• Title/Summary/Keyword: ZnO photoluminescence

Search Result 392, Processing Time 0.017 seconds

Effect of Surfactants on ZnO Synthesis by Hydrothermal Method and Photocatalytic Properties (계면활성제 첨가에 의한 산화아연의 수열합성과 광촉매 특성)

  • Hyeon, Hye-Hyeon;Lee, Dong-Kyu
    • Journal of the Korean Applied Science and Technology
    • /
    • v.34 no.1
    • /
    • pp.50-57
    • /
    • 2017
  • Zinc oxide is, one of metal oxide semiconductor, harmless to human and environment-friendly. It has excellent chemical and thermal stability properties. Wurtzite-zinc oxide is a large band gap energy of 3.37 eV and high exciton binding energy of 60 meV. It can be applied to various fields, such as solar cells, degradation of the dye waste, the gas sensor. The photocatalytic activity of zinc oxide is varied according to the particle shape and change of crystallinity. Therefore, It is very important to specify the additives and the experimental variables. In this study, the zinc oxide were synthesized by using a microwave assisted hydrothermal synthesis. The precursor was used as the zinc nitrate, the pH value was controlled as 11 by NaOH. Surfactants are the ethanolamine, cetyltrimethylammonium bromide, sodium dodecyl sulfate, sorbitan monooleate was added by changing the concentration. The composite particles had the shape of a star-like, curcular cone, seed shape, flake-sphere. Physical and chemical properties of the obtained zinc oxide was characterized using x-ray diffractometer, field emission scanning electron microscopy, thermogravimetric analysis and optical properties was characterized using UV-visible spectroscopy, photoluminescence and raman spectroscopy.

Electro-Optical Properties of AZO Thin Films with Deposition & Heat treatment Conditions (AZO 박막의 증착 및 열처리 조건에 따른 전기·광학적 특성)

  • Yeon, Eung-Beom;Lee, Taek-Yong;Kim, Seon-Tai;Lim, Sang-Chul
    • Korean Journal of Materials Research
    • /
    • v.30 no.10
    • /
    • pp.558-565
    • /
    • 2020
  • AZO thin films are grown on a p-Si(111) substrate by RF magnetron sputtering. The characteristics of various thicknesses and heat treatment conditions are investigated by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Hall effect and room-temperature photoluminescence (PL) measurements. The substrate temperature and the RF power during growth are kept constant at 400 ℃ and 200 W, respectively. AZO films are grown with a preferred orientation along the c-axis. As the thickness and the heat treatment temperature increases, the length of the c-axis decreases as Al3+ ions of relatively small ion radius are substituted for Zn2+ ions. At room temperature, the PL spectrum is separated into an NBE emission peak around 3.2 eV and a violet regions peak around 2.95 eV with increasing thickness, and the PL emission peak of 300 nm is red-shifted with increasing annealing temperature. In the XPS measurement, the peak intensity of Al2p and Oll increases with increasing annealing temperature. The AZO thin film of 100 nm thickness shows values of 6.5 × 1019 cm-3 of carrier concentration, 8.4 cm-2/V·s of mobility and 1.2 × 10-2 Ω·cm electrical resistivity. As the thickness of the thin film increases, the carrier concentration and the mobility increase, resulting in the decrease of resistivity. With the carrier concentration, mobility decreases when the heat treatment temperature increases more than 500 ℃.