• Journal of computational fluids engineering
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• v.14 no.1
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• pp.70-77
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• 2009

In this study, time-dependent numerical analysis was carried out to investigate the plasma jet impingement on a flat plate, and a compressible form of two-dimensional inviscid gas dynamics equations were solved using the flux corrected transport algorithm. The mathematical modeling of Joule heating in the polycarbonate capillary bore and the mass ablation from the bore wall was incorporated in the numerical analysis and the series of computation was performed for three cases depending on the distance of the opposing plate from the capillary exit. The computational results reveal that the presence of the opposing plate does not affect the flow conditions inside the capillary when compared to the case of open-air plasma discharge. In the exterior region, the flow structure shows the typical supersonic underexpanded jet which consists of the strong Mach disk in front of the opposing plate and the barrel shock at the side of the jet. It is found that the shock evolution becomes more quasi-steady when the plate distance decreases. Also, the effects of the distance between the capillary bore exit and the opposing plate on the flow conditions along the opposing plate are investigated and the pressure variation on the plate shows more complicated interaction between the plasma discharge and the opposing plate when the location of plate becomes closer to the capillary exit.

• Journal of Environmental Science International
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• v.22 no.7
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• pp.915-923
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• 2013

Decomposition of non-biodegradable contaminants such as phenol contained in water was investigated using a dielectric barrier discharge (DBD) plasma reactor in the aqueous solutions with continuous oxygen bubbling. Effects of various parameters on the removal of phenol in aqueous solution with high-voltage streamer discharge plasma are studied. In order to choose plasma gas, gas of three types (argon, air, oxygen) were investigated. After the selection of gas, effects of 1st voltage (80 ~ 220 V), oxygen flow rate (2 ~ 7 L/min), pH (3 ~ 11), and initial phenol concentration (12.5 ~ 100.0 mg/L) on phenol degradation and change of $UV_{254}$ absorbance were investigated. Absorbance of $UV_{254}$ can be used as an indirect indicator of phenol degradation and the generation and disappearance of the non-biodegradable organic compounds. Removal of phenol and COD were found to follow pseudo first-order kinetics. The removal rate constants for phenol and COD of phenol were $5.204{\times}10^{-1}min^{-1}$ and $3.26{\times}10^{-2}min^{-1}$, respectively.

• Journal of Environmental Health Sciences
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• v.37 no.3
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• pp.218-225
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• 2011

Objectives: In this paper, a dielectric barrier discharge (DBD) plasma reactor was investigated for degrading the dye Rhodamine B (RhB) in aqueous solutions. Methods: The DBD plasma reactor system in this study consisted of a plasma component [titanium discharge (inner), ground (outer) electrode and quartz dielectric tube], power source, and gas supply. The effects of various parameters such as first voltage (input power), gas flow rate, second voltage (output power), conductivity and pH were investigated. Results: Experimental results showed that a 99% aqueous solution of 20 mg/l Rhodamine B is decolorized following an eleven minute plasma treatment. When comparing the performance of electrolysis and plasma treatment, the RhB degradation of the plasma process was higher that of the electrolysis. The optimum first voltage and air flow rate were 160 V (voltage of trans is 15 kV) and 3 l/min, respectively. With increased second voltage (4 kV to 15 kV), RhB degradation was increased. The higher the pH and the lower conductivity, the more Rhodamine B degradation was observed. Conclusions: OH radical generation of dielectric plasma process was identified by degradation of N, N-dimethyl-4-nitrosoaniline (RNO, indicator of OH radical generation). It was observed that the effect of UV light, which was generated as streamer discharge, on Rhodamine B degradation was not high. Rhodamine B removal was influenced by real second voltage regardless of initial first and second voltage. The effects of pH and conductivity were not high on the Rhodamine B degradation.

• Journal of the Speleological Society of Korea
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• no.76
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• pp.37-42
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• 2006

The Dielectric Barrier Discharge (DBD) is a nonequilibrium gas discharge that is generated in the space between two electrodes, which are separated by an insulating dielectric layer. The dielectric layer can be put on either of the two electrodes or be inserted in the space between two electrodes. If an AC or pulse high voltage is applied to the electrodes that is operated at applied frequency from 50Hz to several MHz and applied voltages from a few to a few tens of kilovolts rms, the breakdown can occur in working gas, resulting in large numbers of micro-discharges across the gap, the gas discharge is the so called DBD. Compared with most other means for nonequilibrium discharges, the main advantage of the DBD is that active species for chemical reaction can be produced at low temperature and atmospheric pressure without the vacuum set up, it also presents many unique physical and chemical process including light, heat, sound and electricity. This has led to a number of important applications such as ozone synthesizing, UV lamp house, CO2 lasers, et al. In recent years, due to its potential applications in plasma chemistry, semiconductor etching, pollution control, nanometer material and large area flat plasma display panels, DBD has received intensive attention from many researchers and is becoming a hot topic in the field of non-thermal plasma.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.581-582
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• 2005

In order to apply the discharge plasma processing. to industrial areas, the control of the chemical reaction mechanism is necessary. The hybrid plasma reactor was designed for the effective treatment of wastewater and hazardous volatile organic substances. This plasma reactor was similar to the barrier discharge, and surface discharge on the dielectric surface was propagated to the water surface strongly for the heterogeneous chemical reaction at the interface between the working gas and the water surface. The discharge emission in this discharge reactor was mainly $N_2$ second positive band in the case of $N_2$ or air gas atmosphere, and intensities from OH radicals in Ar gas atmosphere were stronger than in $N_2$ or air gas atmosphere. From this result, it is necessary to apply Ar gas for the effective generation of OH radicals in this plasma reactor.

