• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.380-380
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• 2011

ZnO nanorod (NR) arrays prepared via simple ammonia hydrothermal method exhibiting superhydrophilicity, high transmittance and antireflection. These properties result from the unique surface structure and material property of ZnO NR arrays. Highly rough surface due to ZnO NRs enhanced hydrophobicity/hydrophilicity of the films and short NRs (about 300 nm) made ZnO arrays transparent. ZnO NR films were chemically modified by dipping the sample into 5mM stearic acid/ethanol solution for 3 hours. Then the ZnO NRs became superhydrophobic surfaces, whose contact angle reached 159.2$^{\circ}$ maintaining their high transmittance. These biomimetic ZnO NR arrays can be used in diverse field, such as antifogging/self-cleaning surfaces and optical devices.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1994년도 춘계학술대회 논문집
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• pp.123-126
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• 1994

We discussed the thermal analysis for recording media with the variation of the laser pulse duration and the power and the temperature distribution for the optimized Te-based antireflection structure by using the computer calculations. If the radial diffusion of heat is negligible, we can calculate the maximum temperature at the spot center in recording layer by Simple Method, and the temperature profile considering the specific heat and the latent heat by Numerical Method. As a result, the effect of the heat sinking which acted as a loss for the hole formation can be minimized by introducing the pulse of the hole formation duration( $\tau$ ) shorter than the thermal time constant( $\tau$$\sub$D/) of dielectric layer. This requirments can be satisfied as using the dielectric thickness of the 7nd ART condition or the dielectric materials with low thermal diffusivity.

• 한국전기전자재료학회논문지
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• 제22권7호
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• pp.616-621
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• 2009

Reduction of optical losses in crystalline silicon solar cells by surface modification is one of the most important issues of silicon photovoltaics. Porous Si layers on the front surface of textured Si substrates have been investigated with the aim of improving the optical losses of the solar cells, because an anti-reflection coating(ARC) and a surface passivation can be obtained simultaneously in one process. We have demonstrated the feasibility of a very efficient porous Si ARC layer, prepared by a simple, cost effective, electrochemical etching method. Silicon p-type CZ (100) oriented wafers were textured by anisotropic etching in sodium carbonate solution. Then, the porous Si layers were formed by electrochemical etching in HF solutions. After that, the properties of porous Si in terms of morphology, structure and reflectance are summarized. The structure of porous Si layers was investigated with SEM. The formation of a nanoporous Si layer about 100nm thick on the textured silicon wafer result in a reflectance lower than 5% in the wavelength region from 500 to 900nm. Such a surface modification allows improving the Si solar cell characteristics. An efficiency of 13.4% is achieved on a monocrystalline silicon solar cell using the electrochemical technique.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2004년도 하계학술대회 논문집 C
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• pp.1737-1739
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• 2004

Diamond-like carbon (DLC) films were prepared with RF-PECVD (Plasma Enhanced Chemical Vapor Deposition) method on coming glass and silicon substrates using methane ($CH_4$) and hydrogen ($H_2$) gases. We examined the effects of $CH_4$ to $H_2$ ratios on tribological and optical properties of the DLC films. The structure and surface morphology of the films were examined using Raman spectroscopy and atomic force microscopy (AFM). The hardness of the DLC film was measured with nano-indentor. The optical properties of DLC thin film were investigated by UV/VIS spectrometer and ellipsometry. And also, solar cells were fabricated using DLC as antireflection coating before and after coating DLC on silicon substrate and compared the efficiency.

• 한국조명전기설비학회:학술대회논문집
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• 한국조명전기설비학회 2002년도 학술대회논문집
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• pp.329-334
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• 2002

This study evaporates TiO$_2$ layer thickness differently with RF sputtering method on Si Wafer(n-100). Thin film is made with the structure of Si+TiO$_2$ and Si+TiO$_2$+Al by evaporating TiN which is used as Antireflection of superintegrated semiconductor integrated circuit with Photo Catalyst. The research is performed to increase the characteristics of photon energy according to TiO$_2$ thickness and the reliability and reproducibility of TiO$_2$ thin film. Reversal of electric Permittivity values is induced by dipole polarization shown in the dielectric of thin film. Complex electric constant ($\varepsilon$$_1$, $\varepsilon$$_2$) has larger peak values as it's thickness is thinner and then it is larger according to the increase of frequency. Electric Permittivity by photon energy has large value in imaginary number and is reduced exponentially by the increase of carrier density according to that of photon energy.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.474-474
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• 2013

