• Journal of the Korean Society of Industry Convergence
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• v.25 no.4_2
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• pp.699-706
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• 2022

In this study, Directed energy deposition (DED) among additive manufacturing is applied to repair damaged spindle key parts of planner miller. The material of the spindle key is SCM415, and the P21 Powder is used. In order to find the optimal deposition conditions for DED equipment, a single-line deposition experiment is conducted to analysis five parameters. The laser power affects the width, and the height is a parameter affected by coaxial gas and powder gas. In addition, laser power, powder feed rate, coaxial gas, and powder gas are parameters that affect dilution. Otimal deposition is that 400 W of laser power, 4.0 g/min of powder feed rate, 6.5 L/min of coaxial gas, 3.0 L/min of powder gas and 4.5 L/min of shield gas. By setting the optimum conditions, a uniform deposition cross section in the form of an ellipse can be obtained. Damage recovery process of spindle key consists of 3D shape design of the base and deposition parts, deposition path creation and deposition process, and post-processing. The hardness of deposited area with P21 powder on the SCM415 spindle key is 336 HV for the surface of the deposition, 260 HV for the boundary area, and 165 HV for the base material.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1995.11a
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• pp.269-272
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• 1995

As methane concentration was varietal, the textures of diamond films deposited on Si(100)substrate could be observed by XRD, SEM and Raman spectroscope. As a result, O$_2$plasma etching has been useful to observe microscopic structure of diamond films by SEM. The cross section of diamond films deposited on Si(100) substrate with 4% concentration of methane to hydrogen was a polycrystal like a pillar. The diamond crystal like a pillar has been oriented to (110) surface and the high quality diamond with FWHM of Raman spectra being 3.8cm$\^$-1/ has been grown. As time goes by deposition time, the preferred orientation increases.

• Electrical & Electronic Materials
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• v.9 no.3
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• pp.270-276
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• 1996

As methane concentration was varied, the textures of diamond films deposited on Si(100)substrate were observed by XRD,SEM and Raman spectroscope. As a result, $O_{2}$ plasma etching has been useful to observe microscopic structure of diamond films by SEM. The cross section of diamond films deposited on Si(100)substrate with 4% concentration of methane to hydrogen was a polycrystal like a pillar. The diamond crystal like a pillar has been oriented to (110)surface and the high quality diamond film with FWHM of Raman spectra being 3.8 $cm^{-1}$ / has been grown. As time goes by deposition time, the preferred orientation increases

• Journal of the Korean Electrochemical Society
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• v.13 no.4
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• pp.270-276
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• 2010

Nickel-copper foam electrodes with pore gradient micro framework and nano-ramified wall have been prepared by using an electrochemical deposition process. Growth habit of nickel-copper co-deposits was quite different from that of pure nickel deposit. In particular, the ramified structure of the individual particles was getting clear with chloride ion content in the electrolyte. The ratio of nickel to copper in the deposits decreased with the distance away from the substrate and the more chloride ions in the electrolyte led to the more nickel content throughout the deposits. Compositional analysis for the cross section of a ramified branch, together with tactical selective copper etching, proved that the copper content increased with approaching central region of the cross section. Such a composition gradient actually disappeared after heat treatment. It is anticipated that the pore gradient nickel-copper nanostructured foams presented in this work might be a promising option for the high-performance electrode in functional electrochemical devices.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.10 no.2
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• pp.100-104
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• 2000

Diamond film was deposited on Si substrate by using microwave plasma-enhanced chemical vapor deposition (MPECVD) system. After thinning the cross section between diamond film and Si substrate by ion milling method, we investigated its interface via transmission electron microscopy We could observe that the diamond film was grown either directly on Si substrate or via the interlayer between diamond film and Si substrate. Thickness of the interlayer was varied along the cross section. The interlayer might mainly composed of Sic andlor amorphous carbon. We could observe the well-developed electron diffraction pattern of both Si and diamond around the interface. Based on this result, we can conjecture the initial growth behavior of diamond film on Si substrate.

