• Proceedings of the IEEK Conference
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• 2006.06a
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• pp.981-982
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• 2006

In this study, the synthesis and semiconducting properties of cation and defect-doped KTaO3 film is reported. KTaO3is an important material for optoelectronic and tunable microwave applications. It is an incipient ferroelectric with a cubic structure that becomes ferroelectric when doped with Nb. the films were grown on (001) MgO single crystal substrates using pulsed-laser deposition. Semiconducting behavior is achieved by inducing oxygen vacancies in the KTaO3 lattice via growth in a hydrogen atmosphere. The resistivity of semiconducting KTaO3:Ca films was as low as 10cm, and n-type semiconducting behavior was indicated. Hall mobility and carrier concentration were 0.27 cm2/Vs and 3.21018cm-3.

• The Korean Journal of Ceramics
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• v.3 no.1
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• pp.37-42
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• 1997

The DC current variation of calcia doped zirconia single crystal was measured under various oxygen containing gases at high temperatures. The DC current was influenced by the gas species for oxygen activity establishment. Also, strong non-ohmic characteristics were observed in the $CO/CO_2/N_2$ gas mixtures. Based on the experimental data obtained by introducing the non-buffering gas $N_2$ into the $CO/CO_2$ mixtures, the processes occurring at the gas/solid interface during a defect relaxation process are discussed.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.35D no.3
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• pp.28-38
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• 1998

In our paper is reported a new 3D(dimensional) trajectory split approach with greatly improved efficiency for the Monte Carlo simulation of the 3D profiles of implanted ionand point defect concentrations in single-crystal silicon. This approach has been successfully implemented in our TRICSI Monte Carlo code. Combined with the previously developed model for damage accumalation in our TRICSI code, this model allows phasically based dynamic simulation of 3D profiles over an subsequent process simulation such as diffusion modeling and simulation. A typical time saving of over 10 timeshas been achieved for 3D simulation. Our method ensures much better region aground the implanted area. For 1-D simulation, the optimized condition for trajectory split has set to 3,000 pseudoparticles with 2 split branches.

• Korean Journal of Crystallography
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• v.9 no.2
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• pp.131-137
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• 1998

결정결함의 밀도가 낮은 GaN epitaxy 막을 MOCVD(metal organic chemical vapour deposition) 방법에 의해 성장시켰다. 기판은 6H-SiC를 사용하였으며, AlN과 GaN으로 구성된 이중 buffer 층을 도입하였다. GaN buffer 층은 반응원료인 trimethyl gallium(TMG)과 NH3 가스를 교호식펄스공급(alternating pulsative supply, APS)방법에 의해 만들었다. AlN buffer/6H-SiC 위에 초기단계에 형성되는 GaN 섬은 APS처리에 의해 크기가 커지는 것을 AFM(atomic force microscope)으로 관찰하였다. Buffer 층의 역할은 그 위에 성막시킨 GaN epitaxy 막의 결정성과 결함밀도에 의해 조사하였다. 성막된 GaN의 결정구조와 결정성은 DCXRD(double crystal X-ray diffractormeter)에 의해 측정되었다. 결정결함은 EPD(etching pit density)를 측정하는 방법으로 알칼리혼합용에서 처리된 막을 SEM(scanning electron microscope)으로 관찰하였다.

• Proceedings of the Korean Society of Machine Tool Engineers Conference
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• 2002.10a
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• pp.164-169
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• 2002

Recently, LCD(Liquid Crystal Display) is the display product widely used on various fields of industry. This is generally composed of many parts. Among many parts, polarizer film control the intensity of the transmitted light according to the degree of rotation of the polarizer axis. Therefore, this film must be free from defects. But it contains many defects such as the defects caused by dust or different thing, adhesive badness, scratch. Presently, the inspection of these defects is depending on the sight of operator. In this paper, we propose the vision system composed of telecentric lens and optical mirror. This system use the coaxial illumination and the light is specularly reflected on the optical mirror. And we develop the image processing algorithm using the threshold and morphological technique.

• Proceedings of the KIEE Conference
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• 2007.07a
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• pp.1864-1865
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• 2007

In this paper, we proposed pre-filter algorithms which using frequency domain analysis method, for the detections of defects in large-sized Thin Film Transistor-Liquid Crystal Display(TFT-LCD) panel surfaces. We performed frequency analysis with 1-D, 2-D FFT methods for extract periodic patterns of lattice structures in TFT-LCDs. To remove this patterns, band-stop filters were used for eliminating specific frequency components. In order to acquire only defected images, we used 2-D inverse FFT methods which can be reverts images that remains defects.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.25 no.2
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• pp.51-55
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• 2015

