• Transactions on Electrical and Electronic Materials
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• 제5권1호
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• pp.1-6
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• 2004

Zinc sulfide is a semiconductor with wide band gap and high refractive index and hence promising material to be used as ARC on commercial silicon solar cells. Uniform deposition of zinc sulfide (ZnS) by using chemical bath deposition (CBD) method over a large area of silicon surface is an emerging field of research because ZnS film can be used as a low cost antireflection coating (ARC). The main problem of the CBD bath process is the huge amount of precipitation that occurs during heterogeneous reaction leading to hamper the rate of deposition as well as uniformity and chemical stoichiometry of deposited film. Molar concentration of thiorea plays an important role in varying the percentage of reflectance and refractive index of as-deposited CBD ZnS film. Desirable rate of film deposition (19.6 ${\AA}$ / min), film uniformity (Std. dev. < 1.8), high value of refractive index (2.35), low reflectance (0.655) have been achieved with proper optimization of ZnS bath. Decrease in refractive index of CBD ZnS film due to high temperature treatment in air ambiance has been pointed out in this paper. Solar cells of conversion efficiency 13.8 ％ have been successfully achieved with a large area (103 mm ${\times}$ 103 mm) mono-crystalline silicon wafers by using CBD ZnS antireflection coating in this modified approach.

• 한국산학기술학회논문지
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• 제12권11호
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• pp.5172-5177
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• 2011

본 논문은 박막 실리콘 태양전지에 적용되는 반사방지 또는 고반사 코팅 기술에 관한 연구이다. 태양광 흡수율을 개선하기 위하여 박막 실리콘 태양전지의 앞면에는 반사를 줄이는 반사방지막 기술이 필요하며, 뒷면에는 반대로 반사를 높이는 고반사 기술이 필요하다. 반사방지막 기술에서 단층의 구조에서는 코팅의 두께에 따라 반사율이 틀려지고, 적절한 범위에서 두께를 제어하면 낮은 반사율을 얻을 수 있다. 대칭형태의 다층의 구조에서는 단층구조에 비해서 넓은 파장대에 걸쳐서 낮은 반사율을 얻을 수 있다. 또한 뒷면에 적용되는 고반사막 기술에서는 높은 굴절율을 갖는 매질과 낮은 굴절율을 갖는 매질을 대칭 구조로 구성하여 계산한 결과 높은 반사율을 얻을 수 있다는 것을 확인하였다.

• 한국산학기술학회논문지
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• 제13권9호
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• pp.4139-4145
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• 2012

본 논문에서는 향후 태양전지 반사방지막에 적용여부를 알기 위하여 굴절률 분포에 따른 반사방지막의 성능을 분석하였다. 기존논문에서 제시되었던 1차, 3차 및 5차 함수의 굴절률 분포를 6층 구조의 두께 180 nm 반사방지막에 적용하고 각 굴절률 분포에 대한 반사율을 계산하고 비교하였다. 또한 새로운 구배형 굴절률(graded index) 구조를 제안하였고, 제안한 구조와 기존의 1차, 3차 및 5차 함수의 반사율과 비교하였다. 그 결과로써, 굴절률 분포가 고차 함수로 갈수록 반사율이 대체적으로 감소하였고, 구배형 굴절률 분포의 경우는 짧은 파장대(500 nm ~ 700 nm 이하)에서는 1차, 3차 및 5차 함수보다 더 높은 반사율을 보였고, 긴 파장대(700 nm 이상 ~ 800 nm)에서는 더 낮은 반사율을 보였다. 따라서 긴 파장대에서는 구배형 굴절률 분포가 기존의 1차, 3차, 5차 함수인 경우보다 더 좋은 반사방지막이 될 수 있다는 것을 발견했고, 이 결과는 긴 적색 가시광선에서 적외선 영역에 적용되는 광소자 및 광필터에 적용 가능하리라 판단된다.

