• Title/Summary/Keyword: c-Si :H

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Investigation of annealing effect for a-SiC:H thin films deposited by plasma enhanced chemical vapor deposition (플라즈마 화학기상 증착방식으로 성장시킨 비정질 실리콘 카바이드 박막의 열처리 효과에 관한 특성분석)

  • 박문기;김용탁;최원석;윤대호;홍병유
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.747-750
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    • 2000
  • In this work, we investigated the dependence of optical and electrical properties of amorphous hydrogenated SiC (a-SiC:H) films on annealing temperature(T$\sub$a/). The a-SiC:H films were deposited by PECVD(plasma enhanced vapor deposition) on coming glass, p-type Si(100) wafer using SiH$_4$+CH$_4$+N$_2$gas mixture. The experimental results have shown that the optical energy band gap(E$\sub$g/) of the a-SiC thin films unchanged in the range of T$\sub$a/ from 400$^{\circ}C$ to 600$^{\circ}C$. The Raman spectrum of the thin films, annealed at high temperatures, has shown that graphitization of carbon clusters and micro-crystalline silicon occurs. The current-voltage characteristics have shown good electrical properties at the annealed films.

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Glass / p ${\mu}c-Si:H$ 특성에 따른 i ${\mu}c-Si:H$ 층 및 태양전지 특성 변화 분석

  • Jang, J.H.;Lee, J.E.;Kim, Y.J.;Jung, J.W.;Park, S.H,;Cho, J.S.;Yoon, K.H.;Song, J.;Park, H.W.;Lee, J.C.
    • 한국신재생에너지학회:학술대회논문집
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    • 2009.06a
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    • pp.31-31
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    • 2009
  • PECVD를 이용하여 제조된 미세결정질 p-i-n 실리콘 박막 태양전지에서, p 층은 태양전지의 윈도우 역할 및 그 위에 증착될 i ${\mu}c-Si:H$ 층의 'seed'층 역할을 수행하기 때문에, p층의 구조적 및 전기적, 광학적 특성은 태양전지의 전체 성능에 큰 영향을 미칠 수 있다. 본 연구에서는 $SiH_4$ 농도를 변화시켜 각기 다른 결정 특성을 갖는 p ${\mu}c-Si:H$층을 제조하고 그 위에 i ${\mu}c-Si:H$ 층을 증착하여 p층의 결정 특성변화와 그에 따른 i ${\mu}c-Si:H$ 층 및 'superstrate' p-i-n 미세결정질 실리콘 박막 태양전지의 특성 변화를 조사하였다. P층의 경우, $SiH_4$ 농도가 증가함에 따라 결정분율 (Xc)이 감소하여 비정질화되었으며 그에 따라 dark conductivity가 감소하는 경향을 나타내었다. 각기 다른 결정분율을 가지는 p 'seed' 층 위에 증착된 태양전지는, p 'seed' 층의 결정분율이 증가함에 따라 개방전압, 곡선인자, 변환효율이 경향적으로 감소하였다. 이는 p 층 결정분율 변화에 따른 p/i 계면특성 저하 및 그 위에 증착되는 i ${\mu}c-Si:H$ 층의 결함밀도 증가 등에 따른 태양전지 특성 감소 때문인 것으로 판단되며, 이를 분석하기 위하여 i ${\mu}c-Si:H$ 층의 전기적, 구조적 특성 분석 및 태양전지의 dark I-V 특성 등을 분석하고자 한다.

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Microstructure and Polytype of in situ-Toughened Silicon Carbide

  • Young Wook Kim;Mamoru Mitomo;Hideki Hirotsuru
    • The Korean Journal of Ceramics
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    • v.2 no.3
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    • pp.152-156
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    • 1996
  • Fine (~0.09 $\mu$m) $\beta$-SiC Powders with 3.3wt% of large (~0.44$\mu$m) $\alpha$-SiC of $\beta$-SiC particles (seeds) added were hotpressed at 175$0^{\circ}C$ using $Y_2O_3$, $Al_2O_3$ and CaO as sintering aids and then annealed at 185$0^{\circ}C$ for 4 h to enhance grain growth. The resultant microstructure and polytypes were analyzed by high resolution electron microscopy (HREM).Growth of $\beta$-SiC with high density of microtwins and formation of ${\alpha}/{\beta}$ composite grains consisting of $\alpha$-SiC domain sandwiched between $\beta$-SiC domains were found in both specimens. When large $\alpha$-SiC (mostly 6H) seeds were added, the $\beta$-SiC transformend preferentially to the 6H polytype. In contrast, when large $\beta$-SiC (3C) seeds were added, the fine $\beta$-SiC transformed preferentially to the 4H polytype. Such results suggested that the polytype formation in SiC was influenced by crystalline form of seeds added as well as the chemistry of sintering aids. The ${\alpha}/{\beta}$ interface played and important role in the formation of elongated grains as evidenced by presence of ${\alpha}/{\beta}$ composite grains with high aspect ratio.

