• Title/Summary/Keyword: average film thickness

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The Optimization of Indium Zinc Oxide Thin Film Process in Color Filter on Array structure

  • Lee, Je-Hun;Kim, Jin-Suek;Jeong, Chang-Oh;Kim, Shi-Yul;Lim, Soon-Kwon;Souk, Jun-Hyung
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.1244-1247
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    • 2004
  • For obtaining the best panel quality of color filter on array(COA) architecture in TFF LCD, we investigated the influence of deposition temperature, $O_2$ flow, thickness on the optical transmittance, wet etching and adhesion properties of IZO deposited onto each color photo resist(red, green, blue). Average transmittance of the pixel single layer in the visible range(between 380 and 780nm) was mainly affected by thickness and showed maximum at 1250 ${\AA}$ while the thickness showing peak transparency in each R, G, B wavelength was different. The relation was calculated by using bi-layer transmission and reflectance model, which corresponded to experimental data very well. The adhesion of IZO deposited on each color PR was found to have enhanced value except red PR case, compared to that of IZO which was deposited on $SiN_x$. Wet etching pattern linearity was decreased as the thickness increased. The thickness of IZO was one of vital factors in order to optimize overall pixel process for fabricating COA structure.

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Average Flow Model with Elastic Deformation for CMP (화학적 기계 연마를 위한 탄성변형을 고려한 평균유동모델)

  • Kim Tae-Wan;Lee Sang-Don;Cho Yong-Joo
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 2004.11a
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    • pp.331-338
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    • 2004
  • We present a three-dimensional average flow model considering elastic deformation of pad asperities for chemical mechanical planarization. To consider the contact deformation of pad asperities in the calculation of the flow factor, three-dimensional contact analysis of a semi-infinite solid based on the use of influence functions is conducted from computer generated three dimensional roughness data. The average Reynolds equation and the boundary condition of both force and momentum balance are used to investigate the effect of pad roughness and external pressure conditions on film thickness and wafer position angle.

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A Study of Body Surface Area Calculation -Centering around 40 Ages- (체표면적 산출식에 관한 연구 -40대 여성을 중심으로-)

  • Im, Soon
    • The Research Journal of the Costume Culture
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    • v.2 no.2
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    • pp.385-394
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    • 1994
  • Data of the body surface is a necessary unit for the measuring of metabolism energy and activity energy. And also, these data are referring to check the degree of retaining warmth of clothes, to find the effect of heat insulation according to body surface, to calculate an average temperature of skin, and to study the several fields of clothing. In measuring of body surface, it si actually impossible to measure a subject's body surface in each experiment. As the experimental method, both gypsum method, by which the shape of body an be copied as it is, and the weighting method from which planed body surface area can be measured with consistent thickness of polyprophylene film as used. In fact, every female subject feels uncomfortable to measure her body surface as a naked body. There, it is providing a simple, accurate regressive equation with weight & height as variable factors in this study. This equation is as=117.02W+77.31H-3344.94 with average error : 0.1%, absolute average error : 2.07%.

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Growth Behavior of Heteroepitaxial β-Ga2O3 Thin Films According to the Sapphire Substrate Position in the Hot Zone of the Mist Chemical Vapor Deposition System (미스트화학기상증착 시스템의 Hot Zone 내 사파이어 기판 위치에 따른 β-Ga2O3 이종 박막 성장 거동 연구)

  • Kyoung-Ho Kim;Heesoo Lee;Yun-Ji Shin;Seong-Min Jeong;Si-Young Bae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.36 no.5
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    • pp.500-504
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    • 2023
  • In this study, the heteroepitaxial thin film growth of β-Ga2O3 was studied according to the position of the susceptor in mist-CVD. The position of the susceptor and substrate was moved step by step from the center of the hot zone to the inlet of mist in the range of 0~50 mm. It was confirmed that the average thickness increased to 292 nm (D1), 521 nm (D2), and 580 nm (D3) as the position of the susceptor moved away from the center of the hot zone region. The thickness of the lower region of the substrate is increased compared to the upper region. The surface roughness of the lower region of the substrate also increased because the nucleation density increased due to the increase in the lifetime of the mist droplets and the increased mist density. Therefore, thin film growth of β-Ga2O3 in mist-CVD is performed by appropriately adjusting the position of the susceptor (or substrate) in consideration of the mist velocity, evaporation amount, and temperature difference with the substrate, thereby determining the crystallinity of the thin film, the thickness distribution, and the thickness of the thin film. Therefore, these results can provide insights for optimizing the mist-CVD process and producing high-quality β-Ga2O3 thin films for various optical and electronic applications.

