• Title/Summary/Keyword: deposited layer

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Fabrication of $MgB_2$ Thin Films by rf-sputtering (rf-sputtering을 이용한 $MgB_2$ 박막 제작)

  • 안종록;황윤석;이순걸
    • Progress in Superconductivity
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    • v.4 no.2
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    • pp.153-156
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    • 2003
  • We have studied fabrication of $MgB_2$ thin film on $SrTiO_3$ (001) and r-cut $A1_2$$O_3$ substrates by rf magnetron sputtering method using and $ MgB_2$ single target and two targets of Mg and B, respectively. Based on P -T phase diagram of $MgB_2$ and vapor pressure curves of Mg and B, a three-step process was employed. B layer was deposited at the bottom to enhance the film adhesion to the substrate. Secondly, co-sputtering of Mg and B was done. Finally, Mg was sputtered on top to compensate fur the loss of Mg during annealing. Subsequently, $MgB_2$ films were in-situ annealed in various conditions. The sample fabricated using the three-step process showed $T_{c}$ of 24 K and formation of superconducting $MgB_2$ phase was confirmed by XRD spectra. In case of co-sputtering deposition, $T_{c}$ depended on annealing time and argon pressure. However, those made by single-target sputtering showed non-superconducting behavior or low transition temperature, at best.est.

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Numerical Simulation on Self-heating for Interlayer Tunneling Spectroscopy in $Bi_2Sr_2CaCu_2O_{8+x}$

  • Park, Jae-Hyun;Lee, Hu-Jong
    • Progress in Superconductivity
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    • v.9 no.1
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    • pp.18-22
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    • 2007
  • For interlayer tunneling spectroscopy using a small stack of $Bi_2Sr_2CaCu_2O_{8+x}$ (Bi-2212) intrinsic junctions in a high-bias range, large self-heating takes place due to the poor thermal conductivity of Bi-2212. In this study, we numerically estimate the self-heating around a Bi-2212 sample stack for I-V or dI/dV-V measurements. Our results show that the temperature discrepancy between the Bi-2212 sample stack and top Au electrodes due to bias-induced self-heating is small enough along the c-axis direction of Bi-2212. On the other hand, the lateral temperature discrepancy between the sample stack and the Bi-2212 on-chip thermometer stack can be as large as ${\sim}20\;K$ for the highest bias required to observe the pseudogap hump structure. We thus suggest a new in-situ ac thermometry, employing the Au current-bias electrode itself deposited on top of the sample stack as the resistive thermometer layer, which is supposed to allow safe temperature measurements for the interlayer tunneling spectroscopy.

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Characteristics of $TiN/TiSi_2$ bilayer by $BF_2$ dopant at Si substrate (기판 실리콘의 $BF_2$ 불순물 원자에 의한 $TiN/TiSi_2$ bilayer의 특성)

  • Lee, C.J.;Park, J.S.;You, H.S.;Sung, Y.K.
    • Proceedings of the KIEE Conference
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    • 1992.07b
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    • pp.835-838
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    • 1992
  • The $TiN/TiSi_2$ bilayer has been studied for contact barrier layer at ULSI recently. The $TiN/TiSi_2$ bilayer was formed by RTA in $NH_3$ ambient simultaneously after the Ti film was deposited on silicon substrate. In this paper, properties of $TiN/TiSi_2$ bilayer was evaluated according to $BF_2$ dopant concentration and dopant redistribution in $TiN/TiSi_2$ bilayer was also analyzed. In this experiment, the composition and structure of $TiN/TiSi_2$ bilayer were constant even though dopant concentration increased but silicide growth rate decreased. Boron atoms were redistributed within TiN film and at $TiSi_2Si$ interface during the bilayer formation.