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저가 고효율 실리콘계 (protocrystalline Si/$\mu$c-Si:H) 적층형 박막 태양전지 개발

  • Im, Goeng-Su
    • 한국신재생에너지학회:학술대회논문집
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    • 2005.11a
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    • pp.191-202
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    • 2005
  • 비정질 실리콘 태양전지 대신에 열화가 더 적은 프로터결정 실리콘(pc-Si:H)을 상층전지 흡수층으로 사용한 고효율 실리콘계 적층형(pc-Si:H/$\mu$c-Si:H) 박막 태양전지를 개발하였다. 우선, 높은 전도도와 넓은 에너지 밴드갭 특성을 갖는 p-a-SiC:H 박막을 개발하였고, p/i 계면의 특성 향상을 위해 p-nc-SiC:H 완충층을 개발하였다. 프로터결정 실리콘 다층막을 제작하고 FTIR, 평면 TEM, 단면 TEM 측정을 통해 프로터결정 실리콘 다층막의 우수한 열화 특성의 원인을 규명하였다. 적층형 태양전지의 성능향상을 위해 n-p-p 구조의 터널접합을 제안, 제작하고 특성을 분석하였으며, pc-Si:H/a-Si:H 적층형 태양전지에 적용하여 성능향상을 이루었다. 양질의 하층전지용 마이크로결정 실리콘 박막을 증착하기 위하여 광CVD법과 플라즈마CVD법을 결합한 2단계 마이크로결정 실리콘 증착법을 개발하였다.

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The role of porous graphite plate for high quality SiC crystal growth by PVT method (고품질 4H-SiC 단결정 성장을 위한 다공성 흑연 판의 역할)

  • Lee, Hee-Jun;Lee, Hee-Tae;Shin, Hee-Won;Park, Mi-Seon;Jang, Yeon-Suk;Lee, Won-Jae;Yeo, Im-Gyu;Eun, Tai-Hee;Kim, Jang-Yul;Chun, Myoung-Chul;Lee, Si-Hyun;Kim, Jung-Gon
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.25 no.2
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    • pp.51-55
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    • 2015
  • The present research is focused on the effect of porous graphite what is influenced on the 4H-SiC crystal growth by PVT method. We expect that it produces more C-rich and a change of temperature gradient for polytype stability of 4H-SiC crystal as adding the porous graphite in the growth cell. The SiC seeds and high purity SiC source materials were placed on opposite side in a sealed graphite crucible which was surrounded by graphite insulator. The growth temperature was around $2100{\sim}2300^{\circ}C$ and the growth pressure was 10~30 Torr of an argon pressure with 5~15 % nitrogen. 2 inch $4^{\circ}$ off-axis 4H-SiC with C-face (000-1) was used as a seed material. The porous graphite plate was inserted on SiC powder source to produce a more C-rich for polytype stability of 4H-SiC crystal and uniform radial temperature gradient. While in case of the conventional crucible, various polytypes such as 6H-, 15R-SiC were observed on SiC wafers, only 4H-SiC polytype was observed on SiC wafers prepared in porous graphite inserted crucible. The defect level such as MP and EP density of SiC crystal grown in the conventional crucible was observed to be higher than that of porous graphite inserted crucible. The better crystal quality of SiC grown using porous graphite plate was also confirmed by rocking curve measurement and Raman spectra analysis.

Characterization of 6H-SiC Single Crystals grown by Sublimation Method

  • Kim, Hwa-Mok;Kang, Seung-Min;Kyung Joo;Auh, Keun-Ho
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1997.06a
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    • pp.261-263
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    • 1997
  • 6H-SiC single crystals were successfully grown by the self-designed sublimation apparatus and the optimum growth condition was established. The grown SiC crystals were about 33mm in diameter and 10mm in length. Carrier concentration and doping type of undopped 6H-SiC wafer grown by sublimation method were 1016∼1017/㎤ and n-type Crystallinity of grown 6H-SiC wafer was better than of Acheson seed by data of Raman spectroscopy and Double Crystal XRD. We continue to characterize the grown 6H-SiC wafer in more detail and so we will grow the high-quality 6H-SiC single crystal wafer.

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Effects $H_2$ carrier gas on the mechanical properties of poly 3C-SiC thin films ($H_2$ 캐리어가스가 다결정 3C-SiC 박막의 기계적 특성에 미치는 영향)

  • Han, Ki-Bong;Chung, Gwiy-Sang;Hong, Hoang Sy
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.89-90
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    • 2007
  • This paper presents the mechanical properties of 3C-SiC thin film according to 0, 7, and 10% carrier gas $(H_2)$ concentrations using Nano Indentation. When carrier gas $(H_2)$ concentration was 10%, it has been proved that the mechanical properties, elastic modulus and hardness, of 3C-SiC are the best of them. In the case of 10% carrier gas concentration, Young's modulus and Hardness were obtained as 367 GPa and 36 GPa, respectively. When the surface roughness according to $H_2$ concentrations was investigated by AFM (atomic force microscope), when $H_2$ concentration was 10%, the roughness of 3C-SiC thin was 9.92 nm, which is also the best of them. Therefore, in order to apply poly 3C-SiC thin film to MEMS applications, $H_2$ concentration's rate should increase to obtain better mechanical properties and surface roughness.