Studies on Salmonella enteritidis Contamination in Chicken Egg using Confocal Scanning Laser Microscopy (Confocal Scanning Laser Microscopy 를 이용한 계란에서의 Salmonella enteritidis 오염 연구)

  • Jang, Keum-Il;Park, Jong-Hyun;Kim, Kwang-Yup
    • Korean Journal of Food Science and Technology
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    • v.31 no.3
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    • pp.771-777
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    • 1999
  • The structural function of three egg membrane layers and cuticle layer, and the effectiveness of 5 film coatings (chitosan, starch, gelatin, dextrin, mineral oil) on the prevention of Salmonella enteritidis penetration was investigated using confocal scanning laser microscopy (CSLM). Diameters of outer membrane fibers, inner membrane fibers and limiting membrane particles in eggshell were $1.5{\sim}7.2$, $0.8{\sim}2.0$ and $0.1{\sim}1.4\;{\mu}m$, respectively and average thicknesses were 10.0, 3.5, $3.6\;{\mu}m$, respectively. Average thickness of cuticle layer was $6.0\;{\mu}m$ and cuticle layer covered $40{\sim}80%$ of total eggshell surface. Average coating films thickness for chitosan, starch, gelatin, dextrin and mineral oil were 2.2, 2.5, 3.9, 3.6 and $5.0\;{\mu}m$, respectively. After immersion process eggshell surface was almost completely covered by coating films. Chitosan coating was most effective among 5 film coatings in inhibiting growth of Salmonella enteritidis. Penetration process of Salmonella enteritidis through eggshell was investigated by multicolor imaging using CSLM and plate counting. Cuticle layer was the most important structure in blocking the penetration. Among 5 film coatings, chitosan showed the best and similar effectiveness with cuticle layer.

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Bubbly, Slug, and Annular Two-Phase Flow in Tight-Lattice Subchannels

  • Prasser, Horst-Michael;Bolesch, Christian;Cramer, Kerstin;Ito, Daisuke;Papadopoulos, Petros;Saxena, Abhishek;Zboray, Robert
    • Nuclear Engineering and Technology
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    • v.48 no.4
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    • pp.847-858
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    • 2016
  • An overview is given on the work of the Laboratory of Nuclear Energy Systems at ETH, Zurich (ETHZ) and of the Laboratory of Thermal Hydraulics at Paul Scherrer Institute (PSI), Switzerland on tight-lattice bundles. Two-phase flow in subchannels of a tight triangular lattice was studied experimentally and by computational fluid dynamics simulations. Two adiabatic facilities were used: (1) a vertical channel modeling a pair of neighboring sub-channels; and (2) an arrangement of four subchannels with one subchannel in the center. The first geometry was equipped with two electrical film sensors placed on opposing rod surfaces forming the subchannel gap. They recorded 2D liquid film thickness distributions on a domain of $16{\times}64$ measuring points each, with a time resolution of 10 kHz. In the bubbly and slug flow regime, information on the bubble size, shape, and velocity and the residual liquid film thickness underneath the bubbles were obtained. The second channel was investigated using cold neutron tomography, which allowed the measurement of average liquid film profiles showing the effect of spacer grids with vanes. The results were reproduced by large eddy simulation + volume of fluid. In the outlook, a novel nonadiabatic subchannel experiment is introduced that can be driven to steady-state dryout. A refrigerant is heated by a heavy water circuit, which allows the application of cold neutron tomography.

Electrical and Optical Properties of Al-doped ZnO Films Deposited by Atomic Layer Deposition (Atomic Layer Deposition법에 의한 Al-doped ZnO Films의 전기적 및 광학적 특성)

  • An, Ha-Rim;Baek, Seong-Ho;Park, Il-Kyu;Ahn, Hyo-Jin
    • Korean Journal of Materials Research
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    • v.23 no.8
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    • pp.469-475
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    • 2013
  • Al-doped ZnO(AZO) thin films were synthesized using atomid layer deposition(ALD), which acurately controlled the uniform film thickness of the AZO thin films. To investigate the electrical and optical properites of the AZO thin films, AZO films using ALD was controlled to be three different thicknesses (50 nm, 100 nm, and 150 nm). The structural, chemical, electrical, and optical properties of the AZO thin films were analyzed by X-ray diffraction, X-ray photoelectron spectroscopy, field-emssion scanning electron microscopy, atomic force microscopy, Hall measurement system, and UV-Vis spectrophotometry. As the thickness of the AZO thin films increased, the crystallinity of the AZO thin films gradually increased, and the surface morphology of the AZO thin films were transformed from a porous structure to a dense structure. The average surface roughnesses of the samples using atomic force microscopy were ~3.01 nm, ~2.89 nm, and ~2.44 nm, respectively. As the thickness of the AZO filmsincreased, the surface roughness decreased gradually. These results affect the electrical and optical properties of AZO thin films. Therefore, the thickest AZO thin films with 150 nm exhibited excellent resistivity (${\sim}7.00{\times}10^{-4}{\Omega}{\cdot}cm$), high transmittance (~83.2 %), and the best FOM ($5.71{\times}10^{-3}{\Omega}^{-1}$). AZO thin films fabricated using ALD may be used as a promising cadidate of TCO materials for optoelectronic applications.

