• 한국인쇄학회지
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• 제10권1호
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• pp.35-54
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• 1992

Direct electrostatic coating method is simple, low cost and environmentally useful method. We are investigated on the coating of carrier transfer polymer layer on the carrier generate inorganic pigment layer using direct electrostatic coating method. The sample was obtained electrostatic deposite layer by fusing and calendering on the copper phthalocyanine. we could be found several polymer thin film shows good bond properties between film and pigment layer.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.320.1-320.1
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• 2013

We have investigated the effect of surface passivation for crystalline silicon solar cell using ozone-based atomic layer deposited (ALD) $Al_2O_3$. We examined passivation properties such as uniformity, carrier lifetime, thickness, negative fixed charge density at AlOx/Si interface, and reflectance. The influences of process temperature and heat treatment were investigated using microwave photoconductance decay (PCD). Ozone-based ALD $Al_2O_3$ film shows the best carrier lifetime at lower deposition temperature than $H_2O$-based ALD.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2001년도 추계학술대회 논문집 전기물성,응용부문
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• pp.165-167
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• 2001

Emitter injection efficiency of p+/n-buffer Junction with Gaussian impurity distribution is presented. This model takes into account the variation of the carrier lifetime with injection level which allows a unified interpretation of the injection efficiency for all injection level. The injected carrier density and injection efficiency of the anode are calculated as a function of the current density with the low level lifetime as a parameter for different thicknesses of the anode. The analytical results agree well with simulation.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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• pp.216.2-216.2
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• 2015

본 연구에서는 charge pumping method에서 사용되는 변수들의 변화를 이용하여 hot carrier stress가 MOSFET소자의 oxide내에서의 trap 분포에 어떤 영향을 미치는지에 대해서 연구하였다. trap 분포를 확인하기 위해 스트레스 전 후에 reverse bias와 주파수에 따른 trap의 양을 측정 하였다. 스트레스 전과 후에 reverse bias와 주파수가 감소할수록 trap이 증가하는 모습이 나타났고, 스트레스 후에는 전과 비교하여 전반적으로 trap의 양이 증가하였다. 또한, 스트레스 전과 후에 MOSFET소자의 trap density는 center region에서 $2.89{\times}$10^10에서 $1.64{\times}$10^10으로 감소하였고, drain region에서 $2.83{\times}$10^10에서 $5.26{\times}$10^10으로 증가한 것을 확인하였다. 이는 reverse bias와 주파수의 가변에 따라서 trap의 공간적 분포를 측정할 수 있다는 것을 의미한다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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• pp.212.2-212.2
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• 2015

본 연구에서는 용액 공정을 통해 제작한 IGZO, ITZO 박막 트랜지스터의 전기적 특성을 비교, 분석하였다. 실험에 사용된 용액의 농도는 In:Zn:Ga, In:Zn:Sn = 1:1:1로 제작하여 Spin-Coating을 통해 증착하였다. 두 소자 모두 $350^{\circ}C$에서 열처리 공정을 진행한 뒤, 전기적 특성을 측정 및 분석하였다. IGZO 박막 트랜지스터의 경우, Threshold Voltage, S.Swing, Mobility, On/Off ratio가 각각 2.2 V, 0.42, $0.18cm^2/Vs$, $1.5{\times}$10^5로 측정되었으나 ITZO 박막 트랜지스터의 경우, -6.92 V, 0.91, $0.43cm^2/Vs$, $2.1{\times}$10^5 로 IGZO보다 Negative한 방향으로 이동하였다. 이는 Sn이 Ga에 비해 Band gap이 넓고, 산소와의 결합력이 작기 때문에, ITZO 박막 트랜지스터가 Oxygen vacancy형성을 통한 Carrier density가 높은 것으로 판단된다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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• pp.1026-1029
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• 2002

We report the electric properties of organic light emitting diodes (OLEDs) by controlling the carrier density according to the crystalline of copper(II) phthalocyanine(CuPc) and the irradiation light intensity. OLEDs were constructed with indium tin oxaide (ITO)/CuPc/triphenyl-diamin (TPD)/tris-(8-hydroxyquinoline)aluminum (Alq3)/Al. The transport properties of OLEDs were changedby the heat-treatments of CuPc. The irradiation of red and blue light exciting CuPc, TPD and Alq3. And then we observed the carrier density of OLEDs.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.143-144
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• 2008

Single crystal $ZnIn_2S_4$ layers were grown on a thoroughly etched semi-insulating GaAs(100) substrate at $450^{\circ}C$ with the hot wall epitaxy (HWE) system by evaporating the polycrystal source of $ZnIn_2S_4$ at $610^{\circ}C$ prepared from horizontal electric furnace. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of single crystal $ZnIn_2S_4$ thin films measured with Hall effect by van der Pauw method are $8.51\times10^{17}$ electron/$cm^{-3}$, 291 $cm^2$/v-s at 293 K, respectively.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.96-97
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• 2008

Single crystal $AgGaSe_2$ layers were grown on thoroughly etched semi-insulating GaAs(100) substrate at 420 $^{\circ}C$ with hot wall epitaxy (HWE) system by evaporating $AgGaSe_2$ source at 630 $^{\circ}C$. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of single crystal $AgGaSe_2$ thin films measured with Hall effect by van def Pauw method are $9.24\times10^{16}cm^{-3}$ and 295 $cm^2/V{\cdot}s$ at 293 K, respectively.

• 산업기술연구
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• 제16권
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• pp.147-155
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• 1996

There is a considerable interest in tunable DFB-LD for their use in OFDM and coherent optical communications. In this paper, A modeling of ${\lambda}/4$-shifted tunable wavelength three electrode DFB-LD was performed considering the spatial hole burning within a laser diode cavity. The modeling will show design paramenters' requirement for high-speed and broad bandwidth lasers. The simulations of modeling prove that the continuous tuning range is about 3nm and the SMSR is about several dB. We showed that the optical power and carrier density distribution along z for several dc current with SHB. It was shown that prove that optical power and carrier density along cavity are changed and thismeans that modeling is correct.

• Transactions on Electrical and Electronic Materials
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• 제6권6호
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• pp.280-283
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• 2005

The moving photocarrier grating (MPG) technique for the determination of the carrier mobilities and the recombination lifetime of $\alpha$-Se:As films has been studied. The electron and hole drift mobility and the recombination lifetime of $\alpha$-Se films with arsenic (As) additions have been obtained from measurement of the short circuit current density $j_{sc}$ as a function of grating velocity and spatial period. The hole mobility decreases due to defect density of hole traps when x exceeds 0.003, whereas the hole mobility increases for the case of low As addition (x$\le$0.003). We have found an increase in hole drift mobility and recombination lifetime, especially when As with (x = 0.003) is added into the $\alpha$-Se film.