• 제목/요약/키워드: embossing

검색결과 222건 처리시간 0.026초

평면이방성을 고려한 사각엠보싱 공정의 미세면굴곡에 대한 연구 (A Study on the Surface Deflection in Rectangular Embossing Considering Planar Anisotropy)

  • 김진학;정완진
    • 소성∙가공
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    • 제22권6호
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    • pp.310-316
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    • 2013
  • Recently, numerical predictions of surface deflection based on curvature analysis have been developed. In the current study, a measure of surface deflection is proposed as the maximum variation of curvature difference between the panel and the tool in order to account for surfaces that have high curvature. The current study focused on the assessment of accuracy for the surface deflection prediction with the consideration of planar anisotropy. As an example, a shallow rectangular drawn part with rectangular embossing was considered. In terms of the proposed surface deflection measure, the maximum variation of curvature difference, the prediction with a planar anisotropic model shows better correspondence with experiment than the one using a normal anisotropic model.

엠보싱 PVC 시트를 이용한 부분절연 블록형 옥상 비노출 복합방수공법 개발에 관한 연구 (Research about point adhesion disconnection type non-exposure composition waterproof method of construction development that use embossing PVC sheet)

  • 위태환;강효진;오상근
    • 한국건축시공학회:학술대회논문집
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    • 한국건축시공학회 2003년도 학술.기술논문발표회
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    • pp.37-40
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    • 2003
  • This present paper mainly contains adhesion part disconnection type exposure composition waterproof method using embossing PVC sheet. The existing polymer resin coating and sheet waterproofing construction method have, however, some weak point such as being decrease life cycle of concrete with water leaking from materials be affected by crack and movement dash bond concrete through the whole-adhere construction. Above the reason, this paper has particular method increasing crack-defending performance from stress occurred concrete movement by part disconnection, adds maintain waterproofing performance subordinate sheet, that can be contributed a convenience of maintenance which is decreasing industrial waste and repair construction cycle through the part repair in case of leaking water.

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Seat recliner용 sector gear의 fine blanking에 관한 연구 (A study on properties of sector gear for seat recliner)

  • 김창호;강수호;이관영;남기우
    • 한국기계가공학회지
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    • 제9권1호
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    • pp.99-105
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    • 2010
  • This study was performed to solve the breaking problem in the fine blanking(FB) process of sector gears for car seat recliner using nickel chrome molybdenum steel(SNCM220) plate. The optimal design of embossing circle is changed to oval with labors' experiences and finite element analysis. The maximum principal stress and effective strain in a forming process are analyzed by commercial finite element software to solve the problems in embossing stage of FB process. As a result of FE analysis, the maximum principal stress in forming is lower than yield point of material. It is shown from experiments in the modified die that the formed gear does not break in embossing stage.

고분자 광도파로용 핫엠보싱 마스터의 표면거칠기 최소화를 위한 열산화 영향 (Thermal oxidation effect for sidewall roughness minimization of hot embossing master for polymer optical waveguides)

  • 최춘기;정명영
    • 한국진공학회지
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    • 제13권1호
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    • pp.34-38
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    • 2004
  • 핫엠보싱 기술을 이용하여 고분자 광도파로를 제작하기 위해서는 핫엠보싱 마스터가 필수적이며, 본 연구에서는 deep-RIE 공정에 의해 실리콘 마스터를 제작하였다. 광도파로의 광손실과 직접 연관이 있는 실리콘 마스터의 측면 거칠기를 최소화하기 위해 deep-RIE 공정 수행 후, 온도 $1050^{\circ}C$에서 $H_2/O_2$ 분위기하에 산화층을 각각 400$\AA$, 1000$\AA$, 3000$\AA$, 4500$\AA$, 5600$\AA$ 및 6200$\AA$ 두께로 형성하였으며, 곧바로 $NH_4$F:HF=6:1 BOE를 사용하여 산화층을 제거하였다. 제작된 마스터의 측면 거칠기를 SPM-AFM을 이용하여 측정하였으며, 측면 거칠기가 scallop 부분의 경우, 산화층 형성과 제거 후, 12nm (RMS)에서 최소 약 6nm (RMS)로 개선되었으며, vertical striation부분은 162nm (RMS)에서 최소 39m (RMS)로 개선됨을 확인하였다.

