• 제목/요약/키워드: c-axis oriented film

검색결과 137건 처리시간 0.035초

$Bi_2Sr_2Ca_1Cu_2O_x$ 조성으로 제작된 박막의 결정상에 대한 고용비 해석 (Analysis of the Staking Fault in Crystalline Phase of Thin Films Fabricated by $Bi_2Sr_2Ca_1Cu_2O_x$ Composition)

  • 양승호;이호식;박용필
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2007년도 춘계종합학술대회
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    • pp.524-527
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    • 2007
  • 이온 빔 스퍼터법을 이용하여 저속성장으로 동시 증착에 의해 $Bi_2Sr_2Ca_{n-1}Cu_nO_x$(n=0, 1, 2) 박막을 제작하였다. Bi 2212 상은 기판온도 $750\sim795^{\circ}C$의 범위에서 나타났으며, $750^{\circ}C$보다 저온 측에서는 Bi 2201의 단일강이 존재하였나. 그러나, 조성과 관계되는 $PO_3$에 대해서 크게 변하지 않았다. 그리고 임계온도(Tc)가 $45\sim90K$ 가지는 c축 배향한 고품질의 Bi 2212 박막을 얻었다. 소수의 박막에서는 소량의 CuO가 불순물로 관찰되었으며, 얻어진 모든 박막에서 $CaCuO_2$의 불순물 상은 관찰되지 않았다.

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결정상에 대한 고용체가 $Bi_2Sr_2Ca{_{n-1}}Cu_nO_x$(n=0,1,2) 박막의 특성에 미치는 영향 (Influence of the Solid Solution for Crystalline Phase on the Characterization of $Bi_2Sr_2Ca{_{n-1}}Cu_nO_x$(n=0,1,2) Thin Films)

  • 양승호;이호식;박용필
    • 한국정보통신학회논문지
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    • 제11권6호
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    • pp.1115-1121
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    • 2007
  • 이온 빔 스퍼터법을 이용하여 저속성장으로 동시 증착에 의해 $Bi_2Sr_2Ca{_{n-1}}Cu_nO_x$(n=0,1,2) 박막을 제작하였다. Bi 2212 상은 기판온도 $750{\sim}795^{\circ}C$의 범위에서 나타났으며, $750^{\circ}C$보다 저온 측에서는 Bi 2201의 단일상이 존재하였다. 그러나, 조성과 관계되는 $PO_3$은 압력 변화에 대해서는 관찰되지 않았다. 그리고 $45{\sim}90K$의 임계온도(Tc)를 갖는 c축 배향한 고품질의 Bi 2212 박막을 얻었다. 소수의 박막에서는 소량의 CuO가 불순물로 관찰되었으며, 얻어진 모든 박막에서 $CaCuO_2$ 의 불순물 상은 관찰되지 않았다.

Ga 도핑된 ZnO 박막의 기판에 따른 성장 특성 (Effect of substrate on growth of Ga-doped ZnO thin films)

  • 김지홍;노지형;류경진;문성준;김재원;도강민;문병무;구상모
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.296-296
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    • 2010
  • In this work, we report the effect of substrate on the growth of Ga-doped ZnO (GZO) thin films. GZO thin films were deposited on various substrates by using pulsed laser deposition (PLD). The structural properties, surface morphologies, and electrical properties were investigated. From the results of HRXRD, c-plane (0002) oriented growth of GZO films was confirmed on $Al_2O_3$ (0001). On the other hand, the GZO films on LAO (100) substrates were grown along the a-axis. The obvious differences on the electrical properties of each film were also obtained.

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다결정 AIN 박막을 이용한 800 MHz 대 표면탄성파 대역통과 필터개발에 관한 연구 (A Stydy on the Development of 800 MHz band Pass Fiters using Polycrystal AIN Film)

  • 이형규;최익권;용윤중;이재영
    • 한국전자파학회논문지
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    • 제8권4호
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    • pp.382-389
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    • 1997
  • 본 논문에서는 다결정 AlN 박막을 이용하여 800 MHz 대역의 표면탄성파 펼터를 시험제작한 연구 결과를 제시한다. 고주파 스퍼터링 방법에 의하여 실리콘 기판위에 증착시켜 X선 rocking curve의 반치폭이 $3^{\circ}$이고 박막 성장 방향으로 결정의 c축이 우선 배향된 박막을 얻었다. 임펄수 모텔링 기법을 이용하여 시험제작된 표면탄성파 필터는 중심주파수 865 MHz, 3 dB 대역폭 45 MHz이며 측정된 주파수 응답곡선으로부터 유도된 전기기계 결합상수는 0.8 %, 표면탄성파 전달속도는 5,709 m/s이다.