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Performance Comparison of Vertical DMOSFETs in Ga2O3 and 4H-SiC (Ga2O3와 4H-SiC Vertical DMOSFET 성능 비교)

  • Chung, Eui Suk;Kim, Young Jae;Koo, Sang-Mo
    • Journal of IKEEE
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    • v.22 no.1
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    • pp.180-184
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    • 2018
  • Gallium oxide ($Ga_2O_3$) and silicon carbide (SiC) are the material with the wide band gap ($Ga_2O_3-4.8{\sim}4.9eV$, SiC-3.3 eV). These electronic properties allow high blocking voltage. In this work, we investigated the characteristic of $Ga_2O_3$ and 4H-SiC vertical depletion-mode metal-oxide-semiconductor field-effect transistors. We demonstrated that the blocking voltage and on-resistance of vertical DMOSFET is dependent with structure. The structure of $Ga_2O_3$ and 4H-SiC vertical DMOSFET was designed by using a 2-dimensional device simulation (ATLAS, Silvaco Inc.). As a result, 4H-SiC and $Ga_2O_3$ vertical DMOSFET have similar blocking voltage ($Ga_2O_3-1380V$, SiC-1420 V) and then when gate voltage is low, $Ga_2O_3-DMOSFET$ has lower on-resistance than 4H-SiC-DMOSFET, however, when gate voltage is high, 4H-SiC-DMOSFET has lower on-resistance than $Ga_2O_3-DMOSFET$. Therefore, we concluded that the material of power device should be considered by the gate voltage.

CO Gas Sensing Characteristic of ZnO Thin Film/Nanowire Based on p-type 4H-SiC Substrate at 300℃ (P형 4H-SiC 기판에 형성된 ZnO 박막/나노선 가스 센서의 300℃에서 CO 가스 감지 특성)

  • Kim, Ik-Ju;Oh, Byung-Hoon;Lee, Jung-Ho;Koo, Sang-Mo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.2
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    • pp.91-95
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    • 2012
  • ZnO thin films were deposited on p-type 4H-SiC substrate by pulsed laser deposition. ZnO nanowires were formed on p-type 4H-SiC substrate by furnace. Ti/Au electrodes were deposited on ZnO thin film/SiC and ZnO nanowire/SiC structures, respectively. Structural and crystallographical properties of the fabricated ZnO thin film/SiC and ZnO nanowire/SiC structures were investigated by field emission scanning electron microscope and X-ray diffraction. In this work, resistance and sensitivity of ZnO thin film/SiC gas sensor and ZnO nanowire/SiC gas sensor were measured at $300^{\circ}C$ with various CO gas concentrations (0%, 90%, 70%, and 50%). Resistance of gas sensor decreases at CO gas atmosphere. Sensitivity of ZnO nanowire/SiC gas sensor is twice as big as sensitivity of ZnO thin film/SiC gas sensor.

Performances of a-Si:H thin-film solar cells with buffer layers at TCO/p a-SiC:H interface (CO/p a-SiC:H 계면의 버퍼층에 따른 비정질 실리콘 박막태양전지 동작특성)

  • Lee, Ji-Eun;Jang, Ji-Hun;Jung, Jin-Won;Park, Sang-Hyun;Jo, Jun-Sik;Yoon, Kyung-Hoon;Song, Jin-Soo;Kim, Dong-Hwan;Lee, Jeong-Chul
    • 한국신재생에너지학회:학술대회논문집
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    • 2009.06a
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    • pp.32-32
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    • 2009
  • 실리콘 박막 태양전지에서 전면 투명전도막(TCO)은 태양전지의 전기, 광학적 특성을 결정하는 중요한 기능을 한다. ZnO:Al TCO는 기존에 사용되던 $SnO_2:F$와는 비정질 실리콘(a-Si:H) 박막 태양전지의 윈도우 층으로 사용되는 p a-SiC:H와의 일함수(work function) 차이로 인해 접촉전위(contact barrier)를 형성하게 되며 이로 인해 태양전지의 충진율(fill factor)이 $SnO_2:F$에 비해 감소하는 단점을 보인다. 본 연구에서는 ZnO:Al/p a-SiC:H 계면의 접촉전위 발생원인 및 태양전지 충진율 감소현상에 관한 정확한 원인규명을 위해 다양한 특성을 갖는 버퍼층을 삽입하여 계면특성 및 태양전지의 동작특성을 분석하고자 한다.

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