• Title/Summary/Keyword: abrasive size

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Study on Surface Roughness due to WA-BF-Fe Grain for Internal Magnet-abrasive Finishing Apparatus of STS 304 Pipe (STS 304 파이프 내면의 자기연마법에 있어서 WA-BF-Fe 자성입자가 표면거칠기에 미치는 영향)

  • 김용수;정윤중;김희남;김순채;배재만
    • Journal of the Korean Society of Safety
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    • v.16 no.3
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    • pp.35-40
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    • 2001
  • An internal finishing process applying Magnetic Abrasive Finishing (MAF) was proposed to produce smooth inner surfaces of tubes at a high rate. Since this process uses the tube rotation system, it has been considered applicable only to tubes which are rotatable at high speeds. Here development of the stainless tube(STS 304) rotation system to extend the scope of the application of the internal finishing process applying MAF was made. By the stainless tube(STS 304) rotation system, the abrasive magnetically attracted by the poles is rotated along the inner surface of the tube by magnetic force together with fixed poles, finishing the inner surface of the tube. The main results obtained are as follows : 1) The magnet abrasive finishing minimized influence due to external force because non-contact finishing, 2) The profile of surface roughness decreased very good in 11.4m/min range because abrasive size and speed, 3) The profile of surface roughness by flux density decreased in finishing speed 28m/min, 4) The profile of surface roughness by fled rate decreased in 0.16mm/rev and 0.18mm/rev.

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Extraction of Factors Effecting Surface Roughness Using the System of Experiments in the Ultra-precision Mirror Surface Finishing (실험 계획법을 이용한 초정밀 경면 연마 가공에서 표면 거칠기에 영향을 미치는 인자의 검출)

  • 배명일;김홍배;김기수;남궁석
    • Journal of the Korean Society for Precision Engineering
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    • v.15 no.2
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    • pp.53-60
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    • 1998
  • In this study, it is experimented to find factors effecting surface roughness using the system of experiments. in the mirror surface finishing system. (1) The film feed and oscillation frequency in $40{\mu}m$ abrasive film, grinding speed in $30{\mu}m$, and machining time in $15{\mu}m$15 are the main factors effecting the surface roughness. (2) Applying the optimal finishing condition to $40{\mu}m$, $30{\mu}m$, $15{\mu}m$ abrasive finishing film in sequence, it is possible to obtian about Ra 10 nm surface roughness on SM45C workpiece. (3) Application of the system of experments to the micro abrasive grain film finishing was very effective method in the extraction of main factor and optimal condition.

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Micro Groove Cutting of Glass Using Abrasive Jet Machining (Abrsive Jet Machining을 이용한 유리의 미세 홈 가공)

  • 최종순;박경호;박동삼
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2000.11a
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    • pp.963-966
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    • 2000
  • Abrasive jet machining(AJM) process is similar to the sand blasting, and effectively removes hard and brittle materials. AJM has applied to rough working such as deburring and rough finishing. As the needs for machining of ceramics, semiconductor, electronic devices and LCD are increasing, micro AJM was developed, and became the inevitable technique to micromachining. This paper describes the performance of the micro AJM in micro groove cutting of glass. Diameter of hole and width of line in this groove cutting is 80${\mu}{\textrm}{m}$. Experimental results showed good performance in micro groove cutting in glass, but the size of machined groove was increased about 2~4${\mu}{\textrm}{m}$. therefore, this micro AJM could be effectively applied to the micro machining of semiconductor, electronic devices and LCD parts.

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A Study on the Ultra-Precision Polishing Technique for the Upper Surface of the Micro-Channel Structure (미세채널 구조물 상부의 초정밀 연마 기술 연구)

  • 강정일;이윤호;안병운;윤종학
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 2003.10a
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    • pp.313-317
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    • 2003
  • Micro-Channel ultra-precision polishing is a new technology used in magnetic field-assisted relishing. In this paper, an electromagnet or the i18 of test system was designed and manufactured. A size of magnetic abrasive is used on 25~75${\mu}{\textrm}{m}$ and for the polish a micro-channel upper part. A surface of channel which is not even is manufactured using magnetic abrasive finishing at upper surface of micro-channel. As a result, the surface roughness rose by 80% after upper surface of micro- channel was polished up 8 minutes by polishing.

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Study on Abrasive Wear Behaviour of a Carbon Fiber Composites (탄소 섬유 강화 고분자 복합재의 연삭마모 특성에 관한 연구)

  • Koh, S.W.;Yang, B.C.;Kim, H.J.;Kim, J.D.
    • Journal of Power System Engineering
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    • v.10 no.1
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    • pp.46-51
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    • 2006
  • Present study was investigated the effect of the particle of the counterface of unidirectional carbon fiber reinforced composite. The friction coefficient of composite and the specific wear rate different sliding velocity were measured for this materials. The friction track of counterface was observed by an optical microscope and scanning electron microscope. There were insignificant effects of the specific wear rate under lower Sic abrasive particle, however it showed high effect on $30{\mu}m$ abrasive particle size. There were significant effects of friction and wear behavior of the fiber direction under 0.3m/s sliding speed. Major failure mechanisms can be classified such as microfracture, plowing, microcutting, cutting and cracking.