The present research is focused on the effect of porous graphite what is influenced on the 4H-SiC crystal growth by PVT method. We expect that it produces more C-rich and a change of temperature gradient for polytype stability of 4H-SiC crystal as adding the porous graphite in the growth cell. The SiC seeds and high purity SiC source materials were placed on opposite side in a sealed graphite crucible which was surrounded by graphite insulator. The growth temperature was around $2100{\sim}2300^{\circ}C$ and the growth pressure was 10~30 Torr of an argon pressure with 5~15 % nitrogen. 2 inch $4^{\circ}$ off-axis 4H-SiC with C-face (000-1) was used as a seed material. The porous graphite plate was inserted on SiC powder source to produce a more C-rich for polytype stability of 4H-SiC crystal and uniform radial temperature gradient. While in case of the conventional crucible, various polytypes such as 6H-, 15R-SiC were observed on SiC wafers, only 4H-SiC polytype was observed on SiC wafers prepared in porous graphite inserted crucible. The defect level such as MP and EP density of SiC crystal grown in the conventional crucible was observed to be higher than that of porous graphite inserted crucible. The better crystal quality of SiC grown using porous graphite plate was also confirmed by rocking curve measurement and Raman spectra analysis.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.327-327
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• 2009

ZnO with a large band gap (~3.37 eV) and exciton binding energy (~60 meV), is suitable for optoelectronic applications such as ultraviolet (UV) light emitting diodes (LEDs) and detectors. However, the ZnO-based p-n homojunction is not readily available because it is difficult to fabricate reproducible p-type ZnO with high hall concentration and mobility. In order to solve this problem, there have been numerous attempts to develop p-n heterojunction LEDs with ZnO as the n-type layer. The n-ZnO/p-GaN heterostructure is a good candidate for ZnO-based heterojunction LEDs because of their similar physical properties and the reproducible availability of p-type GaN. Especially, the reduced lattice mismatch (~1.8 %) and similar crystal structure result in the advantage of acquiring high performance LED devices. In particular, a number of ZnO films show UV band-edge emission with visible deep-level emission, which is originated from point defects such as oxygen vacancy, oxygen interstitial, zinc interstitial[1]. Thus, defect-related peak positions can be controlled by variation of growth or annealing conditions. In this work, the undoped ZnO film was grown on the p-GaN:Mg film using RF magnetron sputtering method. The undoped ZnO/p-GaN:Mg heterojunctions were annealed in a horizontal tube furnace. The annealing process was performed at $800^{\circ}C$ during 30 to 90 min in air ambient to observe the variation of the defect states in the ZnO film. Photoluminescence measurements were performed in order to confirm the deep-level position of the ZnO film. As a result, the deep-level emission showed orange-red color in the as-deposited film, while the defect-related peak positions of annealed films were shifted to greenish side as increasing annealing time. Furthermore, the electrical resistivity of the ZnO film was decreased after annealing process. The I-V characteristic of the LEDs showed nonlinear and rectifying behavior. The room-temperature electroluminescence (EL) was observed under forward bias. The EL showed a weak white and strong yellowish emission colors (~575 nm) in the undoped ZnO/p-GaN:Mg heterojunctions before and after annealing process, respectively.

• Journal of the Korean Vacuum Society
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• v.16 no.1
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• pp.27-32
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• 2007

We have investigated photoluminescence(PL) spectra of four $In_xGa_{1-x}N(x=0.15)/GaN$ multiple quantum well(MQW) structures with different well widths in order to study a phenomenon on crystal phase separation. The asymmetic behavior of PL spectra becomes stronger with increase of the well width from 1.5 nm to 6.0 nm, which indicates dual-peak nature. Analyzing the dual-peak fit PL spectra, we have observed that the intensity of low-energy shoulder peak rapidly becomes stronger, compared to that of high-energy peak corresponding to a transition in InGaN QW. It suggests that InGaN QW has two phases with tiny different In compositions, and that In-rich(InN-like) phase forms more and more relatively than stoichiometric InGaN(x=0.15) phase by the InN phase separation mechanism as the QW width increases. PL spectrum of 6.0-nm sample shows an additional peak at low-energy lesion(${\sim}2.0\;eV$) whose energy position is almost the same as a defect band of yellow luminescence frequently observed in GaN epilayers. It may be due to a defect resulted from In deficiency formed with development of the phase separation.

• Journal of the Korean Ceramic Society
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• v.38 no.11
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• pp.967-972
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• 2001

The crystal and defect structures of U $O_{x}$(x=2.0, 2.03, 2.14, 2.19, 2.20 and 2.26) were analysed by rietveld refinement and the results were compared to the U-O phase diagram. Neutron diffraction data were collected in the temperature range of RT~100$0^{\circ}C$. The specimens of x=2.14, 2.19, and 2.20 consisted of two phase: $UO_{2+x}$(Fm3m, a≒5.4$\AA$) and $U_4$$O_{9}$(I43d, a≒21.8$\AA$). The proportion of the $UO_{2+x}$(Fm3m) phase increased with increasing the temperature. The variation of the proportion of the two phases with temperature in the U $O_{2.2}$ and U $O_{2.18}$ samples showed some deviation from the expected values from the phase diagram especially at the high temperature range. The phase transitions ${\gamma}$longrightarrow$\beta$longrightarrow$\alpha$ of $U_4$$O_{9}$ were discussed in relation with the phase separation.eparation.ion.