• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.311-311
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• 2013

The resistance switching memory devices have several advantages to take breakthrough for the limitation of operation speed, retention, and device scale. Especially, the metal-oxide materials such as ZnO are able to fabricate on the flexible and visible transparent plastic substrate. Also, the quantum dots (QDs) embedded in dielectric layer could be improve the ratio between the low and the high resistance becauseof their Coulomb blockade, carrier trap and induced filament path formation. In this study, we irradiated 0.2-MeV-electron beam on the ZnO/QDs/ZnO structure to control the defect and oxygen vacancy of ZnO layer. The metal-oxide QDs embedded in ZnO layer on Pt/glass substrate were fabricated for a memory device and evaluated electrical properties after 0.2-MeV-electron beam irradiations. To formation bottom electrode, the Pt layer (200 nm) was deposited on the glass substrate by direct current sputter. The ZnO layer (100 nm) was deposited by ultra-high vacuum radio frequency sputter at base pressure $1{\times}10^{-10}$ Torr. And then, the metal-oxide QDs on the ZnO layer were created by thermal annealing. Finally, the ZnO layer (100 nm) also was deposited by ultra-high vacuum sputter. Before the formation top electrode, 0.2 MeV liner accelerated electron beams with flux of $1{\times}10^{13}$ and $10^{14}$ electrons/$cm^2$ were irradiated. We will discuss the electrical properties and the physical relationships among the irradiation condition, the dislocation density and mechanism of resistive switching in the hybrid memory device.

• Korean Journal of Materials Research
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• v.17 no.3
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• pp.160-166
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• 2007

TRISO coatings on $ZrO_{2}$ surrogate kernels were conducted by a fluidized-bed chemical vapor deposition (FBCVD) method. Effects of the deposition temperature and the gas flow rate on the properties of SiC layer were investigated in the TRISO-coated particles. Deposition rate of the SiC layer decreased as the deposition temperature increased in the temperature range of $1460^{\circ}-1550^{\circ}C$. At the deposition temperature of $1550^{\circ}C$ the SiC layer contained an excess carbon, whereas the SiC layers had stoichiometric compositions at $1460^{\circ}C\;and\;1500^{\circ}C$. Hardness and elastic modulus measured by a nanoindentation method were the highest in the SiC layer deposited at $1500^{\circ}C$. The SiC layer deposited at the gas flow rate of 4000 sccm exhibited a high porosity and contained large pores more than $1{\mu}m$, being due to a violent spouting of particles. On the other hand, the SiC layer deposited at 2500 sccm revealed the lowest porosity.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.11a
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• pp.271-274
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• 2003

[ $Sr_xBa_{1-x}Nb_2O_6$ ] (SBN, $0.25{\leq}x{\leq}0.75$) ceramic is a ferroelectric material with tetragonal tungsten bronze (TTB) type structure, which has a high pyroelectric coefficient and a nonlinear electro-optic coefficient value. In spite of its advantages, SBN has not been investigated well compared to other ferroelectric materials with perovskite structure. In this study, SBN thin film was manufactured by ion beam sputtering technique using the prepared SBN target in $Ar/O_2$ atmosphere. SBN30 thin films of different thickness were pre-deposited as a seed layer on $Pt(100)/TiO_2/SiO_2/Si$ substrate followed by SBN60 deposition up to $4500\;{\AA}$ in thickness. As-deposited SBN60/SBN30 layer was heat-treated at different temperatures of 650, 700, 750, and $800\;^{\circ}C$ in air, respectively, The crystallinity and orientation behavior as well as electric properties of SBN60/SBN30 multi-layer were examined. The deposited layer was uniform and the orientation was shown primarily along (001) plane from XRD pattern. There was difference in the crystal structure with heat-treatment temperature, and the electric properties depended on the heating temperature and the seed-layer thickness. In electric properties of Pt/SBN60/SBN30/Pt thin film capacitor prepared, the remnant polarization (2Pr) value was $15\;{\mu}C/cm^2$, the coercive field (Ec) 65 kV/cm, and the dielectric constant 1492, respectively.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.1813-1818
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• 2006

We demonstrate a new approach to form gradient hole injection layer (HIL) in organic light-emitting diodes (OLEDs). Single spincoating of hole-injecting conducting polymer compositions with a perfluorinated ionomer results in gradient workfunction through the layer by self-organization, which lead to remarkably efficient single layer polymer light-emitting diodes (PLEDs) (${\sim}21$ cd/A). The device lifetime was significantly improved (${\sim50$ times) compared with the conventional hole injection layer, poly(3,4-ethylenedioxy-thiophene)/polystyrene sulfonate. This solution processed HIL also produced dramatically enhanced luminous efficiency (${\sim}34$ cd/A) in vacuum- deposited green fluorescent OLEDs while the vacuum deposited HIL gave the luminous efficiency of ${\sim}23$ cd/A in the same device structure.

