• 제목/요약/키워드: deposited layer

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대구(Gadus macrocephalus)의 초기 발생시기의 비중변화 (Changes in the Specific Gravity of Pacific Cod Gadus macrocephalus, During the Early Life Stages)

  • 이화현
    • 한국수산과학회지
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    • 제51권3호
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    • pp.332-337
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    • 2018
  • The Pacific cod Gadus macrocepahlus, lays demersal eggs and the hatching larvae rise toward the surface layer of the ocean to feed. The change in the specific gravity of eggs and larvae was investigated to examine their vertical distribution and movement in the water column. The specific gravities of fertilized eggs and various size classes of larvae were measured using a density gradient apparatus. In total, the instantaneous specific gravity of 146 eggs and 225 larvae were measured. To prevent any disturbance in the gradient water column due to larval movement, 0.004% MS222 was used for anesthesia. Due to their high specific gravity, eggs spawned were deposited over the sea-bed of the spawning ground. The specific gravity of hatching larvae decreased abruptly. However, Pacific cod larvae still had a comparatively high specific gravity at hatching ($1.03655{\pm}0.00146g/cm3$, n=4, mean SL=3.62 mm) and their specific gravities tended to decrease as they grew. The specific gravity stabilized 6 days after hatching ($1.02590{\pm}0.00212g/cm3$, n=15, mean SL=4.67 mm) and the cod larvae were eventually able to float in the water column.

Hot-filament 플라즈마화학기상증착법 이용한 패턴된 DLC층 위에 탄소나노튜브의 선택적 배열

  • 최은창;박용섭;홍병유
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.293-293
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    • 2010
  • Carbon nanotubes (CNTs) have attracted considerable attention as possible routes to device miniaturization due to their excellent mechanical, thermal, and electronic properties. These properties show great potential for devices such as field emission displays, CNT based transistors, and bio-sensors. The metals such as nickel, cobalt, gold, iron, platinum, and palladium are used as the catalysts for the CNT growth. In this study, diamond-like carbon (DLC) was used for CNT growth as a nonmetallic catalyst layer. DLC films were deposited by a radio frequency (RF) plasma-enhanced chemical vapor deposition (RF-PECVD) method with a mixture of methane and hydrogen gases. CNTs were synthesized by a hot filament plasma-enhanced chemical vapor deposition (HF-PECVD) method with ammonia (NH3) as a pretreatment gas and acetylene (C2H2) as a carbon source gas. The grown CNTs and the pretreated DLC filmswere observed using field emission scanning electron microscopy (FE-SEM) measurement, and the structure of the grown CNTs was analyzed by high resolution transmission scanning electron microscopy (HR-TEM). Also, using energy dispersive spectroscopy (EDS) measurement, we confirmed that only the carbon component remained on the substrate.

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Characterization of Al2O3 Thin Film Encasulation by Plasma Assisted Spatial ALD Process for Organic Light Emitting Diodes

  • Yong, Sang Heon;Cho, Sung Min;Chung, Ho Kyoon;Chae, Heeyeop
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.234.2-234.2
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    • 2014
  • Organic light emitting diode (OLED) is considered as the next generation flat panel displays due to its advantages of low power consumption, fast response time, broad viewing angle and flexibility. For the flexible application, it is essential to develop thin film encapsulation (TFE) to protect oxidation of organic materials from oxidative species such as oxygen and water vapor [1]. In many TFE research, the inorganic film by atomic layer deposition (ALD) process demonstrated a good barrier property. However, extremely low throughput of ALD process is considered as a major weakness for industrial application. Recently, there has been developed a high throughput ALD, called 'spatial ALD' [2]. In spatial ALD, the precursors and reactant gases are supplied continuously in same chamber, but they are separated physically using a purge gas streams to prevent mixing of the precursors and reactant gases. In this study, the $Al_2O_3$ thin film was deposited by spatial ALD process. We characterized various process variables in the spatial ALD such as temperature, scanning speed, and chemical compositions. Water vapor transmission rate (WVTR) was determined by calcium resistance test and less than $10-^3g/m^2{\cdot}day$ was achieved. The samples were analyzed by x-ray photoelectron spectroscopy (XPS) and field emission scanning electron microscope (FE-SEM).

