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http://dx.doi.org/10.4313/JKEM.2020.33.3.219

Study of Deposition Mechanism of Al2O3 Films According to Al2O3 Particle Size via Aerosol Deposition Process  

Kim, Ik-Soo (Department of Electronic Materials Engineering, Kwangwoon University)
Cho, Myung-Yeon (Department of Electronic Materials Engineering, Kwangwoon University)
Koo, Sang-Mo (Department of Electronic Materials Engineering, Kwangwoon University)
Lee, Dong-Won (Department of Electronic Materials Engineering, Kwangwoon University)
Oh, Jong-Min (Department of Electronic Materials Engineering, Kwangwoon University)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.33, no.3, 2020 , pp. 219-224 More about this Journal
Abstract
Al2O3 powders with particle sizes of 0.35 ㎛, 0.5 ㎛, 1.5 ㎛, and 2.5 ㎛ are deposited onto glass and Cu substrates using the aerosol deposition (AD) process. The deposition characteristics of Al2O3 films using those four types of Al2O3 powders are investigated to determine the influence of the particle size on the films. To observe detailed micro-structures of the films, the cross-section and surface morphology are observed. Then, the crystalline size and internal strain are calculated from X-ray diffraction peaks in order to confirm the hammering effect as well as the micro-strain during the AD deposition. From the above results, deposition mechanisms related to the particle size are studied. The results of this study indicate the optimal particle size and formation mechanisms for dense Al2O3 film with a smooth surface roughness as well as for a porous Al2O3 film with a rough surface roughness.
Keywords
Aerosol deposition; Different particle size; Deposition mechanism; Hammering effect; Internal strain; Dense $Al_2O_3$ coating; Porous $Al_2O_3$ coating;
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