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직류 Magnetron Sputter 법으로 제막된 ZnO : Al 박막의 전기광학 특성 (Electrical and Optical Properties of ZnO : Al Films Prepared by the DC Magnetron Sputtering System)

  • 김의수;유세웅;유병석;이정훈
    • 한국세라믹학회지
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    • 제32권7호
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    • pp.799-808
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    • 1995
  • Transparent conductive films of aluminium doped zinc oxide (AZO) have been prepared by using the DC magnetron sputtering with the ZnO : Al (Al2O3 2 wt%) oxide target oriented to c-axis. Electrical and optical properties depended upon the O2/Ar gas ratio. The optical transmittance and sheet resistance of the AZO coated glass was 60~65% and 75Ω/$\square$, respectively at the O2/Ar gas ratio of 0. With the increase of the oxygen partial pressure to 2.0$\times$10-2, they were increased to the values of 81% and 1kΩ/$\square$, respectively. The films with the resistivities of 1.2~1.4$\times$10-3 Ω.cm, mobilities of 11~13 $\textrm{cm}^2$/V.sec and carrier concentrations of 3.5$\times$1020~4.0$\times$1020/㎤ were produced at the optimum O2/Ar gas ratio, which was 0.5$\times$10-2~1.0$\times$10-2. According to XRD analysis, the films have only one peak corresponding to the (002) plane, which indicates that there is a strong preferred orientation of the films. The grain size of ZnO films were calculated to 200~320 $\AA$, which was increased with the O2/Ar gas ratio and Ar gas flowrate.

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In 도핑된 ZnO 박막의 투명 전극과 유기 발광 다이오드 특성 (Transparent Anodic Properties of In-doped ZnO thin Films for Organic Light Emitting Devices)

  • 박영란;김용성
    • 한국세라믹학회지
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    • 제44권6호
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    • pp.303-307
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    • 2007
  • Transparent In-doped zinc oxide (IZO) thin films are deposited with variation of pulsed DC power at Ar atmosphere on coming 7059 glass substrate by pulsed DC magnetron sputtering. A c-axis oriented IZO thin films were grown in perpendicular to the substrate. The optical transmittance spectra showed high transmittance of over 80% in the UV-visible region and exhibited the absorption edge of about 350 nm. Also, the IZO films exhibited the resistivity of ${\sim}10^{-3}{\Omega}\;cm$ and the mobility of ${\sim}6cm/V\;s$. Organic Light-emitting diodes (OLEDs) with IZO/N,N'-diphenyl-N, N'-bis(3-methylphenl)-1, 1'-biphenyl-4,4'-diamine (TPD)/tris (8-hydroxyquinoline) aluminum ($Alq_3$)/LiF/Al configuration were fabricated. LiF layer inserted is used as an interfacial layer to increase the electron injection. Under a current density of $100\;mA/cm^2$, the OLEDs show an excellent efficiency (9.4 V turn-on voltage) and a good brightness ($12000\;cd/m^2$) of the emission light from the devices. These results indicate that IZO films hold promise for anode electrodes in the OLEDs application.

졸-겔법에 의한 $GdAlO_3$ 버퍼층의 제조 (DFabrication of $GdAlO_3$ Buffer Layers by Sol-Gel Processing)

  • 방재철
    • 한국산학기술학회논문지
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    • 제7권5호
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    • pp.801-804
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    • 2006
  • [ $YBa_2Cu_3O_{7-{\delta}}(YBCO)$ ]계 초전도 선재용 $GdAlO_3(GAO)$ 버퍼층을 졸-겔(sol-gel) 공정에 의해 제조하였다. 전구체 용액은 Gd 질산염과 Al 질산염을 1:1 화학양론비로 하여 메탄올에 용해하여 준비하였다. 전구체 용액을 $SrTiO_3(STO)$ (100) 단결정 기판위에 스핀 코팅하고, 수분이 포함된 $N_2-5%\; H_2$ 분위기에서 $1000^{\circ}C$에서 2시간 열처리 하였다. 열처리 후 GAO 층의 표면에 대한 주사전자현미경 관찰에 의해 GAO 층이 에피택셜의 특징인 각면 형상을 갖는 것을 알 수 있었다. X-선 회절분석에 의하면 GAO 버퍼층은 c-축으로 우선 배향된 에피택셜 박막으로써 반가폭이 각각 (002)면에서 $0.29^{\circ}(out-of-plane)$, {112}지면에서 $1.10^{\circ}(in-plane)$의 우수한 배향성을 나타내었다.