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Effects of NaF evaporation rate on the properties of $CuInSe_2$ thin-film solar cells

  • 박순용;이은우;이상환;박상욱;정우진;김우남;전찬욱
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2010년도 춘계학술발표대회
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    • pp.36.2-36.2
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    • 2010
  • A small amount of Na incorporated in $CuInSe_2$ (CIS) absorption layer has become widely accepted as a requirement for efficient polycrystalline CIS solar cells. However, there is ongoing argument on the role of sodium incorporated in the absorber. In this paper, CIS absorption layers have been deposited using the three-stage co-evaporation process on Mo coated non-Alkali glass substrates. The NaF was evaporated during the second-stage with various fluxes. This paper is focusing on differences of micro-structure and composition ratio of the absorber realized with different Na contents and the variation of electrical properties of the cells with the corresponding absorbers. The analytical results of x-ray diffraction (XRD) patterns, field emission scanning electron microscope (FE-SEM), energy dispersive spectroscopy (EDS) and current-voltage characteristics will be discussed to investigate the effect of NaF flux on the CIS absorber formation and its cell performance.

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Reactive Sputtering으로 제조된 /SrBi_2Ta_2O_9$박막의 전기적 특성에 미치는 조성의 영향 (Effect of Composition on Electrical Properties of SBT Thin Films Deposited by Reactive Sputtering)

  • 박상식;양철훈;채수진;윤손길;김호기
    • 한국재료학회지
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    • 제6권9호
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    • pp.931-936
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    • 1996
  • 비휘발성 메모리 소자에의 적용을 위한 SrBi2Ta2O9(SBT)박막이 고순도의 Sr, Bi, Ti 금속타겟을 사용하여 Pt/Ti/SiO2/Si 기판 위에 reactive sputtering 법에 의해 증착되었다. 조성의 영향을 평가하기 위하여 Bi 타겟에 인가되는 전원의 변화와 열처리에 따른 C-F(capacitance-frequency), P-E(polarization-electric field), I-V(current-voltage)등의 전기적 특성이 조사되었다. Bi의 양이 증가함에 따라 Bi layer 구조를 나타내는 (105)회절 피크가 증가하였고 $700^{\circ}C$, 산소분위기에서 1시간 동안 열처리후 Sr과 Bi가 심하게 휘발되었으며 박막의 미세구조는 다공질이 되었다. 이러한 이유로 열처리된 박막의 누설 전류 밀도는 증가하였다. 열처리된 시편의 조성은 거의 화학양론비를 이루었으며 4.5$\mu$C/$\textrm{cm}^2$의 Pr값을 갖는 강유전(ferroelectric)특성을 나타내었다.

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RTP를 사용한 타이타늄 실리사이드 형성의 공정 조절 (Process Control of Titanium Silicide Formation Using RTP)

  • 이용재
    • 한국통신학회논문지
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    • 제15권5호
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    • pp.399-405
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    • 1990
  • 急速 熱處理 공정을 高融點 타이타늄 실리사이드 형성을 위한 反應率의 연구와 정확한 形成 調節에 이용하였다. 試料는 n형 실리콘과 다결정 웨이퍼이며, 타이타늄을 스퍼터로 증착시켰다. 工程은 질소와 아르곤 가스 분위기 下에 실리사이드 형성을 정확하게 조절하기 위해 急速 時間 溫度 분포의 行列로 수행하였다. 반응된 박막은 面抵抗 측정과 전자현미경 사진, 自動分 抛抵抗 측정, X-선 回折 등으로 分析하였다. 結果는 실리사이드의 抵抗度는 20$\mu$$\Omega$-cm이하 이고, 박막 두께는 타이타늄 燕着 의 두께보다 약 2배로 나타났다. 실리사이드 形成 분위기는 아르곤과 窒素가 同一한 溫度 時間 조건에서 形成되었다.

