• Title/Summary/Keyword: discharge uniformity

Search Result 91, Processing Time 0.026 seconds

Performance and Hydraulic Characteristics of Drip Emitters (점적 emitter 의 성능과 수리적 특성)

  • 이남호
    • Magazine of the Korean Society of Agricultural Engineers
    • /
    • v.41 no.3
    • /
    • pp.33-40
    • /
    • 1999
  • Variations in the discharge rates of drip emittes were examined to find the effects of operation pressure and the tube length and to evaluate performance of the emitters. Several point-source emitters were selected such as pressure compensated, anti-leak pressure compensated, turbulent flow regulated, flow regulated, ready-made dripper, and spaghetti. Combination of operation pressure and tube length were compared. The microirrigatioon system was operated at pressures of 0.5 , 1.0 , 1.5 and 2.0 bar. The discharge from emitters wer collected at every ten meters along the lateral tube and weighted. In order to evaluate the drip emitters performance coeffcient of discharge variation , statistical uniformity, and emission uniformity were calculated. No significant variation in discharge along drip tube resulted with all emitters. There is no trend of variatiiono of discharge rate from pressure compensated emitters with increase in operation pressures. But discharge rate from other types of emitters increased with increase in operation pressures. The nominal discharge of each emitter was secured at pressure of 1.0 bar, Evaluation using statiscal and emission uniformity coefficients indicated that most of the emitters excepts tubulent flow regulated emitter and ready-made dripper performed at excellent level.

  • PDF

Development of a Variable Rate Granule Applicator for Environment-Friendly Precision Agriculture (II) - Development of Pneumatic Fertilizer Blow Head and Its Application Uniformity - (친환경 정밀농업을 위한 입제 변량살포기 개발 (II) -송풍식 붐형 분두 개발과 살포균등도 -)

  • Kim, Y.J.;Kim, H.J.;Seo, M.;Rhee, J.Y.
    • Journal of Biosystems Engineering
    • /
    • v.31 no.6 s.119
    • /
    • pp.474-481
    • /
    • 2006
  • In this paper, a new type blow head was developed and pneumatic application system was evaluated. The blow head had one operating factor, inserting length of collecting plate, that was directly related to discharge rate and application pattern. To determine Proper blow head arrangement and application height, a blow head set was tested. Three-way ANOVA was conducted to investigate relationships between CV value, the discharge rate and inserting length of collecting plate. The discharge rate and inserting length of collecting plate were statistically significant at p=0.01, affecting uniformity of application pattern. The best CV value among the application tests was 23.3% when the application rate and application height was 23.5 g/sec and 80 cm respectively. The worst CV value was 63.3% in 111.4 g/sec. Therefore, it is necessary to increase number of blow head in a section of the boom in improve application uniformity.

Discharge Uniformity and Performance Assessment of Drip Irrigation System (점적관개 시설의 관개균일도 및 성능 평가)

  • Nam, Won-Ho;Choi, Jin-Yong;Choi, Soon-Kun;Hong, Eun-Mi;Jeon, Sang-Ho;Hur, Seung-Oh
    • Journal of The Korean Society of Agricultural Engineers
    • /
    • v.54 no.4
    • /
    • pp.29-38
    • /
    • 2012
  • Drip irrigation is a affordable irrigation under structured cultivation. Drip irrigation system with high uniformity can be achieved through effective design, maintenance and management of irrigation systems. Nevertheless the design guidelines have not been established for the drip irrigation system products in domestic and imported considering cultivation method and greenhouse environment in Korea. The objectives of this study were to evaluate the performance of drip irrigation system with uniformity through an experiment. The experiment was conducted to study with nine different types of emitters produced in domestic and imported. Hazen-Williams coefficients were also estimated for the drip emitter through hydraulic simulation for design use. It was found that approximately 91.5 % for 10 cm emitter spacing and 96.2 % for 30 cm emitter spacing of statistical uniformity were observed in respectively. Average emission uniformity was decreased as the reduction of emitter spacing. The results would be used in the drip irrigation system design and guideline construction.