• Korean Journal of Fisheries and Aquatic Sciences
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• v.52 no.6
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• pp.617-624
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• 2019

Dielectric barrier discharge (DBD) plasma is one of the promising next generation non-thermal technologies for food sterilization. The present study investigated the effects of DBD plasma on the reduction of most common food-borne pathogenic bacteria (Staphylococcus aureus, Bacillus cereus, Vibrio parahaemolyticus, Salmonella enterica) and sanitary indicative bacteria (Escherichia coli) in the suspension (initial inoculum of approx. 9 log CFU/mL). The bacterial counts were significantly (P<0.05) reduced with the increase in the treatment time (1-30 min) of DBD plasma in the suspension. The D-values (time for 90% reduction) of DBD plasma by first-order kinetics for S. aureus, B. cereus, V. parahaemolyticus, S. enterica, and E. coli were 17.76, 19.96, 32.89, 21.55, and 15.24 min, respectively (R²>0.90). These results specifically showed that 30 min of DBD plasma treatment in > 90% reduction of seafood-borne pathogenic and sanitary indicative bacteria. This suspension study may provide the basic data for use in seafood processing and distribution.

• Transactions of the Korean Society of Automotive Engineers
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• v.20 no.2
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• pp.70-77
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• 2012

The selective catalytic reduction(SCR) system used to reduce NOx in diesel engines requires an NO/$NO_2$ ratio of about 1 in exhaust emissions to realize the fast SCR mode at temperatures lower than $300^{\circ}C$. This study investigated the characteristics of a plasma system as a pre-active apparatus for the fast SCR reaction mode of an SCR system. Plasma was generated by the pulse corona discharge(PCD) method with a four-channel wire-cylinder reactor. This study showed that plasma was easily generated in the exhaust gas by the PCD system, and the peak voltage of the normal state condition for plasma generation was generally 12 kV. The PCD system easily converted NO into $NO_2$ at lower temperatures and the NO/$NO_2$ conversion ratio increased with the discharge current for plasma generation. But the PCD system could not convert NO into $NO_2$ at higher engine speeds and higher engine loads due to the lack of oxygen in exhaust gas. The PCD system also activated the diesel oxidation catalysts(DOC) system to reduce CO emissions.

• Journal of the Korean Vacuum Society
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• v.22 no.3
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• pp.111-118
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• 2013

The influence of gas flow on the plasma generation in the atmospheric plasma jet is described with the theory of hydrodynamics. The plasma discharge is affected by the gas-flow streams with Reynolds number (Re) as well as the gas pressure with Bernoulli's theorem according to the gas flow rate inserted into the glass tube. The length of plasma column is varied with the flow types such as the laminar flow of Re<2,000 and the turbulent flow of Re>4,000 as it has been known in a general fluid experiments. In the laminar flow, the plasma column length is increased as the increase of flow rate. Since the pressure in the glass tube becomes low as the increase of flow velocity by the Bernoulli's theorem, the breakdown voltage of plasma discharge is reduced by the Paschen's law. Therefore, the plasma length is increased as the increasing flow rate with the fixed operation voltage. In the transition of laminar and turbulent flows, the plasma length is decreased. When the flow becomes turbulent as the flow rate is increasing, the plasma length becomes short and the discharge is shut down ultimately. In the discharge of laminar flow, the diameter of plasma beam exposed on the substrate surface is kept less than the glass diameter, since the gas flow is kept to the distinct distance from the nozzle of glass tube.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.96-97
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• 2012

In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

• Applied Chemistry for Engineering
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• v.23 no.6
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• pp.608-613
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• 2012

Dielectric barrier discharge plasma reactor was applied to the removal of ethylene from a simulated storage facility ($1.0m^3$) of fruits and vegetables. The system operated in a closed-loop mode by feeding the contaminated gas to the plasma reactor and recirculating the treated gas back to the storage facility. The experiments were carried out with parameters such as discharge power, circulation flow rate, initial ethylene concentration and treatment time. The rate of ethylene decomposition was mainly controlled by the discharge power and the treatment time. With the other conditions kept constant, the ethylene decomposition rate in the presence of the manganese oxide ozone control catalyst installed downstream from the plasma reactor was lower than that in the absence of it. The suggests that unreacted ozone from the plasma reactor accumulated in the storage facility where it additionally decomposed ethylene. On the basis of an initial ethylene concentration of 50 ppm, the energy requirement for completing the decomposition was about 60 kJ.