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Effect of annealing on the electrical properties of amorphous oxide semiconductor $InGaZnO_4$ films (열처리에 의한 비정질 산화물 반도체 $InGaZnO_4$ 박막의 전기적 특성 변화 연구)

  • Bae, Sung-Hwan;Koo, Hyun;Yoo, Il-Hwan;Jung, Myung-Jin;Kang, Suk-Ill;Park, Chan
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1277_1278
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    • 2009
  • Amorphous oxide semiconductor $InGaZnO_4$(IGZO) is a very promising candidate of channel layer in transparent thin film trasisitor(TTFT) because of its high mobility and high transparency in visible light region. Amorphous IGZO films were deposited at room temperature on a fused silica substrate using pulsed laser deposition method. In-situ post annealing was carried out at 150-450C right after film deposition. The $O_2$ partial pressures during the deposition and the post annealing was fixed to 10mTorr. The electron transport properties of the amorphous IGZO films were improved by thermal annealing. The temperature range in which the improvement of the electrical properties, was 150C~300C.

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Interface Charateristics of Plasma co-Polymerized Insulating Film/Pentacene Semiconductor Film (플라즈마 공중합 고분자 절연막과 펜타센 반도체막의 계면특성)

  • Shin, Paik-Kyun;Lim, H.C.;Yuk, J.H.;Park, J.K.;Jo, G.S.;Nam, K.Y.;Park, J.K.;Kim, Y.W.;Chung, M.Y.
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1349_1350
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    • 2009
  • Thin films of pp(ST-Co-VA) were fabricated by plasma deposition polymerization (PVDPM) technique. Properties of the plasma polymerized pp(ST-Co-VA) thin films were investigated for application to semiconductor device as insulator. Thickness, dielectric property, composition of the pp(ST-Co-VA) thin films were investigated considering the relationship with preparation condition such as gas pressure and deposition time. In order to verify the possibility of application to organic thin film transistor, a pentacene thin film was deposited on the pp(ST-Co-VA) insulator by vacuum thermal evaporation technique. Crystalline property of the pentacene thin film was investigated by XRD and SEM, FT-IR. Surface properties at the pp(ST-Co-VA)/pentacene interface was investigated by contact angle measurement. The pp(ST-Co-VA) thin film showed a high-k (k=4.6) and good interface characteristic with pentacene semiconducting layer, which indicates that it would be a promising material for organic thin film transistor (OTFT) application.

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Fabrication of nano pattern using the injection molding (사출성형을 이용한 미세 패턴 성형)

  • Lee, Kwan-Hee;Yoo, Yeong-Eun;Kim, Sun-Kyoung;Kim, Tae-Hoon;Je, Tae-Jin;Choi, Doo-Sun
    • Proceedings of the KSME Conference
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    • 2007.05a
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    • pp.1532-1536
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    • 2007
  • A plastic substrate with tiny rectangular pillars less than 100nm is injection molded to study pattern replication in injection molding. The size of the substrate is 50mm ${\times}$ 50mm and 1mm thick. The substrate has 9 patterned areas of which size is 2mm ${\times}$ 2mm respectively. The lengths of the pillars are 50nm, 100nm, 150nm and 200nm and the width and height are 50nm and about 100nm respectively. A pattern master is fabricated by e-beam writing using positive PR(photo resist) and then a nickel stamper replicated from the PR master by nickel electro-plating. Cr is deposited on the PR pattern master before nickel electro-plating as a conducting layer. Using this nickel stamper, several injection molding experiments are done to investigate effects of the injection molding parameters such as mold temperature, injection rate, packing pressure or pattern location on the replication of the patterns under 100nm.

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Sliding Wear Behavior of Plasma Sprayed Zirconia Coatingagainst Silicon Carbide Ceramic Ball

  • Le Thuong Hien;Chae Young-Hun;Kim Seock Sam;Kim Bupmin;Yoon Sang-bo
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 2004.11a
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    • pp.66-74
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    • 2004
  • The sliding wear behavior of $ZrO_2-22wt\%MgO\;(MZ)\;and\;ZrO_2-8wt\%Y_2O_3\;(YZ)$ deposited on a casting aluminum alloy with bond layer (NiCrCoAlY) by plasma spray against an SiC ball was investigated under dry test conditions at room temperature. At all load conditions, the wear mechanisms of the MZ and the YZ coatings were almost the same. The wear mechanisms involved the forming of a smooth film by material transferred on the sliding surface and pullout. The wear rate of the MZ coating was less than that of the YZ coating. With an increase normal load the wear rate of the studied coatings increased. The SEM was used to examine the sliding surfaces and elucidate likely wear mechanisms. The EDX analysis of the worn surface indicated that material transfer was occurred from the SiC ball to the disk. It was suggested that the material transfer played an important role in the wear performance.

