• 한국물환경학회지
• /
• 제23권3호
• /
• pp.314-318
• /
• 2007

The feasibility of the employment of waste oyster shell as an adsorbent for fluoride ion has been tested by considering the effect ionic condition on the adsorption of fluoride ion on oyster shell. The adsorption capacity of oyster shell for fluoride ion was found not to be significantly influenced by the ionic strength of aqueous environment. The existence of complexing agent such as nitrilotriacetic acid in wastewater decreased the adsorbed amount of fluoride ion by forming a stable complex of $CaT^-$ and the adsorption reaction of fluoride ion on oyster shell was examined to be endothermic. The coexisting heavy metal ionic adsorbate in wastewater hindered the adsorption of fluoride ion, however, its adsorbed amount was increased as the particulate size of adsorbent was decreased. Finally, a serial adsorption column test has been conducted for a practical application of adsorption process and the breakthrough of the column adsorption was observed in 22 hours under the experimental condition.

• 대한화학회지
• /
• 제35권5호
• /
• pp.520-526
• /
• 1991

Dinonylnaphthalene sulfonic acid(DNNS) 양이온 교환체와 tartaric acid 착화제를 이용하는 동적계에서 희토류원소의 용리거동을 연구하였다. 등용매 용리에서 logK' vs log$[NH^{4+}]$ 및 logK' vslog[tar-tarate]의 관계가 직선으로 나타났다. Tartaric acid에 대한 기울기 용리에서 logK' vs logR의 관계의 기울기값은 초기 농도가 낮을수록 증가하였다. DNNS 이온교환체에서 히토류 원소의 분리관 효율 및 분해능은 tartaric acid 용리제보다 ${\alpha}$-hydroxyisobutyric acid 용리제가 더 우수한 결과를 주었다.

• 한국표면공학회:학술대회논문집
• /
• 한국표면공학회 2018년도 춘계학술대회 논문집
• /
• pp.33.1-33.1
• /
• 2018

pH is expressed mathematically as $pH=-{\log}[H^+]$, is a measure of the hydrogen ion concentration, [$H^+$] to specify the acidity or basicity of an aqueous solution. The pH scale usually ranges from 0 to 14. Every aqueous solution can be measured to determine its pH value. The pH values below 7.0 express the acidity, above 7.0 are alkalinity and pH 7.0 is a neutral solution. The solution pH can be determined by indicator or by measurement using pH sensor, which measuring the voltage generated between a glass electrode and a reference electrode according to the Nernst Equation. The pH value of solutions depends on the temperature and the activity of contained ions. In nickel electroless plating process, the controlled pH value in some limited ranges are extremely important to achieve optimal deposition rate, phosphorus content as well as solution stability. Basically, nickel electroless plating solution contains of $Ni^{2+}ions$, reducing agent, buffer and complexing agents. The plating processes are normally carried out at $82-92^{\circ}C$. However, the change of its pH values with temperatures does not follow any rule. Thus, the purpose of study is to understand the relationship between pH and temperature of some based solutions and electroless nickel plating solutions. The change of pH with changing temperatures is explained by view of the thermal dynamic and the practical measurements.

• 공업화학
• /
• 제17권5호
• /
• pp.561-564
• /
• 2006

$SnO_{2}$가 도핑된 아나타제형의 $TiO_{2}$ 분말을 tin (IV) bis (acetylacetonate) dichloride와 titanium diisopropoxide bis (acetyl- acetonate)를 출발물질로, polyethylene glycol (PEG)을 첨가하여 합성하였다. 반응과정에 대한 구조변화를 FT-IR로 추적하였고, 입자의 모양과 형태 및 결정의 구조는 FE-SEM과 XRD 분석기로 관찰하였다. 합성된 분말의 광촉매 효과는 환경오염물질로 indigo carmine (IC)을 선택하여 UV-visible 스펙트라로 관찰하였다.

• 한국재료학회:학술대회논문집
• /
• 한국재료학회 2009년도 춘계학술발표대회
• /
• pp.34.2-34.2
• /
• 2009

The silver sulphide (Ag2S) thin films have been chemically deposited from an alkaline medium (pH 8 to 10) by using a silver nitrate and thiourea as a Ag and S ion precursor sources. Ethylene Damine tetraacetic acid (EDTA) was used as a complexing agent. The effect of annealing atmosphere such as Ar, N2+H2S and O2 on the structural, morphological and optical properties of Ag2S thin films has been studied. The annealed films were characterized by using X-ray diffraction (XRD), scanning electron microscopy (SEM) and optical absorption techniques for the structural, morphological, and optical properties, respectively. XRD studies reveal that the as-deposited thin films are polycrystalline with monoclinic crystal structure, is converted in to silver oxide after air annealing. The surface morphology study shows that grains are uniformly distributed over the entire surface of the substrate. Optical absorption study shows the as-deposited Ag2S thin films with band gap energy of 0.92eV and after air annealing it is found to be 2.25 eV corresponding to silver oxide thin films.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
• /
• pp.162-165
• /
• 2003

The corrosion characteristics of diffusion barrier in Copper CMP has been investigated. Key experimental variables that has been investigated are the corrosion rate by different agents containing slurry of Cu CMP. Whenever Cu and Ta films were corroded adding each oxidizer, the corrosion rate of Ta was much lower than that of Cu. That is, the difference in the corrosion rates of Ta by oxidizer was not larger as compared with Cu. As corroded by complexing agents, the corrosion rate of Ta was close to O. The corrosion rate of Ta increased as added $HNO_3$ and $CH_3COOH$ compared with the reference slurry; on the other hand, it decreased with addition of HF. In addition, resulting corrosion rate went up with lower pH of agent. The corrosion rates by agents were however significant small; hence, it doesn't affect on the removal rate of Cu CMP practically. Consequently, this can be explained by assuming that the mechanical effect dominates than the chemical effect on the polishing rate of Ta(TaN).

