• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2009년도 추계학술대회 논문집
• /
• pp.127-127
• /
• 2009

The most important part of the fabrication solar cells is the anti-reflection coating when excludes the kinds of silicon substrates (crystalline, polycrystalline, or amorphous), patterns and materials of electrodes. Anti-reflection coatings reduce the reflection of sunlight and at last increase the intensity of radiation to inside of solar cells. So, we can obtain increase of solar cell efficiency about 10% using anti-reflection coating. There are many kinds of anti-reflection film for solar cell, such as SiN, $SiO_2$, a-Si, and so on. And, they have two functions, anti-reflection and passivation. However such materials could not perfectly prevent reflection. So, in this work, we investigated the anti-reflection coating with the columnar structure ZnO thin film. We synthesized columnar structure ZnO film on glass substrates. The ZnO films were synthesized using a RF magnetron sputtering system with a pure (99.95%) ZnO target at room temperature. The anti-reflection coating layer was sputtered by argon and oxygen gases. The angle of target and substrate measures 0, 20, 40, 60 degrees, the working pressure 10 mtorr and the 250 W of RF power during 40 minutes. The confirm the growth mechanism of ZnO on columnar structure, the anti-reflection coating layer was observed by field emission scanning electron microscopy (FE-SEM). The optical trends were observed by UV-vis and Elleso meter.

• 한국전기전자재료학회논문지
• /
• 제29권12호
• /
• pp.841-846
• /
• 2016

ZnO nanorods were grown on $SiO_2$ coated Si wafers and glass by the hydrothermal method. The structural and optical properties variation of ZnO nanorods as a function of growing time was studied. ~10 nm-thick ZnO thin films deposited on substrates by rf magnetron sputtering were employed as seed layers. Zinc nitrate hexahydrate (0.05 M) and hexamethylenetetramine (0.05 M) mixed in DI water were used as a reaction solution. ZnO nanorods were respectively grown for 30 min, 1 h, 2 h, 3 h, and 4 h by maintaining the reactor at $90^{\circ}C$. Crystallinity of ZnO nanorods was analyzed by X-ray diffraction, and the morphology of nanorods was observed by a field emission scanning electron microscope. Transmittance and absorbance were measured by a UV-Vis spectrophotometer, and energy band gap and urbach energy were obtained from the data. Photoluminescence measurements were carried out using Nd-Yag laser (266 nm).

• 한국전기전자재료학회논문지
• /
• 제26권3호
• /
• pp.177-182
• /
• 2013

Transparent thin film transistors (TTFT) were fabricated on $N^+$ Si wafers. $SiO_2$, $Si_3N_4/SiO_2$ and $Al_2O_3/SiO_2$ grown on the wafers were used as gate insulators. The rf magnetron sputtered zinc tin oxide (ZTO) films were adopted as active layers. $N^+$ Si wafers were wet-oxidized to grow $SiO_2$. $Si_3N_4$ and $Al_2O_3$ films were deposited on the $SiO_2$ by plasma enhanced chemical vapor deposition (PECVD) and atomic layer deposition (ALD), respectively. The mobility, $I_{on}/I_{off}$ and subthreshold swing (SS) were obtained from the transfer characteristics of TTFTs. The properties of gate insulators were analyzed by comparing the characteristics of TTFTs. The property variation of the ZTO TTFTs with time were observed.

• E2M - 전기 전자와 첨단 소재
• /
• 제8권4호
• /
• pp.400-405
• /
• 1995

ZnO films have been grown easily with the conventional thermal evaporation method on SiO$\_$2/ coated Si wafers. Anhydrous zinc acetate has been used as evaporation source. Zinc-acetate was directly heated in the laboratory-made brass boat. Zinc-acetate was sublimed at the boat temperature of about 220.deg. C. The substrates were heated to 600.deg. C with home made tantalium heater. Oxygen has been flowed into the deposition chamber to change the partial pressure of oxygen. X-ray diffraction patterns showed all the films to be amorphous. The films deposited at high oxygen pressure exhibit higher resistivity than films at low pressure. Energy dispersive spectroscopy(EDS) and rutherford backscattering spectrometry(RBS) were conducted on the films to reveal the composition of the ZnO films.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2010년도 하계학술대회 논문집
• /
• pp.259-259
• /
• 2010

교류 전기장에 의해 배열된 ZnO 나노선 기반의 광다이오드를 제작하고 자외선 광특성을 조사하였다. ZnO 나노선은 dielectrophoresis (DEP) force와 토크 (T)에 의하여 두 전극사이에 배열되며, silicon (Si)나노선과 접합을 하여 p-n 접합을 형성한다. 형성된 p-n 접합은 정류작용을 하는 다이오드 특성을 보이며, 자외선 입사시 전류 점멸비 (on/off ratio) $10^1{\sim}10^2$을 보이는 광다이오드(photodiode)로서 동작한다.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2010년도 하계학술대회 논문집
• /
• pp.218-218
• /
• 2010