PDMS는 미세패턴을 위해 소프트 리소그래피 널리 활용되어질 뿐만 아니라, 재질이 투명하고 탄성과 강한 내구성을 갖고 있어 유연한 광학 및 전자소자에 이용될 수 있다. 최근에는, 이러한 PDMS를 서브파장구조(subwavelength grating structure)를 형성하거나 텍스쳐(texture)표면구조를 이용한 효과적인 반사방지막(antireflection coating)기판을 제작하여 태양전지 및 디스플레이 소자의 성능을 발전시키는 연구가 활발히 진행되고 있다. 한편, 수열합성법(hydrothermal method)이나 전기화학증착법(electrodeposition method)으로 비교적 간단한 공정을 통해서 다양한 기판위에 산화아연(ZnO) 나노막대(nanorod)를 수직정렬로 성장시킬 수 있는데, 이러한 구조는 반사방지특성의 유효 굴절률 분포(effective refractive index profile)를 갖고 있기 때문에 LED나 태양전지에 성능을 개선할 수 있다. 이에 본 연구에서는 수열합성법을 통해 성장된 수직 정렬된 산화아연 나노막대를 이용한 PDMS 표면의 미세패턴 형성하여 광학적 특성을 분석하였다. 실험을 위해, 스퍼터링을 통해서 산화아연 시드층을 형성한 후, 질산아연헥사수화물과 헥사메틸렌테트라민을 수용액에 담가두어 산화아연 나노막대를 성장시켰으며, PDMS의 베이스와 경화제의 질량비를 10：1으로 용액을 준비하여 수직 정렬된 산화아연 나노막대 표면을 casting method으로 코팅하여 열경화 처리하였다. 제작된 샘플의 형태, 구조 광특성을 관찰하기 위해서 전계방출형전자현미경, X선 회절 분석기, 분광 광도계를 이용하였다.

• 한국생산제조학회지
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• 제18권6호
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• pp.697-701
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• 2009

A simple method for the fabrication of porous nano-master for the anti-reflection effect on the transparent substrates is presented. In the conventional fabrication methods for antireflective surface, coating method using materials with low refractive index has usually been used. However, it is required to have a high cost and long processing time for mass production. In this paper, we developed a porous nano-master with anti-reflective surface for the molding stamper of the injection mold, hot embossing and UV imprinting by using the aluminum anodizing process. Through two-step anodizing and etching processes, a porous nano-master with anti-reflective surface was fabricated at the large area. Pattern size Pore diameter and inter-pore distance are about 130nm and 200nm, respectively. In order to replicate anti-reflective structure, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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• pp.85.1-85.1
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• 2010

$Cu(In,Ga)Se_2$ (CIGS) thin film solar cell is currently 19.5% higher efficiency and developing a large area technology. The structure of CIGS solar cell that make five unit layers as back contact, light absorption, buffer, front transparent conducting electrode and antireflection to make them sequentially forming. Materials and various compositions of thin film unit which also manufacture a variety method used by the physical and chemical method for CIGS solar cell. The construction and performance test of evaporator for CIGS thin film solar cell has been done. The vapor pressures were changed by using vapor flux meter. The vapor pressure were copper (Cu) $2.1{\times}10^{-7}{\sim}3.0{\times}10^{-7}$ Torr, indium (In) $8.0{\times}10^{-7}{\sim}9.0{\times}10^{-7}$ Torr, gallium (Ga) $1.4{\times}10^{-7}{\sim}2.8{\times}10^{-7}$ Torr, and selenium (Se) $2.1{\times}10^{-6}{\sim}3.2{\times}10^{-6}$ Torr, respectively. The characteristics of the CIGS thin film was investigated by using X-ray diffraction (XRD), scanning electron microscopy/energy dispersive spectroscopy (SEM/EDS) and photoluminescence (PL) spectroscopy using a He-Ne laser. In PL spectrum, temperature dependencies of PL spectra were measured at 1137 nm wavelength.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1998년도 춘계학술대회 논문집
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• pp.117-120
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• 1998

In this study, $Al_2O_3/MgO$ bilayer was prepared with Electron-beam evaporation and the properties of the film was investigated in order to improve the property of MgO film, which is used for the protection layer in PDP(P1asma Display Panel). The thickness of $Al_2O_3/MgO$ bilayer was optimized by the Matrix Theory for the fabrication of antireflection structure for 5350A wavelength. The secondary electron emission yields of as-deposited film and annealed film were measured and compared, the bilayer was considered for the applicability as PDP. XRD showed the strong (200) primary peak of MgO. The intensity of (200) peak in the film annealed at 300C was decreased. As the result of SEM analysis for MgO films and Alz03 films, it is considered that the morphology of the films were improved of roughness and it were condensed by annealing.

• Transactions on Electrical and Electronic Materials
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• 제1권4호
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• pp.11-15
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• 2000

This paper presents a process optimization of antireflection (AR) coating on crystalline Si solar cells. Theoretical and experimental investigations were performed on a double-layer AR(DLAR) coating of MgFe$_2$/GeO$_2$. We investigated GeO$_2$ films as an AR layer because they have a proper refractive index of 2.46 and demonstrate the same lattice constant as Si substrate. RF sputter grown GeO$_2$ film showed deposition temperature strong dependence. The GeO$_2$ at 400$\^{C}$ exhibited a strong (111) preferred orientation and the lowest surface roughness of 6.87 $\AA$. Refractive index of MgFe$_2$film was measured as 1.386 for the most of growth temperature. An optimized DLAR coating showed a reflectance as low as 2.04% in the wavelengths ranged from 0.4 ㎛ to 1.1 ㎛. Solar cells with a structure of MgFe$_2$/GeO$_2$/Ag/N$\^$+//p-type Si/P$\^$+//Al were investigated with the without DLAR coatings. We achieved the efficiency of solar cells greater than 15% with 3.12% improvement with DLAR coatings. Further details about MgFe$_2$,GeO$_2$ films, and cell fabrication parameters are presented in this paper.