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
• /
• pp.339-342
• /
• 2003

The corrosion characteristics of Copper by oxidizers in Cu CMP slurry has been investigated. Key experimental variables that has been investigate are the corrosion rate by different oxidizers containing slurry of Cu CMP. Oxidizers in Cu CMP slurry reacts with Cu surfaces to raise the oxidation state of the metal via a reduction-oxidation reaction, resulting in either dissolution of the Cu or the formation of Ta surface film on the metal.[1] When Cu films were corroded adding each oxidizer, corrosion rate increased as much as higher Icorrosion. The corrosion rate of Cu was the largest as added $(NH_4)_2S_2O_8$. The higher content of Urea Hydrogen peroxide was, the higher corrosion rate was measured. Putting in tartaric acid as complexing agent, the corrosion rates of the compounds(Urea hydrogen peroxide+$H_2O_2$) are uniformly. As a result of Cu corrosion by $Cu(NO_3)_2$, the high corrosion rate was determined by even small amounts of $Cu(NO_3)_2$. Consequently, this can be explained by assuming that corrosion by oxidizers has primary effects on the removal rate of Cu and the proper oxidizer needs to be chosen in accordance with relationship of each slurry agent.

• Bulletin of the Korean Chemical Society
• /
• 제33권2호
• /
• pp.519-523
• /
• 2012

A kinetic study is reported on nucleophilic displacement reactions of benzyl 2-pyridyl carbonate 6 with alkalimetal ethoxides, EtOM (M = Li, Na, and K), in anhydrous ethanol at $25.0{\pm}0.1^{\circ}C$. The plots of pseudo-firstorder rate constant $k_{obsd}$ vs. [EtOM] curve upward, a typical phenomenon reported previously for alkaline ethanolysis of esters in which alkali-metal ions behave as a Lewis-acid catalyst. The kobsd value for the reaction of 6 with a fixed EtOK concentration decreases rapidly upon addition of 18-crown-6-ether (18C6), a complexing agent for $K^+$ ion up to [18C6]/[EtOK] = 1.0 and then remains constant thereafter, indicating that the catalytic effect exerted by K+ ion disappears in the presence of excess 18C6. The reactivity of EtOM towards 6 increases in the order $EtO^-$ < EtOLi < EtONa < EtOK, which is contrasting to the reactivity order reported for the corresponding reactions of 2-pyridyl benzoate 4, i.e., $EtO^-$ < EtOK < EtONa < EtOLi. Besides, 6 is 1.7 and 3.5 times more reactive than 4 towards dissociated $EtO^-$ and ion-paired EtOK, respectively. The reactivity difference and the contrasting metal-ion selectivity are discussed in terms of electronic effects and transition-state structures.

• 대한화학회지
• /
• 제52권2호
• /
• pp.140-147
• /
• 2008

추출- 전열 원자 흡수 분광법에 대한 새로운 시도가 비스머스 측정에 사용되었다.수용액 분석물은 황산으로 산성화하였다(pH 3.0-3.5). Triton X-114는 계면활성제로 가하였고, natriumdiethyldithiocarbaminat(Na-DDTC)는 착체 시약으로 사용했다. 혼합물의 흐림점 분리를 기저로한 50oC에서 상분리 후에 많은 계면활성제는 tetrahydrofuran(THF)로 희석했다. 농축 용액의 20L와 화학개질제로 0.1% (w/v) Pd(NO3)2를 10? 그라파이트 튜브안으로 분산시켰다. 분석물은 전열 원자 흡수 분광법으로 측정했다. 추출 조건과 기기 파라메타의 최적화 후에 195의 예비농축 인자를 10mL의 시료에서 얻었다. 검출한계는 0.04 ng ml1 분석곡선은 0.04-0.70 ng mL1의 농도범위에서 선형을 얻었다. 상대표준편차는 5% 보다 적었다. 이 방법은 성공적으로 추출과 물시료에서 비스머스 추출과 검출에 적용되었다.

• 대한화학회지
• /
• 제51권2호
• /
• pp.141-146
• /
• 2007

2-mercaptobenzimidazol을 착화제로 사용하여 천연수 중 흔적량의 구리를 분리-예비농축-정량하는 과정을 보고한다. 이 방법은 황산소듐도데실과 γ-알루미나를 물속에서 혼합할 때 γ-알루미나 위에 형성되는 계면활성제 응집체에 기반을 두고 있는데, 2-mercaptobenzimidazol이 산성 매질 속에서 생성된 부가미셀 내부의 소수성 부분으로 들어가 구리 이온의 예비농축과 정량에 적합한 조립체가 된다. 수용액으로부터 μg/ml 수준의 구리이온을 흡착제로 흡착하는 최적 실험조건을 알아내었다. 구리 이온은 pH 7.1-8.0 범위에서 흡착제에 정량적으로 흡착되며 설포살리산을 용리액으로 사용하여 정량적으로 탈착할 수 있다. 용액 중의 다른 이온은 구리 이온의 정량을 방해하지 않았으며, 이 방법을 강물 분석에 적용하니 상대표준편차가 4.91%였다.