• 한국정밀공학회지
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• 제19권2호
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• pp.160-170
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• 2002

Retroreflective article is different from other reflecting objects as it returns the incidence ray to the near of its source. This characteristic makes the retroreflectors have many applications in reflective highway signs, reflective vests, and other safety-relaxed items. These articles may have various shapes. However, the quantitative evaluation of performance for the best shape of retroreflector needs much time and cost for manufacturing prototypes and for performance experiments. In this work, we have developed a program for simulating the trace of ray entered into a retroreflective element, in order to determine the optimal shape of retro-reflection. We have also proposed new performance criterion of retroreflective articles, which can confide the range of incidence angle, instead of the criterion with the merely retroreflective strength.

• 한국정밀공학회지
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• 제22권7호
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• pp.62-70
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• 2005

The nanoindenter and AFM have been used for nanofabrication, such as nanolithography, nanowriting, and nanopatterning, as well as measurement of mechanical properties and surface topology. Nanoscale indents can be used as cells for molecular electronics and drug delivery, slots for integration into nanodevices, and defects for tailoring the structure and properties. Therefore, it is very important to make indents of desired morphology (shape, size and depth). Indents of different shapes can be obtained by using indenters of different geometries such as a cube comer and conical and spherical tips. The depth and size of indents can be controlled by making indentations at different indentation loads. However, in case of viscoplastic viscoelastic materials such as polymethylmethacrylate (PMMA) the time dependent deformation (TDD) should also be considered. In this study, the effect of process parameters such as loading rate and hold-time at peak load on the indent morphology (maximum penetration depth, elastic recovery, transient creep recovery, residual depth pile-up height) of PMMA were studied for hyperfine pattern fabrication.