• The Korean Journal of Ceramics
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• v.3 no.1
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• pp.1-4
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• 1997

Diamond film (24$\mu\textrm{m}$) were prepared by Microwave Plasma Chemical Vapor Deposition method from a reactive CO/H$_2$ mixtures. Micro-Raman spectroscopy and micro-cathodoluminescence study were carried out along the crosssection and correlated to SEM observation. CL image of cross-section was also investigated. Peak position, FWHM of Raman spectrum were determined using Lorentzing fit. The stress in this sample is 0.4~0.7 GPa compressive stress, and along the distance the compressive stress reduced. The Raman peak broadening is dominated by phonon life time reduction at grain boundaries and defect sites. Defects and impurities were mainly present inside the film, not at Silicon/Diamond interface.

• Journal of the Semiconductor & Display Technology
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• v.7 no.1
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• pp.29-34
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• 2008

In this paper, the DE(double erosion) cathode for the reactive magnetron sputtering system is developed for high deposition rate and high target utilization efficiency. The utilization efficiency of the developed DE cathode is 22% higher than that of normal SE(single erosion) cathode. Sputtering process for the nickel oxide thin films with the DE cathode is performed under the following conditions; power with $1kW{\sim}3kW$, pressure with 4mtorr and 8mtorr, oxygen flow ratio with $0%{\sim}80%$. As a result, the hysteresis phenomenon of discharge voltage in 4mtorr is lower than that in 8mtorr and the hysteresis phenomenon of discharge voltage is getting lower as the applied power is getting higher. The structure of cross section and surface roughness of the thin films are observed by FE-SEM and AFM. The structure of cross section of the thin films is columnar and the average surface roughness under oxygen flow ratio of 0%, 52.5% and 65.0% are $2.08{\AA}$, $2.20{\AA}$ and $0.854{\AA}$, respectively.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.14 no.3
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• pp.50-56
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• 2015

In this study, AISI M2 powder was selected primarily through various pieces of literature in order to improve the hardness and wear resistance. Among the laser metal deposition parameters, laser power was studied to improve the deposition efficiency in the laser metal deposition using a diode-pumped disk laser. An SKD61 hot work steel plate and AISI M2 powder were used as a substrate and powder for laser metal deposition, respectively. Experiments for the laser metal deposition were carried out by changing the laser power and track layer. The quality of the track surface and cross-section after applying the single-layer method was better than that obtained from applying the multi-layer method. As the laser power increased, the track thickness was increased, and the surface roughness deviation was decreased. In laser power condition of 1.6kW, the maximum hardness of the deposition track was 790Hv. This value was 40% better than the hardness of the SKD61 after heat treatment.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.33 no.3
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• pp.219-224
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• 2020

Al₂O₃ powders with particle sizes of 0.35 ㎛, 0.5 ㎛, 1.5 ㎛, and 2.5 ㎛ are deposited onto glass and Cu substrates using the aerosol deposition (AD) process. The deposition characteristics of Al₂O₃ films using those four types of Al₂O₃ powders are investigated to determine the influence of the particle size on the films. To observe detailed micro-structures of the films, the cross-section and surface morphology are observed. Then, the crystalline size and internal strain are calculated from X-ray diffraction peaks in order to confirm the hammering effect as well as the micro-strain during the AD deposition. From the above results, deposition mechanisms related to the particle size are studied. The results of this study indicate the optimal particle size and formation mechanisms for dense Al₂O₃ film with a smooth surface roughness as well as for a porous Al₂O₃ film with a rough surface roughness.

• Journal of Korean Society on Water Environment
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• v.32 no.6
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• pp.582-588
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• 2016

The hydrological simulation program FORTRAN (HSPF) is a comprehensive watershed model that employs the hydraulic function table (FTABLE) (depth-area-volume-flow relationship) to represent the geometric and hydraulic properties of water bodies. The hydraulic representation of the HSPF model mainly depends on the accuracy of the FTABLES. These hydraulic representations determine the response time of water quality state variables and also control the scour, deposition, and transport of sediments in the water body. In general, FTABLES are automatically generated based on reach information such as mean depth, mean width, length, and slope along with a set of standard assumptions about the geometry and hydraulics of the channel, so these FTABLES are unable to accurately describe the geometry and hydraulic behavior of rivers and reservoirs. In order to compensate the weakness of HSPF for hydraulic modeling, we generated alternate method to improve the accuracy of FTABLES for rivers, using the surveyed cross sections and rating curves. The alternative method is based on the hydraulics simulated by HEC-RAS using the surveyed cross sections and rating curves, and it could significantly improve the accuracy of FTABLES. Although the alternate FTABLE greatly improved the hydraulic accuracy of the HSPF model, it had little effect on the hydrological simulation.