Etching characteristics of ArF and EUV resists in dual-frequency superimposed capacitively coupled $CF_{4}/O_{2}/Ar$ and $CF_{4}/CHF_{3}/O_{2}$ /Ar plasmas
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- 한국표면공학회:학술대회논문집
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- 한국표면공학회 2009년도 춘계학술대회 논문집
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- pp.252-253
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- 2009