• Electrical & Electronic Materials
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• v.9 no.10
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• pp.991-1000
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• 1996

PbTiO$_{3}$-PbZrO$_{3}$-Pb(Ni$_{1}$3/Nb$_{2}$3/O$_{3}$) (PZT-PNN) thin films were prepared from corresponding metal organics partially stabilized with diethanolamine by the sol-gel spin coating method. Each mol ratio of PT:PZ:PNN solutions were #1(50:40:10), #2(50:30:20), #3(45:35:20), #4(40:40:20), #5(40:50:10), #6(35:45:20) and #7(30:50:20) respectively. The spin-coated PZT-PNN films were heat-treated at 350.deg. C for decomposition of residual organics, and were sintered from 450.deg. C to 750.deg. C for crystallization. The substrates, such as Pt and Pt/TiN/Ti/TiN/Si were used for the spin coating of PZT PNN films. The perovskite phase was observed in the PZT-PNN films heat-treated at 500.deg. C. The crystalline of the PZT-PNN films was optimized at the sintering of 700.deg. C. By the result of AES analysis, It is confirmed that the films of TiN/Ti/TiN was a good diffusion barrier and that co-diffusion into the each films was not observed.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.11a
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• pp.29-30
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• 2001

This paper presents some results of plasma nitriding on hard chromium deposit. The substrates were C45 steel and $30~50{\;}\mu\textrm{m}$ of chromium deposit by electroplating was formed. Plasma nitriding was carried out in a plasma nitriding system with $95NH_3{\;}+{\;}SCH_4$ atmosphere at the pressure about 600 Pa and different temperature from $450^{\circ}C{\;}to{\;}720^{\circ}C$ for various time. Optical microscopy and X-ray diffraction were used to evaluate the characteristics of surface nitride layer formed by nitrogen diffusion from plasma atmosphere inward iCr coating and interface carbide layer formed by carbon diffusion from substrate outward Cr coating. The microhardness was measured using microhareness tester at the load of 100 gf. Corrosion resistance was evaluated using the potentiodynamic measurement in 3.5% NaG solution. A saturated calomel electrode (SiCE) was used as the reference electrode. Fig.1 shows the typical microstructures of top surface and cross-section for nitrided and unnitrided samples. Aaer plasma nitriding a sandwich structure was formed consisting of surface nitride layer, center chromium layer and interface carbide layer. The thickness of nitride and carbide layers was increased with the increase of processing temperature and time. Hardness reached about 1000Hv after nitriding while 900Hv for unnitrided hard chromium deposit. X-ray diffraction indicated that surface nitrided layer was a mixture of $Cr_2N$ and CrN at low temperature and erN at high temperature (Fig.2). Anodic polarization curves showed that plasma nitriding can greatly improve the corrosion resistance of chromium e1ectrodeposit. After plasma nitriding, the corrosion potential moved to noble direction and passive current density was lower by 1 to 4 orders of magnitude compared with chromium deposit(Fig.3).

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2018.06a
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• pp.129-129
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• 2018

Hard coating application is effective way of cutting tool for hard-to-machine materials such as Inconel, Ti and composite materials focused on high-tech industries which are widely employed in aerospace, automobile and the medical device industry also Information Technology. In cutting tool for hard-to-machine materials, high hardness is one of necessary condition along with high temperature stability and wear resistance. In recent years, high-entropy alloys (HEAs) which consist of five or more principal elements having an equi-atomic percentage were reported by Yeh. The main features of novel HEAs reveal thermodynamically stable, high strength, corrosion resistance and wear resistance by four characteristic features called high entropy, sluggish diffusion, several-lattice distortion and cocktail effect. It can be possible to significantly extend the field of application such as cutting tool for difficult-to-machine materials in extreme conditions. Base on this understanding, surface coatings using HEAs more recently have been developed with considerable interest due to their useful properties such as high hardness and phase transformation stability of high temperature. In present study, the nanocomposite coating layers with high hardness on WC substrate are investigated using high entropy alloy target made a powder metallurgy. Among the many surface coating methods, reactive magnetron sputtering is considered to be a proper process because of homogeneity of microstructure, improvement of productivity and simplicity of independent control for several critical deposition parameters. The N2 is applied to reactive gas to make nitride system with transition metals which is much harder than only alloy systems. The acceleration voltage from 100W to 300W is controlled by direct current power with various deposition times. The coating layers are systemically investigated by structural identification (XRD), evaluation of microstructure (FE-SEM, TEM) and mechanical properties (Nano-indenter).