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Influence of the Diamond Abrasive Size during Mechanical Polishing Process on the Surface Morphology of Gallium Nitride Substrate (Gallium Nitride 기판의 Mechanical Polishing시 다이아몬드 입자 크기에 따른 표면 Morphology의 변화)

  • Kim, Kyoung-Jun;Jeong, Jin-Suk;Jang, Hak-Jin;Shin, Hyun-Min;Jeong, Hae-Do
    • Journal of the Korean Society for Precision Engineering
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    • v.25 no.9
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    • pp.32-37
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    • 2008
  • Freestanding hydride vapor phase epitaxy grown GaN(Gallium Nitride) substrates subjected to various polishing methods were characterized for their surface and subsurface conditions, Although CMP(Chemical Mechanical Polishing) is one of the best approaches for reducing scratches and subsurface damages, the removal rate of Ga-polar surface in CMP is insignificant($0.1{\sim}0.3{\mu}m$/hr) as compared with that of N-polar surface, Therefore, conventional MP(Mechanical Polishing) is commonly used in the GaN substrate fabrication process, MP of (0001) surface of GaN has been demonstrated using diamond slurries with different abrasive sizes, Diamond abrasives of size ranging from 30nm to 100nm were dispersed in ethylene glycol solutions and mineral oil solutions, respectively. Significant change in the surface roughness ($R_a$ 0.15nm) and scratch-free surface were obtained by diamond slurry of 30nm in mean abrasive size dispersed in mineral oil solutions. However, MP process introduced subsurface damages confirmed by TEM (Transmission Electronic Microscope) and PL(Photo-Luminescence) analysis.

A study of size and frictional effect on the evolution of melting PartII: Twin screw extruder

  • Kim, D.S.;Lee, B.K.;Kim, H.S.;Lee, J.W.;C.G. Gogos
    • Korea-Australia Rheology Journal
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    • v.13 no.2
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    • pp.89-95
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    • 2001
  • Effects of particulate size and frictional characteristics were examined on the melting behavior of PP(polypropylene) in a twin screw extruder. Powder and pellet types of PP were used and each component was blended with PE(polyethylene) wax and clay, respectively. It was observed that small size particulates, 1.e. powder systems exhibit accelerated melting behavior; and it was also found that the abrasive auditive acts as an effective agent for fast melting of PP powder. Retardation of melting due to the reduced friction was observed in both types of PP, contrary to the result found in a batch mixer. The tendency observed in variation of torque and exit temperature was explained in terms of frictional effect and length of compacted region formed during evolution of melting.

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An Experimental Study on the Effect of Contaminated Lubricants on Wear Characteristics (오염된 윤활유가 마멸특성에 미치는 영향에 관한 실험적 연구)

  • Kim, Hae-Won;Hong, Jae-Hak
    • Journal of the Korean Society for Precision Engineering
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    • v.7 no.2
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    • pp.113-123
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    • 1990
  • To study deleterious effects of contaminants contained in lubricating systems, the effects of fine alumina particle concentration and size on the critical failure load, friction and wear characteristic were examined on boundary lubrication condition using the four ball machine. The following conclusions are deduced: The abrasive is found to cause a transition from mild wear to severe wear at less severe conditions than with clean oil. In mild wear region the friction and wear increase with particle size and concentration, but in severe wear region do not exhibit any definite trend. In relation to film thinckness there is a threshold of particle size beyond which the failure load no longer decreases with particle size.

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Variation of abrasive feed rate with abrasive injection waterjet system process parameters (연마재 투입형 워터젯 시스템의 공정 변수에 따른 연마재 투입량 변화)

  • Joo, Gun-Wook;Oh, Tae-Min;Kim, Hak-Sung;Cho, Gye-Chun
    • Journal of Korean Tunnelling and Underground Space Association
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    • v.17 no.2
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    • pp.141-151
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    • 2015
  • A new rock excavation method using an abrasive injection waterjet system has been developed to enhance the efficiency and reduce the vibration of tunnel excavation. The abrasive feed rate is an important factor for the cutting performance and the economical efficiency of waterjet-based excavation. In this study, various experiments were performed to explore the effects of major process parameters for both the abrasive feed rate and the suction pressure occurring inside the mixing chamber when the abrasives are inhaled. Experimental results reveal that the abrasive feed rate is affected by geometry parameters (abrasive pipe height, length, and tortuosity), abrasive parameters (abrasive particle size), and jet energy parameters (water pressure and water flow rate). In addition, the relation between the cutting performance and the abrasive feed rate was discussed on the basis of the results of an experimental study. The cutting performance can be maximized when the abrasive feed rate is controlled appropriately via careful management of major process parameters.

A study on the recycle of reused slurry abrasives (CMP 폐슬러리내의 필터링된 연마 입자 재활용에 관한 연구)

  • Kim, Gi-Uk;Seo, Yong-Jin;Park, Sung-Woo;Jeong, So-Young;Kim, Chul-Bok
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07a
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    • pp.50-53
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    • 2003
  • CMP (chemical mechanical polishing) process remained to solve several problems in deep sub-micron integrated circuit manufacturing process. especially consumables (polishing pad, backing film, slurry, pad conditioner), one of the most important components in the CMP system is the slurry. Among the composition of slurries (buffer solution, bulk solution, abrasive particle, oxidizer, inhibitor, suspension, antifoaming agent, dispersion agent), the abrasive particles are important in determining polish rate and planarization ability of a CMP process. However, the cost of abrasives is still very high. So, in order to reduce the high COO (cost of ownership) and COC (cost of consumables) in this paper, we have collected the silica abrasive powders by filtering after subsequent CMP process for the purpose of abrasive particle recycling. And then, we have studied the possibility of recycle of reused silica abrasive through the analysis of particle size and hardness. Also, we annealed the collected abrasive powders to promote the mechanical strength of reduced abrasion force. Finally, we compared the CMP characteristics between self-developed KOH-based silica abrasive slurry and original slurry. As our experimental results, we obtained the comparable removal rate and good planarity with commercial products. Consequently, we can expect the saving of high cost slurry.

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