-particle fluence. The measurements of UV-Visible (UV-Vis) absorbance at 500 and 600 nm reveal that the absorbance is linearly correlated with the fluence of alpha particles at the etching times of 2 and 4 hour. For extended etching times of 6, 10, and 14.5 hour, the absorbance is saturated for fluence values of $4.05{\times}10^8$, $5.30{\times}10^8$, and $7.36{\times}10^8\;alphas/cm^2$. These new methods pave the way to extend the dynamic range of polymer-based solid state nuclear track detectors (SSNTDs) in measurement of high fluence of heavy ions as well as in radiation dosimetry.

A Study on the Radius of Curvature of Concave Optical Fiber Tips fabricated by Laser-Induced Photothermal Effect (레이저 유도 광열 효과를 이용하여 제작된 오목한 광섬유 팁의 곡률 반경에 관한 연구)

  • Choi, Ji-Won;Son, Gyeong-Ho;Yu, Kyoung-Sik
    • The Journal of the Korea institute of electronic communication sciences
    • /
    • v.14 no.5
    • /
    • pp.871-876
    • /
    • 2019
  • We fabricated concave optical fiber tips using hydrofluoric acid solution and photothermal effect induced by $1.55{\mu}m$ wavelength laser applied to an optical fiber. The radius of curvature of the concave optical fiber tips fabricated with different applied laser power, etching time, and concentration of hydrofluoric acid was measured with an optical microscope. Then, we analyzed how the radius of curvature changes for those three variables. In addition, the reliability of the measurement method using a microscope was verified through a free spectral range(FSR) and a scanning electron microscope(SEM). Through this paper, the radius of curvature can be adjusted by the variables of the fabrication process of concave optical fiber tips; thus, it is overcoming the limitations of conventional optical fiber etching methods using hydrofluoric acid solutions.

Photovoltaic Performance of Crystalline Silicon Recovered from Solar Cell Using Various Chemical Concentrations in a Multi-Stage Process (습식 화학 공정에 의한 태양전지로부터 고순도 실리콘 회수 및 이를 이용한 태양전지 재제조)

  • Noh, Min-Ho;Lee, Jun-Kyu;Ahn, Young-Soo;Yeo, Jeong-Gu;Lee, Jin-Seok;Kang, Gi-Hwan;Cho, Churl-Hee
    • Korean Journal of Materials Research
    • /
    • v.29 no.11
    • /
    • pp.697-702
    • /
    • 2019
  • In this study, using a wet chemical process, we evaluate the effectiveness of different solution concentrations in removing layers from a solar cell, which is necessary for recovery of high-purity silicon. A 4-step wet etching process is applied to a 6-inch back surface field(BSF) solar cell. The metal electrode is removed in the first and second steps of the process, and the anti-reflection coating(ARC) is removed in the third step. In the fourth step, high purity silicon is recovered by simultaneously removing the emitter and the BSF layer from the solar cell. It is confirmed by inductively coupled plasma mass spectroscopy(ICP-MS) and secondary ion mass spectroscopy(SIMS) analyses that the effectiveness of layer removal increases with increasing chemical concentrations. The purity of silicon recovered through the process, using the optimal concentration for each process, is analyzed using inductively coupled plasma atomic emission spectroscopy(ICP-AES). In addition, the silicon wafer is recovered through optimum etching conditions for silicon recovery, and the solar cell is remanufactured using this recovered silicon wafer. The efficiency of the remanufactured solar cell is very similar to that of a commercial wafer-based solar cell, and sufficient for use in the PV industry.

STI Top Profile Improvement and Gap-Fill HLD Thickness Evaluation (STI의 Top Profile 개선 및 Gap-Fill HLD 두께 평가)

  • Seong-Jun, Kang;Yang-Hee, Joung
    • The Journal of the Korea institute of electronic communication sciences
    • /
    • v.17 no.6
    • /
    • pp.1175-1180
    • /
    • 2022
  • STI has been studied a lot as a process technology for wide area planarization according to miniaturization and high integration of semiconductor devices. In this study, as methods for improving the STI profile, wet etching of pad oxide using hydrofluorine solution and dry etching of O2+CF4 after STI dry etching were proposed. This process technology showed improvement in profile imbalance and leakage current between patterns according to device density compared to the conventional method. In addition, as a result of measuring the HLD thickness after CMP for a device having the same STI depth and HLD deposition, the measured value was different depending on the device density. It was confirmed that this was due to the difference in the thickness of the nitride film according to the device density after CMP and the selectivity of the slurry.

