• Archives of Pharmacal Research
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• 제15권1호
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• pp.99-103
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• 1992

Susceptibility of Psudomonas aeruginosa, Staphylococcus aureus, and Bacillus subtilis to gentimicin and ceforaxime was affected by salicylaye. In presence of salicylaye (15 mM) and gentamicin (1.0 .mu.g/ml), log efficiency of plating (log E. O. P. s) for the tested bacteria were -1.24, -2.17 and -1.66 respectively. The activity of cefotaxime against Bacillus subtilis was reduced (log E. O. P. = 1.33). The highest potentiating effects of salicylaye were shown when using gentamicin against Staphylococcus aureus, cefotaxime against Ps. aeruginosa, log E. O. P.s were -3.0, and -2.4 respectively. On the other hand, no significant effects were detected with cefotaxime against Staphylococcus aureus (log E. O. P. = -0.04). No significant killing was shown in presence of gentamicin or salicylaye alone. There was no significant effect for salicylaye on MICs (By broth dilution) could be observed except in case of gentamicin against Staphyloccus aureus, which was reduced from 0.02 .mu.g/ml to 0.0012 .mu.g/ml. These results raise the concern that high concentrations of salicylaye in patients might interfere with antibiotic therapies.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2001년도 The 6th International Symposium of East Asian Resources Recycling Technology
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• pp.270-274
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• 2001

With Increasing importance of electroless nickel plating technology in many fields such as electronic and automobile industries, the treatment of the spent baths is becoming a serious problem. These spent baths contain iron and zinc as impurities, organic acids as complexing reagents, and phosphonate ions as oxidized species of tile reducing reagent. as well as several grams per liter of nickel. The spent baths are currently treated by conventional precipitation method. but a mettled with no sludge generation is desired. This work aims at establishing a recycling process of nickel from tile spent baths using solvent extraction. Extraction behaviors of nickel. iron. and zinc in various 쇼pes of real spent baths are investigated as a function of pH using LIX841, di (2-ethylhexyl)phosphoric acid (D2EHPA), and PC88A as tile extractants. Nickel is extracted by LIX84I at the equilibrium pH of more than 6 with high efficiency. For the weakly acid baths. iron and zinc are extracted by D2EHPA or PC88A without adjusting the pH of the baths leaving nickel in the aqueous phase. Stripping of nickel from LIX84I with sulfuric acid is also investigated. It is shown that concentrated nickel sulfate solution (> 100 ㎏-Ni/㎥) is obtained. This solution can be reused in the electroless plating process. Based on these findings, flow sheets for recovering nickel from the spent baths are proposed.

• 한국표면공학회지
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• 제40권3호
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• pp.125-130
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• 2007

Many fundamental studies have been carried out regarding waste water and hazardous gas treatment technology using the photolysis effect of $TiO_2$. However, photolysis of both organic and organic-inorganic binders immobilizing $TiO_2$ makes permanent use impossible. In this study we manufactured a catalytic electrode by nickel-$TiO_2$ composite plating in order to immobilize $TiO_2$. The surface properties according to the current density changes of cathode and concentration changes of $TiO_2$ powder in nickel plating bath has been analysed with EDX, XRF, SEM, Raman spectrometer etc. The characterization of the catalytic electrode in decomposition of organic compound has been obtained by using UV-Visible spectrophotometer through analysing concentration changes of methyl orange solution containing the catalytic electrode vs. time with projecting UV-light in the solution. The study shows that a catalytic electrode of nickel-$TiO_2$ composite plating with high-efficiency in decompostion of organic compound has been formed under high concentration of $TiO_2$ powder and low current density of cathode.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2003년도 춘계학술발표회 초록집
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• pp.33-33
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• 2003

• 한국표면공학회지
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• 제19권2호
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• pp.59-64
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• 1986

SRHS(Self-Regulating High Speed) 크롬도금욕을 사용하여 도금욕온도 10-80$^{\circ}C$, 전류밀도 0-400A/$dm^2$의 직류전해도금에서의 전류효율 및 표면광택을 조사하였으며, 동이도금욕 조건에서 펄스 주파수 10-100,000Hz의 펄스전해도금 경우와 비교검토하여 다음과 같은 결론을 얻었다. (1) 20$^{\circ}C$의 욕온도의 경우 5-100Hz의 주파수의 펄스전해도금에서 직류전해도금보다 40%의 높은 전류효율 값을 나타내었다. (2) 75$^{\circ}C$의 욕온도에서는 10-100,000Hz의 전주파수 범위와 25$^{\circ}C$에서는 500Hz이상의 주파수 범위에서 펄스 전해도금의 전류효율은 직류전해 도금보다 낮은 값을 보였다. (3) 직류 전해도금조건에서 광택 및 반광택 표면은 펄스 전해도금으로 무광택으로 변하며, 펄스 주파수가 10,000Hz이상되면 직류전해 도금의 동일 표면광택을 다시 나타났다.

