• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 춘계학술대회 논문집
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• pp.561-564
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• 2003

The machining technology for the removal of micro-burr has been demanded because electrode parts of electron gun have minute holes. In this study, Magnetic Assisted Polishing(MAP) is applied to remove the micro-burr instead of the contentional polishing process such as the etching and barrel. Optimal polishing conditions are selected from many experiments using the tool of the flat end slit type. On the basis of experimental results, the deburring machine for the Magnetic Assisted Polishing of electrode part is developed and its performance is evaluated.

• Nuclear Engineering and Technology
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• 제38권8호
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• pp.779-784
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• 2006

The design, manufacturing process, and first operating test of a high power RF source for a proton accelerator are described. A klystron amplifier system has been developed for operation at 700 MHz, 1 MW and is composed of a triode type electron gun, six cavities, an RF output window, a beam collector, and an electromagnet. The prototype klystron was constructed and tested at a reduced duty to produce the designed output RF power.

• 전자공학회논문지D
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• 제35D권9호
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• pp.26-34
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• 1998

본 논문은 주사전자현미경(SEM)의 전자총을 이용하여 MCM 또는 PCB 회로기판의 신호연결선에서 전압차를 유도시켜 개방/단락 등의 결함을 측정 검사하는 방법을 제시한다. 본 실험에서는 주사전자현미경의 구조를 변형시키지 알고 회로기판의 개방/단락 검사를 실시할 수 있는 이중전위전자빔(Dual Potential) 검사방법을 사용한다. 이중전위전자빔(Dual Potential) 측정검사 방법은 이차전자수율 값 δ의 차이를 유기시키는 δ < 1 인 충전 전자빔과 δ > 1 인 읽기 전자빔을 사용하여 한 개의 전자총이 각각 다른 가속전압에 의해 생성된 두 개의 전자빔으로 측정하는 방법으로 특정 회로네트에 대한 개방/단락 등의 측정 검사가 가능하다. 또한 읽기 전자빔을 이용할 경우 검사한 회로 네트를 방전시킬 수 있어 기판 도체에 유기된 전압차를 없앨 수 있는 방전시험도 실시할 수 있어, 많은 수의 회로네트를 지닌 회로 기판에 대해 측정 검사할 때 충전되어 있는 회로네트에 대한 측정오류를 줄일 수 있다. 측정검사를 실시한 결과 glass-epoxy 회로기판 위에 실장된 구리(Cu) 신호연결선은 7KeV의 충전 전자빔으로 충전시키고 10초 이내에 주사전자현미경을 읽기 모드로 바꾸어 2KeV의 읽기 전자빔으로 구리표면에서의 명암 밝기 차이를 읽어 개방/단락 상태를 검사할 수 있었다. 또한 IC 칩의 Au 패드와 BGA의 Au 도금된 Cu 회로패드를 검사한 결과도 7KeV 충전 전자빔과 2KeV 읽기 전자빔으로 IC칩 내부회로에서의 개방 단락 상태를 쉽게 검사할 수 있었다. 이 검사방법은 주사전자현미경에 있는 한 개의 전자총으로 비파괴적으로 회로 기판의 신호 연결선의 개방/단락 상태를 측정 검사할 수 있음을 보여 주었다.

• 한국레이저가공학회지
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• 제2권2호
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• pp.1-7
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• 1999

• 한국레이저가공학회지
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• 제1권1호
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• pp.11-17
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• 1998

The electron beam welding system has the advantages of the high power density, narrow welding section, and small thermal distortion of a workpiece. Recently, the electron beam welding system is widely used to the airplane engineering, nuclear power plant, and automobile industry. In the present paper, the structural analyses on the vacuum chamber of the electron beam welding system are performed by the F.E.M. analysis. The stiffening characteristics on the geometric shape, stiffener height and stiffener span are investigated. The deflection of the stiffened vacuum chamber under pressure is minimized by longitudinal and transverse stiffeners which are continuous in both direction.

