• Journal of the Korean Society for Heat Treatment
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• v.24 no.4
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• pp.199-202
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• 2011

Ga doped ZnO thin films were deposited with RF magnetron sputtering on glass substrate without intentional substrate heating and then the effect of post deposition annealing temperature on the structural, optical and electrical properties of the films was investigated. The post deposition annealing process was conducted for 30 minutes in a vacuum of $1{\times}10^{-3}$ Torr and the vacuum annealing temperatures were 150 and $300^{\circ}C$, respectively. As increase annealing temperature, GZO films show the increment of the prefer orientation of ZnO (002) diffraction peak in the XRD pattern and the optical transmittance in a visible wave region was also increased, while the electrical sheet resistance was decreased. The figure of merit obtained in this study means that GZO films which vacuum annealed at $300^{\circ}C$ have the highest optoelectrical performance in this study.

• Korean Journal of Computational Design and Engineering
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• v.8 no.3
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• pp.150-156
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• 2003

Direct Metal Deposition (DMD) is a new additive process producing three-dimensional metal components or tools directly from CAD data, which aims to take mold making and metalworking in an entirely new direction. It is the blending of five common technologies: lasers, CAD, CAM, sensors and materials. In the resulting process, alternatively called laser cladding, an industrial laser is used to locally heat a spot on a tool-steel work piece or platform, forming a molten pool of metal. A small stream of powdered tool-steel metal is then injected into the metal pool to increase the size of the molten pool. By moving the laser beam back and forth, under CNC control, and tracing out a pattern determined by a computerized CAD design, the solid metal part is eventually built line-by-line, one layer at a time. DMD produces improved material properties in less time and at a lower cost than is possible with traditional fabrication technologies.

• Transactions of the Korean Society of Machine Tool Engineers
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• v.17 no.2
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• pp.45-50
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• 2008

Molecular flows inside a guide block in the OLED(organic luminescent emitting device) deposition process have been simulated using DSMC(direct simulation Monte Carlo) method. Because the organic materials are evaporated under vacuum, molecules flow at a high Knudsen number of the free molecular regime, where the continuum mechanics is not valid. A guide block is designed as a part of the linear cell source to transport the evaporated materials to a deposition chamber, When solving the flows, the inlet boundary condition is proved to affect significantly the whole flow pattern. Thus, it is proposed that the pressure should be specified at the inlet. From the analysis of the density distributions at the nozzle exit of the guide block, it is shown that the longer nozzle can emit molecules more straightly. Finally, a nondimensionalized mass flow profile is obtained by numerical experiments, where various nozzle widths and inlet pressures are tested.

• Journal of the Korean Vacuum Society
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• v.4 no.S2
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• pp.163-169
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• 1995

Ion beam assisted deposition(IBAD) technique was used to synthesize hard coatings including diamond-like carbon(DLC), carbon nitride(CN) and metal-ceramic multilayered films. It was found that DLC films formed at low energy ion bombardment possess more $Sp^3$ bonds and much higher hardness. The films exhibited an excellent wear resistance. Nanometer multialyered Fe/TiC films was deposited by ion beam sputtering. The structure and properties were strongly dependent on the thickness of the individual layers and modulation wave length. It was disclosed that both hardness and toughness of the films could be enhanced by adjusting the deposition parameters. The CN films synthesized by IBAD method consisted of tiny crystallites dispersed in amorphous matrix, which were identified by electron diffraction pattern to be $\beta -C_3N_4$.

• Journal of the Korean Society for Precision Engineering
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• v.18 no.3
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• pp.47-52
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• 2001

Rapid Prototyping(RP) has been widely applied in designing and developing process of new products. RP can reduce the lead time and expense required to bring a new product form initial concept to production. Among several RP process can dramatically reduce the total build time and be applied for fabrication of large-sized and free form object because it uses in LOM the paper thickness is 0.05∼0.38mm as deposition feature segment. In this study, mechanical properties of pattern with LOM system is studied for optimal design of sand mold casting. The main result is that tensile, compressive strength and pattern size are significantly affected by temperature of hot roll.

