• Title/Summary/Keyword: electro deposition process

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Porous Nickel-Tin Nano-Dendritic Electrode for Rechargeable Lithium Battery (리튬 이차 전지를 위한 다공성 니켈-주석 나노 수지상 전극)

  • Jung, Hye-Ran;Shin, Heon-Cheol
    • Korean Journal of Materials Research
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    • v.20 no.11
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    • pp.592-599
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    • 2010
  • A porous nickel-tin nano-dendritic electrode, for use as the anode in a rechargeable lithium battery, has been prepared by using an electrochemical deposition process. The adjustment of the complexing agent content in the deposition bath enabled the nickel-tin alloys to have specific stoichiometries while the amount of acid, as a dynamic template for micro-porous structure, was limited to a certain amount to prevent its undesirable side reaction with the complexing agent. The ratios of nickel to tin in the electro-deposits were nearly identical to the ratios of nickel ion to tin ion in the deposition bath; the particle changed from spherical to dendritic shape according to the tin content in the deposits. The nickel to tin ratio and the dendritic structure were quite uniform throughout the thickness of the deposits. The resulting nickel-tin alloy was reversibly lithiated and delithiated as an anode in rechargeable lithium battery. Furthermore, the resulting anode showed much more stable cycling performance up to 50 cycles, as compared to that resulting from dense electro-deposit with the same atomic composition and from tin electrodeposit with a similar porous structure. From the results, it is expected that highly-porous nickel-tin alloys presented in this work could provide a promising option for the high performance anode materials for rechargeable lithium batteries.

Oxygen Control in CdS Thin Film by UV Illumination in Chemical Bath Deposition (용액성장법에서 자외선 조사를 이용한 CdS의 산소함량 제어)

  • Baek, Hyeon-ji;Oh, Ji-A;Seo, Young-Eun;Shin, Hye-Jin;Cho, Sung-Wook;Jeon, Chan-Wook
    • Current Photovoltaic Research
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    • v.7 no.2
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    • pp.33-37
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    • 2019
  • In this paper, we compared the performance of $Cu(In,Ga)(S,Se)_2$ (CIGSSe) thin film solar cell with CdS buffer layer deposited by irradiating 365 nm UV light with 8 W power in Chemcial Bath Deposition (CBD) process. The effects of UV light irradiation on the thin film deposition mechanism during CBD-CdS thin film deposition were investigated through chemical and electro-optical studies. If the UV light is irradiated during the solution process, the hydrolysis of Thiourea is promoted even during the same time, thereby inhibiting the formation of the intermediate products developed in the reaction pathway and decreasing the pH of the solution. As a result, it is suggested that the efficiency of the CdS/CIGSSe solar cell is increased because the ratio of the S element in the CdS thin film increases and the proportion of the O element decreases. This is a very simple and effective approach to control the S/O ratio of the CdS thin film by the CBD process without artificially controlling the process temperature, solution pH or concentration.

The modification of materials for flexible Dye-Sensitized Solar Cells

  • Kim, Chang-Ho;Han, In-Young;Kim, Jae-Hoon
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.1560-1563
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    • 2009
  • We fabricated Dye-Sensitized Solar Cells(DSSCs) which are modified by using liquid crystals(LCs) and electro-deposition on cathode electrode in order to apply to flexible DSSCs. We deposited Pt metal layers on ITO electrode through the method of electro-deposition process during low-temperature. We could expect the long-term stability by using ionic liquid(IL) and liquid crystals(LCs). We can also see the enhancement of efficiency through orientation of LCs in gel-state electrolyte using liquid crystals at the DSSCs.

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A Study on the Pd-Ni Alloy Hydrogen Membrane Using the Sputter Deposition (스퍼터 증착 방식으로 제조된 Pd-Ni 합금 수소 분리막 연구)

  • Kim Dong-Won;Park Jeong-Won;Kim Sang-Ho;Park Jong-Su
    • Journal of the Korean institute of surface engineering
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    • v.37 no.5
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    • pp.243-248
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    • 2004
  • A palladium-nikel(Pd-Ni) alloy composite membrane has been fabricated on microporous nickel support formed with nickel powder. Plasma surface treatment process is introduced as pre-treatment process instead of HCI activation. Pd coating layer was prepared by dc magnetron sputtering deposition after $H_2$ plasma surface treatment. Palladium-nickel alloy composite layer had a fairly uniform and dense surface morphology. The membrane was characterized by permeation experiments with hydrogen and nitrogen gases at temperature of 773 K and pressure of 2.2psi. The hydrogen permeance was 6 ml/minㆍ$\textrm{cm}^2$ㆍatm and the selectivity was 120 for hydrogen/nitrogen($H_2$/$N_2$) mixing gases at 773 K.