Analysis of Optical Process Depending On Texturing Process of Si Wafer (실리콘 웨이퍼의 표면조직화에 따른 광학적 특성분석)

  • Oh, Teresa
    • Journal of the Korea Institute of Information and Communication Engineering
    • /
    • v.15 no.11
    • /
    • pp.2439-2443
    • /
    • 2011
  • To obtain the effect of texturing process in Solar cells, the Si-wafers were textured by using the IPA+DI water mixed etching solution with KOH alkaline. All samples were analyzed by the scanning electron microscopy for the surface images, and it was researched the correlation between the efficiency of optical properties and the effect of texturing. From the results of the surface images obtained by SEM, mc-Si wafer shows a isotropic surface but sc-Si wafers displays the unisotropic surface. The reflectance was improved at the sc-Si wafer textured uniformly, and the reflectance of over etched-samples increased.

Alkali metal free texturing for mono-crystalline silicon solar cell (알카리 금속을 배재한 단결정 실리콘 태양전지의 텍스쳐링 공정)

  • Kim, Taeyoon;Kim, Hoechang;Kim, Bumho
    • 한국신재생에너지학회:학술대회논문집
    • /
    • 2010.11a
    • /
    • pp.48.1-48.1
    • /
    • 2010
  • Mono-crystalline silicon solar cell is fabricated by using alkali metals. These alkali metal, used in wet etching process, must be removed for the high efficiency solar cell. As wet etching process has been adapted due to its low cost. But lots of alkali metals like potassium remains on the silicon surface and acts as impurities. To remove these alkali metals many of cleaning process have to be applied when solar cell manufacturing process. In terms of alkali metal removal, modified etchant solution is required for concise cleaning process. In this paper ethylenediamine was used and proposed for the substituion of postassium hydroxide.

  • PDF

Optimization on the fabrication process of Si pressure sensors utilizing piezoresistive effect (압저항 효과를 이용한 실리콘 압력센서 제작공정의 최적화)

  • Yun Eui-Jung;Kim Jwayeon;Lee Seok-Tae
    • Journal of the Institute of Electronics Engineers of Korea SD
    • /
    • v.42 no.1
    • /
    • pp.19-24
    • /
    • 2005
  • In this paper, the fabrication process of Si pressure sensors utilizing piezoresistive effect was optimized. The efficiency(yield) of the fabrication process for Si piezoresistive pressure sensors was improved by conducting Si anisotrophic etching process after processes of piezoresistors and AI circuit patterns. The position and process parameters for piezoresistors were determined by ANSYS and SUPREM simulators, respectively. The measured thickness of p-type Si piezoresistors from the boron depth-profile measurement was in good agreement with the simulated one from SUPREM simulation. The Si anisotrohic etching process for diaphragm was optimized by adding ammonium persulfate(AP) to tetramethyl ammonium hydroxide (TMAH) solution.

Fabrication and Characterization of AAO Template with Variation of the Phosphoric Acid Amount of the Etching Solution (에칭용액의 인산 첨가량에 따른 양극산화 알루미늄 템플레이트의 제작 및 특성)

  • Jo, Ye-Won;Kim, Yong-Jun;Yeo, Jin-Ho;Lee, Sung-Gap;Kim, Young-Gon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.27 no.7
    • /
    • pp.448-451
    • /
    • 2014
  • Anodic aluminum oxides (AAO) fabricated by the two-step anodizing process have attracted much attention for the fabrication of nano template because of pore structure with high aspect ratio, low cost process and ease of fabrication. AAOs are characterized by a homogeneous morphology of parallel pores that grow perpendicular to the template surface with a narrow distribution of diameter, length and inter-pores spacing, all of which can be easily controlled by suitably choosing of the anodizing parameters such as pH of the electrolyte, anodizing voltage and duration of anodizing. In this study, AAO templates were characterized by X-ray diffraction and field-emission scanning electron microscope (FE-SEM). The dependence of the pore size change according to the amount of addition of phosphoric acid, which was used to remove the initial alumina oxide layer, was not observed.

A Study on Water Tree Degradation Using Image Measurement in Underground Power Cables (화상계측에 의한 지중 전력케이블의 수트리 열화에 관한 연구)

  • Kim, Duck-Keun;Lim, Jang-Seub;Lee, Jin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.13 no.12
    • /
    • pp.1063-1068
    • /
    • 2000
  • Water treeing in underground distribution power cable is not easy to observe by nondestructive method and it has very complex patterns. This study describes the principles and practices of a continuous observation of initiation and growth of tree in polymeric insulation material using an image measurement technique. Using this technique we could observe water tree and the growing process of electrical tree due to the water tree and the growing process of electrical tree due to the water tree. All of these growing process is analyzed quantitatively by image measurement program composed of borland c++. We fabricated the thin film type specimen to observe water tree easier and also the needle electrode was prepared by etching method using electrolytes. Initiation and the growth of three was observed somewhat different depending on the applied voltage and the water electrode. AgNO$_3$solution electrode accelerates the initiation and the growth of water tree, compared to those of distilled water electrode. The water and the electrical tree occurred by water tree has discontinuous growth characteristic.

  • PDF