• 한국광학회지
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• 제13권3호
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• pp.189-196
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• 2002

파장 50 $\AA$ 이하의 연엑스선 영역에서 사용될 평면결상형 연엑스선 분광기의 구성요소와 정렬조건을 결정하고 분광기의 분광학적 특성을 해석하였다. 평면결상형 연엑스선 분광기는 토로이드거울, 실틈, 비등간격 오목에돌이발, 연엑스선 검출기로 구성되어 있다. 토로이드거울과 홈간격이 2400 grooves/mm인 비등간격 오목에돌이발을 사용하여 공간분해된 빛띠가 단일 평면 위에 결상되도록 분광기를 구성하였다. 토로이드거울은 연엑스선 광선이 에돌이발에 비스듬하게 입사할 때 발생되는 비점 수차를 보상하기 위해 사용되었다. 파면수차 이론을 적용하여 분광기가 가지는 파장분해와 공간분해를 계산하고, 에돌이 현상에 대한 스칼라 이론을 적용하여 에돌이발의 에돌이효율을 계산하였다.

• Transactions on Electrical and Electronic Materials
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• 제7권1호
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• pp.21-25
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• 2006

In this study, liquid crystal (LC) aligning properties for homeotropic alignment on the $SiO_x$ thin film by electron beam evaporation method with electron beam system in accordance with the evaporation angles were investigated. Also, the control of pretilt angles homeotropic aligned LC on $SiO_x$ thin film as the function of the evaporation angles were studied. The uniform vertical LC alignment on the $SiO_x$ thin film surfaces with electron beam evaporation was achieved with all of the thin film angle conditions. It is considerated that the LC alignment on the $SiO_x$ thin film by electron beam evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the $SiO_x$ thin film surface created by evaporation. The values of the pretilt angles according to the evaporation angle were from about $0.7^{\circ}$ to about $3.4^{\circ}$. The highest pretilt angles of about $3.4^{\circ}$ in aligned NLC on the $SiO_x$ thin film surfaces by electron beam evaporation were measured under the condition of $45^{\circ}$. Also, good LC alignment states on the treated $SiO_x$ thin film layer by electron beam evaporation were observed at annealing temperature of $250^{\circ}C$. Consequently, the high pretilt angle and the good thermal stability of LC alignment on the $SiO_x$ thin film by electron beam evaporation can be achieved.

• 한국광학회:학술대회논문집
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• 한국광학회 1997년도 Advance Program of 14th optics andquantum Electronics conference, 1997제14 회 광학 및 양자전자 학술 발표회 논문 요약집
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• pp.111-113
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• 1997

The purpose of this paper is to propose a production flow for 155Mbps transmitter/receiver optical modules. Compact optical module packages for use as 155Mbps optical interfaces are developed by implementing a self-alignment principle for the formation of V-grooves and solder bumps. on the bases of experimental results of two hundreds of receiver/transmitter optical modules, each steps and flows of our production are developed by production efficiencies.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.1088-1091
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• 2003

We have studied liquid crystal orientation on rubbed and photoaligned polymer surfaces. The following topics will be presented; (1) visualization of nonuniformity of rubbing, (2) competition between grooves and photoalignment and (3) alignment process of 5CB evaporated on treated surfaces. Through these topics, the importance of the intermolecular liquid crystalline interaction will be emphasized.

• Journal of the Optical Society of Korea
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• 제9권1호
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• pp.1-5
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• 2005

Using tightly focused femtosecond laser pulses, we produce an optical waveguide and optical devices in transparent materials. This technique has the potential to generate not only channel waveguides, but also three-dimensional optical devices. In this paper, an optical splitter and U-grooves, which are used for fiber alignment, are simultaneously fabricated in a fused silica glass using near-IR femtosecond laser pulses. The fiber aligned optical splitter has a low insertion loss, less than 4㏈, including an intrinsic splitting loss of 3㏈ and excess loss due to the passive alignment of a single-mode fiber. Finally, we demonstrate the utility of the femtosecond laser writing technique by fabricating gratings at the surface and inside the silica glass.

