• Title/Summary/Keyword: disk substrate

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The Identification and Physiological Properties of Lactobacillus plantarum JK-01 Isolated from Kimchi (김치로부터 분리한 Lactobacillus plantarum JK-01의 동정 및 생리적 특성)

  • Cho, Jin-Koo;Li, Guan-Hao;Cho, Sung-Jin;Yoon, Yoh-Chang;Hwang, Seong-Gu;Heo, Kang-Chil;Choe, Il-Shin
    • Food Science of Animal Resources
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    • v.27 no.3
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    • pp.363-370
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    • 2007
  • In order to identify probiotic microorganisms, 25 isolates of Lactobacillus sp. were selected from kimchi based on their growth rates, lactic acid production and salt tolerance. The isolate JK-01 was identified as Lactobacillus plantarum by the API kit and 16S rDNA analysis (99.9% of homology), and named as L. plantarum JK-01. The maximum number of L. plantarum JK-01 was reached at 18 hr fermentation in MRS broth and the pH gradually decreased to 4.5. L. plantarum JK-01 showed high enzyme activities for xylanase, amylase, protease, and phytase on MRS agar plates containing each substrate. L. plantarum JK-01 showed high resistance to acidic pH and bile salts, and grew well even at pH 2.0 and 1.0% bile salt. In particular, L. plantarum JK-01 showed high heat stability as shown by $3.3{\times}10^3$ CFU/mL at $60^{\circ}C$. The isolate showed remarkable antimicrobial activity against E. coli in MRS broth based on its disappearance after 18 hr and clear zone formation using a paper disk assay. These results suggest that L. plantarum JK-01 may be probiotic in nature.

Influence of thickness ratio and substrate bias voltage on mechanical properties of AlCrN/AlCrSiN double-layer coating (두께 비율과 기판 바이어스 전압이 AlCrN/AlCrSiN 이중층 코팅의 기계적 특성에 미치는 영향)

  • Kim, Hoe-Geun;Ra, Jeong-Hyeon;Lee, Sang-Yul;Han, Hui-Deok
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2017.05a
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    • pp.162-162
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    • 2017
  • AlCrN 코팅은 높은 경도, 낮은 표면 조도 등의 상온에서의 우수한 기계적 특성 이외에 고온에서 안정한 합금상의 형성으로 인하여 우수한 내열성을 보이는 코팅이며, Si을 첨가하여 나노복합구조를 갖는 AlCrSiN 코팅은 고경도 특성을 나타내는 나노결정립과 고내열성을 나타내는 $Si_3N_4$ 비정질이 동시에 존재함으로써 뛰어난 고온 특성까지 보유하여 공구 코팅으로의 적용 가능성이 크다. 본 연구에서는, 가혹화된 공구사용 환경 대응 하는 더욱 우수한 내마모성 및 내열성을 보이는 코팅막을 개발하기 위해 AlCrN/AlCrSiN 이중층 코팅을 합성하였다. 합성된 코팅의 구조 및 물성을 분석하기 위해 field emission scanning electron microscopy(FE-SEM), nano-indentation, atomic force microscopy(AFM) 및 ball-on-disk wear tester를 사용하였다. 내열성을 확인하기 위하여 코팅을 furnace에 넣어 500, 600, 700, 800, 900도에서 30분 동안 annealing한 후에 nano-indentation을 사용하여 경도를 측정을 하였다. 5:5, 7:3, 9:1의 두께 비율로 AlCrN/AlCrSiN 이중층 코팅을 합성하였으며 모든 코팅의 두께는 $3{\mu}m$로 제어되었다. AlCrN 코팅층의 두께가 증가할수록, 이중층 코팅의 경도 및 내마모성은 점차 향상되었지만 코팅의 밀착력은 감소하였다. 일반적으로 AlCrN 코팅은 상대적으로 높은 잔류응력을 갖고 있으므로, AlCrN 층의 두께비율이 증가함에 따라 코팅내의 잔류응력이 높아져 코팅의 경도는 증가하고 밀착특성은 낮아진 것으로 판단된다. AlCrSiN 상부층 공정시 기판 바이어스 전압을 -50 ~ -200V 로 증가시키면서 이중층 코팅을 합성하였다. XRD 분석 결과, 공정 바이어스 전압이 증가함에 따라 AlCrSiN 상부층은 점차 비정질화 되었고, 코팅의 경도와 표면 특성이 향상되는 것을 확인하였다. 이러한 특성 향상은 높은 바이어스 인가가 이온 충돌효과의 증가를 야기시켰으, 이로 인해 치밀한 코팅층 합성에 의한 결과로 판단된다. AlCrN/AlCrSiN 이중층 코팅을 어닐링 한 후 경도 분석 결과, -150, -200V에서 합성한 코팅은 900도 이상에서 26GPa 이상의 높은 경도를 보인 것으로 보아 우수한 내열성을 갖는 것으로 확인 되었다. 이는 AlCrSiN 상부층의 높은 Si 함량 (11at.%) 으로 인한 충분한 $Si_3N_4$ 비정질상의 형성과, 고바이어스 인가로 인한 AlCrN 결정상과 $Si_3N_4$ 비정질상의 고른 분배가 코팅의 내열성을 향상시키는데 기여를 한 결과로 판단된다.