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Chemiresistive Sensor Based on One-Dimensional WO3 Nanostructures as Non-Invasive Disease Monitors

  • Moon, Hi Gyu;Han, Soo Deok;Kim, Chulki;Park, Hyung-Ho;Yoon, Seok-Jin
    • Journal of Sensor Science and Technology
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    • v.23 no.5
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    • pp.291-294
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    • 2014
  • In this study, a chemiresistive sensor based on one-dimensional $WO_3$ nanostructures is presented for application in non-invasive medical diagnostics. $WO_3$ nanostructures were used as an active gas sensing layer and were deposited onto a $SiO_2/Si$substrate using Pt interdigitated electrodes (IDEs). The IDE spacing was $5{\mu}m$ and deposition was performed using RF sputter with glancing angle deposition mode. Pt IDEs fabricated by photolithography and dry etching. In comparison with thin film sensor, sensing performance of nanostructure sensor showed an enhanced response of more than 20 times when exposed to 50 ppm acetone at $400^{\circ}C$. Such a remarkable faster response can pave the way for a new generation of exhaled breath analyzers based on chemiresistive sensors which are less expensive, more reliable, and less complicated to be manufactured. Moreover, presented sensor technology has the potential of being used as a personalized medical diagnostics tool in the near future.

The Growth of Diamond-Like-Carbon (DLC) Film by PECVD and the Characterization (PECVD에 의한 DLC 박막의 성장과 그 특성 조사)

  • 조재원;김태환;김대욱;최성수
    • Journal of the Korean Vacuum Society
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    • v.7 no.3
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    • pp.248-254
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    • 1998
  • DLC(Diamond-Like-Carbon) thin film, one of the solid state amorphous carbon films, has been deposited by the method of PECVD (Plasma Enhanced Chemical Vapor Deposition). The structural features have been characterized using both FT-IR Spectroscopy and Raman Scattering. The film is considered to consist of microcrystalline diamond domains and graphitelike carbon domains, which are interconnected by hydrogenated $sp^3$ tetrahedral carbons. This shows a good agreement with the results by I-Vmeasurements. In I-Vstudy, the sudden increase of current has been observed and this phenomenon is understood to be due to the tunneling effect between graphitelike domains. A characteristic feature related to the $\beta$-SiC has been identified in the study of Raman Scattering for the very thin film, which suggests that a buffer layer forms at the interface of the Si substrate and the carbon film.

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The Morphology and Adhesion of TiCN Film formed by PECVD (PECVD 에 의해 형성된 TiCN 박막의 형상 및 밀착성)

  • Huh, J.;Nam, T.W.
    • Journal of the Korean Society for Heat Treatment
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    • v.15 no.3
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    • pp.118-126
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    • 2002
  • TiCN thin films were deposited on tool steels at $510^{\circ}C$ by PECVD from a $TiCl_4+N_2+CH_4+H_2+Ar$ gaseous mixture. The microstructures and preferred orientation were investigated. The micro-scratch tests were performed using a system equipped with an acoustic emission sensor. Critical loads were determined to evaluate the adhesion of TiCN to substrate. The influences of the microstructures of substrates, double layered coatings, and coatings after nitriding(duplex coating) were investigated. The experimental results showed that the microstructures of substrates and double layered coating did not affect the critical loads considerably. By the duplex coating, critical loads were not always increased. In some cases, duplex coatings decreased critical loads significantly despite of absence of black layer. In this study, we tried to relate the results of scratch test to the residual stress analysis. Nitriding before the coating reduces the tensile residual stress in the film, which gives rise to low critical load in scratch test.