Development of an advanced atmospheric pressure plasma source with high spatial uniformity and selectiveness for surface treatment

  • Im, Yu-Bong;Choe, Won-Ho;Lee, Seung-Hun;Han, U-Yong;Lee, Jong-Hyeon;Lee, Sang-Gyun;Ha, Jeong-Min;Kim, Jong-Hun
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2016.02a
    • /
    • pp.176-177
    • /
    • 2016
  • In the last few decades, attention toward atmospheric pressure plasma (APP) has been greatly increased due to the numerous advantages of those applications, such as non-necessity of high vacuum facility, easy setup and operation, and low temperature operation. The practical applications of APP can be found in a wide spectrum of fields from the functionalization of material surfaces to sterilization of medical devices. In the secondary battery industry, separator film has been typically treated by APP to enhance adhesion strength between adjacent films. In this process, the plasma is required to have high stability and uniformity for better performance of the battery. Dielectric barrier discharge (DBD) was usually adopted to limit overcurrent in the plasma, and we developed the pre-discharge technology to overcome the drawbacks of streamer discharge in the conventional DBD source which makes it possible to produce a super-stable plasma at atmospheric pressure. Simulations for the fluid flow and electric field were parametrically performed to find the optimized design for the linear jet plasma source. The developed plasma source (Plasmapp LJPS-200) exhibits spatial non-uniformity of less than 3%, and the adhesion strength between the separator and electrode films was observed to increase 17% by the plasma treatment.

  • PDF

The electro-magnetic properties of Xe type flat lamp by discharge electrode structure (Xe형 평면광원의 방전 전극 구조 변화에 따른 전자계 특성)

  • Yang, Jong-Kyung;Pack, Kwang-Hyun;Lee, Jong-Chan;Choi, Yong-Sung;Park, Dae-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2005.05b
    • /
    • pp.15-18
    • /
    • 2005
  • As a display becomes large recently, Acquisition of high luminance and Luminance uniformity is becoming difficult in the existing CCFL or EEFL backlight system. So, study for a performance enhancement has enforced. but lamp development of flat type is asked for high luminance and a luminance uniformity security in of LCD and area anger trend ultimately. In this paper, we changed a tip shape of an electrode for production by the most suitable LCD backlight surface light source, and confirmed discharge characteristic along discharge gas pressure and voltage, and confirmed electric field distribution and discharge energy characteristic through a Maxwell 2D simulation. Therefore the discharge firing voltage characteristic showed a low characteristic than a rectangular type and round type in case of electrode which used tip of a triangle type, and displayed a discharge electric current as a same voltage was low.

  • PDF

Electricla Properties of Xe Plasma Flat Lamp (Xe 플라즈마 평판 램프의 전기적 특성)

  • Choi, Yong-Sung;Cho, Jae-Cheol;Hong, Kyung-Jin;Lee, Woo-Sun;Lee, Kyung-Sup
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2006.12a
    • /
    • pp.35-38
    • /
    • 2006
  • As a display becomes large recently, Acquisition of high luminance and Luminance uniformity is becoming difficult in the existing CCFL or EEFL backlight system. So, study for a performance enhancement has enforced. but lamp development of flat type is asked for high luminance and a luminance uniformity security in of LCD and area anger trend ultimately. In this paper, we changed a tip shape of an electrode for production by the most suitable LCD backlight surface light source, and confirmed discharge characteristic along discharge gas pressure and voltage, and confirmed electric field distribution and discharge energy characteristic through a Maxwell 2D simulation. Therefore the discharge firing voltage characteristic showed a low characteristic than a rectangular type and round type in case of electrode which used tip of a triangle type, and displayed a discharge electric current as a same voltage was low.

  • PDF

Electrical and Electromagnetic Characteristics of Xe Plasma Flat Lamp by Electrode Structure (Xe 플라즈마 평판형 광원의 전극 구조에 따른 전기.자기적 특성)

  • Choi, Yong-Sung;Moon, Jong-Dae;Lee, Kyung-Sup;Lee, Sang-Heon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2006.05a
    • /
    • pp.82-85
    • /
    • 2006
  • As a display becomes large recently, Acquisition of high luminance and Luminance uniformity is becoming difficult in the existing CCFL or EEFL backlight system. So, study for a performance enhancement has enforced. but lamp development of flat type is asked for high luminance and a luminance uniformity security in of LCD and area anger trend ultimately. In this paper, we changed a tip shape of an electrode for production by the most suitable LCD backlight surface light source, and confirmed discharge characteristic along discharge gas pressure and voltage, and confirmed electric field distribution and discharge energy characteristic through a Maxwell 2D simulation. Therefore the discharge firing voltage characteristic showed a low characteristic than a rectangular type and round type in case of electrode which used tip of a triangle type, and displayed a discharge electric current as a same voltage was low.