Effect of Surface Pretreatment on Film Properties Deposited by Electro-/Electroless Deposition in Cu Interconnection (반도체 구리 배선공정에서 표면 전처리가 이후 구리 전해/무전해 전착 박막에 미치는 영향)

  • Lim, Taeho;Kim, Jae Jeong
    • Journal of the Korean Electrochemical Society
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    • v.20 no.1
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    • pp.1-6
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    • 2017
  • This study investigated the effect of surface pretreatment, which removes native Cu oxides on Cu seed layer, on subsequent Cu electro-/electroless deposition in Cu interconnection. The native Cu oxides were removed by using citric acid-based solution frequently used in Cu chemical mechanical polishing process and the selective Cu oxide removal was successfully achieved by controlling the solution composition. The characterization of electro-/electrolessly deposited Cu films after the oxide removal was then performed in terms of film resistivity, surface roughness, etc. It was observed that the lowest film resistivity and surface roughness were obtained from the substrate whose native Cu oxides were selectively removed.

Screening of spherical phosphors by electrophoretic deposition for full-color field emission display application

  • Kwon, Seung-Ho;Cho, sung-Hee;Yoo, Jae-Soo;Lee, Jong-Duk
    • Journal of Korean Vacuum Science & Technology
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    • v.3 no.1
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    • pp.79-84
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    • 1999
  • the photolithographic patterning on an indium-tin oxide (ITO) glass and the electro-phoretic deposition were combined for preparing the screen of the full-color field emission display(FED). the patterns with a pixel of 400$\mu\textrm{m}$ on the ITO-glass were made by etching the ITO with well-prepared etchant consisting of HCL, H2O, and HNO3. Electrophoretic method was carried out in order to deposit each spherical red (R), green(G), and blue (B) phosphor on the patterned ITO-glass. The process parameters such as bias voltage, salt concentration, and deposition time were optimized to achieve clear boundaries. It was found that the etching process of ITO combined with electrophoretic method was cost-effective, provided distinct pattern, and even reduced process steps compared with conventional processes. The application of reverse bias to the dormant electrodes while depositing the phosphors on the stripe pattern was found to be very critical for preventing the cross-contamination of each phosphor in a pixel.

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Effect of Sulfurization on CIGS Thin Films by RF Magnetron Sputtering Using a Cu(In1-xGax)Se2 Single Target

  • Jung, Sung Hee;Chung, Chee Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.675-675
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    • 2013
  • CIGS thin films have received a great attention as a promising material for solar cells due to their high absorption coefficient, appropriate bandgap, long-term stability, and low cost production. CIGS thin films have been deposited by various methods such as co-evaporation, sputtering, spray pyrolysis and electro-deposition. In this study, Cu(In,Ga)Se2(CIGS) thin films were prepared using a single quaternary target by rf magnetron sputtering. The effect of sulfurization on the structural, compositional and electrical properties of the films was examined in order to develop the deposition process. An optimal sulfurization process will be selected for the preparation of CIGS thin films with good structural, optical and electrical properties by applying various sulfurization processes. In addition, the electrical properties of CIGS thin films were investigated by post-deposition annealing process. The carrier concentration of CIG(SSe) thin films after sulfurization was increased from $10^{14}cm^{-3}$ to $10^{16}cm^{-3}$ and the resistivity was increased from 10 ${\Omega}cm$ to $10^3$ ${\Omega}cm$. It is confirmed that CIG(SSe) thin films prepared at optimal deposition condition have similar atomic ratio to the target value after sulfurization.

