• 제목/요약/키워드: corning

검색결과 238건 처리시간 0.027초

Two-dimensionally Integrated Fluorescent Lamp for 40 inch LCD-TV Application

  • Kim, Joong-Hyun;Hwang, In-Sun;Byun, Jin-Seob;Park, Hae-Il;Kim, Hyoung-Joo;Jang, Hyeon-Yong;Kang, Seock-Hwan;Kim, Min-Gyu;Kwon, Nam-Ok;Lee, Sang-Yu;Souk, Jun-Hyung;Ko, Jae-Hyeon;Lee, Ki-Yeon;Jung, Kyeong-Taek;Kim, Dong-Woo;Ha, Hae-Soo;Heon, Min;Kim, Nam-Hun;Kim, Hyun-Sook;Kim, Geun-Young;Cho, Seog-Hyun
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.795-798
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    • 2004
  • After showing 32 inch two-dimensionally integrated fluorescent lamp (TIFL) and its module at SID '04, 40 inch TIFL and its module of prototype have been developed at the first time. It is the biggest size in the world as well as has a backlight unit without BEF optical film. The luminance of TIFL is 14000 nit at 190 watt power consumption and its luminous efficacy is 51 lumen/watt. The use of TIFL simplifies backlight assembly process and removes high price optical sheets. As a result, LCD TV, used by TIFL, is rapidly going to expand its market share in the large size TV area.

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Organosilicate Glass Dielectrics for High Performance FPD Applications

  • Choi, Dong-Kyu;Amako, Masaaki;Maghsoodi, Sina;Bilgrien, Carl
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.832-835
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    • 2005
  • Organosilicate Glass has quite a long history in the Semiconductor industry but has received very limited evaluation for Display industry applications. In this paper, we would like to introduce several kinds of Organosilicate Glasses for Display applications.

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Silicon Carbide Barrier Technology to Enable Flexible OLED Displays

  • Kim, Sang-Jin;Zambov, Ludmil;Weidner, Ken;Shamamian, Vasgen;Cerny, Glenn
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.452-455
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    • 2007
  • This paper provides an overview on the characteristics of a-SiC:H barrier film deposited for flexible display applications. Key characteristics such as high crack resistance, high thermal/hydro stability, excellent adhesion to the polymer substrate, as well as very low permeance has been demonstrated. The excellence of this barrier film has been shown from competitive analysis compared with other barrier coating materials. Finally, flexible Polymer Light Emitting Diode (PLED) test pixels have been fabricated on the barrier coated plastic substrate, demonstrating the viability of the device with lifetime data.

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GaN 단결정 분말을 이용한 $Ga_2O_3$ 합성 및 구조 특성 ($Ga_2O_3$ synthesis using GaN mono-crystal powder and its structural properties)

  • 방진현;고정은;소대영;김영수;김정돈
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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    • pp.12-13
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    • 2006
  • $Ga_2O_3$ is associated with the fabrication of thin window layer of solar cell. Usually, $Ga_2O_3$ is synthesized from Ga-metal oxidation method and GaN mono-crystal heat treatment method. We synthesized $Ga_2O_3$ powder using two methods and analyzed powder using latter method compared with powder by former method. XPS, XRD, IR analysis are conducted. XPS result, surface of GaN powder is almost oxidized to $Ga_2O_3$ at $1124^{\circ}C$ heat treatment and XRD and IR result, the inside of GaN powder is dramatically oxidized at $1124^{\circ}C{\sim}1300^{\circ}C$.

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Corning glass 기판위에 증착된 PZT 박막의 전기적 특성 (Electrical properties of PZT thin films deposited on corning glass substrates)

  • 주필연;정규원;박영;김홍주;박기엽;송준태
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 추계학술대회 논문집
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    • pp.263-266
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    • 2000
  • Effects of excess Pb(50 mole %) on the crystallization properties of amorphous PZT thin films on the glass substrates by post-annealing in oxygen ambient were investigated to lower the crystallization temperature of the PZT thin films with a single perovskite phase. The PZT thin films(350nm) were prepared on Pt/Ti/corning glass(1737) substrates. The PZT thin films and bottom electrode were deposited by RF magnetron sputtering. Crystallization properties of PZT thin films were strongly dependent on RTA(Rapid Thermal Annealing) temperature. We were able to obtain a perovskite structure of PZT at 600$^{\circ}C$ for 10min. After thermal treatments were done, electrical properties such as I-V, P-E, and fatigue were measured.

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$In_2O_3-SnO_2$ 이성분계 소결특성에 있어서 $SnO_2$ 분산성 ($SnO_2$ Dispersion of Sintered Body in $In_2O_3-SnO_2$ Binary System)

  • 전태진;박완수;조명진;김종수;김영수
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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    • pp.198-198
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    • 2006
  • SnO2가 첨가된 In2O3(ITO) sputtering 타켓은 넓은 파장영역에서의 투광성과 높은 전기전도도의 특성 때문에 여러 종류의 평판형 디스플레이 제품에 사용되고 있다. 사용된 In2O3와 SnO2 분말은 높은 순도의 금속을 사용하였으며, 공질법을 이용하여 분말을 제조하였으며, 혼합된 In2O3-SnO2 분말은 하소조건과 소결조건에 따라 특성을 평가 하였다. 본 연구의 목적인 ITO sprttering 타켓의 SnO2 분산조건은 하소 온도가 증가함에 따라 분산성이 뛰어났으며, 조사된 30wt% 에서 5wt%로 SnO2의 함량이 감소함에 따라 분산성은 향상되었다. 이러한 결과들로부터 ITO 타켓 밀도와 SnO2의 분산성은 1150C 이상에서 휘발하는 SnO2의 량에 의해 크게 영향을 받는다.

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HVPE법에 의해 성장된 GaN 기판의 Homoepitaxial 성장 (Homoepitaxial Growth on GaN Substrate Grown by HVPE)

  • 김정돈;김영수;고정은;권소영;이성수
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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    • pp.14-14
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    • 2006
  • Al2O3 단결정을 기판을 이용하여 HVPE법으로 GaN를 성장한 후 얻어진 GaN wafer는 N-face에 동종인 GaN를 성장하였다. 이때 동종 성장은 Al2O3와의 열팽창계수 차이로 야기된 휨을 제거할 수 있었으며, 양쪽 면은 결합 밀도가 급격히 감소하였다. 또한 표면 분극을 조사하기 위하여 에칭후 SEM 형상과 CBED를 조사 하였으며 특히 N-face에서의 표면 형상과 PL의 변화를 조사하였다. 이때 N-face의 변화는 초기의 N-face의 특성과 다른 양상을 보여 주고 있으며, DXRD와 PL 분석 걸과 결정성은 두배나 높은 결과를 보여주고 있다.

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