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2016.11a
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• pp.105-105
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• 2016

Recently, high power impulse magnetron sputtering (HIPIMS) has attracted considerable attentions due to its high potential for industrial applications. By pulsing the sputtering target with high power density and short duration pulses, a high plasma density and high ionization of the sputtered species can be obtained. HIPIMS has exhibited several merits such as increased coating density, good adhesion, microparticle-free and smooth surface, which make the HIPIMS technique desirable for synthesizing hard coatings. However, hard coatings present intrinsic defects (columnar structures, pinholes, pores, discontinuities) which can affect the corrosion behavior, especially when substrates are active alloys like steel or in a wear-corrosion process. Atomic layer deposition (ALD), a CVD derived method with a broad spectrum of applications, has shown great potential for corrosion protection of high-precision metallic parts or systems. In ALD deposition, the growth proceeds through cyclic repetition of self-limiting surface reactions, which leads to the thin films possess high quality, low defect density, uniformity, low-temperature processing and exquisite thickness control. These merits make ALD an ideal candidate for the fabrication of excellent oxide barrier layer which can block the pinhole and other defects left in the coating structure to improve the corrosion protection of hard coatings. In this work, CrN/Al2O3/CrN multilayered coatings were synthesized by a hybrid process of HIPIMS and ALD techniques, aiming to improve the CrN hard coating properties. The influence of the Al2O3 interlayer addition, the thickness and intercalation position of the Al2O3 layer in the coatings on the microstructure, surface roughness, mechanical properties and corrosion behaviors were investigated. The results indicated that the dense Al2O3 interlayer addition by ALD lead to a significant decrease of the average grain size and surface roughness and greatly improved the mechanical properties and corrosion resistance of the CrN coatings. The thickness increase of the Al2O3 layer and intercalation position change to near the coating surface resulted in improved mechanical properties and corrosion resistance. The mechanism can be explained by that the dense Al2O3 interlayer acted as an excellent barrier for dislocation motion and diffusion of the corrosive substance.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.23 no.2
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• pp.81-85
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• 2013

We performed analysis of composition and structure of coating layers by using ED-XRF and TOF-SIMS for some passion topaz of Swarovski which developed recently as new surface treatment of TCF (thermal color fusion) technique. In addition, we compared differences between Ti-coated topaz (Mystic topaz) and new treated colored topazes (passion topaz) with magnification observation and simplified durability test. As a result, we can observe similar characteristic clues in Ti-coated topaz and passion topaz by magnified observation. According to results of depth profile by TOF-SIMS, we can know that topaz is treated by multi-layer coating or surface diffusion coating. Moreover, the passion topaz which is treated by chemical reaction between metal elements shows more stable chemical resistance and higher Mohs' hardness than Ti-coated topaz.

• Journal of Environmental Health Sciences
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• v.36 no.3
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• pp.236-246
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• 2010

In preparative anti-corrosive coating experiments, polyaniline was obtained by reacting an oxidizing agent with the monomer aniline. Further, the primer coating was prepared using a variety of widely-used materials such as urethane resin. For the top coating, epoxy resin and acrylic urethane resin were used. Characteristics of the coatings were assessed according to KS and ASTM specifications, and the structure of the polyaniline was characterized using FT-IR and TGA. For analysis of anti-corrosive properties in salt-spray experiments, measurements of the oxidation state of iron and surface atomic analysis were conducted using XPS and SEM-EDX. Unlike general anti-corrosive coatings which exhibit anti-corrosive effects only as a primer coating, the anti-corrosive coatings using polyaniline as the anti-corrosive pigment showed a marked synergistic effect with the top coatings. In other words, the top coatings not only produce a fine view effect, but also increase, through interaction with the primer coatings, the resistance to diffusion of corrosive factors from the external environment. It was also found that, unlike the heavy metal oxide-forming layer of the passive barrier alone, the polyaniline anti-corrosive pigment oxidized iron at the interface with the iron substrate to form a passive barrier in the oxidic layer, and itself formed a potential barrier layer with anti-corrosive factors from the external environment. Although the passive layer was damaged, the damaged area did not become completely oxidized iron; on the contrary, it showed a tendency to reduction. This can be interpreted such that a passive layer is formed again on the damaged area, and that at the same time there is a tendency to self-healing.

