• 제목/요약/키워드: dielectric properties

검색결과 3,406건 처리시간 0.043초

xZnO+(1-x)$TiO_2$계 세라믹의 마이크로파 유전특성 (Microwave Dielectric Properties of xZnO+{1-x)$TiO_2$ Ceramic Systems)

  • 심우성;방재철
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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    • pp.605-608
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    • 2002
  • In order to improve the microwave dielectric properties of ZnO+$TiO_2$ ceramic systems, we studied the relations among microstructures, phases, and microwave dielectric properties at various mole ratio and sintering temperatures. The optimum composition was found to be 0.2ZnO+0.8$TiO_2$ when sintered at $1100^{\circ}C$, at which we could obtain following results: $Q{\times}f_o$ = 22,500 GHz, ${\varepsilon}_r$ = 73, and $\tau_f=+210ppm/^{\circ}C$.

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비냉각 적외선 감지소자 응용을 위한 $V_{1.9}W_{0.1}O_5$ 박막의 전기적 특성 (Electrical Properties of $V_{1.9}W_{0.1}O_5$ Thin Films for the uncooled Infrared Detector)

  • 남성필;이성갑;배선기;이영희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2008년도 제39회 하계학술대회
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    • pp.1248-1249
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    • 2008
  • The $V_{1.8}W_{0.2}O_5$ thin films deposited on $Pt/Ti/SiO_2/Si$ substrates by RF sputtering method exhibited fairly good TCR and dielectric properties. It was found that film crystallinity, dielectric properties, and TCR properties were strongly dependent upon the annealing temperature. The dielectric constants of the $V_{1.8}W_{0.2}O_5$ thin films annealed at 400$^{\circ}C$ were 38.11, with a dielectric loss of 0.134, respectively. Also, the TCR values of the $V_{1.8}W_{0.2}O_5$ thin films annealed at 400$^{\circ}C$ were about -3.15%/K.

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전력케이블용 반도전층의 유전/절연특성과 온도 의존성 (A Temperature dependancy and dielectric/insulation properties for power cables)

  • 이종찬;허인성;김광수;박대희;이재관;김동찬
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2002년도 하계학술대회 논문집 C
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    • pp.1463-1466
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    • 2002
  • In this paper, the thermal analysis and dielectric/insulation properties were investigated with considering the temperature depenence Using the sheet of semi-conductor/XLPE came from 22 kV power cables, the dielectric/insulation properties and temperature dependence were measured under 1kHz. According to the results we can verify that only semi-conductor sheet changed linearly, and with the unstable results. the dielectric/insulation properties of the semi-conductor/XLPE sheet show the highest value in the range of 40 $^{\circ}C$ and 50 $^{\circ}C$ and are rely on XLPE rather than semi-conductor in terms of the temperature.

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열처리조건이 폴리우레탄수지의 전기적 특성에 미치는 영향에 관한 연구 (Effect of Heat-treatment on the Electrical Properties of Polyurethane Resin)

  • 조정수;곽영순;이종호;곽병구
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1987년도 정기총회 및 창립40주년기념 학술대회 학회본부
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    • pp.293-295
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    • 1987
  • This paper deals with the dielectric properties dielectric breakdown strength and mechanical tensile properties according to heat - treatment condition of polyurethane resin. This resin is heat - treated over a range of temperature from $50^{\circ}C$ to $150^{\circ}C$. It is shown that the dielectric dissipation factor decreases with increase of heat - treatment temperature of the sample exept for the sample heat - treated at $150^{\circ}C$. The maximum dielectric breakdown strength is appeared for the sample heat - treated for 10 hours at $100^{\circ}C$, after curing for 24 hours at room temperature. The optimal heat - treatment condition in the view point of the electrical and mechanical properties is appeared for the sample heat - treated for 10 hours at $100^{\circ}C$, after curing for 24 hours at room temperature.

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OLED용 정공주입층(AF)의 유전특성 (Dielectric Properties of the Hole Injection Layer(AF) for OLEDs)

  • 이영환;이강원;신종열;김태완;이충호;홍진웅
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.409-410
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    • 2008
  • We studied dielectric properties of Organic Light-emitting Diodes(OLEDs) depending on applied voltage of AF(Amorphous Polytetrafluoroethylene), material of hole injection layer in structure of ITO/hole injection layer (AF)/Al. AF is deposited 5 [nm] as deposition rate of 0.1~0.2 [$\AA$/s] in high vacuum of $5\times10^{-6}$ [Torr]. In result of these studies, we can know dielectric properties of OLEDs. The impedance decreases as the applied voltage increases and the Cole-Cole plots of devices are decreases as the applied voltage increases.