• 한국공작기계학회논문집
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• 제15권2호
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• pp.24-29
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• 2006

The use electron-beam(E-beam) manufacturing system provides a means to alleviate optic exposure equipment's problems. We are developing an E-beam manufacturing system with scanning electron microscope(SEM) function. The E-beam manufacturing system consist of high voltage generator, beam blanker, condenser lenses, object lenses, stigmator and stage. The development of E-beam manufacturing system is used on the method of remaking SEM's structure. The functions of SEM are developed. It is important for the test of E-beam performance. In E-beam manufacturing system and SEM, beam focus is important function. In this paper, we propose intelligent remote control function for beam focus in E-beam manufacturing system. The function extends the user's function and gives convenience.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 하계학술대회 논문집
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• pp.934-941
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• 2000

We measured the electron transport coefficients, the electron drift velocity W and the longitudinal diffusion coefficient $D_{L}$ in the 0.526% and 5.05% $C_{3}F_{8}$-Ar mixtures over the E/N range from 0.01 Td to 100 Td by the double shutter drift tube, and compared the measured results by Hunter et al. with those. We determined the inelastic collision cross sections for the $C_{3}F_{8}$ molecule by the comparison of the present measurements and the calculation of electron transport coefficients in the $C_{3}F_{8}$-Ar mixtures by using a multi-term Boltzmann equation analysis.

• 대한전자공학회논문지
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• 제24권6호
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• pp.969-974
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• 1987

High value sheet resistance (Rs, 350 \ulcorner/ -80 K \ulcorner/ ) borom implanted polysilicon resistors were fabricated under process condition compatible with bipolar integrated circuits fabrication. This paper includes the effect of contact ion implantation on Rs and the effect of electron gun(e-gun) deosition vs. non e-gun evaporated metal contacts on the Rs. From results, we observed that the contact ion implanted samples showed higher Rs value than those without contact ion implantation. Also, it was shown that there is noticeable amount of Rs degradation for e-gun samples, while sputtered samples expressed little Rs degradation after PtSi was formed.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1997년도 하계학술대회 논문집 E
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• pp.1657-1659
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• 1997

Electron temperature and electron density were measured in a radio-frequency inductively coupled plasma (RFICP) using a probe measurements. Measurement was conducted in an argon discharge for pressures from 10 [mTorr] to 40 [mTorr] and input rf power from 100 [W] to 800 [W], Ar flow rate from 5 [sccm] to 30 [sccm], Spatial distribution electron temperature and electron density were measured for discharge with same aspect ratio (R/L=2). Electron temperature and electron density were discovered depending on both pressure and power, Ar flow rate. Electron density was increased with increasing input power and in creasing pressure, increasing Ar flow rate. Radial distribution of the electron density was peaked in the plasma center. Normal distribution of the electron density was peaked in the center between quartz plate and substrate. From these results, We found out the generation mechanism of Radio-Frequency Inductively Coupled Plasma.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2007년도 춘계학술대회A
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• pp.1288-1293
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• 2007

The present study covers the design and analysis of a thermionic scanning electron microscope (SEM) column. The SEM column contains an electron optical system in which electrons are emitted and moved to form a focused beam, and this generates secondary electrons from the specimen surfaces, eventually making an image. The electron optical system mainly consists of a thermionic electron gun as the beam source, the lens system, the electron control unit, and the vacuum unit. In the design process, the dimension and capacity of the SEM components need to be optimally determined with the aid of finite element analyses. Considering the geometry of the filament, a three-dimensional (3D) finite element analysis is utilized. Through the analysis, the beam emission characteristics and relevant trajectories are predicted from which a systematic design of the electron optical system is enabled. The validity of the proposed 3D analysis is also discussed by comparing the directional beam spot radius. As a result, a prototype of a thermionic SEM is successfully developed with a relatively short time and low investment costs, which proves the adoptability of the proposed 3D analysis.