• 제목/요약/키워드: dielectric model

검색결과 408건 처리시간 0.032초

에폭시의 분극 및 전하 이동 (Polarization and Charge Transport in Epoxy)

  • 안종현;최충석
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2008년도 추계학술대회 논문집 전기설비전문위원
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    • pp.229-230
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    • 2008
  • The investigations included the measurements of volume currents and also internal space charges on epoxy samples of mm thicknesses. The current versus time relations were shown to correspond well with classical forms of dielectric response such as the Curie-von Schweidler model. After the time transient, near steady currents were extremely small and exhibited a significant temperature dependence, similar in relation to the Poole-Frenkel hoping transport model. Equivalent resistances were on the order of $10^{19}$ ohms and represent very weak charge transport. Electrically stimulated acoustic waves were used to quantify the small internal charges that would accumulate within the epoxy. There was a notable homocharge near both anode and cathode. The dielectric response and the internal charge were related to show a consistent model for charge transport within unfilled epoxy.

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비충전 에폭시의 분극 및 전하 이동 (Polarization and Charge Transport in Unfilled Epoxy)

  • 곽현우;최용성;이경섭
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2008년도 제39회 하계학술대회
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    • pp.2311-2312
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    • 2008
  • The investigations included the measurements of volume currents and also internal space charges on epoxy samples of mm thicknesses. The current versus time relations were shown to correspond well with classical forms of dielectric response such as the Curie-von Schweidler model. After the time transient, near steady currents were extremely small and exhibited a significant temperature dependence, similar in relation to the Poole-Frenkel hoping transport model. Equivalent resistances were on the order of 1019 ohms and represent very weak charge transport. Electrically stimulated acoustic waves were used to quantify the small internal charges that would accumulate within the epoxy. There was a notable homocharge near both anode and cathode. The dielectric response and the internal charge were related to show a consistent model for charge transport within unfilled epoxy.

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동적인 전기장이 다마신 구리 배선에서의 절연파괴에 미치는 영향 (Effect of Dynamic Electric Fields on Dielectric Reliability in Cu Damascene Interconnects)

  • 연한울;송준영;임승민;배장용;황유철;주영창
    • 마이크로전자및패키징학회지
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    • 제21권4호
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    • pp.111-115
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    • 2014
  • 다마신 구리 배선에서의 동적인 전기장에 따른 절연체 파괴거동을 연구하였다. DC, 단극성, 및 이극성 펄스 조건 중에서 절연체의 수명은 이극성 펄스 조건에서 가장 길었다. DC 및 단극성 펄스 조건에서는 절연체에 가해지는 전기장의 방향이 바뀌지 않지만 이극성 펄스 조건에서는 전기장의 방향이 반복적으로 180도 바뀌기 때문에, 이극성 펄스 조건에서는 절연체의 구리오염이 억제되고, 이로 인해서 절연체 수명이 이극성 펄스 조건에서 가장 긴 것으로 판단된다. 단극성 펄스 조건에서 펄스 주파수가 커질수록 DC 조건보다 절연체의 수명이 증가하였다. 이는 절연체 수명에 구리오염 뿐만 아니라 내재적인 절연파괴현상이 상당한 영향을 미치며, 절연체 분자결합파괴가 일어날 확률은 펄스 폭이 좁아질수록 감소한다고 판단된다.

원자층 식각을 이용한 Sub-32 nm Metal Gate/High-k Dielectric CMOSFETs의 저손상 식각공정 개발에 관한 연구

  • 민경석;김찬규;김종규;염근영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.463-463
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    • 2012
  • ITRS (international technology roadmap for semiconductors)에 따르면 MOS(metal-oxide-semiconductor)의 CD (critical dimension)가 45 nm node이하로 줄어들면서 poly-Si/$SiO_2$를 대체할 수 있는 poly-Si/metal gate/high-k dielectric이 대두된다고 보고하고 있다. 일반적으로 high-k dielectric를 식각시 anisotropic 한 식각 형상을 형성시키기 위해서 plasma를 이용한 RIE (reactive ion etching)를 사용하고 있지만 PIDs (plasma induced damages)의 하나인 PIED (plasma induced edge damage)의 발생이 문제가 되고 있다. PIED의 원인으로 plasma의 direct interaction을 발생시켜 gate oxide의 edge에 trap을 형성시키므로 그 결과 소자 특성 저하가 보고되고 있다. 그러므로 본 연구에서는 이에 차세대 MOS의 high-k dielectric의 식각공정에 HDP (high density plasma)의 ICP (inductively coupled plasma) source를 이용한 원자층 식각 장비를 사용하여 PIED를 줄일 수 있는 새로운 식각 공정에 대한 연구를 하였다. One-monolayer 식각을 위한 1 cycle의 원자층 식각은 총 4 steps으로 구성 되어 있다. 첫 번째 step은 Langmuir isotherm에 의하여 표면에 highly reactant atoms이나 molecules을 chemically adsorption을 시킨다. 두 번째 step은 purge 시킨다. 세 번째 step은 ion source를 이용하여 발생시킨 Ar low energetic beam으로 표면에 chemically adsorbed compounds를 desorption 시킨다. 네 번째 step은 purge 시킨다. 결과적으로 self limited 한 식각이 이루어짐을 볼 수 있었다. 실제 공정을 MOS의 high-k dielectric에 적용시켜 metal gate/high-k dielectric CMOSFETs의 NCSU (North Carolina State University) CVC model로 구한 EOT (equivalent oxide thickness)는 변화가 없으면서 mos parameter인 Ion/Ioff ratio의 증가를 볼 수 있었다. 그 원인으로 XPS (X-ray photoelectron spectroscopy)로 gate oxide의 atomic percentage의 분석 결과 식각 중 발생하는 gate oxide의 edge에 trap의 감소로 기인함을 확인할 수 있었다.