본 연구에서는 투명 전극 대체 물질로써 유망한 ZnO의 전기적 특성 향상을 위하여 IV족 원소인 Si을 1, 3, 5 wt% 첨가하여 SZO 박막을 제작하여 dopant의 앙, 온도 변화에 따른 전기적, 광학적, 구조적 특성을 분석하였다. Rf-magnetron sputtering system을 이용하여 slide glass위에 증착 하였으며 $100{\sim}500^{\circ}C$ 온도 변화를 주었다. 결정성 분석을 위한 XRD 분석 결과 온도 증가에 따라 (002) peak의 세기가 증가하며, Si 첨가량과 관계없이 동일한 2 theta에서 peak가 관측되었다. 미세 구조 분석 결과 입자 크기 또한 온도 증가에 따라 증가함을 확인하였으며, 박막 두께는 대략 300nm로 확인하였다. 모든 SZO 박막은 가시광선 영역에서 80% 이상의 투과율을 보였으며 PL 분석 결과 Si 첨가량과 관계없이 동일한 스펙트럼을 가지며 380 nm, 540 nm 근처에서 peak를 확인하였다. 최소 비저항 값은 5SZO 막에서 $2.44{\times}10^{-3}\;{\Omega}cm^{-1}$을 보였다.

• 한국재료학회지
• /
• 제21권6호
• /
• pp.341-346
• /
• 2011

In this study, we inserted a Zn buffer layer into a AZO/p-type a-si:H layer interface in order to lower the contact resistance of the interface. For the Zn layer, the deposition was conducted at 5 nm, 7 nm and 10 nm using the rf-magnetron sputtering method. The results were compared to that of the AZO film to discuss the possibility of the Zn layer being used as a transparent conductive oxide thin film for application in the silicon heterojunction solar cell. We used the rf-magnetron sputtering method to fabricate Al 2 wt.% of Al-doped ZnO (AZO) film as a transparent conductive oxide (TCO). We analyzed the electro-optical properties of the ZnO as well as the interface properties of the AZO/p-type a-Si:H layer. After inserting a buffer layer into the AZO/p-type a-Si:H layers to enhance the interface properties, we measured the contact resistance of the layers using a CTLM (circular transmission line model) pattern, the depth profile of the layers using AES (auger electron spectroscopy), and the changes in the properties of the AZO thin film through heat treatment. We investigated the effects of the interface properties of the AZO/p-type a-Si:H layer on the characteristics of silicon heterojunction solar cells and the way to improve the interface properties. When depositing AZO thin film on a-Si layer, oxygen atoms are diffused from the AZO thin film towards the a-Si layer. Thus, the characteristics of the solar cells deteriorate due to the created oxide film. While a diffusion of Zn occurs toward the a-Si in the case of AZO used as TCO, the diffusion of In occurs toward a-Si in the case of ITO used as TCO.

• 한국세라믹학회지
• /
• 제52권3호
• /
• pp.197-203
• /
• 2015

The colorization of $Zn_2SiO_4$ crystal glazes was investigated by adding nucleating seeds with various coloring agents. The addition of color fixing agents such as $Fe_2O_3$, $MnO_2$, and NiO with seeds caused changes in the colors of glazes. The crystallinity and crystal size were dependent on glaze composition and firing schedules. By controlling coloring agents and firing schedules, it was possible to create various colors and sizes of crystals in a zinc-based crystalline glaze.

• 한국반도체및디스플레이장비학회:학술대회논문집
• /
• 한국반도체및디스플레이장비학회 2003년도 추계학술대회 발표 논문집
• /
• pp.54-58
• /
• 2003

본 연구에서는 $SiO_2/Si$ 기판 위에 $1.1\mu\textrm{m}$ 두께의 ZRO 압전층을 다양한 조건 하에서 증착하고, 그 특성을 분석하고, film bulk acoustic wave resonator 소자에 적용하였다. 증착조건으로 $Ar/O_2$ 유량비를 25-75 %로 변화시켰으며, working pressure는 3~15 mtorr, RF power는 213~300 W로 변화시켜가며 실험을 하였다. 증착된 ZnO 박막은 XRD (X-ray diffractomter)와 SEM (scanning electron microscopy)을 통해 특성이 분석되었다. LFE모드의 BAW 공진기는 $50\times50\mu\textrm{m}^2$ 공진면적을 가지며, $W/SiO_2$의 5층 Bragg reflector와 상하부 전극으로 $1800{\AA}$의 Al-3% Cu, 그리고 $1.4\mu\textrm{m}$ 두께의 ZnO 압전박막으로 구성되었다. 2.128-2.151 GHz 주파수 사이에서 공진이 일어났으며, Q factor는 400으로 측정되었다.

• Bulletin of the Korean Chemical Society
• /
• 제31권12호
• /
• pp.3723-3729
• /
• 2010

We investigated the high-excitation voltage cathodoluminescence (CL) performance of blue light-emitting (ZnS:Ag,Al,Cl) and green light-emitting (ZnS:Cu,Al) phosphors coated with metal oxides ($SiO_2$, $Al_2O_3$, and MgO). Hydrolysis of the metal oxide precursors tetraethoxysilane, aluminum isopropoxide, and magnesium nitrate, with subsequent heat annealing at $400^{\circ}C$, produced $SiO_2$ nanoparticles, an $Al_2O_3$ thin film, and MgO scale-type film, respectively, on the surface of the phosphors. Effects of the phosphor surface coatings on CL intensities and aging behavior of the phosphors were assessed using an accelerating voltage of 12 kV. The MgO thick film coverage exhibited less reduction in initial CL intensity and was most effective in improving aging degradation. Phosphors treated with a low concentration of magnesium nitrate maintained their initial CL intensities without aging degradation for 2000 s. In contrast, the $SiO_2$ and the $Al_2O_3$ coverages were ineffective in improving aging degradation.