• 한국표면공학회지
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• 제52권2호
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• pp.78-83
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• 2019

Chloride baths for electrodeposited Ni thin films were fabricated by dissolving metal Ni powders with the mixed solution consisting of HCl and de-ionized water. Current efficiency, residual stress, surface morphology and microstructure of Ni films with the change of metal ion ($Ni^{2+}$) concentrations in the plating solution were studied. Current efficiency was measured to be more than 90% with increasing $Ni^{2+}$ concentrations in the plating solution. Residual stress of Ni thin film was increased from about 400 to 780 MPa with increasing $Ni^{2+}$ concentration from 0.2 to 0.5 M. It is gradually decreased to 650 MPa at 0.9 M $Ni^{2+}$ concentration. Smooth surface morphologies were observed over 0.3 M $Ni^{2+}$ concentration, but nodule surface morphology at 0.2 M. Ni films consist of FCC(111), FCC(200), FCC(220) and FCC(311) peaks in XRD patterns. Preferred orientation of FCC(111) was observed and its intensity was slightly decreased with increasing $Ni^{2+}$ concentration. The average grain size was slightly increased at 0.3 M $Ni^{2+}$ concentration and then slightly decreased with increasing $Ni^{2+}$ concentration.

• 공업화학
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• 제25권3호
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• pp.268-273
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• 2014

본 연구에서는 탄소나노튜브의 전자파 차폐 성능을 향상시키고자 무전해 도금법을 이용하여 다중벽 탄소나노튜브에 니켈을 도입하였다. 니켈 도금된 다중벽 탄소나노튜브의 물리적 특성은 고분해능주사전자현미경, 열중량분석기, 표면저항측정기, 전자파 차폐능 분석기를 이용하여 분석하였다. 니켈 도금된 다중벽 탄소나노튜브의 전자파 차폐 효율은 800 MHz 영역에서 16 dB로 측정되었으며 활성화 처리된 다중벽 탄소나노튜브에 비하여 최대 1.6배 증가하였다. 또한, 평균 표면 저항 역시 $70{\Omega}/sq$로 활성화 처리된 다중벽 탄소나노튜브에 비하여 최대 56% 감소한 수치를 나타내었다. 이러한 결과는 니켈 도금 함량에 비하여 표면의 도금 형태가 전자파 차폐 효율에 더 많은 영향을 끼치기 때문인 것으로 판단된다.

• 한국가스학회지
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• 제26권3호
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• pp.21-26
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• 2022

아연은 인체에 유해한 카드뮴을 대체하여 금속재료에 수소가스가 침투하거나 금속재료 내부로부터 수소가 누출되는 것을 방지하기 위한 친환경 코팅 재료로 주목받고 있다. 일반적으로 수성 및 산성 분위기에서 수행되는 아연(Zn) 및 아연 합금의 전기도금은 낮은 쿨롱 효율, 부식 및 수소 누출과 같은 단점이 있어 산업적 이용이 어렵다. 본 연구에서는 염화콜린과 에틸렌글리콜을 이용하여 Deep-eutectic solvent를 합성하고 이를 용매로 사용하여 아연 도금용 전해질을 제조하여 STS 304 기판 위에 전기 도금하였다. 주사전자현미경(SEM)과 원자힘현미경(AFM)을 이용하여 표면 미세구조와 조도를 관찰하였다. X선회절분석(XRD)을 이용하여 도금 막의 결정구조를 분석하였다. 마지막으로 수소를 주입한 STS 304 기판에 최적화된 Zn 도금액을 코팅한 시료의 수소 방출 방지 효과를 분석하였다.

• 한국표면공학회지
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• 제24권1호
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• pp.24-24
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• 1991

Cr-N films were deposited on low-carbon steel sheets by the reactive arc-induced ion plating (AIIP). The influence of the deposition conditions (nitrogen pressure and substrate bias voltage) on the crystal orientation, morphology and microhardness of the Cr-N films has been investigated using x-ray diffractometer and scanning electron microscope. The impurities and contaminations on the surface and at the interface, and the layer-by-layer compositions of the film have been analyzed using scanning Auger multiprobe (SAM) and glow discharge spectroscope (GDS). The mixed state of Cr and Cr2N turned out to have a fine fibrous structure. The Cr2N films were deposited at a wide range of nitrogen flow rates. The orientations of Cr2N films were mainly (110) and (111), and the intensity of the (111) peak increased as the substrate bias voltage increased. The micorstructure of the Cr2N film was dense and no columnar structure was observed. The films in the mixed state of Cr2N and CrN were also dense without columnar structure. The maximum microhardness of the Cr-N films was 2400 kg/$\textrm{mm}^2$ at 10gf load.

• 한국표면공학회지
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• 제25권1호
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• pp.24-33
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• 1992

Cr-N films were deposited on low-carbon steel sheets by the reactive arc-induced ion plating (AIIP). The influence of the deposition conditions (nitrogen pressure and substrate bias voltage) on the crystal orientation, morphology and microhardness of the Cr-N films has been investigated using x-ray diffractometer and scanning electron microscope. The impurities and contaminations on the surface and at the interface, and the layer-by-layer compositions of the film have been analyzed using scanning Auger multiprobe (SAM) and glow discharge spectroscope (GDS). The mixed state of Cr and Cr₂N turned out to have a fine fibrous structure. The Cr₂N films were deposited at a wide range of nitrogen flow rates. The orientations of Cr₂N films were mainly (110) and (111), and the intensity of the (111) peak increased as the substrate bias voltage increased. The microstructure of the Cr₂N film was dense and no columnar structure was observed. The films in the mixed state of Cr₂N and CrN were also dense without columnar structure. The maximum microhardness of the Cr-N films was 2400 kg/㎟ at 10 gf load.