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ELECTROSLAG STRIP OVERLAY OF PIPE, FITTINGS, AND PRESSURE VESSELS

  • Dan, Capitanescu
    • Proceedings of the KWS Conference
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    • 2002.10a
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    • pp.355-360
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    • 2002
  • ElectroSlag Strip Overlaying (ESSO) process has been around since 1970. ESSO process had limited acceptance due to a few problems associated with the use of this process in its very early stage. Limited knowledge and, most significantly, poor quality of the equipment and welding flux gave the ESSO process a bad name. However, this process is well accepted today and used in North America, Europe and Japan. The ESSO process provides low dilution overlays at high deposition rates, excellent and consistent deposit chemistry with excellent surface quality, and virtually no defects. Capitan has taken this process one step further through extensive research and development of the process itself as well as the equipment. The improvement brought to the process warranted the issuance in May 2000 of an US patent. This study demonstrates the feasibility of this process with immediate positive production results. The main achievements of this work are as follows: $\textbullet$ Development of six various strip-flux combinations on three different base materials: carbon steel, $\frac{1}{4}$ Cr/.5 Mo and 2 $\frac{1}{4}$ Cr/l Mo, fully tested with: penetrant, ultrasound, bends, hardness, overlay chemistry, corrosion and hydrogen disbonding. $\textbullet$ 12" dia. 90 hot formed elbows from straight pipe electroslag overlayed with "1 layer" and "2 layer" Alloy 625 $\textbullet$ a very unique development of miniaturized overlaying equipment able to perform overlay in pipe with diameters as low as 10" (254 mm). This development has large applications in the field of offshore, petrochemical, refining, pulp and paper and power generation industries. The aftermath of this development was its immediate acceptance by major end users with the completion of four projects of overlayed pipe in the USA and Far East Asia.

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Electrolytic Synthesis of Cobalt Nanorods without Using a Supporting Template (템플릿 없이 전해 합성된 코발트 나노 로드)

  • Kim, Seong-Jun;Shin, Heon-Cheol
    • Korean Journal of Materials Research
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    • v.24 no.6
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    • pp.319-325
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    • 2014
  • Cobalt nano-rods were fabricated using a template-free electrochemical-deposition process. The structure of cobalt electro-deposits strongly depends on the electrolyte composition and on the density of the applied current. In particular, as the content of boric acid increased in the electrolyte, deposits of semi-spherical nuclei formed, and then grew into one-dimensional nano-rods. From analysis of the electro-deposits created under the conditions of continuous and pulsed current, it is suggested that the distribution of the active species around the electrode/electrolyte interface, and their transport, might be an important factor affecting the shape of the deposits. When transport of the active species was suppressed by lowering the deposition temperature, more of the well-defined nano-rod structures were obtained. The optimal conditions for the preparation of well-defined nano-rods were determined by observing the morphologies resulting from different deposition conditions. The maximum height of the cobalt nano-rods created in this work was $1{\mu}m$ and it had a diameter of 200 nm. Structural analysis proved that the nano-rods have preferred orientations of (111).

Fabrication Method of OPV using ESD Spray Coating (ESD 스프레이를 이용한 OPV 제작 기법)

  • Kim, Jungsu;Jo, Jeongdai;Kim, Dongsoo
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.84.2-84.2
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    • 2010
  • PEMS (printed electro-mechanical system) is fabricated by means of various printing technologies. Passive and active components in 2D or 3D such as conducting lines, resistors, capacitors, inductors and TFT, which are printed with functional materials, can be classified in this category. And the issue of PEMS is applied to a R2R process in the manufacturing process. In many electro-devices, the vacuum process is used as the manufacturing process. However, the vacuum process has a problem: it is difficult to apply toa continuous process as a R2R printing process. In this paper, we propose an ESD (electro static deposition) printing process has been used to apply an organic solar cell of thin film forming. ESD is a method of liquid atomization by electrical forces, anelectrostatic atomizer sprays micro-drops from the solution injected into the capillary, with electrostatic force generated by electric potential of about tens of kV. ESD method is usable in the thin film coating process of organic materials and continuous process as a R2R manufacturing process. Therefore, we experiment the thin films forming of PEDOT:PSS layer and Active layer which consist of the P3HT:PCBM. The result of experiment, organic solar cell using ESD thin film coated method is occurred efficiency of about 1.4%. Also, the case of only used to ESD method in the active layer coating is occurred efficiency of about 1.86% as the applying a spin coating in the PEDOT:PSS layer. We can expect that ESD method is possible for continuous process to manufacture in the organic solar cell or OLED device.

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