• Transactions on Electrical and Electronic Materials
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• 제6권6호
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• pp.272-275
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• 2005

We studied the control of pretilt angles for homeotropic aligned nematic liquid crystal (NLC) on SiOx thin film surface by $45^{\circ}$ evaporation method with electron beam system. The uniform vertical LC alignment on. the SiOx thin film surfaces with electron beam evaporation was achieved. It is considered that the LC alignment on SiOx thin film by $45^{\circ}$ electron beam evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the SiOx thin film surface created by evaporation. The pretilt angles of about $3.5^{\circ}$ in aligned NLC on SiOx thin film surfaces by electron beam evaporation of $45^{\circ}$ were measured. Consequently, the high pretilt angles of the NLC on the SiOx thin film by $45^{\circ}$ oblique electron beam evaporation method can be achieved.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.371-371
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• 2007

In this study, liquid crystal (LC) aligning capabilities for vertical alignment on the $CeO_x$ thin film by thermal evaporation method were investigated. Also, the control of pretilt angles and thermal stabilities of the NLC treated on $CeO_x$ thin film were investgated. The uniform LC alignment on the $CeO_x$ thin film surfaces and good thermal stabilities with thermal evaporation can be achieved. It is considerated that the LC alignment on the $CeO_x$ thin film by thermal evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the $CeO_x$ thin film surface created by evaporation. In addition, it can be achieved the good electro-optical (EO) properties of the VA-LCD on $CeO_x$ thin film layer with oblique thermal evaporation.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2004년도 추계학술대회 논문집
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• pp.351-354
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• 2004

This work presents a simple and cost-effective approach for maskless fabrication of positive-tone silicon master for the replica molding of hyperfine elastomeric channel. Positive-tone silicon masters were fabricated by a maskless fabrication technique using the combination of nanoscratch by Nanoindenter ⓡ XP and XOH wet etching. Grooves were machined on a silicon surface coated with native oxide by ductile-regime nanoscratch, and they were etched in a 20 wt％ KOH solution. After the KOH etching process, positive-tone structures resulted because of the etch-mask effect of the amorphous oxide layer generated by nanoscratch. The size and shape of the positive-tone structures were controlled by varying the etching time (5, 15, 18, 20, 25, 30 min) and the normal loads (1, 5 mN) during nanoscratch. Moreover, the effects of the Berkovich tip alignment (0, 45$^{\circ}$) on the deformation behavior and etching characteristic of silicon material were investigated.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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• pp.899-902
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• 2004

The molecular reorientations and surface morphologies of rubbed films formed from atactic polystyrene (PS) samples with various molecular weights were investigated in detail. Previously unknown surface topography features were newly discovered in rubbed films, depending on molecular weights: submicroscale groove-like meandering structures composed of fine-grooves like pebbles in tens nanometers are present, oriented perpendicular to the rubbing direction. The vinyl main chains, however, were preferentially reoriented along the rubbing direction and the planes of the phenyl side groups were preferentially reoriented perpendicular to the rubbing direction with para-directions that were positioned nearly normal to the film plane. Nematic liquid crystal (LC) molecules were found to always align on the rubbed PS surfaces along the orientation direction of the submicroscale grooves generated by rubbing.

• 소성∙가공
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• 제13권4호
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• pp.326-333
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• 2004

The nanoprobe based on lithography, mainly represented by SPM based technologies, has been recognized as a potential application to fabricate the surface nanosctructures because of its operational versatility and simplicity. However, nanoprobe based on lithography itself is not suitable for mass production because it is time a consuming method and not economical for commercial applications. One solution is to fabricate a mold that will be used for mass production processes such as nanoimprint, PDMS casting, and others. The objective of this study is to fabricate the silicon stamper for PDMS casting process by a mastless fabrication technique using the combination of nano/micro machining by Nanoindenter XP and KOH wet etching. Effect of the Berkovich tip alignment on the deformation was investigated. Grooves were machined on a silicon surface, which has native oxide on it, by constant load scratch (CLS), and they were etched in KOH solutions to investigate chemical characteristics of the machined silicon surface. After the etching process, the convex structures was made because of the etch mask effect of the mechanically affected layer generated by nanoscratch. On the basis of this fact, some line patterns with convex structures were fabricated. Achieved groove and convex structures were used as a stamper for PDMS casting process.