• 한국광학회지
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• 제6권4호
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• pp.259-265
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• 1995

국내 민수용으로 유통되고 있는 20여종의 무반사 안경렌즈들을 선정하여 광학적 특성을 분석하였다. 분광광도계를 사용하여 측정한 반사특성과 투과특성을 렌즈의 굴절력, 각 무반사층들 및 렌즈기층에 의한 영향과 연결시켜 분석하였다. 흡수단 근방에서의 겉보기 흡수스펙트럼은 기층물질에 따라 결정되며 400-700nm의 파장대역에서 대부분의 시료들의 겉보기 흡수스펙트럼과 반사스펙트럼은 강한 양의 상관관계를 보여준다. 예외적으로 기층에 의한 흡수가 큰 렌즈들은 상관관계가 약해지며 이와 같은 기층에 의한 흡수는 무반사 특성에 부정적인 효과를 가진다. 또한 국내에서 제작되는 $SiO_2/TiO_2/SiO_2/ZrO_2/Cr$ 다층박막층을 c-Si 기층위에 성장시키면서 각 단계별로 ex-situ 분광타원해석법으로 분석하여 $TiO_2$ 박막과 $ZrO_2$ 박막의 조밀도가 80% 정도에 불과하며 박막이 두꺼원 짐에 따라 박막에 수직한 방향으로 균일하지 않음을 확인하였다. 마지막으로 실시간, in-suti 측정을 바탕으로하여 엄밀한 사양이 요구되는 다층박막, 초격자박막 등을 재현성있게 성장시킬 수 있는 가능성에 대해 토의하였다.

• Transactions on Electrical and Electronic Materials
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• 제11권1호
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• pp.33-36
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• 2010

$MgF_2$ is a current material used for optical applications in the ultraviolet and deep ultraviolet range. Process variables for manufacturing $MgF_2$ thin film were established in order to clarify the optimum conditions for the growth of the thin film, dependant upon the process conditions, and then by changing a number of the vapor deposition conditions, substrate temperatures, and heat treatment conditions, the structural and optical characteristics were measured. Then, optimum process variables were thus derived. Nevertheless, modern applications still require improvement in the optical and structural quality of the deposited layers. In the present work, in order to understand the composition and microstructure of $MgF_2$, single layers grown on a slide glass substrate using an Electron beam Evaporator (KV-660), were analyzed and compared. The surface substrate temperature, having an effect on the quality of the thin film, was changed from $200^{\circ}C$ to $350^{\circ}C$ at intervals of $50^{\circ}C$. The heat treatment temperature, which also has an effect on the thin film, was changed from $200^{\circ}C$ to $400^{\circ}C$ at intervals of $50^{\circ}C$. The physical properties of the thin film were investigated at various fabrication conditions, such as the substrate temperature, the heat treatment temperature, and the heat treatment time, by X-ray diffraction, and field emission-scanning electron microscopy.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제55권12호
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• pp.565-569
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• 2006

Plasma enhanced chemical vapor deposition(PECVD) is a well established technique for the deposition of hydrogenated film of silicon nitride (SiNx:H), which is commonly used as an antireflection coating as well as passivating layer in crystalline silicon solar cell. PECVD-SiNx:H films were investigated by varying the deposition and annealing conditions to optimize for the application in silicon solar cells. By varying the gas ratio (ammonia to silane), the silicon nitride films of refractive indices 1.85 - 2.45 were obtained. The film deposited at $450^{\circ}C$ showed the best carrier lifetime through the film deposition rate was not encouraging. The film deposited with the gas ratio of 0.57 showed the best carrier lifetime after annealing at a temperature of $800^{\circ}C$. The single crystalline silicon solar cells fabricated in conventional industrial production line applying the optimized film deposition and annealing conditions on large area substrate of size $125mm{\times}125mm$ (pseudo square) was found to have the conversion efficiencies as high as 17.05 %. Low cost and high efficiency silicon solar cells fabrication sequence has also been explained in this paper.

