• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2003년도 춘계종합학술대회
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• pp.590-593
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• 2003

금속 산화물 박막 제작에 유효한 산화가스로 오존가스를 채택했다. 고품질의 산화 박막을 얻기 위해 고농도 오존이 필요하여 오존 농축 시스템을 구축 및 평가하였다. 이 장치는 실리카겔로 오존의 선택 흡착을 이용해, 농축 공정 시작 후 유입 농도 8.5 mol%가 검출되는 2.5 h에서 농축이 완료되고, 진공 배기로 고농도 오존가스를 생성하였으며, 성막 장치까지 가스가 공급되는 몇 분 동안은 자연분해 효과를 무시할 수 있었다.

• Transactions on Electrical and Electronic Materials
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• 제1권2호
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• pp.18-22
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• 2000

An ozone condensation system is evaluated from the viewpoint of an ozone supplier fro oxide thin film growth. Ozone is condensed by the adsorption method and its concentration is analyzed using the thermal decomposition method, The concentration of ozone exceeds 90mol% and ozone is supplied for a sufficiently long time to grow oxide thin films. Investigation of the ozone decomposition rate demonstrates that ozone can be transferred into the film growth chamber without marked decomposition. The ozone concentration is also evaluated using a quardrupole mass analyzer and the accuracy of this method is compared with the results of the thermal decomposition method.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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• pp.331-332
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• 2005

Ozone is ambient gas which is useful for the fabrication of metal oxide thin films under conditions of molecular beam epitaxy. Ozone is condensed by the adsorption method and its concentration is analyzed using the thermal decomposition method. The concentration of ozone exceeds 90 mol% and ozone is supplied for a sufficiently long time to grow oxide thin films. The ozone concentration is also evaluated using a quadrupole mass analyzer and the accuracy of this method is compared with the results of the thermal decomposition method.

• Journal of Astronomy and Space Sciences
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• 제7권1호
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• pp.1-10
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• 1990

The thermodynamic distribution of the vibrational states of ozone coupled with anharmonic predissociation produces an unusual isotopomeric pattern of oxygen molecules. The model presented here explains the experimental data obtained from the electric discharge of oxygen gas to produce ozone condensed on a quartz at 77K.

• 한국공작기계학회논문집
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• 제14권4호
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• pp.69-74
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• 2005

Nowadays CFC and HCFC refrigerants are restricted because they causes to depletion of ozone layer. Accordingly, an experiment is apply to the $NH_3$ gas for refrigerant to study the performance characteristic and to improve the energy efficiency. An experiment are carried out for the condensed pressure in a range from 14.5bar to 16bar and for degree of superheat in a range from 0 to $10^{\circ}C$ at each condensed pressure. As the result of experiment, when degree of superheat is $1^{\circ}C$ and condensed pressure is 14.5bar, the refrigeration system showed the high performance.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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• pp.537-538
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• 2006

BSCCO thin films have been fabricated by epitaxy growth at an ultra-low growth rate. The growth rates of the films was set in the region from 0.17 to 0.27 nm/min. MgO(100) was used as a substrate. In order to appreciate stable existing region of Bi 2212 phase with temperature and ozone pressure, the substrate temperature was varied between 650 and $720^{\circ}C$ and the highly condensed ozone gas pressure ($PO_3$) in vacuum chamber was varied between $2.0{\times}10^{-6}$ and $2.3{\times}10^{-5}\;Torr$.

• E2M - 전기 전자와 첨단 소재
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• 제10권5호
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• pp.425-433
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• 1997