  • PDF

Development of magnetron sputtering system for Al thin film decomposition with high uniformity (고균일 Al 박막 증착을 위한 magnetron sputtering system 개발)

  • Lee, J.H.;Hwang, D.W.
    • Journal of the Korean Vacuum Society
    • /
    • v.17 no.2
    • /
    • pp.165-169
    • /
    • 2008
  • It is very important to decompose uniformly the metal film in semiconductor devices process. The thickness uniformity of the ITO film by standard magnetron sputtering system are about $\pm4%\sim\pm5%$ and the center of the wafer is more thick than the edge of the wafer. We designed and made the discharge electrode structure and controlled the direction of sputtering materials in magnetron sputtering system. The thickness uniformity are increased to $\pm0.8\sim1.3%$ in 4" wafer using the new sputtering gun in magnetron sputtering system. In wafer to wafer thickness uniformity, $\pm$5.3% are increased to $\pm$1.5% using the new sputtering gun. The thickness uniformity of the Al film are about $\pm$1.0% using the new sputtering gun in magnetron sputtering system.

Discharge Variation of Perforated Hoses and Drip Irrigation Systems for Protected Cultivation (시설재배용 분수호스 및 점적관수 시스템의 관수균일도 분석)

  • Nam, Sang-Woon;Kim, Young-Shik
    • Journal of Bio-Environment Control
    • /
    • v.16 no.4
    • /
    • pp.297-302
    • /
    • 2007
  • Discharge variations of perforated hose and drip irrigation systems were examined to evaluate irrigation uniformity at different pressures and length of branch line. Evaluation using statistical uniformity indicated that button drippers performed at excellent level but drip tapes and drip hoses were a little lower level. Nominal discharge of drip irrigation systems showed at the high side within the range of regulating pressure provided by the manufacturer. It is desirable that the length of branch line for drip hose, drip tape, and button dripper should be limited to 50 m, 70 m, and 100 m, respectively. Irrigation uniformity of perforated hoses showed very low level. So it is recommended that the length of branch line for perforated hoses should be limited to $30{\sim}35m$.

Uniformity Assessment of Soil Moisture Redistribution for Drip Irrigation (점적관개에 따른 토양수분 재분배 균일성 평가)

  • Choi, Soon-Kun;Choi, Jin-Yong;Nam, Won-Ho;Hur, Seung-Oh;Kim, Hak-Jin;Chung, Sun-Ok;Han, Kyung-Hwa
    • Journal of The Korean Society of Agricultural Engineers
    • /
    • v.54 no.3
    • /
    • pp.19-28
    • /
    • 2012
  • Greenhouse cultivation has been increasing for high quality and four season crop production in South Korea. For the cultivation in a greenhouse, maintaining adequate soil moisture at each crop growth stage is quite important for yield stability and quality while the behavior of moisture movement in the soil has complexity and adequate moisture conditions for crops are vary. Drip irrigation systems have been disseminated in the greenhouse cultivation due to advantages including irrigation convenience and efficiency without savvy consideration of the soil moisture redistribution. This study aims to evaluate soil moisture movement of drip irrigation according to the soil moisture uniformity assessment. Richards equation and finite difference scheme were adapted to simulate soil moisture behavior in soil. Soil container experiment was conducted and the model was validated using the data from the experiment. Two discharge rate (1 ${\ell}/hr$ and 2 ${\ell}/hr$) and three spaces between the emitters (10 cm, 20 cm, and 30 cm) were used for irrigation system evaluation. Christiansen uniformity coefficient was also calculated to assess soil moisture redistribution uniformity. The results would propose design guidelines for drip irrigation system installation in the greenhouse cultivation.