• Title/Summary/Keyword: dielectric protective

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Enhancement of cover-layer surface properties using dielectric protective layer (유전체 보호층을 이용한 NFR 미디어 커버층의 표면 특성 향상)

  • Kim, Jin-Hong;Lim, Jung-Shik;Lee, Jun-Seok;Seo, Jeong-Kyo
    • Transactions of the Society of Information Storage Systems
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    • v.4 no.1
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    • pp.13-18
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    • 2008
  • Scratches are observed on a polymer cover-layer of near-field recording (NFR) media after a servo test with rotating disc. The scratches are formed by the collision of a solid immersion lens (SIL)-media. One of the possible ways to avoid the scratch problem is to coat a dielectric protective film on the polymer cover-layer which enhances the hardness of the surface. The surface with hard characteristics in the surface reduces the scratch problem in the cover-layer. Not only the mechanical properties but also the optical properties should be controlled. Specifically, the refractive index of the dielectric protective film should be matched with the polymer cover-layer not to lose light at the interface due to the difference of the refractive index. The refractive index of the dielectric film can be tailored by controlling process parameters during sputtering and matched with that of the polymer cover-layer.

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Measurement and Verification of Thermal Conductivity of Multilayer Thin Dielectric Film via Differential 3$\omega$ Method (차등 3$\omega$ 기법을 이용한 다층 유전체 박막의 열전도도 측정 및 검증)

  • Shin Sang-Woo;Cho Han-Na;Cho Hyung-Hee
    • 정보저장시스템학회:학술대회논문집
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    • 2005.10a
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    • pp.254-259
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    • 2005
  • In this study, measurement of thermal conductivity of multilayer thin dielectric film has been conducted via differential 3$\omega$ method. Also, verification of differential 3$\omega$ method has been accomplished with various proposed criteria. The target film for measurement is 300 nm silicon dioxide and this thin film is covered with various thicknesses of upper protective layer. The upper protective layer is inserted between the target film and the heater line for purpose of electrical insulator or anti-oxidation barrier since the target film may be a good electrical conductor or a well-oxidizing material. However, the verification of differential 3$\omega$ method has not been conducted. Thus we have shown that the measurement of thermal conductivity of thin films with upper protective layer via differential 3$\omega$ method is verified to be reliable as long as the proposed preconditions are satisfied. Experimental results show that the experimental errors tend to increase with aspect ratio between upper protective layer thickness and width of the heater line due to heat spreading effect.

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Measurement and Verification of Thermal Conductivity of Multilayer Thin Dielectric Film via Differential $3\omega$ Method (차등 $3\omega$ 기법을 이용한 다층 유전체 박막의 열전도도 측정 및 검증)

  • Shin, Sang-Woo;Cho, Han-Na;Cho, Hyung-Hee
    • Transactions of the Society of Information Storage Systems
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    • v.2 no.1
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    • pp.85-90
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    • 2006
  • In this study, measurement of thermal conductivity of multilayer thin dielectric film has been conducted via differential $3\omega$ method. Also, verification of differential $3\omega$ method has been accomplished with various proposed criteria. The target film for the measurement is 300 nm thick silicon dioxide which is covered with upper protective layer of various thicknesses. The upper protective layer is inserted between the target film and the heater line for purpose of electrical insulator or anti-oxidation barrier since the target film may be a good electrical conductor or a well-oxidizing material. Since the verification of differential $3\omega$ method has not been conducted yet, we have shown that the measurement of thermal conductivity of thin films with upper protective layer via differential $3\omega$ method is verified to be reliable as long as the proposed preconditions of the samples are satisfied. Experimental results show that the experimental errors tend to increase with aspect ratio between thickness of the upper protective layer and width of the heater line due to heat spreading effect.

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Discharge delay reduction by controlling the roughness of dielectric surface in AC PDP

  • Seo, Ki-Ho;Whang, Ki-Woong
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.1491-1494
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    • 2006
  • We report a method for reducing the address discharge delay. The address discharge delay was reduced when the MgO protective layer was made on the dielectric area which was made rough intentionally. The delay reduction was more pronounced in the formative delay.