BSCCO thin films have been fabricated by co-deposition at an ultralow growth rate using ion beam sputtering(IBS) method. The growth rates of the films was set in the region from 0.17 to 0.27 nm/min. MgO(100) was used as a substrate. In order to appreciate stable existing region of Bi 2212 phase with temperature and ozone pressure, the substrate temperature was varied between 655 and 82$0^{\circ}C$ and the highly condensed ozone gas pressure(PO$_3$) in vacuum chamber was varied between 2.0$\times$10$^{-6}$ and 2.3$\times$10$^{-5}$ Torr. Bi 2212 phase appeared in the temperature range of 750 and 795$^{\circ}C$ and single phase of Bi 2201 existed in the lower region than 785$^{\circ}C$. Whereas, PO$_3$dependance on structural formation was scarcely observed regardless of the pressure variation. And high quality of c-axis oriented Bi 2212 thin film with T$_{c}$(onset) of about 90 K and T$_{c}$(zero) of about 45 K is obtained. Only a small amount of CuO in some films was observed as impurity, and no impurity phase such as CaCuO$_2$was observed in all of the obtained films.lms.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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• pp.1071-1074
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• 2002

This paper presents Bi thin films have been fabricated by atomic layer-by-layer deposition and co-deposition at an IBS method. The growth rates of the films was set in the region from 0.17 to 0.27 nm/min. MgO(100) was used as a substrate. In order to appreciate stable existing region of Bi 2212 phase with temperature and ozone pressure, the substrate temperature was varied between 655 and $820^{\circ}C$ and the highly condensed ozone gas pressure$(PO_3)$ in vacuum chamber was varied between $2.0{\times}10^{-6}$ and $2.3{\times}10^{-5}Torr$. Bi 2212 phase appeared in the temperature range of 750 and $795^{\circ}C$: and single phase of Bi 2201 existed in the lower region than $785^{\circ}C$. Whereas, $PO_3$ dependance on structural formation was scarcely observed regardless of the pressure variation. And high quality of c-axis oriented Bi 2212 thin film with $T_c$(onset) of about 90 K and $T_c$(zero) of about 45 K is obtained. Only a small amount of CuO in some films was observed as impurity, and no impurity phase such as $CaCuO_2$ was observed in all of the obtained films.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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• pp.671-674
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• 2004

BSCCO thin films have been fabricated by epitaxy growth at an ultra-low growth rate. The growth rates of the films was set in the region from 0.17 to 0.27 nm/min. MgO(100) was used as a substrate. In order to appreciate stable existing region of Bi 2212 phase with temperature and ozone pressure, the substrate temperature was varied between 655 and 820 $^{\circ}C$ and the highly condensed ozone gas pressure(PO3) in vacuum chamber was varied between $2.0{\times}10^{-6}$ and $2.3{\times}10^{-5}$ Torr. Bi 2212 phase appeared in the temperature range of 750 and 795 $^{\circ}C$ and single phase of Bi 2201 existed in the lower region than $785\;^{\circ}C$. Whereas, $PO_3$ dependance on structural formation was scarcely observed regardless of the pressure variation. And high quality of c-axis oriented Bi 2212 thin film with $T_c$(onset) of about 90 K and $T_c$(zero) of about 45 K is obtained. Only a small amount of CuO in some films was observed as impurity, and no impurity phase such as $CaCuO_2$ was observed in all of the obtained films.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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• pp.278-280
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• 2001

BSCCO thin films have been fabricated by co-deposition at an ultralow growth rate using ion beam sputtering(IBS) method. The growth rates of the films was set in the region from 0.17 to 0.27 nm/min. MgO(100) was used as a substrate. In order to appreciate stable existing region of Bi 2212 phase with temperature and ozone pressure, the substrate temperature was varied between 655 and $820^{\circ}C$ and the highly condensed ozone gas pressure($PO_3$) in vacuum chamber was varied between $2.0{\times}10^{-6}$ and $2.3{\times}10^{-5}$ Torr. Bi 2212 phase appeared in the temperature range of 750 and $795^{\circ}C$ and single phase of Bi 2201 existed in the lower region than $785^{\circ}C$. Whereas, $PO_3$ dependance on structural formation was scarcely observed regardless of the pressure variation. And high quality of c-axis oriented Bi 2212 thin film with $T_c$(onset) of about 90 K and $T_c$(zero) of about 45 K is obtained. Only a small amount of CuO in some films was observed as impurity, and no impurity phase such as $CaCuO_2$ was observed in all of the obtained films.