Characteristics of Electroplated Ni Thick Film on the PN Junction Semiconductor for Beta-voltaic Battery (베타전지용 PN 접합 반도체 표면에 도금된 Ni 후막의 특성)

  • Kim, Jin Joo;Uhm, Young Rang;Park, Keun Young;Son, Kwang Jae
    • Journal of Radiation Industry
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    • v.8 no.3
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    • pp.141-146
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    • 2014
  • Nickel (Ni) electroplating was implemented by using a metal Ni powder in order to establish a $^{63}Ni$ plating condition on the PN junction semiconductor needed for production of beta-voltaic battery. PN junction semiconductors with a Ni seed layer of 500 and $1000{\AA}$ were coated with Ni at current density from 10 to $50mA\;cm^{-2}$. The surface roughness and average grain size of Ni deposits were investigated by XRD and SEM techniques. The roughness of Ni deposit was increased as the current density was increased, and decreased as the thickness of Ni seed layer was increased. The results showed that the optimum surface shape was obtained at a current density of $10mA\;cm^{-2}$ in seed layer with thickness of $500{\AA}$, $20mA\;cm^{-2}$ of $1000{\AA}$. Also, pure Ni deposit was well coated on a PN junction semiconductor without any oxide forms. Using the line width of (111) in XRD peak, the average grain size of the Ni thick firm was measured. The results showed that the average grain size was increased as the thickness of seed layer was increased.

A Modelling of magnetization reversal characteristics in magneto-optic memory system (광자기 기억장치에서의 자화반전 특성 모델링)

  • 한은실;이광형;조순철
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.19 no.10
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    • pp.1849-1860
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    • 1994
  • Domain wall dynamics in thin film of amorphous Rare Earth-Transistion Metal alloys were investigated using numerical integration of the Landau-Lifshitz-Gilbert equation. The thin film was divided into a two-dimensional square lattice ($30\times30$) of dipoles. Nearest-neighbor exchange interaction magnetic anisotropy, applied magnetic field, and demagnetiing field of interacting anisotropy, applied magnetic field, and demagnetizing field of interacting dipoles were considered. It was assumed that the film had perfect uniaxial anisotropy in the perpendicular direction and the magnetization reversal existed in the film. The time of domain wall creation and the thickness of the wall were investigated. Also the motion of domain walls under an applied field was considered. Simulation results showed that the time of domain wall creation was decreased significantly and the average velocity of domain wall was increased somewhat when the demagnetizing field was considered.

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Electrical and Optical Properties of SiO2-doped ZnO Films Prepared by Rf-magnetron Sputtering System (Rf-magnetron Sputtering 장치에 의해 제작된 SiO2가 도핑된 ZnO 박막의 전기적 및 광학적 특성)

  • Bae, Kang;Sohn, Sun-Young;Hong, Jae-Suk;Kim, Hwa-Min
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.11
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    • pp.969-973
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    • 2009
  • In this study, the electrical and optical properties of $(SiO_2)_x(ZnO)_{100-x}$ (SZO) films prepared on the coming 7059 glass substrates by using rf-magnetron sputtering method are investigated. The deposition rate becomes maximum near 3 wt.% and gradually decreases when the $SiO_2$ content further increases. The growth rates of the SZO film with $SiO_2$ content of 3 wt.% is $4\;{\AA}/s$. We found that the average transmittance of all films is over 80% in the wavelength range above 500 nm. The optical band gap were decreased from 3.52 to 3.33 eV as an increase the deposition thickness. X-ray diffraction patterns showed that the film with a relatively low $SiO_2$ content (< 4 wt.%) is amorphous. SZO film with the $SiO_2$ contents of 2 wt.% showed the resistivity of about $3.8{\times}10^{-3}\;{\Omega}{\cdot}cm$. The sheet resistance decreases with increasing the heat treatment temperature.