• Journal of the Korean Institute of Telematics and Electronics
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• v.24 no.6
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• pp.975-979
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• 1987

The recrystallization of polysilicon layer deposited on SiO2 was attempted by means of CO2 laser annealing in this paper. SiO2 layer of 13000\ulcornerthick and polysilicon layer of 6000\ulcornerthick were successively deposited on (100) Si wafer by thermal oxidation and LPCVD, respectively. Prior to the annealings the polysilicon layer was defined in small island patterns by means of photolithography. After the annealing an increase in grain size from 1000\ulcornerto 2-10 =\ulcorner was observed by SEM.

• Proceedings of the KIEE Conference
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• 2008.07a
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• pp.1275-1276
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• 2008

In this study, a micro-cavity organic light-emittingdevice (OLED) with semi-transparent-Ag/AgO hole injecting layer (HIL) was fabricated and their performance was investigated. For the fabrication of OLEDs N,N-diphenyl-N,N-(3-methyphenyl)-1,1-biphenyl-4-4-diamine (TPD), known as a hole transporting material and tris (8-hydroxyquinolinato)-aluminum ($Alq_3$) as both electron-transporting layer (ETL) and emission layer (EML) were deposited using thermal evaporation technique. And Al layer as cathode was then deposited using thermal evaporation technique. Effects of the semi-transparent-Ag/AgO layers on the resulting OLED performance were investigated.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.246.2-246.2
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• 2014

Green-light emitting OLED with single layer of Alq3 and orange-light emitting OLED with double layer of rubrene/Alq3 as EML were fabricated and characterized comparatively. The two OLED devices were based on an anode of ITO, HTL of TPD, and cathode of Al, respectively. The green light emitting OLED was then prepared with Alq3 as both ETL and EML, while the orange-light emitting OLED was prepared with rubrene deposited on Alq3. All the component layers of the OLED devices were deposited by a thermal evaporation technique in vacuum. Photoluminescence characteristics of the EML layers were investigated. Electrolumiscence characteristics of the OLED devices were comparatively investigated.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.491.2-491.2
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• 2014

Generally, silicon heterojunction solar cell has intrinsic and n-type of hydrogenated amorphous silicon (a-Si:H) as passivation layer and BSF layer. In this study, antimony, novel material, deposited on back side of the heterojunction solar cell as passivation and BSF layer to substitute the a-Si:H and the characteristics of the solar cell such electrical properties and optical properties were analyzed. And SIMS analysis was carried out to obtain the depth profile of the BSF layer which was deposited by laser annealing process.

• Journal of the Korean Society for Heat Treatment
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• v.24 no.1
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• pp.16-22
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• 2011

Al-Co/AlN-Co multilayer films with different layer thicknesses were prepared by using a two-facing target type D.C sputtering (TFTS) system. The deposited films were annealed isothermally at different temperatures and their microstructure, magnetic properties and resistivity were investigated. The magnetization of as-deposited films is very small irrespective of layer thickness. It was found that annealing conditions and layer thickness ratio (LTR) of Al-Co to AlN-Co can control the microstructure as well as the physical properties of the prepared films. The resistivity and magnetization increase and the coercivity decreases with decreasing LTR. High resistivity and sufficient magnetization were obtained for the films with LTR = 0.35. Films having such considerable magnetization and resistivity will be a potential candidate to be used for a high density recording material.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.318-321
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• 2009

We have studied transparent top gate Al-Zn-Sn-O (AZTO) TFTs with an $Al_2O_3$ protective layer (PL) on an active layer. We also fabricated a transparent 2.5 inch QCIF+AMOLED display panel using the AZTO TFT back-plane. The AZTO active layers were deposited by RF magnetron sputtering at room temperature and the PL was deposited by ALD with two different processes. The mobility and subthreshold slope were superior in the cases of the vacuum annealing and the oxygen plasma PL compared to the $O_2$ annealing and the water vapor PL, however, the bias stability was excellent for the TFTs of the $O_2$ annealing and the water vapor PL.