Effect of nitrogen concentration on the microstructures of AlN thin films fabricated by reactive RF sputtering (반응성 RF 마그네트론 스퍼터링으로 증착한 AlN 박막의 특성에 질소농도 변화가 미치는 영향)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2008.06a
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- pp.367-367
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- 2008