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Band alignment and optical properties of $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ gate dielectrics thin films on p-Si (100)

  • Tahir, D.;Kim, K.R.;Son, L.S.;Choi, E.H.;Oh, S.K.;Kang, H.J.;Heo, S.;Chung, J.G.;Lee, J.C.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.381-381
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    • 2010
  • $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ thin films as gate dielectrics have been proposed to overcome the problems of tunneling current and degradation mobility inachieving a thin equivalent oxide thickness. An extremely thin $SiO_2$ layer is used in order to separate the carrier in MOSFET channel from the dielectric field fluctuation caused by phonons in the dielectric which decreases the carrier mobility. The electronic and optical properties influenced the device performance to a great extent. $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ dielectric films on p-Si (100) were grown by atomic layer deposition method, for which the conduction band offsets, valence band offsets and band gapswere obtained by using X-ray photoelectron spectroscopy and reflection electron energy loss spectroscopy. The band gap, valence and conduction band offset values for $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ dielectric thin film, grown on Si substrate were about 5.34, 2.35 and 1.87 eV respectively. This band alignment was similar to that of $ZrO_2$. In addition, The dielectric function (k, $\omega$), index of refraction n and the extinction coefficient k for the $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ thin films were obtained from a quantitative analysis of REELS data by comparison to detailed dielectric response model calculations using the QUEELS-$\varepsilon$(k, $\omega$)-REELS software package. These optical properties are similar with $ZrO_2$ dielectric thin films.

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강유전체에서의 전계분포 및 절연파괴 (Dielectric Breakdown and Electric Stress Distribution in Ferroelectrics)

  • 신병철;김호기
    • 한국세라믹학회지
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    • 제24권4호
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    • pp.392-396
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    • 1987
  • Pure barium titanate was sintered at $1340^{\circ}C$ for 2, 4, 8, 16 hr to control their grain size. The measurements of breakdown strength and partial discharge characteristics were performed under rising AC voltage(60Hz). With increase of sintering time, the average grain size was increased and breakdown strength was slightly decreased. Partial discharge in pores was observed under high voltage, and a model of dielectric break down in barium titanate ceramics is proposed.

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Optical Simulation for High Efficiency OLEDs

  • Jung, Boo-Young;Jung, Sung-Goo;HwangBo, Chang-Kwon
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.966-969
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    • 2006
  • An optical model based on the optical thin-film theory is derived to calculate the output radiance of small molecules organic light-emitting diodes (OLEDs). We have designed the high efficiency OLEDs using the reflectance phase control of dielectric layers. It is found that OLED with a single $TiO_2$ dielectric layer is a good candidate to enhance the outcoupling efficiency and increase the color purity.

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푸리에 적분 방식에 의한 광도파도의 해석 (Fourier integral approach to the analysis of optical waveguides)

  • 이재승;신상영
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1987년도 정기총회 및 창립40주년기념 학술대회 학회본부
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    • pp.398-400
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    • 1987
  • Using the transmission line model, we have developed a formalism which is fairly accurate and convenient for analyzing the dispersion characteristics of rectangular dielectric waveguides for integrated optics. The fields in open half space regions are expressed as a Fourier integral form. Including all the TE and TM polarized discrete modes in slab waveguide region, our calculation shows that the discrepancies between the previous vectorial wave analysis using one discrete mode and the brute-force numerical analysis for the rectangular dielectric waveguides can be fully reduced with this method.

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Stray field를 고려한 원형 마이크로스트립 공진기 해석 (An Analysis of Circular Microstrip Resonator Considering Stray Fields)

  • 박두석;홍의석
    • 대한전자공학회논문지
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    • 제26권12호
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    • pp.1934-1939
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    • 1989
  • The circular microstrip resonator which can be exactly performed with theoretical resonant frequency using the conception of dynamic effective relative dielectric constants is analyzed in this paper. The formula of exact resonant frequency of resonator, in this study, is estabilished by effective resonator dimension and dynamic relative dielectric constant. The measurement of transmission type circular resonator which fabricated by AL2O3 and Epsilam-10 is to prove that the experimental results are more agreed a well with the simulated values by this new method than the simple resonator model.

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Optical phonon and scattering in uniaxial crystals

  • Lee, B.C
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.118-118
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    • 2000
  • We investigate Frohlich-like electron--optical-phonon interactionsin uniaxial crytals based on the macroscopic dielectric continuum model. In general, the optical-phonon branches support mixed longitudinal and transverse modes due to the anisotropy. For heterostructures with double interfaces and superlattices, it is known that confined, interface, and half-space optical phonon modes exist in zincblende cystals. In uniaxial structures, additional propagating modes may exist in wurtzite heterosystems due to anisotropic phonon dispersion. This is especially the case when the dielectric properties of the adjacent heterostructure materials do not differ substantially. The dispersion relations and the interaction Hamiltonians for each of these modes are derived.

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