반구형 나노 패턴의 크기에 따른 PMMA기판의 광특성 평가 (Fabrication of nano-structured PMMA substrates for the improvement of the optical transmittance)

  • 박용민;신홍규;김병희;서영호
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2009년도 추계학술대회 논문집
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    • pp.217-220
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    • 2009
  • This paper presents fabrication method of nano-structured PMMA substrates as well as evaluations of their optical transmittance. For anti-reflective surface, surface coating method had been conventionally used. However, it requires high cost, complicated process and post-processing times. In this study, we suggested the fabrication method of anti-reflective surface by the hot embossing process. Using the nano patterned master fabricated by anodic aluminum oxidation process. Anodic aluminum oxide(AAO) is widely used as templates or a molds for various applications such as carbon nano tube (CNT), nano rod and nano dots. Anodic aluminum oxidation process provides highly ordered regular nano-structures on the large area, while conventional pattering methods such as E-beam and FIB can fabricate arbitrary nano-structures on small area. We fabricated a porous alumina hole array with various inter-pore distance and pore diameter. In order to replicate nano-structures using alumina nano hole array patterns, we have carried out hot-embossing process with PMMA substrates. Finally the nano-structured PMMA substrates were fabricated and their optical transmittances were measured in order to evaluate the charateristivs of anti-reflection. Anti-reflective structure can be applied to various displays and automobile components.

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연속체 개념에 기반한 나노 임프린트 공정해석 연구 (Numerical Analysis Based on Continuum Hypothesis in Nano-imprining process)

  • 김현칠;이우일
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2003년도 추계학술대회논문집
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    • pp.333-338
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    • 2003
  • Nano-imprint lithography(NIL) is a polymer embossing technique, capable of transferring nano-scale patterns onto a thin film of thermoplastics such as polymethyl methacrylate(PMMA) using this parallel process. Feature size down 10 nm have been demonstrated. In NIL, the pattern is formed by displacing polymer material, which can be squeeze flow of a viscous liquid. Due to the size of the pattern, a thorough understood of the process through experiments may be very different. Therefore we nead to resort to numerical simulation on the embossing process. Generally, there are two ways of numerical simulation on nano-scale flow, namely top-down and bottom-up approach. Top-down approach is a way to simulate the flow assuming that polymer is a continuum. On the contrary, in the bottom-up approach, simulation is peformed using molecular dynamics(MD). However, as latter method is not feasible yet. we chose the top-down approach. For the numerical analysis, two dimensional moving grid was used since the moving grid can predict the flow front. Effects of surface tension as well as the slip at the boundary were also considered.

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하프피어싱에 의한 원형돌기의 성형 및 마킹공정에의 응용 (Forming of Circular Protrusion by Half-Piercing and its Application to Marking of Sheet Metal)

  • 정효기;김종호
    • 소성∙가공
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    • 제21권3호
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    • pp.202-206
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    • 2012
  • Marking is a process that engraves letters or a pattern onto the surface of sheet metal. During marking, it is important to set the proper working conditions for clarity of the letters. In this study a simple case for forming circular protrusions by half-piercing and embossing was initially attempted to determine the working conditions which gave good results with respect to shape accuracy. Corner-radius and flatness of circular protrusions made under several experimental conditions were measured and compared. It is shown that the precision of protrusions by half-piercing is superior to that of embossing, and the clearance between punch and die exerts a strong influence on the shape accuracy rather than the penetration percentage into the thickness of the sheet metal. The marking dies for "SNUT" letters, as an example, by applying the above results were manufactured with four different clearances. The working variables for the experiment were clearance and marking depth. For the very shallow depth of 0.1mm the letters were not clearly read. Letters marked under other conditions were easily distinguished with increasing marking depth. It was confirmed that the half-piercing technique with proper values of the working variables gives good quality for the marking of sheet metal.

전사방법을 이용한 폴리머 필름에 내재된 실리콘 나노구조물 어레이 제작 (Fabrication of a Silicon Nanostructure Array Embedded in a Polymer Film by using a Transfer Method)

  • 신호철;이동기;조영학
    • 한국생산제조학회지
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    • 제25권1호
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    • pp.62-67
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    • 2016
  • This paper presents a silicon nanostructure array embedded in a polymer film. The silicon nanostructure array was fabricated by using basic microelectromechanical systems (MEMS) processes such as photolithography, reactive ion etching, and anisotropic KOH wet etching. The fabricated silicon nanostructure array was transferred into polymer substrates such as polymethyl methacrylate (PMMA), polyethylene terephthalate (PET), and polycarbonate (PC) through the hot-embossing process. In order to determine the transfer conditions under which the silicon nanostructures do not fracture, hot-embossing experiments were performed at various temperatures, pressures, and pressing times. Transfer was successfully achieved with a pressure of 1 MPa and a temperature higher than the transition temperature for the three types of polymer substrates. The transferred silicon nanostructure array was electrically evaluated through measurements with a semiconductor parameter analyzer (SPA).