• Journal of Electrochemical Science and Technology
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• v.9 no.1
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• pp.60-68
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• 2018

In aqueous rechargeable lithium ion batteries, $LiV_3O_8$ exhibits obviously enhanced electrochemical performance after $AlF_3$ surface modification owing to improved surface stability to fragile aqueous electrolyte. The cycle life of $LiV_3O_8$ is significantly enhanced by the presence of an $AlF_3$ coating at an optimal content of 1 wt.%. The results of powder X-ray diffraction, energy dispersive X-ray spectroscopy, X-ray photoelectron spectroscopy, inductively coupled plasma-optical emission spectrometry, and galvanostatic charge-discharge measurements confirm that the electrochemical improvement can be attributed mainly to the presence of $AlF_3$ on the surface of $LiV_3O_8$. Furthermore, the $AlF_3$ coating significantly reduces vanadium ion dissolution and surface failure by stabilizing the surface of the $LiV_3O_8$ in an aqueous electrolyte solution. The results suggest that the $AlF_3$ coating can prevent the formation of unfavorable side reaction components and facilitate lithium ion diffusion, leading to reduced surface resistance and improved surface stability compared to bare $LiV_3O_8$ and affording enhanced electrochemical performance in aqueous electrolyte solutions.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.8 no.2
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• pp.307-314
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• 1998

PZT thin films were fabricated by the Sol-gel method. Starting materials used for the preparation of the stock solution were Pb-acetate trihydrate, Zr-normal propoxide and Ti-isopropoxide. 2-Methoxyethanol and iso-propanol were used for solution. For studying the diffusion of Pb ion into the substrates. We used bare Si substrate, $SiO_2/Si$ substrates which was produced by thermal oxidation and $TiO_2/SiO_2/Si$ which was mad by Sol-gel method. Densification and adhesion of thin films were observed by SEM. Phase formation of thin films and diffusion of Pb ion into the substrate were examined by XRD and ESCA, respectively. In the case of bare Si and $SiO_2/Si$ substrate, we obtained the perovskite phase at $700^{\circ}C$ and restricted a little the diffusion of Si ion into the film with $SiO_2$ buffer layer. In the case of $TiO_2/SiO_2/Si$, perovskite phase were obtained at $500^{\circ}C$ and the diffusion of Pb ion and Si ion were restriced.

• Polymer(Korea)
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• v.27 no.5
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• pp.421-428
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• 2003

The kinetics of photoinitiated polymerization of reactive oligomer methacrylates and oligomer methacrylate/SBS blends have been studied to characterize the diffusion-controlled reaction using Fourier Transform Infrared Spectroscopy-Attenuated Total Reflectance (ATR-FTIR). The polymerization rates of reactive oligomer methacrylates and oligomer methacrylate/SBS blends were autocatalytic in nature at the initial stage and then a retardation of the reaction conversion occurred gradually as the polymer matrix became vitrified, and finally the reaction became diffusion controlled. Photopolymerization behavior of methacrylate/SBS blends was well predicted using the diffusion-controlled reaction model. N-Vinyl-2-pyrrolidinone (NVP) as a reactive solvent was used to incorporate SBS into methacrylate to form semi-IPN via photopolymerization. Due to the high reactivity of NVP, polymerization rate increased with the increase of NVP content. As the content of NVP-SBS in the blends increased up to 10 phr, the reaction conversion maintained almost constant. But above 20 phr of NVP-SBS in the blends, the reaction conversion gradually decreased since the increase of viscosity affected on the photopolymerization rate. The semi-IPN films of methacrylate/SBS blends were transparent at room temperature as well as at increased temperature and were able to be applied to surface coating.

• Journal of the Korean Magnetics Society
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• v.24 no.6
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• pp.186-190
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• 2014

To establish the coating conditions for $^{57}Co$, non-radioactive Co ions are dissolved in an acid solution and electroplated on to a copper plate. Then, the thermal diffusion of electroplated Co into a copper matrix was studied to apply a $^{57}Co$ $M{\ddot{o}}ssbauer$ source. Nanocrystalline Co particles were coated on a Cu substrate using DC electro-deposition at a pH of 1.89 to 5 and $20{\sim}30mA/cm^2$. The average grain size was up to 54 nm as the pH increased to 5. The second phase of Co-oxide was formatted as the pH was increased above 4. The diffusion degree was evaluated by mapping using scanning electron microscopy (SEM). The influence of different annealing conditions was investigated. The diffusion depth of Co depends on the annealing temperature and time. The results obtained confirm that the deposited Co diffused almost completely into a copper matrix without substantial loss at an annealing temperature of $900^{\circ}C$ for 2 hours.