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Growth and characterization of molecular beam epitaxy grown GaN thin films using single source precursor with ammonia

  • Chandrasekar, P.V.;Lim, Hyun-Chul;Chang, Dong-Mi;Ahn, Se-Yong;Kim, Chang-Gyoun;Kim, Do-Jin
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.174-174
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    • 2010
  • Gallium Nitride(GaN) attracts great attention due to their wide band gap energy (3.4eV), high thermal stability to the solid state lighting devices like LED, Laser diode, UV photo detector, spintronic devices, solar cells, sensors etc. Recently, researchers are interested in synthesis of polycrystalline and amorphous GaN which has also attracted towards optoelectronic device applications significantly. One of the alternatives to deposit GaN at low temperature is to use Single Source Molecular Percursor (SSP) which provides preformed Ga-N bonding. Moreover, our group succeeds in hybridization of SSP synthesized GaN with Single wall carbon nanotube which could be applicable in field emitting devices, hybrid LEDs and sensors. In this work, the GaN thin films were deposited on c-axis oriented sapphire substrate by MBE (Molecular Beam Epitaxy) using novel single source precursor of dimethyl gallium azido-tert-butylamine($Me_2Ga(N_3)NH_2C(CH_3)_3$) with additional source of ammonia. The surface morphology, structural and optical properties of GaN thin films were analyzed for the deposition in the temperature range of $600^{\circ}C$ to $750^{\circ}C$. Electrical properties of deposited thin films were carried out by four point probe technique and home made Hall effect measurement. The effect of ammonia on the crystallinity, microstructure and optical properties of as-deposited thin films are discussed briefly. The crystalline quality of GaN thin film was improved with substrate temperature as indicated by XRD rocking curve measurement. Photoluminescence measurement shows broad emission around 350nm-650nm which could be related to impurities or defects.

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AlN/PSS Template 위에 HVPE로 성장한 GaN 막의 특성 (Properties of GaN Film Grown on AlN/PSS Template by Hydride Vapor Phase Epitaxy)

  • 손호기;이영진;이미재;김진호;전대우;황종희;이혜용
    • 한국전기전자재료학회논문지
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    • 제29권6호
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    • pp.348-352
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    • 2016
  • In this paper, GaN film was grown on AlN/PSS by hydride vapor phase epitaxy compared with GaN on planar sapphire. Thin AlN layer for buffer layer was deposited on patterned sapphire substrate (PSS) by metal organic chemical vapor deposition. Surface roughness of GaN/AlN on PSS was remarkably decreased from 28.31 to 5.53 nm. Transmittance of GaN/AlN grown on PSS was lower than that of planar sapphire at entire range. XRD spectra of GaN/AlN grown on PSS corresponded the wurzite structure and c-axis oriented. The full width at half maximum (FWHM) values of ${\omega}$-scan X-ray rocking curve (XRC) for GaN/AlN grown on PSS were 196 and 208 arcsec for symmetric (0 0 2) and asymmetric (1 0 2), respectively. FWHM of GaN on AlN/PSS was improved more than 50% because of lateral overgrowth and AlN buffer effect.

Power Enhancement of ZnO-Based Piezoelectric Nanogenerators Via Native Defects Control

  • Kim, Dohwan;Kim, Sang-Woo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.297.2-297.2
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    • 2013
  • Scavenging electricity from wasteful energy resources is currently an important issue and piezoelectric nanogenerators (NGs) based on zinc oxide (ZnO) are promising energy harvesters that can be adapted to various portable, wearable, self-powered electronic devices. Although ZnO has several advantages for NGs, the piezoelectric semiconductor material ZnO generate an intrinsic piezoelectric potential of a few volts as a result of its mechanical deformation. As grown, ZnO is usually n-type, a property that was historically ascribed to native defects. Oxygen vacancies (Vo) that work as donors exist in ZnO thin film and usually screen some parts of the piezoelectric potential. Consequently, the ZnO NGs' piezoelectric power cannot reach to its theoretical value, and thus decreasing the effect from Vo is essential. In the present study, c-axis oriented insulator-like sputtered ZnO thin films were grown in various temperatures to fabricate an optimized nanogenerator (NGs). The purity and crystalinity of ZnO were investigated with photoluminescence (PL). Moreover, by introducing a p-type polymer usually used in organic solar cell, it was discussed how piezoelectric passivation effect works in ZnO thin films having different types of defects. Prepared ZnO thin films have both Zn vacancies (accepter like) and oxygen vacancies (donor like). It generates output voltage 20 time lager than n-type dominant semiconducting ZnO thin film without p-type polymer conjugating. The enhancement is due to the internal accepter like point defects, zinc vacancies (VZn). When the more VZn concentration increases, the more chances to prevent piezoelectric potential screening effects are occurred, consequently, the output voltage is enhanced. Moreover, by passivating remained effective oxygen vacancies by p-type polymers, we demonstrated further power enhancement.

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