• Journal of the Microelectronics and Packaging Society
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• v.25 no.1
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• pp.11-15
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• 2018

In this study, we deposited silver nanoparticles on the nanocone array structure which was fabricated by the UV nanoimprint process for optical signal amplification. The deposition of the silver nanoparticles was based on the evaporation behavior of the solution droplet according to wettability of surface and the deposition pattern changed from the center of the droplet to the edge depending on the difference of thermal energy. The optical property of silver nanoparticles that were deposited on imprinted nanohole patterns was simulated by the Finite difference time domain (FDTD) analysis method, and it was confirmed that energy was concentrated around the silver nanoparticle of the finally fabricated structure.

• Journal of the Korean Society for Precision Engineering
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• v.21 no.11
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• pp.186-194
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• 2004

In this research, microfabrication technique using localized electrochemical deposition (LECD) with ultra short pulses is presented. Electric field is localized near the tool tip end region by applying a few hundreds of nano second pulses. Pt-Ir tip is used as a counter electrode and copper is deposited on the copper substrate in 0.5 M CuSO$_4$ and 0.5 M H$_2$SO$_4$ electrolyte. The effectiveness of this technique is verified by comparison with LECD using DC voltage. The deposition characteristics such as size, shape, surface, and structural density according to applied voltage and pulse duration are investigated. The proper condition is selected from the results of the experiments. Micro columns less than 10 $\mu$m in diameter are fabricated using this technique. The real 3D micro structures such as micro pattern and micro spring can be fabricated by this method. It is suggested that presented method can be used as an easy and inexpensive method for fabrication of microstructure with complex shape.

• Journal of the Korean institute of surface engineering
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• v.33 no.5
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• pp.319-328
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• 2000

Silver is known to have such characteristics as low shear strength, good transfer-film forming tendency, and good corrosion resistance. Silver thin films have been prepared by ion plating of physical vapour deposition (PVD) using both argon gas pressure and bias voltage of processing condition. After the silver films were prepared, the properties in them were examined by gas pressure and bias voltage of substrate. Their morphology and crystal orientation were investigated by scanning electron microscopy (SEM) and X-ray diffractor. The properties of film were, also, studied to relate with morphology, X-ray diffraction pattern, and friction coefficient at vacuum ambient. The friction coefficient was stabilized remarkably on deposited films with increasing argon pressure for deposition. Also, the effect of increasing of the bias voltage for deposition resulted in lower friction coefficient and stability in $1.7$\times$10^{-4}$ torr. On the contrary, behavior of friction coefficient was stabilized on deposited films with decreasing the bias voltage in $1.7$\times$10^{-5}$ torr for deposition.

• Journal of the Semiconductor & Display Technology
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• v.8 no.2
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• pp.11-14
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• 2009

The $Sr_{0.7}Bi_{2.3}Nb_2O_9$(SBN) thin films are deposited on Pt-coated electrode(Pt/Ti/$SiO_2$/Si) using RF sputtering method at various $Ar/O_2$ ratio. We investigated the effect of deposition condition(specially $Ar/O_2$ ratio) on the structural properties of SBN thin film. As $Ar/O_2$ ratio was increased, the peaks in the XRD pattern became more sharp. Also, the peaks(008)(115)(220) in 80/20 of $Ar/O_2$ ratio were suddenly appeared. The optimum of the rougness showed about 4.33 nm in 70/30 of $Ar/O_2$ ratio. The crystallinity of SBN thin films were increased with the increase of $Ar/O_2$ ratio. Also, Deposition rate of SBN thin films was about 4.17 nm/min in 70/30 of $Ar/O_2$ ratio. The capacitance of SBN thin films were increased with the increase of $Ar/O_2$ ratio.

• 한국전자현미경학회:학술대회논문집
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• 2005.11a
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• pp.143-143
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• 2005