• Title/Summary/Keyword: diffraction grating

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Grating phase measurement of photopolymer hologram by self-diffraction oscillations (자체회절 진동에 의한 포토폴리머 홀로그램의 격자 위상측정)

  • 경천수;성기영;곽종훈;최옥식;이윤우;이인원;서호형;이일항
    • Korean Journal of Optics and Photonics
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    • v.10 no.4
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    • pp.328-334
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    • 1999
  • Methylene blue-sensitized photopolymerizable material based on acrylamide is investigated with two-wave energy coupling experiments. Differently from other studies, self-diffraction oscillations are observed and the grating phase is determined without applying external electric fields, moving nonlinear materials, and phase shifting one of two writing beams. The phase grating showed a phase shift of $\pm$50$^{\circ}$ with respect to the intensity grating. Modified Kogelnik's coupled wave equation considering the mixed gratings of phase and absorption gratings and nonzero spatial phase shifts of the gratings with respect to the intensity interference patterns formed during the two-wave energy coupling is discussed in detail to understand these phenomenon.

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Wide-fan-angle Flat-top Linear Laser Beam Generated by Long-pitch Diffraction Gratings

  • Lee, Mu Hyeon;Ryu, Taesu;Kim, Young-Hoon;Yang, Jin-Kyu
    • Current Optics and Photonics
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    • v.5 no.5
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    • pp.500-505
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    • 2021
  • We demonstrated a wide-fan-angle flat-top irradiance pattern with a very narrow linewidth by using an aspheric lens and a long-pitch reflective diffraction grating. First, we numerically designed a diffraction-based linear beam homogenizer. The structure of the Al diffraction grating with an isosceles triangular shape was optimized with 0.1-mm pitch, 35.5° slope angle, and 0.02-mm radius of the rounding top. According to the numerical results, the linear uniformity of the irradiance was more sensitive to the working distance than to the shape of the Al grating. The designed Al grating reflector was fabricated by using a conventional mold injection and an Al coating process. A uniform linear irradiance of 405-nm laser diode with a 100-mm flat-top length and 0.176-mm linewidth was experimentally demonstrated at 140-mm working distance. We believe that our proposed linear beam homogenizer can be used in various potential applications at a precise inspection system such as three-dimensional morphology scanner with line lasers.

Optical Analysis of Diffraction Grating and Fresnel Zone Plate Fabricated on Fused Silica Glass by a Femtosecond Laser (펨토초 레이저를 이용한 회절격자와 Fresnel Zone Plate 제작 및 광학적 분석)

  • Ryu, Jin-Chang;Kim, Jin-Tae;Sohn, Ik-Bu
    • Journal of the Korean Society for Precision Engineering
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    • v.27 no.3
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    • pp.18-26
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    • 2010
  • Diffraction gratings with precise spatial periods of 2 ${\mu}m$ and 5 ${\mu}m$ have been fabricated by using a femtosecond laser which does not have limits on materials of micromachining and small thermal effects due to high peak power. Diffraction angle and diffraction efficiency of those were measured. Simulation results of diffraction angle and diffraction efficiency of the diffraction grating calculated with the parameters such as line width, depth, and spatial period of the fabricated gratings were compared with experimental results measured with a He-Ne laser. Besides these, Fresnel Zone Plates (FZPs) with focal distances of 50 mm and 25 mm were fabricated and focal distances of fabricated FZP were measured. Those experimental results for diffraction gratings and FZPs match well with experimental results.

Etching characteristics of holographic grating on chalcogenide As-Ge-Se-S thin films (칼코게나이드 As-Ge-Se-S 박막에서 홀로그래픽 격자의 에칭 특성)

  • Park, Jong-Hwa;Park, Jeong-Il;Na, Sun-Woong;Son, Chul-Ho;Shin, Kyung;Lee, Young-Jong;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.644-647
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    • 2001
  • Amorphous As-Ge-Se-S thin films have been studied with the aim of identifying optimum etching condition which can be used to produce holographic grating structure for use as diffractive optical elements. In this study, holographic gratings have been formed using He-Ne laser(632.8nm), and fabricated by the method of wet etching using NaOH etchant with various concentration(0.26N, 0.33N, 0.40N). The diffraction efficiency was obtained by +1st order intensity of the diffracted beam. The formed grating profiles were observed by atomic force microscope and showed that the expected grating profile could be achieved by controlling the etching time. Over-etching resulted in under-cutting of the grating lines. The highest 1st order diffraction efficiency for these gratings was about 5.05%.