• 한국재료학회지
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• 제26권1호
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• pp.47-53
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• 2016

Silicon nitride ($SiN_x:H$) films made by plasma enhanced chemical vapor deposition (PECVD) are generally used as antireflection layers and passivation layers on solar cells. In this study, we investigated the properties of silicon nitride ($SiN_x:H$) films made by PECVD. The passivation properties of $SiN_x:H$ are focused on by making the antireflection properties identical. To make equivalent optical properties of silicon nitride films, the refractive index and thickness of the films are fixed at 2.0 and 90 nm, respectively. This limit makes it easier to evaluate silicon nitride film as a passivation layer in realistic application situations. Next, the effects of the mixture ratio of the process gases with silane ($SiH_4$) and ammonia ($NH_3$) on the passivation qualities of silicon nitride film are evaluated. The absorption coefficient of each film was evaluated by spectrometric ellipsometry, the minority carrier lifetimes were evaluated by quasi-steady-state photo-conductance (QSSPC) measurement. The optical properties were obtained using a UV-visible spectrophotometer. The interface properties were determined by capacitance-voltage (C-V) measurement and the film components were identified by Fourier transform infrared spectroscopy (FT-IR) and Rutherford backscattering spectroscopy detection (RBS) - elastic recoil detection (ERD). In hydrogen passivation, gas ratios of 1:1 and 1:3 show the best surface passivation property among the samples.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 하계학술대회 논문집
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• pp.1039-1042
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• 2001

A method for designing antireflection (AR) and antistatic (AS) films by the use of conducting polymer as an electrically conductive transparent layer is proposed. The conducting AR film is composed of four-layer with alternating high and low refractive index layer: silicon dioxide (n=1.44) and titanium dioxide (n=2.02) prepared at low temperature by sol-gel method are used as the low and high refractive index layer, respectively. The 3,4-polyethylenedioxythiophene (PEDOT) which has the sheet resistance of 10$^4$$\Omega$/$\square$ is used as a conductive layer. Optical constant of ARAS film was measured by the spectroscopic ellipsometer and from the measured optical constants the spectral properties such as reflectance and transmittance were simulated in the visible region. The reflectance of ARAS films on glass substrate was below 0.8 %R and the transmittance was higher than 95 % in the visible wavelength (400-700 nm). The measured AR spectral properties was very similar to its simulated results.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1998년도 하계학술대회 논문집 D
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• pp.1340-1342
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• 1998

The diamond-like carbon(DLC) film, as an antireflection layer, is coated on a commerically used Ge window. DLC films are deposited by using an rf(13.56 MHz) plasma CVD. The optimal value of thickness and refractive index of DLC layer has been determined from the computer simulation. IR-transmittances of DLC-coated Ge windows are estimated by measuring FTIR spectra in the wavelength range of$ 2.5{\sim}25{\mu}m$. By coating the DLC film on one side of the Ge window, the transmittance measured at a wavelength of $10{\mu}m$ is about 60 %, while that of the bare Ge is lower than 50 %. Also, a higher transmittance up to about 90 % is obtained by coating the DLC film on both sides of the window. It may be suggested that the further improvement of the IR-transmittance can be achieved by more precisely controlling the thickness and the refractive index of DLC layer and also by adopting various muliti-layer antireflection structures.

• Macromolecular Research
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• 제16권4호
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• pp.373-378
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• 2008

A simple chemical fixation method for the fabrication of layer-by-layer (LbL) polyelectrolyte multilayer (PEM) has been developed to create a large area, highly uniform film for various applications. PEM of weak poly-electrolytes, i.e., polyallylamine hydrogen chloride (PAH) and poly(acrylic acid)(PAA), was assembled on polymer substrates such as poly(methyl methacrylate)(PMMA) and polycarbonate (PC). In the case of a weak polyelectrolyte, the fabricated thin film thickness of the polyelectrolyte multilayers was strongly dependent on the pH of the processing solution, which enabled the film thickness or optical properties to be controlled. On the other hand, the environmental stability for device application was poor. In this study, we utilized the chemical fixation method using glutaraldehyde (GA)-amine reaction in order to stabilize the polyelectrolyte multilayers. By simple treatment of GA on the PEM film, the inherent morphology was fixed and the adhesion and mechanical strength were improved. Both surface tension and FT-IR measurements supported the chemical cross-linking reaction. The surface property of the polyelectrolyte films was altered and converted from hydrophilic to hydrophobic by chemical modification. The possible application to antireflection coating on PMMA and PC was demonstrated.