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VDP(Vapor Deposition Polymerization) 방법을 이용한 유기 게이트 절연막의 대한 연구 (Study on the Organic Gate Insulators Using VDP Method)

  • 표상우;심재훈;김정수;김영관
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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    • pp.185-190
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    • 2003
  • In this paper, it was demonstrated that the organic thin film transistors were fabricated by the organic gate insulators with vapor deposition polymerization (VDP) processing. In order to form polyimide as a gate insulator, vapor deposition polymerization process was also introduced instead of spin-coating process, where polyimide film was co-deposited by high-vacuum thermal evaporation from 4,4'-oxydiphthalic anhydride (ODPA) and 4,4'-oxydianiline (ODA) and 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride (6FDA) and ODA, and cured at $150^{\circ}C$ for 1hr. Electrical output characteristics in our organic thin film transistors using the staggered-inverted top-contact structure obtained to the saturated slop in the saturation region and the subthreshold non-linearity in the triode region. Field effect mobility, threshold voltage, and on-off current ratio in $0.45\;{\mu}m$ thick gate dielectric layer were about $0.17\;cm^2/Vs$, -7 V, and $10^6\;A/A$, respectively. Details on the explanation of compared to organic thin-film transistors (OTFTS) electrical characteristics of ODPA-ODA and 6FDA-ODA as gate insulators by fabricated thermal co-deposition method.

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Tunable microwave device에 사용될 수 있는 $(Ba,Sr)TiO_{3}$ 박막의 유전특성 향상에 관한 연구 (Enhanced dielectric properties of $(Ba,Sr)TiO_{3}$ thin films applicable to tunable microwave devices)

  • 박배호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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    • pp.73-76
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    • 2001
  • We deposited epitaxial $Ba_{0.6}Sr_{0.4}TiO_{3}(BST)$ films having thickness of 400 nm on MgO(001) substrates, where a 10 nm thick $Ba_{1-x}Sr_{x}TiO_{3}$ (x = 0.1 - 0.7) interlayer was inserted between BST and MgO to manipulate the stress of the BST films. Since the main difference of those epitaxial BST films was the lattice constant of the interlayers, we were very successful in controlling the stress of the BST films. BST films under small tensile stress showed larger dielectric constant than that without stress as well as those under compressive stress. Stress relaxation was investigated using epitaxial BST films with various thicknesses grown on different interlayers. For BST films grown on $Ba_{0.7}Sr_{0.3}TiO_{3}$ interlayers, the critical thickness was about 600 nm. On the other hand, the critical thickness of single-layer BST film was less than 100 nm.

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Mo 박막의 성장조건에 따른 Cu(InGa)$Se_2$ 박막 태양전지의 광변환효율 (Photovoltaic Properties of Cu(InGa)$Se_2$ Solar Cells with Sputter Conditions of Mo films)

  • 김석기;이정철;강기환;윤경훈;박이준;송진수;한상옥
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 일렉트렛트 및 응용기술
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    • pp.63-66
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    • 2002
  • Bi-layer Mo films were deposited on sodalime glass substrates using DC magnetron sputtering. As the gas pressure and power density, the resistivity varied from $1.5{\times}10^{-5}$ to $4.97{\times}10^{-4}{\Omega}{\cdot}cm$. Furthermore, stress direction yielded compressive-to-tensile transition stress curves. The microstructure of the compressive stress films which had poor adhesion consists of tightly packed columns, but of the tensile-stressed films had less dense structure. Under all gas pressure conditions, Mo films exhibited distinctly increasing optical reflection with decreasing gas pressure. The expansion of (110) peak width with the gas pressure meant the worse crystalline growth. Also, The highest efficiency was 15.2% on 0.2 $cm^2$. The fill factor, open circuit voltage and short circuit current were 63 %, 570 m V and 42.6 $mA/cm^2$ respectively.

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마이크로웨이브 플라즈마 화학기상증착장비를 사용한 유리기판상의 탄소나노튜브의 합성 (GROWTH OF CARBON NANOTUBES ON GLASS BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION)

  • 이재형;최성헌;최원석;홍병유;김정태;임동건;양계준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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    • pp.99-100
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    • 2005
  • We have grown carbon nanotubes (CNTs) with a microwave plasma chemical vapor deposition (MPECVD) method, which has been regard as one of the most promising candidates for the synthesis of CNTs due to the vertical alignment, the low temperature and the large area growth. We use methane ($CH_4$) and hydrogen ($H_2$) gas for the growth of CNTs. 60 nm thick Ni catalytic layer were deposited on the TiN coated glass substrate by RF magnetron sputtering method. In this work, we report the effects of pressure on the growth of CNTs. We have changed pressure of processing (10 $\sim$ 20 Torr) deposition of CNTs. SEM (Scanning electron microscopy) images show diameter, length and cross section state CNTs.

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