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22-9kV급 XLPE 시이트의 유전특성과 계면효과 (Interface Effects and Dielectric Properties of 22.9kV XLPE sheets)

  • 이관우;이종복;황보승;박대희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 추계학술대회 논문집
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    • pp.441-444
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    • 2000
  • In this paper, dielectric properties of XLPE sheets of 22kV cable with semiconducting and water were investigated. The breakdown strength of XLPE under rod/needle electrode were measured at without oil. It is found that the dielectric properties such tan$\delta$ of XLPE sheet dependence on semiconducting and water layer and are decreased much lower increase with temperature. The breakdown strength and the electrode effect are obtained as a function of thickness, and a equation for the sheet thickness dependent breakdown strength is also discussion.

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Eu 첨가에 따른 PZT 박막의 강유전 특성 (Ferroelectirc Properties of Eu-doped PZT Thin Films)

  • 김창일;손영훈;김경태;김동표;이병기
    • 한국전기전자재료학회논문지
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    • 제16권7호
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    • pp.611-615
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    • 2003
  • Eu-doped lead zirconate titanate(Pb$\sub$1.1/(Zr$\sub$0.6/Ti$\sub$0.4/)O$_3$; PZT) thin films on the Pt/Ti/SiO$_2$/Si substrates prepared by a sol-gel method. The effect on structural and electrical properties of PZT thin films measured according to the Eu content. Eu-doping altered significantly dielectric and ferroelectric properties. The remanent polarization and the coercive field decreased with the increasing Eu content. The dielectric constant and the dielectric loss of PZT thin films decreased with the increasing Eu content. The 0.5 mol% of Eu-doped PZT thin film showed improved fatigue characteristic comparing to the undoped PZT thin film.

졸-겔법에 의한$ Ta_2$$O_5$ 박막의 전기적 특성 (Electric properties of $ Ta_2$$O_5$ thin films by sol-gel method)

  • 유영각;이준웅
    • E2M - 전기 전자와 첨단 소재
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    • 제10권1호
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    • pp.61-67
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    • 1997
  • We have studied dielectric properties of sol-gel derived tantalum oxide thin films as the insulators. As the sample is annealed from 300.deg. C to 700.deg. C, it is found amorphous below 600.deg. C and crystalline over it. Dielectric constant is maximum(18.6) when Ta$_{2}$O$_{5}$ film was annealed at 400.deg. C. It is found that dielectric strength in Ta$_{2}$O$_{5}$ film annealed at 400.deg. C (1.5MV/cm) increases and then decreases over annealed at 500.deg. C. This phenomenon was attributed to pinhole effect and crystallization. The de conduction properties can be interpreted by Poole-Frenkel effect.ect.

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비냉각 적외선 감지소자 응용을 위한 $V_2O_5$ 박막의 전기적 특성 (Electrical Properties of $V_2O_5$ Thin Films for the uncooled Infrared Detector)

  • 남성필;이성갑;배선기;이영희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2007년도 Techno-Fair 및 추계학술대회 논문집 전기물성,응용부문
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    • pp.116-117
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    • 2007
  • The $V_2O_5$ thin films deposited on Pt/Ti/$SiO_2$/Si substrates by RF sputtering method exhibited fairly good TCR and dielectric properties. It was found that film crystallinity, dielectric properties, and TCR properties were strongly dependent upon the annealing temperature. The dielectric constants of the $V_2O_5$ thin films annealed at $300^{\circ}C$ were 37.7, with a dielectric loss of 2.535, respectively. Also, the TCR values of the $V_2O_5$ thin films annealed at $300^{\circ}C$ were about -2.65%/K.

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$(ZHMg)TiO_3$계 세라믹스의 저온소결과 마이크로파 유전특성 (Low-Temperature Sintering and Microwave Dielectric Properties of $(ZnMg)TiO_3$ System)

  • 심우성;방재철
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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    • pp.321-324
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    • 2003
  • The effects of various sintering additives such as $Bi_2O_3+V_2O_5$, $BiVO_4$, $B_2O_3$, and $CuO+V_2O_5$ on the low-temperature sintering and microwave dielectric properties of $(ZnMg)TiO_3$ system were studied. Sintering was enhanced by the sintering additives and highly dense samples were obtained for $(Zn_{0.8}Mg_{0.2})TiO_3$ at the sintering temperature of $910^{\circ}C$. $(Zn_{0.8}Mg_{0.2})TiO_3$ with 6.19 mol.%$B_2O_3$ was found to show the best sintering and microwave dielectric properties.

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