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Implementation of Plasmonic Polarization Beam Splitter based on an Asymmetric Grating Profile (비대칭 격자구조에 기초한 플라즈마 편광 빔 분리기의 구현)

  • Kwang-Chun Ho
    • The Journal of the Institute of Internet, Broadcasting and Communication
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    • v.24 no.2
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    • pp.155-160
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    • 2024
  • The polarization-selective beam splitter grating can be widely used in numerous optical information processing systems. In this paper, to design a high-efficiency plasma polarization beam splitter (PBS), the structure composed of an Ag metal layer in Littrow mounting is implemented. To achieve high diffraction efficiency in the transmitted 0th-order TE polarization and the reflected 0th-order TM polarization, the grating depth and grating ratio of presented PBS is optimized by using rigorous Modal Transmission-Line Theory. From the optimized results, PBS has advantages of wide band properties for incident wavelength and angle, and the efficiency is higher than 95% for both TE and TM polarization. Therefore, this highly efficient PBS wideband grating with high extinction ratio can be used as an excellent optical diffraction device.

A Study on the Relief-type Grating Formation and Diffraction Efficiency of Amorphous (Se, S)-based Thin Films ((Se, S)를 기본으로 한 비정질 박막의 Relief-형격자 형성과 회절 효율에 관한 연구)

  • 최대영;박태성;정홍배;김종빈
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1988.10a
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    • pp.91-94
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    • 1988
  • This paper is investigated on the diffraction grating formation of the amorphous As-Se-S-Ge films. AS$\_$40/Se$\_$15/S$\_$36/Ge$\_$10/ film of thickness 0.76 $\mu\textrm{m}$ has achieved a high diffraction efficiency of 4.6%. In this film, high diffraction efficiency is increased to 18% by chemical etching.

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The recording of surface relief grating on the chalcogenide thin film (비정질 칼코게나이드 박막에 Surface Relief 격자 형성)

  • 박종화;장선주;박정일;여철호;이영종;정홍배
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.299-302
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    • 2000
  • In this study, we have made the large holographic surface relief gratings on amorphous chalcogenide $As_{40}$$Ge_{10}$$Se_{15}$$S_{35}$ films by two beam interference using a He-Ne laser(632.8nm) light. The film thickness was about 0.6$\mu\textrm{m}$, we could magnify beam size by using beam expander. We made use $90^{\circ}$ holder which was made of reflection mirror and sample. Formed the surface relief structures were investigated using optical microscope. The diffraction efficiency was obtained by measuring +lst order intensity. In addition we investigated grating formation and diffraction efficiency as a function of polarization states which is linear or circular polarization. The results indicate that the grating was formed by linear polarized beam is better clear than that by circular polarized beam.

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Chalcogenide 박막의 Ag층 두께 의존적 holographic 특성

  • Nam, Gi-Hyeon;Jeong, Hong-Bae
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.107-107
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    • 2010
  • In this study, we have investigated the holographic grating formation on Ag-doped amorphous chalcogenide AsGeSeS thin films with Ag thickness. Ag/AsGeSeS thin films with the incident laser beam wavelength for the improvement of the polarization diffraction grating efficiency. Holographic gratings have been formed using Diode Pumped Solid State laser (DPSS, 532.0nm) under [P:P] polarized the intensity polarization holography. The diffraction efficiency was obtained by +1st order intensity. The result is shown that the diffraction efficiency of Ag/AsGeSeS double layer thin film for the Ag thickness, the maximum grating diffraction efficiency using 60nm Ag layer is 0.96%.

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Poling Quality Evaluation of Periodically Poled Lithium Niobate Using Diffraction Method

  • Pandiyan, Krishnamoorthy;Kang, Yeon-Suk;Lim, Hwan-Hong;Kim, Byeong-Joo;Prakash, Om;Cha, Myoung-Sik
    • Journal of the Optical Society of Korea
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    • v.12 no.3
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    • pp.205-209
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    • 2008
  • We demonstrated a simple way of evaluating the duty cycle error in periodically polled lithium niobate(PPLN) based on the method of binary phase diffraction grating. To demonstrate this method, -Z face etched PPLN of desired periods were fabricated by the standard electric field poling technique. The etched PPLN was considered as a surface-relief binary phase grating. The diffraction patterns were recorded for different spatial locations along the length of the sample. The experimentally observed efficiencies of the diffracted orders were compared with the theoretically calculated values to estimate the duty cycle error.

DPSS laser를 이용한 비정질 칼코게나이드 박막의 회절격자 형성

  • Nam, Gi-Hyeon;Jeong, Won-Guk;Jeong, Hong-Bae
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.246-246
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    • 2010
  • In this paper, we investigated the diffraction grating efficiency on AsSeS and Ag-doped amorphous chalcogenide Ag/AsSeS thin film for used to volume hologram. The Chalcogenide film thickness was 0.5um and Ag thin film was varied from 10nm and 20nm. Diffraction efficiency was obtained from (P:P) polarized Diode Pumped Solid State laser(DPSS, 532.0nm: 200mW) beam on AsSeS and Ag/AsSeS thin films. As a results, diffraction grating was not formed at AsSeS thin film but at Ag-doped AsSeS thin film, diffraction grating was formed well compare with the former.

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