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Secondary Electron Emission Properties with Lead and Lead-Free Dielectric in AC-PDP

  • Cha, Myung-Lyoung;Lee, Hye-Jung;Choi, Eun-Ha;Kim, Hyung-Sun
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1255-1257
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    • 2005
  • The increase of secondary electron-emitting coefficient is effective to reduce the discharge voltage as well as to improve the luminance efficiency of PDP. We investigated the properties of ${\gamma}$ with composition and different dielectric constants, and the microstructure of dielectric after ion collision. As a result the dielectric of PbO system showed higher ${\gamma}$ compared with Pb-free system. However, there was no difference in ${\gamma}$ when the MgO protective layer was covered.

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Preparation of MgO Protective layer by reactive magnetron Sputtering (반응성 스퍼트링에 의한 MgO 유전체 보호층 형성에 관한 연구)

  • Ha, H. J.;Lee, W. G.;Ryu, J. H.;Song, Y.;Cho, J. S.;Park, C. H.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1996.05a
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    • pp.59-62
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    • 1996
  • Plasma displays (PDP) as a large area wall-hanging display device are rabidly developed with flat CRT, TPT LCD and etc. Especially, AC Plasma Display Panels(AC PDPs) have the inherent memory function which is effective for large area displays. The memory function in AC PDPs is caused by the accumulation of the electrical charge on the protecting layer formed on the dielectric layer. This MgO protective layer prevents the dielectric layer from sputtering by ion in discharge plasma and also has the additional important roll in lowering the firing voltage due to the large secondary electron emission coefficient). Until now, the MgO Protective layer is mainly formed by E-Beam evaporation. With increasing the panel size, this process is difficult to attain cost reduction, and are not suitable for large quantity of production. To the contrary, the methode of shuttering are easy to apply on mass production and to enlarge the size of the panel and shows the superior adhesion and uniformity of thin film. In this study, we have prepared MgO protective layer on AC PDP Cell by reactive magnetron sputtering and studied the effect of MgO layer on the surface discharge characteristics of ac PDP.

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Synthesis and Physical Property of Multi-Functional Siloxane Protective Coating Materials Applicable for Electronic Components

  • Kim, Cheol Hyun;Cho, Hyeon Mo;Lee, Myong Euy
    • Bulletin of the Korean Chemical Society
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    • v.35 no.6
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    • pp.1665-1669
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    • 2014
  • Four multialkoxy-functionalized siloxane base-polymers (BP-1~4) were synthesized through either hydrosilylation or condensation reactions in order to prepare multi-networked siloxane polymers having appropriate physical properties for protective coating in fabrications of electronics. Formulations of 4 base-polymers gave coating materials A and B. Product A showed well-controlled flowing and leveling properties, and product A-2 was successfully applied to protective insulating coating for junction areas of connectors and chips in PDP controller. Tack free time, extrusion rate, dielectric breakdown voltage, hardness, thermal stability, water resistance and flame resistance of products A and B were examined.

Effect of MgO Deposition Condition on the Discharge Characteristic of AC-PDP (AC-PDP에서 MgO 증착조건에 따른 패널특성 연구)

  • Jeong, Joo-Young;Cho, Sung-Yong;Lee, Don-Kyu;Lee, Hae-June;Lee, Ho-Jun;Park, Chung-Hoo
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.58 no.8
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    • pp.1566-1571
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    • 2009
  • The discharge electrodes in ac PDP are coated with dielectric layer, and transparent MgO thin films are deposited on the dielectric layer. The main role of the MgO thin films in ac PDP is to protect the dielectric layer from sputtering by ion bombardment in the glow-discharge plasma. An additional important role of the MgO thin film is the high secondary electron emission coefficient which leads the low firing voltage and low cost of the PDP. In this paper, we investigated the relations of the crystal orientation about deposition thickness, deposition rate, temperature of substrate, and distance between the MgO tablet and the substrate. Additionally, we investigated the discharge characteristics of the AC PDP using nano-powder MgO tablet