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$\textrm{CO}_2$ Gas Sensor Based on $\textrm{Li}_2\textrm{ZrO}_3$ System ($\textrm{Li}_2\textrm{ZrO}_3$ 계를 이용한 $\textrm{CO}_2$ 가스 센서)

  • Park, Jin-Seong;Kim, Si-Uk;Lee, Eun-Gu;Kim, Jae-Yeol;Lee, Hyeon-Gyu
    • Korean Journal of Materials Research
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    • v.9 no.9
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    • pp.896-899
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    • 1999
  • A carbon dioxide gas sensor was studied as a function of temperature and $CO_2$concentration in the Li$_2$ZrO$_3$ system. Lithium zirconate(Li$_2$ZrO$_3$) was synthesized by the heat-treatment of zirconia(ZrO$_2$)and Lithium carbonate(Li$_2$CO$_3$). The specimens were prepared both as bulk disk, 10mm in diameter and 1.0mm thickness, and thick films on an alumina substrate. Lithium zirconate readily responded to $CO_2$concentration from 0.1% to 100% in the range of 45$0^{\circ}C$ to $650^{\circ}C$. The sensitivity to $CO_2$ was dependent on the measuring temperature. Lithium zirconate(Li$_2$ZrO$_3$) decomposes into Li$_2$CO$_3$ and ZrO$_2$after the reaction with $CO_2$in the range of 45$0^{\circ}C$ to $650^{\circ}C$. Li$_2$CO$_3$ changes into Li$_2$O and $CO_2$ above $650^{\circ}C$. The material showed difficulty with reversibility and recovery. The optimum temperature for the highest sensitivity is around 55$0^{\circ}C$.

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Determination of the complex refractive index of $Ge_2Sb_2Te_5$ using spectroscopic ellipsometry (분광타원해석법을 이용한 $Ge_2Sb_2Te_5$ 의 복소굴절율 결정)

  • Kim, S. J.;Kim, S. Y.;Seo, H.;Park, J. W.;Chung, T. H.
    • Korean Journal of Optics and Photonics
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    • v.8 no.6
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    • pp.445-449
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    • 1997
  • The complex refractive indices of $Ge_2Se_2Te_5$ which show reversible phase change between the crystalline phase and an amorphous one depending upon the annealing process have been determined in the spectral range of 0.7-4.5 eV. The $Ge_2Se_2Te_5$ films were DC sputter deposited on the crystalline silicon substrate. The spectro-ellipsometry data of a thick film were analyzed following the modelling procedure where the quantum mechanical dispersion relation were used for the complex refractive indices of both the cryastalline phase $Ge_2Se_2Te_5$ and and amorphous phase $Ge_2Se_2Te_5$, respectively. On the other hand, with the surface micro-roughness layer whose effective thickness was determined from AFM analysis, the spectro-ellipsometry data were numerically inverted to yield the complex refractive index of $Ge_2Se_2Te_5$ at each wavelength. With these set of complex refractive indices, the reflectance spectra were calculated and those spectra obtained from the numerical inversion showed better agreement with the experimental reflection spectra for both the cryastalline phase and an amorphous phase. Finally, the thin $Ge_2Se_2Te_5$ film which has the optimum thickness of 26 nm as the medium for optical recording was also analyzed and the quantitative result of the film thickness and the surface microroughness has been reported.

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Design of a Ultra Miniaturized Voltage Tuned Oscillator Using LTCC Artificial Dielectric Reson (LTCC 의사 유전체 공진기를 이용한 초소형 전압제어발진기 설계)

  • Heo, Yun-Seong;Oh, Hyun-Seok;Jeong, Hae-Chang;Yeom, Kyung-Whan
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.23 no.5
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    • pp.613-623
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    • 2012
  • In this paper, we present an ultra miniaturized voltage tuned oscillator, with HMIC-type amplifier and phase shifter, using LTCC artificial dielectric resonator. ADR which consists of periodic conductor patterns and stacked layers has a smaller size than a dielectric resonator. The design specification of ADR is obtained from the design goal of oscillator. The structure of the ADR with a stacked circular disk type is chosen. The resonance characteristic, physical dimension and stack number are analyzed. For miniaturization of ADRO, the ADR is internally implemented at the upper part of the LTCC substrate and the other circuits, which are amplifier and phase shifter are integrated at the bottom side respectively. The fabricated ADRO has ultra small size of $13{\times}13{\times}3mm^3$ and is a SMT type. The designed ADRO satisfies the open-loop oscillation condition at the design frequency. As a results, the oscillation frequency range is 2.025~2.108 GHz at a tuning voltage of 0~5 V. The phase noise is $-109{\pm}4$ dBc/Hz at 100 kHz offset frequency and the power is $6.8{\pm}0.2$ dBm. The power frequency tuning normalized figure of merit is -30.88 dB.